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$NO_x$ Sensing Characteristic of $TiO_2$ Thin Film Deposited by R.F Magnetron Sputtering  

고희석 (경남대학 전기공학과)
박재윤 (경남대학 전기공학과)
박상현 (경남대학 전기공학과)
Publication Information
The Transactions of the Korean Institute of Electrical Engineers C / v.51, no.12, 2002 , pp. 567-572 More about this Journal
Abstract
In these days, diesel vehicle or power plant emits $NO_X\; and SO_2$ which cause air pollution like acid-rain, ozone layer destroy and optical smoke, therefore there are many kinds of methods considered for removing them such as SCR, catalyst, plasma process, and plasma-catalyst hybrid process. T$TiO_2$ is commonly used as catalyst to remove $NO_X$ gas because it have very excellent chemical characteristic as photo catalyst. In this paper, $NO_X$ sensing characteristic of $TiO_2$ thin film deposited by R.F Magnetron sputtering is investigated. A finger shaped electrode on $Al_2$O$_3$ substrate is designed and $TiO_2$ is deposited on the electrode by the magnetron sputtering deposition system. Chemical composition of the deposited $TiO_2$ thin film is $TiO_{1.9}$ by RBS analysis. When the UV is irradiated on it with flowing air, capacitance of $TiO_2$ thin film increases, however, when NO gas is put into the system with air, it immediately decreases because of photo chemical reaction. and it monotonously decreases with increasing NO concentration.
Keywords
$TiO_2; NO_X$; Plasma-catalyst; UV(ultraviolet);
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
연도 인용수 순위
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