• Journal of the Korean Chemical Society
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• v.50 no.1
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• pp.14-22
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• 2006

the basic model of chemical reactor using glow discharge, we used cathode discharge cell with vacant cavity in the middle. Currently glow discharge is widely studied as a radiation source or atomization device in atomic spectroscopy and remarkable technological achievements are made through the graft with other analysis devices such as microanalysis and steel analysis.1 Additionally, as the characteristics of basic glow discharge and radiation have been reviewed many times, those results could be used in this experiment.2-3 In 1993, an article regarding the treatment of poisonous gas in the air using low temperature plasma was published. According to this article, if DC Glow Discharge is used under continuous atmospheric flow, poisonous gases such as SO2 and NO can be removed.4 Based on those findings, we designed highly efficient reactor where stable air plasma is composed and all air flow pass the negative glow area passing through the tube. It was observed that the cathode tube type glow discharge developed in this study would be economical, easy to use and could be used as radiation source as well.

• Journal of the Korean Vacuum Society
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• v.11 no.2
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• pp.127-134
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• 2002

Recently, Plasma display panel(PDP) has been in the spotlight as one of the next generation flat-panel-display device. The luminance and luminous efficiency improvement is the hot issues for making a plasma display into a large flat panel device. In this paper, We suggest a new penning gas mixture, in order to find the optimum mixture gas in plasma display panel. The optimum gas composition has been found by the partial pressure of inert gases(such as Af and Kr added to matrix of He(70%)-Ne(27%)Xe(3%) and Ne(96%)-Xe(4%)). The influences of Ar or Kr addition to Ne(96%)-Xe(4%) and He(70%)-Ne(27%)-Xe(3%) mixture gases are experimentally investigated for AC Plasma Display Panel. When rare As(0.01%-0.03%) or Kr(0.01%-0.03%) is added Ne-Xe and He-Ne-Xe mixture gases, the luminance increases over 10%-20% and luminous efficiency increases over 10%-20% at 200 Torr. It is sure that luminance and efficiency are improved by Penning effect. Also, This influence of Penning effect is shown by increased wall charge(10%-25%). In addition to the result, firing voltage and minimum sustain voltage was approximately decreased by 2V-3V.

• Journal of Korean Ophthalmic Optics Society
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• v.13 no.3
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• pp.57-60
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• 2008

Purpose: The radial speed of plasma current sheath was measured at the plasma focus apparatus. Methods: The measurement was used to time-resolved spectroscopic method and Rogowski coils. Results: Radial current sheath speed was measured with $10^5$ cm/s at Helium and Argon pressure between 5 to 100 torr and discharging voltage of 15 kV. When the gas pressure was increased, the current sheath speeds were decreased. Conclusions: At the optimum condition of plasma focus apparatus, the radial speed is guessed $10^7$ cm/s as a results of the measurement of current sheath speed.

• Journal of the Korean Vacuum Society
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• v.9 no.1
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• pp.36-41
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• 2000

$SnO-2$ thin films for thin film secondary battery anode were deposited n glass substrate with stain-less steel collector and charge/discharge experiments were conducted to investigate feasibility of $SnO-2$ thin film as a new anode material. The as-deposited films were pure $SnO-2$ phase which is not related to deposition condition. The grain size on the surface of as-deposited films increased with increase of oxygen partial pressure. However, the grain size did not show any change above oxygen partial pressure of 80:20. The surface roughness of the as-deposited films increased after decreasing because of resputtering effect of oxygen negative ion in plasma. All films showed typical $SnO-2$ anode characteristics which has a side effect at the first cycle, which is not related to the deposition condition. The charge/discharge experiments of 200cycles indicated that capacity of $SnO-2$ films depended on oxygen contents and surface roughness. The cycle characteristics was determined by initial charge/discharge reaction. The $SnO-2$ film with low initial capacity showed more stable cycle characteristics than film with high initial capacity.

• The Journal of Engineering Geology
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• v.31 no.3
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• pp.433-445
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• 2021

Plasma blasting by high voltage arc discharge were performed in laboratory-scale soil samples to investigate the fluid penetration efficiency. A plasma blasting device with a large-capacity capacitor and columnar soil samples with a diameter of 80 cm and a height of 60 cm were prepared. Columnar soil samples consist of seven A-samples mixed with sand and silt by ratio of 7:3 and three B-samples by ratio of 9:1. When fluid was injected into A-sample by pressure without plasma blasting, fluid penetrated into soil only near around the borehole, and penetration area ratio was less than 5%. Fluid was injected by plasma blasting with three different discharge energies of 1 kJ, 4 kJ and 9 kJ. When plasma blasting was performed once in the A-samples, penetration area ratios of the fluid were 16-25%. Penetration area ratios were 30-48% when blastings were executed five times consecutively. The largest penetration area by plasma blasting was 9.6 times larger than that by fluid injection by pressure. This indicates that the higher discharge energy of plasma blasting and the more numbers of blasting are, the larger are fluid penetration areas. When five consecutive plasma blasting were carried out in B-sample, fluid penetration area ratios were 33-59%. Penetration areas into B-samples were 1.1-1.4 times larger than those in A-samples when test conditions were the same, indicating that the higher permeability of soil is, the larger is fluid penetration area. The fluid penetration radius was calculated to figure out fluid penetration volume. When the fluid was injected by pressure, the penetration radius was 9 cm. Whereas, the penetration radius was 27-30 cm when blasting were performed 5 times with energy of 9 kJ. The radius increased up to 333% by plasma blasting. All these results indicate that cleaning agent penetrates further and remediation efficiency of contaminated soil will be improved if plasma blasting technology is applied to in situ cleaning of contaminated soil with low permeability.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.39-39
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• 1999

The KSTAR (Korea Superconducting Tokamak Advanced Research) tokamak is a nuclear fusion experimental device for a long pulse/steady-state plasma operation, adopting fully superconducting magnets. In accordance with completion of the basic design of the torus vacuum vessel and the enclosing cryostat, the vacuum pumping and gas fueling basic design has been developed to fulfil the physics requirements. The ultra-high vacuum pumping and sophisticated gas fueling system of the machine is essential to achieve such roles for optimized plasma performance and operation. Recently the vacuum exhaust system using dedicated pumping ports for the vacuum vessel and cryostat has been modified to meet more reliable and successful performance of the KSTAR[Fig. 1].In order to achieve the required base pressure of 5 x 10-9 torr, the total impurity load to the vessel internal is limited to ~5 x 10-5 torr-1/x, while the cryostat base pressure is kept as ~5 x 105 torr to mitigate the thermal load applied to the superconducting magnets. Each KSTAR fueling system will be separately capable of fueling gas at a rate of 50 torr-1/x, consistent with the given pumping throughput. In order to initiate a plasma discharge in KSTAR, the vacuum vessel is filled to a gas pressure of few 10-6 to few 10-4 torr, and additional gas injection is required to maintain and increase the plasma density during the course of the discharge period.

• Journal of the Korean Vacuum Society
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• v.21 no.3
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• pp.121-129
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• 2012

RF biased inductively coupled plasma (ICP) is widely used in semiconductor and display etch processes which are based on vacuum science. Up to now, researches on how rf-bias power affects have been focused on the controls of dc self-bias voltages. But, effect of RF bias on plasma parameters which give a crucial role in the processing result and device performance has been little studied. In this work, we studied the correlation between the RF bias and plasma parameters and the recent published results were included in this paper. Plasma density was changed with the RF bias power and this variation can be explained by simple global model. As the RF bias was applied to the ICP, increase in the electron temperature from the electron energy distribution was measured indicating electron heating. Plasma density uniformity was enhanced with the RF bias power. This study can be helpful for the control of the optimum discharge condition, as well as the basic understanding for correlation between the RF bias and plasma parameters.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.26 no.5
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• pp.391-396
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• 2013

Recently, microcavity is studied to reduce the optical loss of BLU and OLED. In this paper, we suggest applying microcavity to photo-luminescent lamp with plasma discharge technology to meet the display applications for a BLU for LCD. The structure of photo-luminescent lamp consists of SUS foil and ITO glass with microcavity. The opto-electric characteristics of photo-luminescent lamp with microcavity was evaluated. The brightness of photo-luminescent device was increased over $111cd/m^2$ with the adaptation of patterned microcavity at $30{\mu}m$. The 3D optical simulation verified the enhanced light outcoupling when microcavity applied to the device.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.65 no.3
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• pp.499-503
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• 2016

For safety and economy reasons, hazardous waste including radioactive waste is desired to be converted into stable waste forms with a maximum volume reduction. High temperature melting technology using a plasma torch system can effectively treat even the non-flammable waste as desired. By far, one of the most difficult process for melting the non-flammable waste is a tapping of melts because the melting point of a residual slag in the tapping hole is high and because the viscosity of the melt increases sharply when tapping out. In case of a stationary furnace with a slant tapping port on the side of furnace, a certain amount of melts is left in the tapping hole after tapping out. Because of this, at every end of a melting cycle, the tapping hole needs to be opened by tapping device. The developed tapping device of melts based on both a guide electrode and auxiliary electrode is adequate for the application to discharge of melts except that the consumption of the guide electrode is somewhat faster than expected. Melt is collected in the water cooled vessel.

• Proceedings of the KIEE Conference
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• 2003.07e
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• pp.162-165
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• 2003

A resonant type voltage source and power device and a control method using Pulse Density Modulation(PDM) power control and Pulse Width Modulation(PWM)voltage control for plasma sterilization are described. For the stability of discharge in the generating tube, it is desirable that the peak apply voltage is constant. The PDM power control is employed for sustaining the voltage constant at any generating tube input power. Moreover, to avoid the influence of input AC voltage fluctuation etc., PWM voltage control with generating tube peak voltage feedback is used. Both functions were confirmed by the experiment with inverter and generating tube. The effect of input synchronous PDM method for input current stabilizing is confirmed also.