• Title/Summary/Keyword: Plasma surface

Search Result 3,419, Processing Time 0.03 seconds

Improvement in Interfacial Performances of Silicone Rubber by Oxygen Plasma Treatment

  • Lee, Ki-Taek;Seo, Yu-Jin;Huh, Chang-Su
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2005.07a
    • /
    • pp.232-233
    • /
    • 2005
  • The Surface of semi-conductive silicone rubber was treated by oxygen plasma to improve adhesion and electric performance in joints between insulating and semi-conductive silicone materials. Surface characterizations were assessed using contact angle measurement and Fourier transform infrared spectroscope (FTIR). Adhesion level was understood from T-peel tests between plasma treated semi-conductive and insulating material. Electrical breakdown strength was measured to understand the charge of electrical performance. From the results, the oxygen plasma treatment produces a significant increase in function group of containing oxygen which can be mainly ascribed to the creation of carbonyl groups on the silicone surface from the strength were improved. Therefore it is concluded then plasma treatment leads to decrease voids originating form poor adhesive, and the improve the adhesion in silicone interface. So we could obtain higher electrical design level of silicone material used for electrical apparatus using oxygen plasma treatment.

  • PDF

Surface modification of polypropylene membrane to improve antifouling characteristics in a submerged membrane-bioreactor: Ar plasma treatment

  • Zhou, Jin;Li, Wei;Gu, Jia-Shan;Yu, Hai-Yin
    • Membrane and Water Treatment
    • /
    • v.1 no.1
    • /
    • pp.83-92
    • /
    • 2010
  • To improve the antifouling characteristics of polypropylene hollow fiber microporous membranes in a submerged membrane-bioreactor for wastewater treatment, the surface-modification was conducted by Ar plasma treatment. Surface hydrophilicity was assessed by water contact angle measurements. The advancing and receding water contact angles reduced after the surface modification, and hysteresis between the advancing and receding water contact angles was enlarged after Ar plasma treatment due to the increased surface roughness after surface plasma treatment. After continuous operation in a submerged membrane-bioreactor for about 55 h, the flux recovery after water cleaning and the flux ratio after fouling were improved by 20.0 and 143.0%, while the reduction of flux was reduced by 28.6% for the surface modified membrane after 1 min Ar plasma treatment, compared to those of the unmodified membrane. Morphological observations showed that the mean membrane pore size after Ar plasma treatment reduced as a result of the deposition of the etched species; after it was used in the submerged membrane-bioreactor, the further decline of the mean membrane pore size was caused by the deposition of foulants. X-ray photoelectron spectroscopy and infrared spectroscopy confirmed that proteins and polysaccharide-like substances were the main foulants in the precipitate.

Infinite Selectivity Etching Process of Silicon Nitride to ArF PR Using Dual-frequency $CH_2F_2/H_2/Ar$ Capacitively Coupled Plasmas (Dual-frequency $CH_2F_2/H_2/Ar$ capacitively coupled plasma를 이용한 실리콘질화물과 ArF PR의 무한 선택비 식각 공정)

  • Park, Chang-Ki;Lee, Chun-Hee;Kim, Hui-Tae;Lee, Nae-Eung
    • Journal of Surface Science and Engineering
    • /
    • v.39 no.3
    • /
    • pp.137-141
    • /
    • 2006
  • Process window for infinite etch selectivity of silicon nitride $(Si_3N_4)$ layers to ArF photoresist (PR) was investigated in dual frequency superimposed capacitive coupled plasma (DFS-CCP) by varying the process parameters such as low frequency power $(P_{LF})$, $CH_2F_2$ and $H_2$ flow rate in $CH_2F_2/H_2/Ar$ plasma. It was found that infinite etch selectivities of $Si_3N_4$ layers to the ArF PR on both blanket and patterned wafers can be obtained for certain gas flow conditions. The etch selectivity was increased to the infinite values as the $CH_2F_2$ flow rate increases, while it was decreased from the infinite etch selectivity as the $H_2$ flow rate increased. The preferential chemical reaction of the hydrogen with the carbon in the polymer film and the nitrogen on the $Si_3N_4$ surface leading to the formation of HCN etch by-products results in a thinner steady-state polymer and, in turn, to continuous $Si_3N_4$ etching, due to enhanced $SiF_4$ formation, while the polymer was deposited on the ArF photoresist surface.

Effects of Low Pressure and Atmospheric Pressure Plasma Treatment on Contact Angle of Polycarbonate Surface (저압 및 대기압 플라즈마 처리를 통한 폴리카보네이트의 접촉각 변화특성 비교)

  • Won, Dong Su;Kim, Tae Kyung;Lee, Won Gyu
    • Applied Chemistry for Engineering
    • /
    • v.21 no.1
    • /
    • pp.98-103
    • /
    • 2010
  • The effect of plasma treatment on surface characteristics of polycarbonate (PC) films was investigated using low pressure plasma and atmospheric pressure plasma with oxygen and argon. Untreated PC has a contact angle of $82.31^{\circ}$ with de-ionized water which reduced to $9.17^{\circ}$ as the lowest value after being treated with a low pressure plasma treatment with oxygen. Increase of delivered powers such as RF and AC with a high frequency and gas flow rates was not effective to reduce contact angles dramatically but gave the trend of reducing gradually. The surface of PC treated with plasma shows a low contact angle but the contact angle increases rapidly according to the exposure time in air ambient. Oxygen plasma was more effective to generate the polar functional group regardless of the type of plasma. Conclusively, a low plasma treatment with oxygen is more recommendable when the hydrophilic surface of PC is required.

Characterization of Atmospheric H2-Plasma-Treated LiNi1/3Co1/3Mn1/3O2 as Cathode Materials in Lithium Rechargeable Batteries (리튬이차전지에서 대기압 수소플라즈마 처리된 LiNi1/3Co1/3Mn1/3O2 양극 활물질의 특성분석)

  • Sun, Ho-Jung;Lee, Jae-Ho;Jeong, Hyun-Young;Seok, Dong-Chan;Jung, Yongho;Park, Gyungse;Shim, Joongpyo
    • Journal of Hydrogen and New Energy
    • /
    • v.24 no.2
    • /
    • pp.160-171
    • /
    • 2013
  • $LiNi_{1/3}Co_{1/3}Mn_{1/3}O_2$ powder for cathode materials in lithium rechargeable batteries was treated by atmospheric plasma containing hydrogen to investigate the relationship between charge/discharge performance and physical/chemical changes of materials. Hydrogen plasma at atmosphere pressure was irradiated on the surface of active materials, and the change for their crystal structure, surface morphology, and chemical composition were observed by XRD, SEM-EDS and titration method, respectively. The crystal structure and surface morphology of $H_2$ plasma-treated powders were not changed but their chemical compositions were slightly varied. For charge/discharge test, $H_2$ plasma affected initial capacity and rate capability of active materials but continuous cycling was not subject to plasma treatment. Therefore, it was observed that $H_2$ plasma treatment affected the surface of materials and caused the change of chemical composition.

Surface Analysis of Silicone Polymer used as Insulating Material by XPS and Surface Voltage Decay (XPS 및 Surface voltage decay를 이용한 실리콘 절연재료의 표면분석)

  • Youn, B.H.;Lee, K.T.;Park, C.R.;Kim, N.R.;Seo, Y.J.;Huh, C.S.;Cho, H.G.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2002.11a
    • /
    • pp.236-239
    • /
    • 2002
  • Surface states of silicone polymer treated by plasma were investigated by the analysis by x-ray photoelectron spectroscopy (XPS) and surface voltage decay. Plasma treatment causes the silica-like oxidative layer, which is confirmed with XPS, and lowers surface resistivity with increasing the plasma treatment time. Using the decay time constant of surface voltage, the calculated surface resistivity was compared with the value directly measured by a voltage-current method. A good agreement between two methods was obtained. In addition, we estimated the thermal activation energy for surface conduction, Based on our results, we could understand the relationship between surface chemical states and surface electrical properties.

  • PDF

A Study on ElectricalㆍOptical Properties of Organic Light Emitting Diode by Oxygen Plasma Surface Treatment of Indium-Tin-Oxide Substrates (ITO 기판의 산소 플라즈마 표면 처리에 의한 OLED의 전기적ㆍ광학적 특성에 관한 연구)

  • Yang Ki-Sung;Kim Byoung-Sang;Kim Doo-Seok;Shin Hoon-Kyu;Kwon Young-Soo
    • The Transactions of the Korean Institute of Electrical Engineers C
    • /
    • v.54 no.1
    • /
    • pp.8-12
    • /
    • 2005
  • Indium tin oxide(ITO) surface treated by Oxygen plasma has been in situ analyzed using XPS(X-ray Photoelectron Spectroscopy) and EDS(Energy Dispersive Spectroscopy), to investigate the relations between the properties of the ITO surface and the properties of OLED(Organic Light Emitting Diode). We measured electrical resistivity using Four-Point-Probe and calculated sheet resistance, and ITO surface roughness was measured by AFM(Atomic Force Microscope). We fabricated OLED using substrate that was treated optimum ITO surface. The plasma treatment of the ITO surface lowered the operating voltage of the OLED. We have obtained an improvement of luminance and decrease of turn-on voltage.

Bathochromic Finish of Dyed Fabrics by Low-Temperature Plasma and Sputter Etching Treatment (저온 플라즈마 및 Sputter Etching 처리에 의한 염색직물의 심색화 가공)

  • Pak, Pyong Ki;Lee, Mun Cheul;Park, Geon Yong
    • Textile Coloration and Finishing
    • /
    • v.8 no.2
    • /
    • pp.56-63
    • /
    • 1996
  • Low-temperature plasma treatment or sputter etching is of interest as one of the techniques to modify polymer surface. In this study, poly(ethylene terephthalate)(PET), nylon 6 and cotton fabrics dyed three black dyes were subjected to low-temperature argon plasma and also sputter etching. In relation to bathochromic effect, the surface characteristics of the treated fabrics and films were investigated by means of critical surface tension, SEM and ESCA measurement. The depth of shade of fabrics more increased by the sputter etching technique than argon plasma treatment. Many microcraters on the fiber surface formed by the sputter etching resulted in increase of surface area of the fiber and wettability, but the hydrophobic group was increased by the results of ESCA analysis. In particular the change in reflective index of the fibers was much more effective than the chemical composition of the fiber surface on increasing of the depth of shade.

  • PDF

Fabrication of Plasma Electrolytic Oxidation Coatings on Magnesium AZ91D Casting Alloys

  • Lee, Sung-Hyung;Yashiro, Hitoshi;Kure-Chu, Song-Zhu
    • Journal of Surface Science and Engineering
    • /
    • v.50 no.6
    • /
    • pp.432-438
    • /
    • 2017
  • AZ91D casting alloy requires an advanced plasma anodizing processing because large amount of defects are liable to generate during anodization. In this study, plasma electrolytic oxidation (PEO) of AZ91D Mg alloy was conducted by the application of either constant voltage or current using a pulse mode and its effects on pore formation, surface roughness and corrosion resistance were investigated. The PEO films showed a three-layer structure. The PEO film thickness was found to increase linearly with voltage. The surface roughness, Ra, ranged between $0.2{\mu}m$ and $0.3{\mu}m$. The corrosion resistance increased from RN 3.5 to 9.5 by the PEO treatment when evaluated according to the 72 hour salt spray test. The PEO-treated surface exhibited higher pitting potential than the raw material.

Structure and Mechanical Characteristics of ZrCrAIN Nanocomposite Thin Films by CFUBMS (CFUBMS을 이용한 ZrCrAIN 나노복합 박막의 구조와 기계적 특성)

  • Kim Youn J.;Lee Ho Y.;Shin Kyung S.;Jung Woo S.;Han Jeon G.
    • Journal of Surface Science and Engineering
    • /
    • v.38 no.5
    • /
    • pp.183-187
    • /
    • 2005
  • The quaternary ZrCrAIN nanocomposite thin films are synthesized by Closed-Field Unbalanced Magnetron Sputtering (CFUBMS). Microstructure and mechanical properties of ZrCrAIN nanocomposite thin films are studied. Grain refinement of ZrCrAIN nanocomposite thin film is occurred by controlling $N_{2}$ partial pressure. Maximum hardness value according to the various $N_{2}$ partial pressures is obtained at 45 GPa. It is also conformed that critical value of the grain size (d) needs to achieve the maximum hardness.