• Journal of Nutrition and Health
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• 제38권7호
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• pp.553-560
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• 2005

The purpose of this study was to examine the lipid peroxidation, plasma antioxidant status and insulin resistance in childhood obesity. To this end, we measured blood lipid profiles, glucose, insulin concentrations, plasma antioxidant vitamins, baseline conjugated diene formation as a measure of LDL oxidation in vivo and TRAP (total radical trapping antioxidant potential) of 93 school children (58 nonobese, 35 overweight-obese). Insulin resistance was estimated by homeostasis model assessment of insulin resistance (HOMA-IR). The overweight-obese children showed significantly higher levels of leptin (p < 0.0001) and triglyceride (p < 0.05) and significantly lower level of plasma Iycopene (p < 0.001) and $\gamma$-tocopherol (p < 0.05) compared with the normal weight children. Furthermore, the levels of TRAP were significantly lower in overweight-obese children (p < 0.05). Significant positive relationships between plasma leptin and conjugated dienes formation (p < 0.005) and inverse relationship between plasma leptin and lipid corrected levels of $\beta$-carotene (p < 0.05), Iycopene (p < 0.05) were observed. Our results showed an increased lipid peroxidation and decreased antioxidant capacity in childhood obesity which could be involved in the atherosclerotic process.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2012년도 추계총회 및 학술대회 논문집
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• pp.175-177
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• 2012

A corrosion resistance and hard nitrocarburized layer was distinctly formed on 310 austenitic stainless steel substrate by DC plasma nitrocarburizing. Basically, 310L austenitic stainless steel has high chromium and nickel content which is applicable for high temperature applications. In this experiment, plasma nitrocarburizing was performed in a D.C. pulsed plasma ion nitriding system at different temperatures in $H_2-N_2-CH_4$ gas mixtures. After the experiment structural phases, micro-hardness and corrosion resistance were investigated by the optical microscopy, X-ray diffraction, scanning electron microscopy, micro-hardness testing and Potentiodynamic polarization tests. The hardness of the samples was measured by using a Vickers micro hardness tester with the load of 100 g. XRD indicated a single expanded austenite phase was formed at all treatment temperatures. Such a nitrogen and carbon supersaturated layer is precipitation free and possesses a high hardness and good corrosion resistance.

• 반도체디스플레이기술학회지
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• 제10권4호
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• pp.43-46
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• 2011

In this study, we investigated the effects of the post Ar plasma treatment at different RF powers for various durations on electrical, structural, and optical properties of relatively thin Al-doped zinc oxide films. The sheet resistance was observed to decrease rapidly for the first 5min, beyond which the resistance apparently saturated. As the RF power increased, the grain size and the interplanar distance of (002) planes also increased. The observed decrease in sheet resistance was stated to be a consequence of Al and/or Zn interstitials as well as grain growth. It was also found that Ar plasma treatment increased the transmittance of Al-doped zinc oxide films in most of the visible light range below the blue light.

• 한국세라믹학회지
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• 제32권9호
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• pp.1003-1008
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• 1995

CVD-Si3N4/CVD-SiC/pack-SiC/pyro-carbon/(3-D C/C composite) multilayer coating was performed to improve the oxdiation resistance and erosion resistance properteis of the 3-D carbon/carbon composite, and the plasma test was performed to measure the oxidation resistance and erosion resistance properties. The thicknesses of each film layer were about 10${\mu}{\textrm}{m}$ for pack-SiC, 5${\mu}{\textrm}{m}$ for CVD-SiC and 40${\mu}{\textrm}{m}$ for CVD-Si3N4. When the multilayer coated specimen was exposed to the plasma flame with temperature of 500$0^{\circ}C$ for 20 seconds, it showed the weight loss five times less than that of the only pyro-carbon coated specimen.

• 한국결정성장학회지
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• 제34권4호
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• pp.131-138
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• 2024

본 연구에서는 소결된 알루미나 기판에 코팅된 35Bi₂O₃-15Al₂O₃-50SiO₂(BiAlSiO) 및 35Bi₂O₃-7.5Al₂O₃-50SiO₂-7.5AlF₃(BiAlSiOF) 유리층의 미세구조와 플라즈마 저항 특성이 소결 조건에 따라 어떻게 변화하는지를 조사하였다. 코팅된 층은 바 코팅(bar Coating) 방법을 사용하여 형성되었으며, 이후 탈지 공정을 거쳐 반구 형성 온도 전/후인 700~900℃ 범위의 온도에서 소결 되었다. 내플라즈마성은 석영유리보다 두개의 코팅 유리가 약 2~3배 더 높았으며, F를 첨가한 BiAlSiOF는 BiAlSiO보다 높은 내플라즈성을 나타냈다. 이는 불소 첨가 효과로 판단된다. 소결 온도가 700℃에서 800℃로 증가함에 따라 두 유리 모두 내플라즈마성이 향상되었으나, 900℃까지 소결 온도를 증가시키면 내플라즈마성은 다시 감소한다(즉, 식각률이 높아진다). 이러한 현상은 두 유리의 결정화 거동과 관련 깊은 것으로 판단된다. 소결 조건에 따른 내플라즈마성의 변화는 Al과 Bi-rich 상의 출현여부에 관련된 것으로 생각된다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2014년도 추계학술대회 논문집
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• pp.293-293
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• 2014

The applicability of graphene has been demonstrated in the electronic fields. But, high performance of graphene is limited by the contact resistance (Rc) at the metal-graphene interface. Recently, Rc was found to be improved by forming edge-contacted graphene via theoretical simulation. Based on the differences between the surface and edge contacts at the M-G interface, we demonstrate "edge-contacted" graphene through the use of a controlled plasma processing technique that generates the edge structure of the bond and significantly reduces the contact resistance. The contact resistance attained by using pre-plasma processing was of $270{\Omega}{\cdot}{\mu}m$. Mechanisms of pre-plasma process leading to low Rc was revealed by SEM and Raman spectroscopy. In the end, controlled pre-plasma processing enabled to fabricate CVD-graphene field effect transistors with an enhanced adhesion and improved carrier mobility.

• 한국분말야금학회:학술대회논문집
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• 한국분말야금학회 2006년도 Extended Abstracts of 2006 POWDER METALLURGY World Congress Part 1
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• pp.234-235
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• 2006

In this study, the plasma sprayed $Al_2O_3$ and $Y_2O_3$ coatings have been investigated for applications of microelectronic components. The plasma sprayed coatings had a well-defined splatted lamellae microstructure, intersplat pores and a higher amount of microcracks within the splats. The plasma sprayed $Y_2O_3$ coating had a relatively lower hardness of 300-400Hv, compared to 650-800Hv for $Al_2O_3$ coating, and would be readily damaged by mechanical attacks such as erosion, wear and friction. For a reactive ion etching against F-containing plasmas, however, the $Y_2O_3$ coating had a much higher resistance than the $Al_2O_3$ coating because of the reduced erosion rate of by-products.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2009년도 춘계학술발표대회
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• pp.38.1-38.1
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• 2009

Plasma etching is an essential process for electronic device industries and the particulate contamination during plasma etching has been interested as a big issue for the yield of productivity. The oxynitride glasses have a merit to prevent particulate contamination due to their amorphous structure and plasma etching resistance. The YSiAlON oxynitride glasses with increasing nitrogen content were manufactured. Each oxynitride glasses were fluorine-plasma etched and their plasma etching rate and surface roughness were compared with reference materials such as sapphire, alumina and quartz. The reinforcement mechanism of plasma etching resistance of the YSiAlON glasses studied by depth profiling at plasma etched surface using electron spectroscopy for chemical analysis. The plasma etching rate decreased with nitrogen content and there was no selective etching at the plasma etched surface of the oxynitride glasses. The concentration of silicon was very low due to the generation of SiF4 very volatile byproduct and the concentration of aluminum and yttrium was relatively constant. The elimination of silicon atoms during plasma etching was reduced with increasing nitrogen content because the content of the nitrogen was constant. And besides, the concentration of oxygen was very low on the plasma etched surface. From the study, the plasma etching resistance of the glasses may be improved by the generation of nitrogen related structural groups and those are proved by chemical composition analysis at plasma etched surface of the YSiAlON oxynitride glasses.

• 대한금속재료학회지
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• 제46권2호
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• pp.97-104
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• 2008

Black interlayer was introduced into between ITO and Bus electrodes to enhance a bright room contrast ratio of a plasma display panel. To measure the electrical resistance of the black interlayer, we designed two test patterns, type I and type II, of which type II pattern was successful. Using type II test pattern, the electrical resistance of the black interlayer was measured to be $300{\Omega}$ for $2{\mu}m$ thickness case and infinitely high for 4, $6{\mu}m$ thickness. This result shows that electrical resistance of the black interlayer in the ITO/black interlayer/Bus electrodes structure is a critical parameter which determines the electrical characteristics of the PDP.

• 한국재료학회지
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• 제16권11호
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• pp.681-686
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• 2006

Plasma nitrocarburising and plasma post oxidation were performed to improve the wear and corrosion resistance of S45C and SCM440 steel by a plasma ion nitriding system. Plasma nitrocarburizing was conducted for 3h at $570^{\circ}C$ in the nitrogen, hydrogen and methane atmosphere to produce the ${\varepsilon}-Fe_{2-3}$(N, C) phase. Plasma post oxidation was performed on the nitrocarburized samples with various oxygen/hydrogen ratio at constant temperature of $500^{\circ}C$ for 1 hour. The very thin magnetite ($Fe_3O_4$) layer $1-2{\mu}m$ in thickness on top of the $15{\sim}25{\mu}m$ ${\varepsilon}-Fe_{2-3}$(N, C) compound layer was obtained by plasma post oxidation. A salt spray test and electrochemical testing revealed that in the tested 5% NaCl solution, the corrosion characteristics of the nitrocarburized compound layer could be further improved by the application of the superficial magnetite layer. Throttle valve shafts were treated under optimum plasma processing conditions. Accelerated life time test results, using throttle body assembled with shaft treated by plasma nitrocarburising and post oxidation, showed that plasma nitrocarburizing and plasma post oxidation processes could be a viable technology in the very near future which can replace $Cr^{6+}$ plating.