• Title/Summary/Keyword: Plasma-UV Process

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Removal of Rhodamine B Dye Using a Water Plasma Process (수중 플라즈마 공정을 이용한 Rhodamine B 염료의 제거)

  • Kim, Dong-Seog;Park, Young-Seek
    • Journal of Environmental Health Sciences
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    • v.37 no.3
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    • pp.218-225
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    • 2011
  • Objectives: In this paper, a dielectric barrier discharge (DBD) plasma reactor was investigated for degrading the dye Rhodamine B (RhB) in aqueous solutions. Methods: The DBD plasma reactor system in this study consisted of a plasma component [titanium discharge (inner), ground (outer) electrode and quartz dielectric tube], power source, and gas supply. The effects of various parameters such as first voltage (input power), gas flow rate, second voltage (output power), conductivity and pH were investigated. Results: Experimental results showed that a 99% aqueous solution of 20 mg/l Rhodamine B is decolorized following an eleven minute plasma treatment. When comparing the performance of electrolysis and plasma treatment, the RhB degradation of the plasma process was higher that of the electrolysis. The optimum first voltage and air flow rate were 160 V (voltage of trans is 15 kV) and 3 l/min, respectively. With increased second voltage (4 kV to 15 kV), RhB degradation was increased. The higher the pH and the lower conductivity, the more Rhodamine B degradation was observed. Conclusions: OH radical generation of dielectric plasma process was identified by degradation of N, N-dimethyl-4-nitrosoaniline (RNO, indicator of OH radical generation). It was observed that the effect of UV light, which was generated as streamer discharge, on Rhodamine B degradation was not high. Rhodamine B removal was influenced by real second voltage regardless of initial first and second voltage. The effects of pH and conductivity were not high on the Rhodamine B degradation.

Inactivation of Sewage Microorganisms using Multi-Plasma Process (멀티 플라즈마 공정을 이용한 하수 미생물의 불활성화)

  • Kim, Dong-Seog;Park, Young-Seek
    • Journal of Environmental Science International
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    • v.23 no.5
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    • pp.985-993
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    • 2014
  • For the field application of dielectric barrier discharge plasma reactor, a multi-plasma reactor was investigated for the inactivation of microorganisms in sewage. We also considered the possibility of degradation of non-biodegradable matter ($UV_{254}$) and total organic carbon (TOC) in sewage. The multi-plasma reactor in this study was divided into high voltage neon transformers, gas supply unit and three plasma modules (consist of discharge, ground electrode and quartz dielectric tube). The experimental results showed that the inactivation of microorganisms with treated water type ranked in the following order: distilled water > synthetic sewage effluent >> real sewage effluent. The dissolved various components in the real sewage effluent highly influenced the performance of the inactivation of microorganisms. After continuous plasma treatment for 10 min at 180 V, residual microorganisms appeared below 2 log and $UV_{254}$ absorbance (showing a non-biodegradable substance in water) and TOC removal rate were 27.5% and 8.5%, respectively. Therefore, when the sewage effluent is treated with plasma, it can be expected the inactivation of microorganisms and additional improvement of water quality. It was observed that the $NH_4{^+}$-N and $PO{_4}^{3-}$-P concentrations of sewage was kept at the constant plasma discharging for 30 min. On the other hand, $NO_3{^-}$-N concentration was increased with proceeding of the plasma discharge.

Fabrication and performance evaluation of ultraviolet photodetector based on organic /inorganic heterojunction

  • Abdel-Khalek, H.;El-Samahi, M.I.;Salam, Mohamed Abd-El;El-Mahalawy, Ahmed M.
    • Current Applied Physics
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    • v.18 no.12
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    • pp.1496-1506
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    • 2018
  • Organic/inorganic ultraviolet photodetector was fabricated using thermal evaporation technique. Organic/inorganic heterojunction based on thermally evaporated copper (II) acetylacetonate thin film of thickness 200 nm deposited on an n-type silicon substrate is introduced. I-V characteristics of the fabricated heterojunction were investigated under UV illumination of intensity $65mW/cm^2$. The diode parameters such as ideality factor, n, barrier height, ${\Phi}_B$, and reverse saturation current, $I_s$, were determined using thermionic emission theory. The series resistance of the fabricated diode was determined using modified Nord's method. The estimated values of series resistance and barrier height of the diode were about $0.33K{\Omega}$ and 0.72 eV, respectively. The fabricated photodetector exhibited a responsivity and specific detectivity about 9 mA/W and $4.6{\times}10^9$ Jones, respectively. The response behavior of the fabricated photodetector was analyzed through ON-OFF switching behavior. The estimated values of rise and fall time of the present architecture under UV illumination were about 199 ms and 154 ms, respectively. Finally, enhancing the photoresponsivity of the fabricated photodetector, post-deposition plasma treatment process was employed. A remarkable modification of the device performance was noticed as a result of plasma treatment. These modifications are representative in a decrease of series resistance and an increase of photoresponsivity and specific detectivity. The process of plasma treatment achieved an increment of external quantum efficiency from 5.53% to 8.34% at -3.5 V under UV illumination.

Theoreitica1 analysis of plasma processes in discharge excited KrF laser (방전어기 KrF 레이저의 프라즈마 프로세서 해석)

  • Choi, Boo-Yeon;Lee, Choo-His
    • Proceedings of the KIEE Conference
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    • 1989.11a
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    • pp.505-508
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    • 1989
  • A computer simulation code of UV preionized discharge KrF laser is developed, including time dependent circuit equations, boltzmann equations, and plasma kinetic equations for various atomic and molecular species. Rate constants for electron collision processes are calculated with a boltzmann equations as a function of E/N. In this study, we studied mainly the $KrF^*$ formation process, relaxation process, and the 248nm absorption process as a function of charging voltage.

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Development of UV-curable paste for micro mold transfer process of barrier ribs of PDPs

  • Kim, Yoo-Seong;Koh, Tae-geum;Kim, Yong-Seog
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.917-920
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    • 2006
  • In an attempt to reduce processing cost and to improve resolution of PDPs, micro mold transfer processing route for barrier ribs of plasma display panel was developed. In this study, the parameters that may cause defects during the process were identified, which include the shrinkage during UV curing process, stress due to evaporation of organic components, and sintering shrinkage. Considering such parameters, UV curable paste was developed and barrier ribs of PDPs were successfully processed via the process. In addition, the process was successfully applied for the processing of barrier ribs with embedded counter electrodes.

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The Study on the Humic Acid Removal using Underwater Plasma Discharge (수중 방전을 이용한 휴믹산 제거)

  • Hong, Eunjung;Chung, Paulgene;Ryu, Seungmin;Park, Junseuk;Yoo, Seungryul;Lho, Taihyeop
    • Journal of Korean Society on Water Environment
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    • v.28 no.3
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    • pp.367-374
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    • 2012
  • A flotation process has a shorter processing time and needs less space than a sedimentation process. Dissolved air flotation process (DAF) is an efficient flotation method and used in a conventional wastewater treatment process. However, DAF requires the circulation of water containing compressed air and requires expensive installation and operation cost. Plasma Air Flotation (PAF) process is able to float flocs by micro bubbles generated from underwater plasma without the circulation of bubbly water and additional saturators. Therefore, PAF can be an alternative solution overcoming economic barriers. In this study, Humic acid removal efficiency by PAF process was compared with that of sedimentation process. 44.67% and 87.3% reduction rate based on UV 254 absorbance has been measured in sedimentation and PAF respectively. In particular, PAF in the flocculation zone can dramatically remove humic acid from water. In flocculation zone, PAF can separate organic matters but sedimentation cannot.

Removal Characteristics of Toluene by the Combined Plasma/Photocatalyst System (플라즈마/광촉매 결합시스템에 의한 톨루엔 제거특성)

  • Yoa, S.J.;Heo, Y.S.
    • Journal of Power System Engineering
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    • v.11 no.2
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    • pp.64-71
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    • 2007
  • The main purpose of this study is to analyze the characteristics of toluene removal by plasma, photocatalyst, and plasma/photocatalyst system with the major parameters such as flow rate, inlet toluene concentration and applied voltage, etc., experimentally. In the combined plasma/photocatalyst process, rates of toluene conversion are represented as 99% at flow rate 250, 500 mL/min while, below 97% at flow rate 1000 mL/min due to the low residence time(reaction time) at the same applied voltage 4173 voltage and toluene inlet concentration 50 ppm. The intermediate products are detected by GC/MS analysis showing the small amounts of benzoic acid, benzyl alcohol and residual ozone concentration $0.04{\sim}0.05$ ppm generated by plasma process in the present system.

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Processing of Barrier Ribs of PDP Using an UV-curable Paste (광경화성 페이스트를 이용한 PDP 격벽 형성 연구)

  • Kim Yoo-Seong;Koh Tae-Gum;Kim Yong-Seog
    • Journal of Powder Materials
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    • v.13 no.3 s.56
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    • pp.211-216
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    • 2006
  • In an attempt to reduce processing cost and to improve resolution of PDPs, micro mold transfer processing route for barrier ribs of plasma display panel was attempted. In this study, the parameters that may cause defects during the process were identified, which include the shrinkage during UV curing process, stress due to evaporation of organic components, and sintering shrinkage. Considering such parameters, UV curable paste was developed and barrier ribs of PDPs were successfully processed via the process. This work demonstrated the possibility of build-up route in manufacturing barrier ribs of PDP.

$NO_x$ Sensing Characteristic of $TiO_2$ Thin Film Deposited by R.F Magnetron Sputtering (R.F 마그네트론 스퍼트링으로 작성된 $TiO_2$박막의 $NO_x$ 감지 특성)

  • 고희석;박재윤;박상현
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.51 no.12
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    • pp.567-572
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    • 2002
  • In these days, diesel vehicle or power plant emits $NO_X\; and SO_2$ which cause air pollution like acid-rain, ozone layer destroy and optical smoke, therefore there are many kinds of methods considered for removing them such as SCR, catalyst, plasma process, and plasma-catalyst hybrid process. T$TiO_2$ is commonly used as catalyst to remove $NO_X$ gas because it have very excellent chemical characteristic as photo catalyst. In this paper, $NO_X$ sensing characteristic of $TiO_2$ thin film deposited by R.F Magnetron sputtering is investigated. A finger shaped electrode on $Al_2$O$_3$ substrate is designed and $TiO_2$ is deposited on the electrode by the magnetron sputtering deposition system. Chemical composition of the deposited $TiO_2$ thin film is $TiO_{1.9}$ by RBS analysis. When the UV is irradiated on it with flowing air, capacitance of $TiO_2$ thin film increases, however, when NO gas is put into the system with air, it immediately decreases because of photo chemical reaction. and it monotonously decreases with increasing NO concentration.

Degradation of synthetic dye in water by solution plasma process

  • Panomsuwan, Gasidit;Morishita, Tetsunori;Kang, Jun;Rujiravanit, Ratana;Ueno, Tomonaga;Saito, Nagahiro
    • Journal of Advanced Marine Engineering and Technology
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    • v.40 no.10
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    • pp.888-893
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    • 2016
  • In this study, the solution plasma process was utilized with the aim of degrading synthetic dyes in water at atmospheric pressure. The experiments were conducted in a batch-type reactor consisting of a symmetric wire-wire electrode configuration with rhodamine B (RhB) as the target synthetic dye. The effects of the plasma treatment time and initial dye concentration on the RhB degradation were investigated by monitoring the change in absorbance of RhB solutions. The RhB solutions turned lighter in color and finally colorless with prolonged plasma treatment time, indicating the destruction of dye molecules. The RhB solutions were found to have degraded, following the first-order kinetic process. However, for high initial RhB concentrations, another kinetic process or factor seems to play a dominant role at the initial degradation stage. The fitted first-order rate constant decreased as the initial concentration increased. This result suggests that the degradation behavior and kinetic process of the RhB solution strongly depends on its initial concentration. The RhB degradation is considered to be due to a combination of factors, including the formation of chemically oxidative species, as well as the emission of intense UV radiation and high-energy electrons from the plasma. We believe that the solution plasma process may prove to be an effective and environment-friendly method for the degradation or remediation of synthetic dye in wastewater.