• 한국막학회:학술대회논문집
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• 한국막학회 2003년도 The 4th Korea-Italy Workshop
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• pp.41-46
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• 2003

Plasma processes developed in our laboratory, of interest for biomaterials, barrier coatings for food packaging and corrosion protection, are briefly reviewed in this contribution. Particular attention is devoted to diagnostics aimed to rationalize plasma-surface interactions and to identify parameters and correlations to be utilized for process control.

• 천문학회보
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• 제43권1호
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• pp.53.2-53.2
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• 2018

We perform seismological diagnostics of the physical parameters in umbral photospheres and G-band bright points. The technique is based on the theory of slow magneto-acoustic waves in a non-isothermally stratified photosphere with uniform vertical magnetic fields. For the seismology of sunspot umbrae, we calculate the weighted frequency of three-minute oscillations observed by SDO/HMI continuum and use it to estimate the Alfvn speed and plasma-beta, which range 7.5-10.5 km/s and 0.65-1.15, respectively. We identify and track bright points in the G-band movie by using a 3D region growing method. Then we apply the seismological diagnostics to the bright points in the Hinode/BFI Blue continuum. We will present the Alfvn speed and plasma-beta in the bright points.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.242.1-242.1
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• 2014

The electron cyclotron resonance plasma source with a belt-type magnet assembly (BMA) is designed for effective plasma confinements. For characterizing the plasma source, the plasma parameters are measured by Langmuir probe. However, the plasma parameters and the motion of charged particles near the ECR zone are not easy to diagnostics, because of the high plasma density and temperature. Thus, as an alternative method, the electromagnetic simulation of the plasma source has been performed by using three-dimensional particle-in-cell and Monte Carlo collisional (PIC-MCC) simulation codes. For considering the limitation of simulation resources and time, the periodic boundary condition is applied and the coulomb collision is neglected. In this paper, we present the results of 3D PIC simulations of ECR plasmas with BMA and we compare them with the experimental results.

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2009년도 정기총회 및 동계학술연구발표회
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• pp.222-223
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• 2009

• BMB Reports
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• 제53권4호
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• pp.191-205
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• 2020

The unexpected pandemic set off by the novel coronavirus 2019 (COVID-19) has caused severe panic among people worldwide. COVID-19 has created havoc, and scientists and physicians are urged to test the efficiency and safety of drugs used to treat this disease. In such a pandemic situation, various steps have been taken by the government to control and prevent the Severe Acute Respiratory Syndrome coronavirus 2 (SARS-CoV-2). This pandemic situation has forced scientists to rework strategies to combat infectious diseases through drugs, treatment, and control measures. COVID-19 treatment requires both limiting viral multiplication and neutralizing tissue damage induced by an inappropriate immune reaction. Currently, various diagnostic kits to test for COVID-19 are available, and repurposing therapeutics for COVID-19 has shown to be clinically effective. As the global demand for diagnostics and therapeutics continues to rise, it is essential to rapidly develop various algorithms to successfully identify and contain the virus. This review discusses the updates on specimens/samples, recent efficient diagnostics, and therapeutic approaches to control the disease and repurposed drugs mainly focusing on chloroquine/hydroxychloroquine and convalescent plasma (CP). More research is required for further understanding of the influence of diagnostics and therapeutic approaches to develop vaccines and drugs for COVID-19.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.144-144
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• 2011

Diagnostics of plasma density and temperature play an important role for monitoring plasma processing and Laser Thomson scattering is a one of the most accurate diagnostic technique for measuring plasma density and temperature because of none-perturbation to plasma among various diagnostic techniques invented to measure plasma density and temperature. I will briefly review Laser Thomson scattering experiment performed in KRISS and difficulties for measuring the electron velocity distribution such as Gaussian due to low signal-to-noise ratio with showing results that we got until now. This work is an intermediate step in a process that we will get a reliable data which shows physical phenomenon of plasma compared with other diagnostic techniques and results.

• 전기학회논문지
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• 제65권10호
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• pp.1706-1711
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• 2016

Electromagnetic wave simulation was performed to predict characteristics of manufactured cutoff probe at low temperature magnetized plasma medium. Microwave cutoff probe is designed for research the properties of magnetized inductively coupled plasma. It was shown that the cutoff probe method can safely be used for weakly magnetized high density plasma sources. Cutoff probe system with two port network analyzer has been prepared and applied to measure electron density distributions in large area, 13.56MHz driven weakly magnetized inductively coupled plasma source. The results shown that, the plasma frequency confirmed cut-off characteristics in low temperature plasma. Especially, cut-off characteristics was found at upper hybrid resonance frequency in the environment of the magnetic field. In case of a induced weak magnetic field in inductively coupled plasma, plasma density estimated from the cutoff frequency in the same way at unmagnetized plasma due to nearly same plasma frequency and upper hybrid resonance frequency. The plasma density is increased and uniformity is improved by applying a induced weak magnetic field in inductively coupled plasma.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.77-77
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• 2016

Thin films synthesized by plasma processes have been widely applied in a variety of industrial sectors. The structure control of thin film is one of prime factor in most of these applications. It is well known that the structure of this film is closely associated with plasma parameters and species of plasma which are electrons, ions, radical and neutrals in plasma processes. However the precise control of structure by plasma process is still limited due to inherent complexity, reproducibility and control problems in practical implementation of plasma processing. Therefore the study on the fundamental physical properties that govern the plasmas becomes more crucial for molecular scale control of film structure and corresponding properties for new generation nano scale film materials development and application. The thin films are formed through nucleation and growth stages during thin film depostion. Such stages involve adsorption, surface diffusion, chemical binding and other atomic processes at surfaces. This requires identification, determination and quantification of the surface activity of the species in the plasma. Specifically, the ions and neutrals have kinetic energies ranging from ~ thermal up to tens of eV, which are generated by electron impact of the polyatomic precursor, gas phase reaction, and interactions with the substrate and reactor walls. The present work highlights these aspects for the controlled and low-temperature plasma enhanced chemical vapour disposition (PECVD) of Si-based films like crystalline Si (c-Si), Si-quantum dot, and sputtered crystalline C by the design and control of radicals, plasmas and the deposition energy. Additionally, there is growing demand on the low-temperature deposition process with low hydrogen content by PECVD. The deposition temperature can be reduced significantly by utilizing alternative plasma concepts to lower the reaction activation energy. Evolution in this area continues and has recently produced solutions by increasing the plasma excitation frequency from radio frequency to ultra high frequency (UHF) and in the range of microwave. In this sense, the necessity of dedicated experimental studies, diagnostics and computer modelling of process plasmas to quantify the effect of the unique chemistry and structure of the growing film by radical and plasma control is realized. Different low-temperature PECVD processes using RF, UHF, and RF/UHF hybrid plasmas along with magnetron sputtering plasmas are investigated using numerous diagnostics and film analysis tools. The broad outlook of this work also outlines some of the 'Grand Scientific Challenges' to which significant contributions from plasma nanoscience-related research can be foreseen.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.73-73
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• 2008

In this work, the study on the $SiO_2$ film non-uniformity by PECVD (Plasma Enhanced Chemical Vapor Deposition) was performed. Plasma diagnostics was analyzed by a DLP(Double Langmuir Probe) and a probe-type QMS(Quadrupole Mass Spectrometer) in order to investigate the spatial distribution of the plasma species in the chamber. The relationship between the plasma species and the depositing rate of the films was examined. On the basis of this work, it was confirmed that O radical density mainly contributed to the increase in the depositing rate of the $SiO_2$ films and the electron temperature in the plasma had a main effect on the formation of the oxygen radicals.

• Journal of the Optical Society of Korea
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• 제20권4호
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• pp.524-529
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• 2016

Diagnostic sensors are demanded during plasma processes. Holograms of plasma taken with laser light without a reference beam were used to monitor behaviors of charged particles produced in nitrogen plasma as a function of electrode temperature ranging between 50 and 300℃. Holograms were characterized as a function of the pixel sum and grayscale value. Pixel sum calculated in identified grayscale ranges strongly correlated with ion density and emitted light intensity measured with a langmuir probe and optical emission spectroscopy, respectively. The performance was further evaluated with data acquired as a function of N₂ and NH₃ flow rates and improved correlations were observed in the new grayscale range. The confirmed correlations indicate that a hologram is a viable means to diagnose behaviors of plasma particles such as ions. Underlying principles are discussed in view of particle and charge composing vacuum and light.