• Title/Summary/Keyword: Plasma light

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Studies on Histological Changes of Bursa of Fabricius in Chicken Treated with Thyroxine; I. Light Microscopic Observations on Bursa of Fabricius Including Other Organs in Chicken Administrated with Thyroxine or PropylthiouraciI (갑상선(甲狀腺) 호르몬이 닭의 Fabricius 낭(囊)에 미치는 조직학적변화(組織學的變化)에 관(關)한 연구(硏究) I. Thyroxine 및 Propylthiouracil을 투여(投與)한 닭의 Fabricius낭(囊) 및 기타(其他) 장기(臟器) 대(對)한 광학현미경적관찰(光學顯微鏡的觀察))

  • Kim, Soon Bok;Lee, Cha Soo
    • Korean Journal of Veterinary Research
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    • v.20 no.1
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    • pp.17-24
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    • 1980
  • In order to know the effects of thyroid hormone on the bursa of Fabricius in chicken, the bursae were studied with the light microscope after administration of thyroxine(TX) or propylthiouracil(PPT). Macroscopically, the bursa of TY-treated group showed increase in size and thickened folds. while those of the PPT-treated group decrease in size, compared with those of control group. In the light microscopic studies, the bursa of Fabricius of the TX-treated group showed active cell-divisions in the medulla, and increased number of pyroninophilic large lymphocytes and plasma cells containing PAS positive materials in the cytoplasms. On the other hand, the bursa from PPT-treated group revealed decreased number of lymphocytes, significant increase of necrotic lymphocytes in the follicles, and the proliferation of the interfollicular connective tissues. A large number of pyroninophilic lymphocytes and plasma cells were also appeared in the spleen of the TX-treated group.

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A Study on the Implementation of a Portable Hologram Recording System for Optical Education

  • Cheolyoung, Go;Juyoung, Hong;Kwangpyo, Hong;Eunyeop, Shin;Leehwan, Hwang;Soonchul, Kwon;Seunghyun, Lee
    • International Journal of Advanced Culture Technology
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    • v.10 no.4
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    • pp.478-486
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    • 2022
  • Holography is a human-friendly technology that can express 3D stereoscopic information without eye fatigue. You can experience the mysterious features of light directly and indirectly, and you can also experience the principles of 3D imaging, which makes it a very good curriculum. As such, although holography is very effective in teaching students optics and 3D imaging technology, it has not yet been systematically established. The reason is the cost burden such as expensive equipment and laboratories, and the lack of easily accessible educational equipment. We implemented a portable holographic recording system to solve this problem. In addition, since silver halides, which use harmful chemicals, are not used in the process of developing the recording medium, and photopolymers are used, it is possible to educate not only the general public but also young students. In order to improve the completeness of the recorded result, the mechanism part, light source, and recording medium part of the production system were newly constructed to complement all the existing problems. The proposed system will make holography easily accessible to many people in a variety of fields, not just education. Through the interesting experience of various features and principles of light and the production of holograms with high satisfaction, we hope to popularize them in various fields such as education.

플라즈마 절단 후 제작된 용접부의 기계적 특성

  • 신규인;김형곤;박재학;김성청
    • Proceedings of the Korean Institute of Industrial Safety Conference
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    • 1999.06a
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    • pp.201-206
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    • 1999
  • The influence of surface preparation methods after plasma cutting on the quality of welding zone is investigated. For comparison. three types of welded specimens are prepared by machining(YM), plasma cutting with light regrinding(WPG) and without regrinding(WP), by using three kinds of materials, carbon steel(S45C), stainless steel(Type304) and aluminum alloy (6061-T6). Nondestructive examination, hardness test, microstructure examination, and fracture toughness test are performed. The results show that there is no appreciable reduction in hardness or fracture toughness in WP specimens. But a little difference in heat affected gone size is observed.

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Optimum Condition for Xe Gas Excitation in Plasma Display Panels through Ternary Gas of He, Ne, Xe

  • Khorami, Alireza;Ghanbari, Shirin
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.744-747
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    • 2009
  • Plasma Display Panels (PDPs) have illustrated impressive results in terms of light emission efficiency of the Ne-Xe mixture compared with the He-Xe mixture. However, He-Xe has shown to achieve superior color purity. This paper presents the optimization of excitation efficiency and color purity for He-Ne-Xe ternary gas mixtures. Furthermore, we investigate the effect that a protective dielectric layer has on UV photon efficiency in a matrix known as electrode type PDP.

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The Study for Improvement of False Contour in the Plasma Display Panel (플라즈마 디스플레이 패널의 의사윤곽 개선에 관한 연구)

  • Shin, Jae-Hwa;Ha, Sung-Chul;Lee, Seok-Hyun
    • The Transactions of the Korean Institute of Electrical Engineers P
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    • v.52 no.3
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    • pp.113-120
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    • 2003
  • Plasma display panels normally utilize the binary coded light emission scheme for gray scale expression. Subsequently, this expression method makes dynamic false contours. We propose the "E3DSM(enhanced 3-dimension scattering method)" that improved existing 3-d scattering method and the "HAM(histogram analysis method)" that is decided the driving schemes and subfield selections with histograms of images. Simulation results show the improving image quality.

A Study of the Properties of Optically Induced Layers in Semiconductors Aided by the Reflection of Optically Controlled Microwave Pulses

  • Wang, Xue;Choi, Yue-Soon;Park, Jong-Goo;Kim, Yong-K.
    • Transactions on Electrical and Electronic Materials
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    • v.10 no.4
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    • pp.111-115
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    • 2009
  • We present a study on the reflection of optically controlled microwave pulses from non uniform plasma layers in semiconductors. The transient response of the microwave pulses in different plasma layers has been evaluated by means of the reflection function of dielectric microstrip lines. The lines were used with an open-ended termination containing an optically induced plasma region, which was illuminated by a light source. The reflection characteristics impedance resulting from the presence of plasma is evaluated by means of the equivalent transmission line model. We have analyzed the variation of the transient response in a 0.01 cm layer with a surface frequency in the region of 128 GHz. In the reflection the variation of the diffusion length $L_D$ is large compared with the absorption depth $1/{\alpha}_l$. The variation of the characteristic response of the plasma layer with differentially localized pulses has been evaluated analytically. The change of the reflection amplitude has been observed at depths of 0.1 cm, 0.01 cm and $0.1{\times}10^{-5}$ cm respectively.

Effects of $O_2$ Plasma Treatment on the Electrical Properties of Organic Photovoltaic Cell (유기 광기전 소자의 전기적 특성에 미치는 산소 플라즈마 처리의 영향)

  • Oh, Dong-Hoon;Lee, Young-Sang;Park, Hee-Doo;Shin, Jong-Yeol;Kim, Tae-Wan;Hong, Jin-Woong
    • Proceedings of the KIEE Conference
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    • 2011.07a
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    • pp.1463-1464
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    • 2011
  • An indium thin oxide(ITO) is used as a substrate material for organic light-emitting diodes(OLEDs) and organic photovoltaic cells. This study examined the effects of an $O_2$ plasma treatment on the electrical properties of an organic photovoltaic cell. The four probe method and Atomic force microscope(AFM) revealed the lowest surface resistance at the plasma treatment intensity of 250 [W] and the lowest average surface roughness of 2.0 [nm] at 250 [W]. The lowest average resistance of 17 [${\Omega}$/sq] was also observed at 250 [W] 40 [sec]. The $O_2$ plasma treatment device and a basic device in a structure of CuPc/C60/BCP/Al on ITO glass were fabricated by thermal evaporation, respectively. When the $O_2$ plasma treatment was used to the ITO, The experimental results revealed that the power conversion efficiency(PCE) indicated 65 [%] higher in the PCE than that without the plasma treatment.

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Box Cathode Sputtering Technologies for Organic-based Optoelectronics (유기물 광전소자 제작을 위한 박스 캐소드 스퍼터 기술)

  • Kim, Han-Ki
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.4
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    • pp.373-378
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    • 2006
  • We report on plasma damage free-sputtering technologies for organic light emitting diodes (OLEDs), organic thin film transistor (OTFT) and flexible displays by using a box cathode sputtering (BCS) method. Specially designed BCS system has two facing targets generating high magnetic fields ideally entering and leaving the targets, perpendicularly. This target geometry allows the formation of high-density plasma between targets and enables us to realize plasma damage free sputtering on organic layer without protection layer against plasma. The OLED with Al cathode prepared by BCS shows electrical and optical characteristics comparable to OLED with thermally evaporated Mg-Ag cathode. It was found that OLED with Al cathode layer prepared by BCS has much lower leakage current density ($1{\times}10^{-5}\;mA/cm^2$ at -6 V) than that $(1{\times}10^{-2}{\sim}-10^0\;mA/cm^2)$ of OLED prepared by conventional DC sputtering system. This indicates that BCS technique is a promising electrode deposition method for substituting conventional thermal evaporation and DC/RF sputtering in fabrication process of organic based optoelectronics.

Study of Plasma Treatments to Increase Work Function of Multilayer Graphene Film

  • Maeng, Min-Jae;Kim, Ji-Hoon;Kwon, Dae-Gyeon;Hong, Jong-Am;Park, Yongsup
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.198.2-198.2
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    • 2014
  • We investigated change of the electronic structure, chemical states and elements ratio in graphene film by using photoelectron spectroscopy (PES). The graphene electrode has attracted considerable interest due to its possible applications in flexible organic light emitting diodes (F-OLEDs). However, to use the graphene for OLEDs, sufficient increase of work function is required, that is related with hole injection barrier. Plasma treatment is one of the most widely used method in OLEDs to increase the work function of the anode such as indium tin oxide (ITO). In this work, we used the plasma treatment, which is generated by various gas types such as O2, and Ar to increase the work function of the graphene film. From these results, we discuss the relation among the change of work function, plasma power, plasma treatment time and gas types.

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Box Cathode Sputtering Technologies for Organic Optoelectronics (유기물 광전소자 제작을 위한 박스 캐소드 스퍼터 기술)

  • Kim, Han-Ki;Lee, Kyu-Sung;Kim, Kwang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.11a
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    • pp.53-54
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    • 2005
  • We report on plasma damage free-sputtering technologies for organic light emitting diodes (OLEDs), organic thin rim transistor (OTFT) and flexible displays by using a box cathode sputtering (BCS) method. Specially designed BCS system has two facing targets generating high magnetic fields ideally entering and leaving the targets, perpendicularly. This target geometry allows the formation of high-density plasma between targets and enables us to realize plasma damage free sputtering on organic layer without protection layer against plasma. The OLED with top cathode prepared by BCS shows electrical and optical characteristics comparable to OLED with thermally evaporated Mg-Ag cathode. It was found that TOLED with ITO or IZO top cathode layer prepared by BCS has much lower leakage current density ($1\times10^{-5}$ mA/cm2 at -6V) than that ($1\times10^{-1}\sim10^{\circ}mA/cm^2$)of OLED prepared by conventional DC sputtering system. This indicates that BCS technique is a promising electrode deposition method for substituting conventional thermal evaporation and dc/rf sputtering in fabrication process of organic based optoelectronics.

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