• 제목/요약/키워드: Plasma Simulation

검색결과 490건 처리시간 0.026초

Electron Beam Propagation in a Plasma

  • Min, Kyoung-W.;Koh, Woo-Hee
    • Journal of Astronomy and Space Sciences
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    • 제5권1호
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    • pp.1-8
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    • 1988
  • Electron beam propagation in a fully ionized plasma has been studied using a one-dimensional particle simulation model. We compare the results of electrostatic simulations to those of electromagnetic simulations. The electrostatic results show the essential features of beam-plasma interactions. It is found that the return currents are enhanced by the beam-plasma instability which accelerates ambinet plasmas. The results also show the heating of ambient plasmas and the trapping of plasmas due to the locally generated electric field. The electromagnetic simulations show much the same results as the electrostatic simulations do. The level of the radiation generated by the same non-relativistic beam is slightly higher than the noise level. We discuss the results in context in context of the heating of coronal plasma during solar flares.

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A Plasma-Etching Process Modeling Via a Polynomial Neural Network

  • Kim, Dong-Won;Kim, Byung-Whan;Park, Gwi-Tae
    • ETRI Journal
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    • 제26권4호
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    • pp.297-306
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    • 2004
  • A plasma is a collection of charged particles and on average is electrically neutral. In fabricating integrated circuits, plasma etching is a key means to transfer a photoresist pattern into an underlayer material. To construct a predictive model of plasma-etching processes, a polynomial neural network (PNN) is applied. This process was characterized by a full factorial experiment, and two attributes modeled are its etch rate and DC bias. According to the number of input variables and type of polynomials to each node, the prediction performance of the PNN was optimized. The various performances of the PNN in diverse environments were compared to three types of statistical regression models and the adaptive network fuzzy inference system (ANFIS). As the demonstrated high-prediction ability in the simulation results shows, the PNN is efficient and much more accurate from the point of view of approximation and prediction abilities.

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Realization of High Luminous Efficacy PDP with Low Voltage Driving

  • Whang, Ki-Woong;Bae, Hyun-Sook;Jung, Hae-Yoon;Kwon, O-Hyung
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.153-156
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    • 2008
  • The use of high Xe content gas is a powerful method for improving the discharge efficacy in PDP, but the accompanying high driving voltage prevents it from being used aggressively. In this paper, we tried to find a method to lower the driving voltage under high Xe gas condition with a new protecting layer. The effective secondary electron emission caused by Xe ions can result in the low voltage driving in panels with high Xe content gas and more importantly high luminous efficacy which were confirmed with the computer simulation and panel experiment.

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A Study on Medium Voltage Power Supply with Enhanced Ignition Characteristics for Plasma Torch

  • 정경섭;서용석
    • 전력전자학회:학술대회논문집
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    • 전력전자학회 2010년도 하계학술대회 논문집
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    • pp.242-243
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    • 2010
  • This paper investigates a power supply of medium voltage with enhanced ignition characteristics for plasma torch. Series resonant half-bridge topology is presented to be a suitable ignition circuitry. The ignition circuitry is integrated into the main power conversion system of a multi-phase staggered three-level dc-dc converter with a diode front-end rectifier. The plasma torch rated for 3MW, 2kA and having the physical size of 1m long is selected to be a high enthalpy source in waste disposal system. The steady-state and transient operations of plasma torch are simulated. The parameters of Cassie-Mary arc model are calculated based on 3D magneto-hydrodynamic simulations. Circuit simulation waveform shows that the ripple of arc current can be maintained within ${\pm}10%$ of its rated value under the existence of load disturbance. This power conversion configuration provides high enough ignition voltage around 5KA during ignition phase and high arc stability under the existence of arc disturbance noise resulting in a high-performance plasma torch system.

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수치모델을 이용한 ICP-CVD 장치의 증착 균일도 해석 (Numerical Modeling of Deposition Uniformity in ICP-CVD System)

  • 주정훈
    • 한국표면공학회지
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    • 제41권6호
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    • pp.279-286
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    • 2008
  • Numerical analysis is done to investigate which would be the most influencing process parameter in determining the uniformity of deposition thickness in TiN ICP-CVD(inductively coupled plasma chemical vapor deposition). Two configurations of ICP antenna are modeled; side and top planar. Side and top gas inlets are considered with each ICP antenna geometries. Precursor for TiN deposition was TDMAT(Tetrakis Diethyl Methyl Amido Titanium). Two step volume dissociation of TDMAT is used and absorption, desorption and deposition surface reactions are included. Most influencing factors are H and N concentration dissociated by electron impact collisions in plasma volume which depends on the relative positions of gas inlet and ICP antenna generated hot plasma region. Low surface recombination of N shows hollow type concentration, but H gives a bell type distribution. Film thickness at substrate edges is sensitive to gas flow rate and at high pressures getting more dependent on flow characteristics.

그래핀의 엣지 접합 (Edge Contact)을 위한 플라즈마 처리 연구 (Controlled Plasma Treatment for Edge Contacts of Graphene)

  • ;;;;유원종
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2014년도 추계학술대회 논문집
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    • pp.293-293
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    • 2014
  • The applicability of graphene has been demonstrated in the electronic fields. But, high performance of graphene is limited by the contact resistance (Rc) at the metal-graphene interface. Recently, Rc was found to be improved by forming edge-contacted graphene via theoretical simulation. Based on the differences between the surface and edge contacts at the M-G interface, we demonstrate "edge-contacted" graphene through the use of a controlled plasma processing technique that generates the edge structure of the bond and significantly reduces the contact resistance. The contact resistance attained by using pre-plasma processing was of $270{\Omega}{\cdot}{\mu}m$. Mechanisms of pre-plasma process leading to low Rc was revealed by SEM and Raman spectroscopy. In the end, controlled pre-plasma processing enabled to fabricate CVD-graphene field effect transistors with an enhanced adhesion and improved carrier mobility.

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Research Status of Sail Propulsion using the Solar Wind

  • Funaki, Ikkoh;Yamakawa, Hiroshi
    • 한국추진공학회:학술대회논문집
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    • 한국추진공학회 2008년 영문 학술대회
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    • pp.583-588
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    • 2008
  • A spacecraft propulsion system utilizing the energy of the solar wind was reviewed. The first plasma sail concept was proposed by Prof. Winglee in 2000, and that was called M2P2(mini-magnetospheric plasmapropulsion). However, the first M2P2 design adopting a small(20-cm-diamter) coil and a small helicon plasma source design was criticized by Dr. Khazanov in 2003. He insisted that: 1) MHD is not an appropriate approximation to describe the M2P2 design by Winglee, and with ion kinetic simulation, it was shown that the M2P2 design could provide only negligible thrust; 2) considerably larger sails(than that Winglee proposed) would be required to tap the energy of the solar wind. We started our plasma ssail study in 2003, and it is shown that moderately sized magnetic sails can produce sub-Newton-class thrust in the ion inertial scale(${\sim}70$ km). Currently, we are continuing our efforts to make a feasibly sized plasma sail(Magnetoplasma sail) by optimizing the magnetic field inflation process Winglee proposed.

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수치해석 기법을 이용한 아크 플라즈마 반응기의 VOCs 분해성능 평가연구 (Numerical simulation of VOC decomposition in an arc plasma reactor)

  • 박미정;조영민
    • 한국산학기술학회논문지
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    • 제17권8호
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    • pp.1-7
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    • 2016
  • 수도권 대기관리권역 내에서 발생되는 휘발성 유기화합물(VOCs)를 규제하고 있다. VOCs는 산업 활동 및 일상생활에서 많이 쓰이고 있는 유기용제에서 발생되고 있다. 특히 주거지역과 인접하게 위치하고 있는 도장 공정에서는 다량의 유기용제를 사용하고 있으며, 그에 대한 영향이 크게 나타날 것으로 예상된다. 도장 공정에서 배출되는 VOCs을 제거하기 위하여 다양한 기술이 개발되고 있다. 최근 플라즈마를 이용하여 유해 VOCs를 고온에서 분해하는 공정이 제시되었는바, 본 연구에서는 반응기 설계에 앞서 전산유체역학기법을 사용하여 초고온 공정 수치해석을 실시하였다. 수치해석은 질량과 운동량에 대한 보존 방정식과 에너지 보존 방정식을 이용하였다. 원심력 반응기의 내부 유체유동은 내측 벽면을 타고 강한 선회류를 형성하면서 하부로 하강하는 것을 알 수 있었다. 플라즈마에 의한 고온 가스는 반응기 하부까지 영향을 주지만, 방사형 방향(radial direction)의 열전달은 거의 없는 것으로 나타났다. 시험용 VOCs인 톨루엔에 대한 분해효율을 계산한 결과, 반응기 전체에 대하여 67%가 얻어졌으며, 이는 실제 플라즈마를 이용한 실험실 규모의 실험 결과치인 약 70% 와 비교적 유사하게 나타났다.

자기유체역학 코드를 이용한 축 대칭 엑스 핀치 플라즈마 구조의 2차원 전산해석 (Numerical Simulation on the Formation and Pinching Plasma in X-pinch Wires on 2-D Geometry)

  • 변상민;나용수;정경재;김덕규;이상준;이찬영;함승기;류종현
    • 한국군사과학기술학회지
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    • 제24권2호
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    • pp.211-218
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    • 2021
  • This paper deals with the computational work to characterize the formation and pinching of a plasma in an X-pinch configuration. A resistive magnetohydrodynamic model of a single fluid and two temperature is adopted assuming a hollow conical structure in the (r,z) domain. The model includes the thermodynamic parameter of tungsten from the corrected Thomas-Fermi EOS(equation of state), determining the average ionization charge, pressure, and internal energy. The transport coefficients, resistivity and thermal conductivity, are obtained by the corrected Lee & More model and a simple radiation loss rate by recombination process is considered in the simulation. The simulation demonstrated the formation of a core-corona plasma and intense compression process near the central region which agrees with the experimental observation in the X-pinch device at Seoul National University. In addition, it confirmed the increase in radiation loss rate with the density and temperature of the core plasma.

Analysis of the luminous efficacy improvement in Full HD ac Plasma Display Panel

  • Bae, Hyun-Sook;Whang, Ki-Woong
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.29-32
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    • 2007
  • We analyzed the effect of cell resolution on the luminous efficacy through three-dimensional numerical simulation to understand the inherent discharge mechanism change in the plasma display panel. As the resolution increases from VGA to Full HD, the luminous efficacy decreases. With higher Xe content, VUV generation efficacy of Full HD becomes much lower than those of VGA or XGA cells, due to the increased plasma loss and lower electron heating. However a long electrode gap $140{\mu}m$ in Full HD cell with Ne-Xe [20%] results in the high luminous efficacy comparable to that of the XGA cell with $60{\mu}m$ gap. When comparing the effects of Xe content variation on the luminous efficacy of two different subpixel types, i. e., SDE (Segmented electrode in Delta color arrayed, Enclosed subpixel) [1] and conventional stripe barrier type in the XGA and Full HD cells, the luminous efficacy of SDE structure shows higher improvement in Full HD resolution compared with that of conventional type XGA cell, whose cause is identified as the reduced plasma loss.

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