• 제목/요약/키워드: Plasma generation

검색결과 540건 처리시간 0.021초

대기압 저온 플라스마를 이용한 산화막 및 고분자 재료의 표면개질 (Surface Modification of Conductive Oxide films and Polymer Materials Employing Atmospheric Cold Plasma Surface Modification of Conductive Oxide films and Polymer Materials Employing Atmospheric Cold Plasma)

  • 이봉주;이현규;김창석;이경섭;김형곤;장헌
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 춘계학술대회 논문집 센서 박막재료
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    • pp.32-34
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    • 2001
  • we have quantitatively investigated the possibility of feeding oxygen radical in air environment. The oxygen radical generation from the plasma was verified and its efficiency was found to be dependent on the cathode material by the analysis with optical emission spectroscopy as well as by the quartz crystal micro-balance method.

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대기압 플라즈마와 응용 (Atmospheric Plasma and Its Applications)

  • 엄환섭
    • 한국진공학회지
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    • 제15권2호
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    • pp.117-138
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    • 2006
  • 지표면에서 플라즈마는 전기방전에 의하여 만들어낸다. 그래서 대부분의 플라즈마 발생은 1백만분의 1기압보다 더 낮은 기압에서 발생하고 있었다. 그러나 많은 플라즈마 응용은 고기압에서 발생한 플라즈마를 요구하고 있다. 진공펌프와 같은 고가의 장비를 피하기 위하여 과학자들은 1기압이나 그이상의 압력에서 플라즈마를 발생하는 연구를 하기 시작했다. 많은 량의 제료 공정, 환경보호와 개선, 그리고 고효율 에너지 창출과 이용 등의 분야에 플라즈마를 사용할 때에는 오직 더 많은 량의 플라즈마를 더욱 값싸게 만들 때에만 가능한 것이다. 우리는 따라서 고기압에서 플라즈마를 만들어내는 새로운 방법을 개발하고 이러한 플라즈마가 21세기 산업에 적용될 수 있는 새로운 기반을 구축하는 연구를 수행하고 있다. 이러한 기술은 미래의 재료 공정이나, 환경 그리고 에너지 분야에 지대한 영향을 미칠 것으로 생각한다.

수처리용 유전체장벽 플라즈마 반응기에 대한 기초 연구 (A Basic Study of Plasma Reactor of Dielectric Barrier Discharge for the Water Treatment)

  • 김동석;박영식
    • 한국환경과학회지
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    • 제20권5호
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    • pp.623-630
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    • 2011
  • This study investigated the degradation of N, N-Dimethyl-4-nitrosoaniline (RNO, indicator of the generation of OH radical) by using dielectric barrier discharge (DBD) plasma. The DBD plasma reactor of this study consisted of a quartz dielectric tube, titanium discharge (inner) and ground (outer) electrode. The effect of shape (rod, spring and pipe) of ground electrode, diameter (9~30 mm) of ground electrode of spring shape and inside diameter (4~13 mm) of quartz tube, electrode diameter (1~4 mm), electrode materials (SUS, Ti, iron, Cu and W), height difference of discharge and ground electrode (1~15.5 cm) and gas flow rate (1~7 L/min) were evaluated. The experimental results showed that shape of ground electrode and materials of ground and discharge electrode were not influenced the RNO degradation. The thinner the diameter of discharge and ground electrode, the higher RNO degradation rate observed. The effect of height gap of discharge between ground electrode on RNO degradation was not high within the experimented value. Among the experimented parameters, inside diameter of quartz tube and gas flow rate were most important parameters which are influenced the decomposition of RNO. Optimum inside diameter of quartz tube and gas flow rate were 7 mm and 4 L/min, respectively.

Numerical Simulation of the Characteristics of Electrons in Bar-plate DC Negative Corona Discharge Based on a Plasma Chemical Model

  • Liu, Kang-Lin;Liao, Rui-Jin;Zhao, Xue-Tong
    • Journal of Electrical Engineering and Technology
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    • 제10권4호
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    • pp.1804-1814
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    • 2015
  • In order to explore the characteristics of electrons in DC negative corona discharge, an improved plasma chemical model is presented for the simulation of bar-plate DC corona discharge in dry air. The model is based on plasma hydrodynamics and chemical models in which 12 species are considered. In addition, the photoionization and secondary electron emission effect are also incorporated within the model as well. Based on this model, electron mean energy distribution (EMED), electron density distribution (EDD), generation and dissipation rates of electron at 6 typical time points during a pulse are discussed emphatically. The obtained results show that, the maximum of electron mean energy (EME) appears in field ionization layer which moves towards the anode as time progresses, and its value decreases gradually. Within a pulse process, the electron density (ED) in cathode sheath almost keeps 0, and the maximum of ED appears in the outer layer of the cathode sheath. Among all reactions, R1 and R2 are regarded as the main process of electron proliferation, and R22 plays a dominant role in the dissipation process of electron. The obtained results will provide valuable insights to the physical mechanism of negative corona discharge in air.

금속씨앗층과 $N_2$ 플라즈마 처리를 통한 Al/CeO$_2$/Si 커패시터의 유전 및 계면특성 개선 (Improvement of dielectric and interface properties of Al/CeO$_2$/Si capacitor by using the metal seed layer and $N_2$ plasma treatment)

  • 임동건;곽동주;이준신
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집
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    • pp.326-329
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    • 2002
  • In this paper, we investigated a feasibility of cerium oxide(CeO$_2$) films as a buffer layer of MFIS(metal ferroelectric insulator semiconductor) type capacitor. CeO$_2$ layer were Prepared by two step process of a low temperature film growth and subsequent RTA (rapid thermal annealing) treatment. By app1ying an ultra thin Ce metal seed layer and N$_2$ Plasma treatment, dielectric and interface properties were improved. It means that unwanted SiO$_2$ layer generation was successfully suppressed at the interface between He buffer layer and Si substrate. The lowest lattice mismatch of CeO$_2$ film was as low as 1.76% and average surface roughness was less than 0.7 m. The Al/CeO$_2$/Si structure shows breakdown electric field of 1.2 MV/cm, dielectric constant of more than 15.1 and interface state densities as low as 1.84${\times}$10$\^$11/ cm$\^$-1/eV$\^$-1/. After N$_2$ plasma treatment, the leakage current was reduced with about 2-order.

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합성가스 생성을 위한 글라이딩 아크 플라즈마 개질기에서 프로판 개질 (Propane Reforming in Gliding Arc Plasma Reformer for SynGas Generation)

  • 양윤철;전영남
    • 대한기계학회논문집B
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    • 제33권11호
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    • pp.869-875
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    • 2009
  • The purpose of this paper is to investigate the optimal condition of the syngas production by reforming of propane using Gliding arc plasma reformer. The gliding arc plasma reformer in 3 phases has been newly designed and developed with a quick starting and fast response time. It can be applicable to the various types of fuels (Hydrocarbons $C_xH_y$), and it has a high conversion rate of fuels and high production of hydrogen. The parametric screening studies were carried out according to the changes of a steam feed amount i.e., steam/carbon ratio, total gas flow rate and input electric power. The optimum operating conditions were S/C ratio 2.8, total gas flow rate of 14 L/min and input electric power of 2.4 kW. The result of optimum operating conditions showed the 55 % $H_2$, 14 % CO, 15 % $CO_2$, 10 % $C_3H_8$ and 4 % $CH_4$. Also, $C_3H_8$ conversion, $H_2$ yield and $H_2$ selectivity were 90 %, 42 %, 15 %, respectively. The energy efficiency and specific energy requirements were 37 % and 334 kJ/mol respectively.

플라즈마 표면처리에 따른 고분자절연재료의 표면개질 (Surface Modification of Polymer Insulator by Plasma Surface Treatment)

  • 임경범;황명환;이백수;유도현;육재호;김형권;임헌찬;박강식;이덕출
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 춘계학술대회 논문집 유기절연재료 전자세라믹 방전플라즈마 일렉트렛트 및 응용기술
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    • pp.31-35
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    • 2002
  • It is hard to expect excellent electrical, mechanical and chemical properties from most of the composite materials presently used as insulators due to insufficient wettability property caused by the difference of interfacial properties between the matrix material and the reinforcer. Therefore, various interfacial coupling agents have been developed to improve the interfacial properties of composite materials. But if the wettable coupling agents are used outdoor for a long time, change in quality takes place in the coupling agents themselves, bringing about deterioration of the properties of the composite materials. In this study, composite materials were put to dry interfacial treatment by use of plasma technology. It has been presented that the optimum parameters for the best wettability of the samples at the time of generation of plasma were oxygen atmosphere, 0.1 torr of system pressure, 100 W of discharge power, and 3 minutes of discharge time. Also, the surface resistance rate and dielectric property were improved.

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Synthesis of Nickel and Copper Nanopowders by Plasma Arc Evaporation

  • Cho, Young-Sang;Moon, Jong Woo;Chung, Kook Chae;Lee, Jung-Goo
    • 한국분말재료학회지
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    • 제20권6호
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    • pp.411-424
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    • 2013
  • In this study, the synthesis of nickel nanoparticles and copper nanospheres for the potential applications of MLCC electrode materials has been studied by plasma arc evaporation method. The change in the broad distribution of the size of nickel and copper nanopowders is successfully controlled by manifesting proper mixture of gas ambiance for plasma generation in the size range of 20 to 200 nm in diameter. The factors affecting the mean diameter of the nanopowder was studied by changing the composition of reactive gases, indicating that nitrogen enhances the formation of larger particles compared to hydrogen gas. The morphologies and particle sizes of the metal nanoparticles were observed by SEM, and ultrathin oxide layers on the powder surface generated during passivation step have been confirmed using TEM. The metallic FCC structure of the nanoparticles was confirmed using powder X-ray diffraction method.

고주파 유도방전 플라즈마의 푸로우브법에 의한 계측 (A Measurements of Radio-Frequency Induction Discharge Plasma using probe method)

  • 박성근;박상윤;하장호;박원주;이광식;이동인
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1997년도 하계학술대회 논문집 E
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    • pp.1657-1659
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    • 1997
  • Electron temperature and electron density were measured in a radio-frequency inductively coupled plasma (RFICP) using a probe measurements. Measurement was conducted in an argon discharge for pressures from 10 [mTorr] to 40 [mTorr] and input rf power from 100 [W] to 800 [W], Ar flow rate from 5 [sccm] to 30 [sccm], Spatial distribution electron temperature and electron density were measured for discharge with same aspect ratio (R/L=2). Electron temperature and electron density were discovered depending on both pressure and power, Ar flow rate. Electron density was increased with increasing input power and in creasing pressure, increasing Ar flow rate. Radial distribution of the electron density was peaked in the plasma center. Normal distribution of the electron density was peaked in the center between quartz plate and substrate. From these results, We found out the generation mechanism of Radio-Frequency Inductively Coupled Plasma.

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차세대 노광공정용 Ta박막의 $0.2\mu\textrm{m}$ 미세패턴 식각특성 연구 (Study on the Etching Characteristics of $0.2\mu\textrm{m}$ fine Pattern of Ta Thin film for Next Generation Lithography Mask)

  • 우상균;김상훈;주섭열;안진호
    • 한국재료학회지
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    • 제10권12호
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    • pp.819-824
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    • 2000
  • 본 연구에서는 Electron Cyclotron Resonance plasma etching system 을 이용한 Ta 박막의 미세 식각 특성을 연구하였다. 염소 plasma를 사용하여 microwave power, RF Power, working pressure, gas chemistry 등의 변화에 따른 식각 profile의 영향을 조사하였고, pattern density가 증가함에 따라 발생하는 microloading 현상을 $0.2{\mu\textrm{m}}$ 이하의 패턴에서 확인 하였다. 이를 개선하기 위하여 식각 과정을 두 단계로 분리하는 2단계 식각 공정을 수행하였으며 이를 통해 우수한 식각 profile을 얻을 수 있었다.

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