• Bulletin of the Korean Chemical Society
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• v.25 no.2
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• pp.233-236
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• 2004

Total impurity analysis of a primary standard solution is one of the essential procedures to determine an accurate concentration of the standard solution by the gravimetry. Bi impurity is determined in Pb standard solutions by inductively coupled plasma mass spectrometry (ICP-MS). The direct nebulization of the Pb standard solution produces a significant amount of the Pb matrix-induced molecular ions which give rise to a serious spectral interference to the Bi determination. In order to avoid the spectral interference from the interferent $^{208}PbH^+$, the hydride generation method is employed for the matrix separation. The Bi hydride vapor is generated by reaction of the sample solution with 1% sodium borohydride solution. The vapor is then directed by argon carrier gas into the ICP after separation from the mixture solution in a liquid-gas separator made of a polytetrafluoroethylene membrane tube. The presence of 1000 ${\mu}$g/mL Pb matrix caused reduction of the bismuthine generation efficiency by about 40%. The standard addition method is used to overcome the chemical interference from the Pb matrix. Optimum conditions are investigated for the hydride-generation ICPMS. The detection limit of this method is 0.5 pg/mL for the sample solutions containing 1000 ${\mu}$g/mL Pb matrix.

• Journal of Korean Society on Water Environment
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• v.28 no.3
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• pp.401-408
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• 2012

High-voltage dielectric discharges are an emerging technique in environmental pollutant degradation, which that are characterized by the production of hydroxyl radicals as the primary degradation species. The initiation and propagation of the electrical discharges depends on several physical, chemical, and electrical parameters such as 1st and 2nd voltage of power, gas supply, conductivity and pH. These parameters also influence the physical and chemical characteristics of the discharges, including the production of reactive species such as OH, $H_2O_2$ and $O_3$. The experimental results showed that the optimum 1st voltage and air flow rate for RNO (N-Dimethyl-4-nitrosoaniline, indicator of the generation of OH radical) degradation were 160 V (2nd voltage of is 15 kV) and 4 L/min, respectively. As the increased of the 2nd voltage (4 kV to 15 kV), RNO degradation, $H_2O_2$ and $O_3$ generation were increased. The conductivity of the solution was not influencing the RNO degradation and $H_2O_2$ and $O_3$ generation. The effects pH was not high on RNO degradation. However, the lower pH and the conductivity, the higher $H_2O_2$ and $O_3$ generation were observed.

• Food Engineering Progress
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• v.15 no.4
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• pp.398-403
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• 2011

A dielectric barrier discharge plasma (DBDP) treatment system was fabricated and the optimum operating conditions for the plasma generation were determined in order to explore the potential of cold plasma as a non-thermal proessing technology. The microbial inactivation performance of the system was also evaluated against Staphyloocus aureus. The system consisted of power supply, transformer, electrode assembly and sample treatment plate. The input power was 220 V single phase AC and amplified to 10.0-50.0 kV on a transformer. A pulsed sine wave of frequency 10.0-50.0 kHz was introduced to the electrode embedded in ceramic as a dielectric barrier material in order to generate plasma at atmospheric pressure. Higher currents and consequently greater power were required for the plasma generation as the frequencies increased. A homogeneous and stable plasma was generated at currents of 1.0-2.0, and frequencies of 32.0-35.3 kHz. The optimum electrode-gaps for the plasma generation were 1.85 mm without loaded samples. More power was consumed as the electrode-gaps increased. The practically optimum electrode- gap was, however, 2.65 mm when samples were treated on slide-glasses for microbial inactivation. The maximum temperature increase after 10 min treatment was less than 20$^{\circ}C$, indicating no microbial inactivation effect by heat and thereby insuring a non-thermal method. The DBDP inactivation effect against Staphyloocus aureus increased linearly with treatment time up to 5 min, but plateaued afterward. More than 5 log reduction was achieved by 10 min treatment at 1.25 A.

• Journal of the Korean Society of Safety
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• v.15 no.2
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• pp.92-96
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• 2000

In this experiment, we studied about concentration characteristics of $NO_x$ and generation of ozone in the reactor of corona discharge type by using mixed gas of $NO/N_2$ and $N_2/O_2$. In the case of the initial NO concentration increased, decrease rate of NO concentration was weakened and discharge input power of minimum NO concentration became high. When NO concentration was high, NO decomposition limit was appeared. And NO reduction rate was decreased, when initial NO concentration and discharge input power increased. When discharge input power was 5W, we could know the most proper energy value for treatment of NO. When the concentration of initial NO increased, generation of ozone decreased and in the case of same concentration of NO, according to discharge input power increase, generation of ozone increased.

• Journal of the Korean institute of surface engineering
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• v.55 no.5
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• pp.292-298
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• 2022

In this study, PEO (plasma electrolytic oxidation) film formation behavior of AZ31 Mg alloy under application of 300 Hz pulse current was studied by the analyses of V-t curve, arc generation behavior, PEO film thickness and morphology of PEO films with treatment time in 0.05 M NaOH + 0.05 M Na₂SiO₃ + 0.1 M NaF solution. PEO films was observed to grow after 10 s of application of pulse current together with generation of micro-arcs. PEO film grew linearly with treatment time at a growth rate of about 5.58 ㎛/min at 200 mA/cm² of pulse current but increasing rate of film formation voltage became lowered largely with increasing treatment time after passing about 250 V, suggesting that resistivity of PEO films during micro-arc generation decreases with increasing film formation voltage at more than 250 V.

• Transactions of the Korean Society of Automotive Engineers
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• v.10 no.2
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• pp.40-47
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• 2002

Because UV wavelength lights can activate photocatalysts, plasma is used as a light source of a photocatalytic reactor. Even though plasma has good intensity for photo reaction, substrate of catalyst coating was limited by the geometry of plasma generator. Usually bead type substrate was used for a pack bed type reactor. Honeycomb monolith type substrate was used with UV lamps instead plasma, due to the light penetration the honeycomb monolith length was too short to show good activity In this study a photocatalytic reactor, which is using a honeycomb monolith substrate, was investigated with plasma as an activation light source. As a parametric study the effects of 1311owing factors on plasma generation and power consumption are examined; supply voltage, substrate length, environment condition, catalyst loading and ratio. Using the test results, the practicability test was done with simulated synthetic gases representing bad smells and automotive exhaust gases.

• Proceedings of the Korea Environmental Mutagen Society Conference
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• 2002.05a
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• pp.93-93
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• 2002

• Applied Science and Convergence Technology
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• v.26 no.5
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• pp.133-138
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• 2017

We investigated the interface defect engineering and reaction mechanism of reduced transition layer and nitride layer in the active plasma process on 4H-SiC by the plasma reaction with the rapid processing time at the room temperature. Through the combination of experiment and theoretical studies, we clearly observed that advanced active plasma process on 4H-SiC of oxidation and nitridation have improved electrical properties by the stable bond structure and decrease of the interfacial defects. In the plasma oxidation system, we showed that plasma oxide on SiC has enhanced electrical characteristics than the thermally oxidation and suppressed generation of the interface trap density. The decrease of the defect states in transition layer and stress induced leakage current (SILC) clearly showed that plasma process enhances quality of $SiO_2$ by the reduction of transition layer due to the controlled interstitial C atoms. And in another processes, the Plasma Nitridation (PN) system, we investigated the modification in bond structure in the nitride SiC surface by the rapid PN process. We observed that converted N reacted through spontaneous incorporation the SiC sub-surface, resulting in N atoms converted to C-site by the low bond energy. In particular, electrical properties exhibited that the generated trap states was suppressed with the nitrided layer. The results of active plasma oxidation and nitridation system suggest plasma processes on SiC of rapid and low temperature process, compare with the traditional gas annealing process with high temperature and long process time.

• Journal of the Institute of Electronics Engineers of Korea SC
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• v.45 no.5
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• pp.44-51
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• 2008

UV lamp systems have been used for cleaning of display panels of TFT LCD or Plasma Display Panel (PDP). However, the needs for high efficient cleaning and low cost made high voltage plasma cleaning techniques to be developed and to be improved. Dielectric-Barrier Discharges (DBDs), also referred to as barrier discharges or silent discharges have been exclusively related to ozone generation for a long time. In this paper, a 6kW high voltage plasma power supply system was developed for LCD cleaning. The 3-phase input voltage is rectified and then inverter system is used to make a high frequency pulse train, which is rectified after passing through a high-power transformer. Finally, hi-directional high voltage pulse switching circuits are used to generate the high voltage plasma. Some experimental results showed the usefulness of atmospheric plasma for LCD panel cleaning.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.20 no.4
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• pp.37-42
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• 2006

The effect of arc like streamer discharge is investigated on the hydrogen generation using the multineedle-plate electrode geometry plasma realtor(MPER) and the needle-plate electrode geometry plasma reactor(NPER). In order to restrict waves at the water surface when the high voltage applied, two kinds of the insulator such as the rectangular mesh or the hole mesh type are installed under the water surface. The discharge assistant of the two type(the saw type and the $TiO_2$ pellet type) was placed under the water surface to investigate the effect of the water surface conditions. The experimental results are compared in case of the reactor with and without the discharge assistant on the water surface.