• 한국연소학회:학술대회논문집
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• 2003.12a
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• pp.27-32
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• 2003

The effect of non-thermal plasma on diffusion flames in co-flow jets has been studied experimentally by adopting a dielectric barrier discharge technique. The generation of streamers was enhanced with a flame due to increased reduced electric fields by high temperature burnt gas and the abundance of ions in the flame region. The effect of streamers on flame behavior reveals that the flame length was significantly decreased as the applied voltage increased and the yellow luminosity by the radiation of soot particles was also significantly reduced. The formation of PAH and soot was influenced appreciably by the non-thermal plasma, while the flame temperature and the concentration of major species were not influence much with the plasma generation. The results demonstrated that the application of non-thermal plasma can be a viable technique in controlling soot generation in flames with low power consumption in the order of 1 W.

• Journal of Electrical Engineering and Technology
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• v.8 no.2
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• pp.326-330
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• 2013

The Korea Superconducting Tokamak Advanced Research (KSTAR) device is an advanced superconducting tokamak to establish scientific and technological bases for attractive fusion reactor. This device requires 3.5 Tesla of toroidal field (TF) for plasma confinement, and requires a strong poloidal flux swing to generate an inductive voltage to produce and sustain the tokamak plasma. KSTAR was originally designed to have 16 serially connected TF magnets for which the nominal current rating is 35.2 kA. KSTAR also has 7 pairs of poloidal field (PF) coils that are driven to 1 MA/sec for generation of the tokamak plasma according to the operation scenarios. The KSTAR Magnet Power Supply (MPS) was dedicated to the superconducting (SC) coil commissioning and $2^{nd}$ plasma experiment as a part of the system commissioning. This paper will describe key features of KSTAR MPS for the $2^{nd}$ plasma experiment, and will also report the engineering and commissioning results of the magnet power supplies.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.209.2-209.2
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• 2016

Up to now, Plasma applications are thought as a leading technology in industrial, chemical and even medical and biological field. Especially, Due to direct discharge in liquid with reaction in ambient solution, plasma in liquid is useful plasma technology. Such as electro-surgery, water purification, radical generation for synthesis. For using those plasma applications efficiently, plasma characteristics should be understood in advance. But discharge in liquid is not much well-known about its characteristics. And plasma discharge in solution is difficult to generate and analysis due to electrolysis, vaporization and radical generation. So, We make stable plasma discharge in solution(saline 0.9%) without input gas. We also analyze new type of plasma source in thermal and electrochemical view. And we check characteristics of plasma in liquid. For example, plasma density and radical density(OH) with optical emission, thermal energy with thermometer, electrical energy with oscilloscope and so on. And we try to explain the bubble and plasma formation with circuit analysis.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.473-476
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• 2006

Microcavity plasma devices having characteristic dimensions below $100\;{\mu}m$ have been investigated as a candidate for the next generation of plasma displays. Arrays of inverted pyramid microcavity devices, fabricated in Si with emitting apertures of $(50\;{\mu}m)^2$ and designed for AC or bipolar excitation, demonstrate a luminous efficacy above 6 lm/W at pressures up to and beyond one atmosphere of Ne/Xe mixtures. Also the design of analogous microplasma devices in ceramic multilayer structures or plastic substrates is disccussed.

• Proceedings of the KIEE Conference
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• 1997.11a
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• pp.364-366
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• 1997

An experimental helical resonator plasma system that can be applied to the next generation semiconductor processing was fabricated and its characteristics was investigated. Helical resonator plasma can operate both in a capacitive and an inductive mode. Such sources will produce an extended plasma for the capacitive mode and a plasma concentrated in the resonator for the inductive mode. Plasma parameters were measured with Double Langmuir Probes. Plasma densities of $10^{11}{\sim}10^{12}cm^{-3}$ were produced in argon for pressure in the $2{\sim}120\;mTorr$ range. From the results, we conclude that helical resonator plasma can be applied to the next generation semiconductor processing.

• Journal of the Semiconductor & Display Technology
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• v.1 no.1
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• pp.35-40
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• 2002

Understanding of charging properties of a small particle is necessary to control the particle contamination and to improve productivity of the electronic device in the plasma aided semiconductor manufacturing processes. In this study, the effects of both magnetic field and particle size on the charging properties are experimentally investigated in collisional dusty plasmas. The experiments carried out in the system consisted of a monodisperse particle generation system, a DC magnetized plasma generation system and a charge measurement system. The plasma chamber is made of cross-shape Pyrex surrounded by magnetic bucket (composed of 12 permanent magnetic bar) to confine the plasma. DC magnetic field up to 250G are applied to the plasma zone by external magnetic coil. Previous work shows the charging effect clearly increase with increasing the size of the particle and plasma density, as it was expected.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.20 no.8
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• pp.6-14
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• 2006

This paper is a study about a proper method of plasma generation to cleaning method and a high frequency power equipment circuit to generation of plasma that used cleaning of chamber for TFT-LCD PECVD. The high density plasma required for cleaning causes a possibility of high density plasma more than $1{\times}10^{11}[EA/cm^3]$. It apply a ferrite core of ferromagnetic body to a existing ICP form. In case of power transfer equipment on 400[kHz] high frequency to generation of plasma it makes certain a stable switching operation in condition of plasma through using a inverter form for general purpose HB. And it demonstrates the performance of power transfer equipment using methods of measurement which use a transformer of series combination the density of plasma and the rate of dissolution of $NF_3$ in condition of $A_r\;and\;NF_3$.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.56.2-56.2
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• 2015

Nonthermal Atmospheric Pressure Plasmas and their Applications to Plasma Bioscience and Medicines have been introduced for next generation human healthcare's quantum developments. Various kinds of nonthermal atmospheric pressure plasmas have been introduced and their electron temperature and plasma densities along with reactive oxygen and nitrogen species have been diagnosed and analyzed for biological cell interactions, especially, used in Plasma Bioscience Research Center (PBRC), Korea. Herein, we have also introduced the plasma-initiated ultraviolet photolysis, which might be a generation mechanism for the reactive oxygen and nitrogen species (RONS) intracellular and extracellular regions inside the liquid when the plasma has been bombarded onto the water. Finally we have investigated the interactions of these RONS with the various cancer cells resulting in apoptotic cell death.

• Journal of Industrial Technology
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• v.25 no.A
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• pp.141-149
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• 2005

We investigated numerically the evolutions of several chemical species which are important for film growth and particle generation in the pulsed $SiH_4$ plasmas. During the plasma-on, the $SiH_x$ concentration increases with time mainly by the generation reaction from $SiH_4$, but, during the plasma-off, decreases because of the hydrogen adsorption reaction. During the plasma-on, the concentrations of negative ions increase with time by the polymerization reactions of negative ions and those become almost zero in the sheath regions because of the electrostatic repulsion. During the plasma-off, the concentrations of negative ions decrease with time by the neutralization reactions with positive ions and some negative ions can diffuse toward the sheath regions because there is no electric field inside the reactor. The polymerized negative ions of higher mass can be reduced successfully by using the pulsed plasma process.

• Journal of Environmental Science International
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• v.22 no.12
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• pp.1561-1569
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• 2013

This study carried out a laboratory scale plasma reactor about the characteristics of chemically oxidative species (${\cdot}OH$, $H_2O_2$ and $O_3$) produced in dielectric barrier discharge plasma. It was studied the influence of various parameters such as gas type, $1^{st}$ voltage, oxygen flow rate, electric conductivity and pH of solution for the generation of the oxidant. $H_2O_2$ and $O_3$.) $H_2O_2$ and $O_3$ was measured by direct assay using absorption spectrophotometry. OH radical was measured indirectly by measuring the degradation of the RNO (N-Dimethyl-4-nitrosoaniline, indicator of the generation of OH radical). The experimental results showed that the effect of influent gases on RNO degradation was ranked in the following order: oxygen > air >> argon. The optimum $1^{st}$ voltage for RNO degradation were 90 V. As the increased of $1^{st}$ voltage, generated $H_2O_2$ and $O_3$ concentration were increased. The intensity of the UV light emitted from oxygen-plasma discharge was lower than that of the sun light. The generated hydrogen peroxide concentration and ozone concentration was not high. Therefore it is suggested that the main mechanism of oxidation of the oxygen-plasma process is OH radical. The conductivity of the solution did not affected the generation of oxidative species. The higher pH, the lower $H_2O_2$ and $O_3$ generation were observed. However, RNO degradation was not varied with the change of the solution pH.