• Title/Summary/Keyword: Plasma Absorption Properties

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Structural Properties of Plasma-treated Polymer Films and Their Applications

  • Lee, Jin Young;Lee, Geon Joon;Kim, In Tae;Choi, Eun Ha
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.522-522
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    • 2013
  • Plasma can be used to various applications such as sterilization, inactivation/removal of microorganisms, wound healing, tooth bleaching, cancer treatment, surface modification and plasma polymerization. In this research, we studied the effect of plasma irradiation on the structural, optical, and biological properties of the polymer films. Several polymers were synthesized and then deposited on the glass substrates. The polymer films were treated by oxygen and nitrogen plasmas. Plasma-treated films were investigated by contact angle, infrared absorption spectroscopy, cathodoluminescence spectroscopy, and scanning electron microscopy. Functional materials were prepared on plasma-treated surface, and their performances were investigated using various techniques. Next, we discuss relationship between the performance of functional materials and the structural properties of plasma-treated polymer films.

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Modeling and Experimental Study of Radio-frequency Glow Discharges and Applications for Plasma Processing

  • Kang, Nam-Jun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.179-179
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    • 2012
  • Low pressure radio-frequency glow discharges are investigated using theoretical modeling and various experimental diagnostic methods. In the calculations, global models and transformer models are developed to understand the chemical kinetics as well as the electrical properties such as the effective collision frequency, the heating mechanism and the power transferred to the plasma electrons. In addition, Boltzmann equation solver is used to compensate the effect of the electron energy distribution function (EEDF) shape in the global model, and the general expression of energy balance for non-Maxwellian electrons is developed. In the experiments, a number of traditional plasma diagnostic methods are used to compare with calculated results such as Langmuir probe, optical emission spectroscopy (OES), optical absorption spectroscopy (OAS) and two-photon absorption laser-induced fluorescence (TALIF). These theoretical and experimental methods are applied to understand several interesting phenomena in low pressure ICP discharges. The chemical and physical properties of low pressure ICP discharges are described and the applications of these methods are discussed.

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Thermal stabilityof fluorine doped silicon oxide films

  • Lee, Seog-Heong;Yoo, Jae-Yoon;Park, Jong-Wan
    • Journal of Korean Vacuum Science & Technology
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    • v.2 no.1
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    • pp.25-31
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    • 1998
  • The reliability of fluorine doped silicon oxide (SiOF) films for intermetal dielectrics in multilevel interconnections of ultra-large scale integrated circuits (ULSIs) is investigated. SiOF films were deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition (ECRPECVD) using H-free source gases, i.e., SiF4 and O2. The effect of post plasma treatment on the moisture absorption and dielectric properties of SiOF films was carried out I terms of air exposure time, The reliability test of Cu/TiN/SiOF/Fi specimen was carried out in terms of temperature by rapid thermal annealing (RTA) in N2 ambient. After O2 plasma treatment,, no appreciable peak directly related to moisture absorption was detected. The capacitance-voltage (C-V) characteristics of the O2 plasma treated SiOF film showed that the film remained to hold the sound dielectric properties even after boiling treatment. The Cu/TiN/SiOF/Si system was found to be reliable up to $600^{\circ}C$.

A Study on the Structure Properties of Plasma Silicon Oxynitride Film (플라즈마 실리콘 OXYNITRIDE막의 구조적 특성에 관한 고찰)

  • 성영권;이철진;최복길
    • The Transactions of the Korean Institute of Electrical Engineers
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    • v.41 no.5
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    • pp.483-491
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    • 1992
  • Plasma silicon oxynitride film has been applied as a final passivation layer for semiconductor devices, because it has high resistance to humidity and prevents from alkali ion's penetration, and has low film stress. Structure properties of plasma silicon oxynitride film have been studied experimentally by the use of FT-IR, AES, stress gauge and ellipsometry. In this experiment,Si-N bonds increase as NS12TO/(NS12TO+NHS13T) gas ratio increases. Peaks of Si-N bond, Si-H bond and N-H bond were shifted to high wavenumber according to NS12TO/(NS12TO+NHS13T) gas ratio increase. Absorption peaks of Si-H bond were decreased by furnace anneal at 90$0^{\circ}C$. The atomic composition of film represents that oxygen atoms increase as NS12TO/(NS12TO+NHS13T) gas ratio increases, to the contrary, nitrogen atoms decrease.

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Laser- Plume Effects on Radiation Energy Transfer in Materials Processing (레이저 가공시 에너지 전달과 Plume 효과)

  • Kang, Kae-Myung;Kim, Kwang-Ryul
    • Korean Journal of Materials Research
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    • v.12 no.1
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    • pp.27-35
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    • 2002
  • In laser materials processing, localized heating, melting and evaporation caused by focused laser radiation forms a vapor on the material surface. The plume is generally an unstable entity, fluctuating according to its own dynamics. The beam is refracted and absorbed as it traverses the plume, thus modifying its power density on the surface of the condensed phases. This modifies material evaporation and optical properties of the plume. A laser-produced plasma plume simulation is completed using axisymmetric, high-temperature gas dynamic model including the laser radiation power absorption, refraction, and reflection. The physical properties and velocity profiles are verified using the published experimental and numerical results. The simulation results provide the effect of plasma plume fluctuations on the laser power density and quantitative beam radius changes on the material surface. It is proved that beam absorption, reflection and defocusing effects through the plume are essential to obtain appropriate mathematical simulation results. It is also found that absorption of the beam in the plume has much less direct effect on the beam power density at the material surface than defocusing does and helium gas is more efficient in reducing the beam refraction and absorption effect compared to argon gas for common laser materials processing.

Absorption and Thermal Properties According to Ionic Impurities of Semiconductive Materials for Underground Power Cable (지중 전력케이블용 반도전재료의 이온성 불순물에 따른 흡습 및 열적특성)

  • Lee, Kyoung-Yong;Choi, Yong-Sung;Park, Dae-Hee
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.05b
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    • pp.133-137
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    • 2004
  • In this paper, we investigated impurities content, absorption properties, and thermal properties showing by changing the content of carbon black which is semiconductive materials for underground power transmission. Specimens were made of sheet form with the three of existing resins and the nine of specimens for measurement. Impurities content of specimens and absorption properties were measured by ICP-AES (Inductively Coupled Plasma Atomic Emission Spectrometer) and Karl Fisher. And high temperature, heat degradation initiation temperature, and heat weight loss were measured by TGA (Thermogravimetric Analysis). The dimension of measurement temperature was 0$[^{\circ}]$ to 800$[^{\circ}]$, and rising temperature was 10$[^{\circ}/min]$. Impurities content was highly measured according to increasing the content of carbon black from this experimental result also absorption amount was increased according to these properties. Specially, impurities content values of the A1 and A2 of existing resins were measured more than 4000[ppm]. Heat degradation initiation temperature from the TGA results was decreased according to increasing the content of carbon black. All over, heat stabilities were EEA>EBA>pEVA. That is, heat stabilities of EVA containing the weak VA(vinyl acetate) against heat was measured the lowest.

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Consideration on the Electromagnetic Wave Absorption Properties of the Plasma for the Stealth Technology (은신기술을 위한 플라즈마의 전자기파 흡수 특성에 대한 고찰)

  • In, S.R.
    • Journal of the Korean Vacuum Society
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    • v.17 no.6
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    • pp.501-510
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    • 2008
  • The stealth technology to conceal an aircraft from the vision of a radar have been accomplished by coating the surface with special paints absorbing the electromagnetic wave. Nowadays, researches to utilize characteristics of the plasma-wave interaction for realizing the stealth technology are actively progressed. In this paper, to investigate the physical feasibility of the plasma stealth, calculation results for the required conditions of the plasma cloaking on the aircraft flying in the air for showing the stealth function, using a flat non-magnetized non-uniform plasma model, are reported and discussed.

Hydroxyl Radical Species Generated by Non-thermal Direct Plasma Jet and Their Qualitative Evaluation

  • Ghimire, B.;Hong, S.I.;Hong, Y.J.;Choi, E.H.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.198.2-198.2
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    • 2016
  • Reactive oxygen and nitrogen species (RONS) can be generated by using non-thermal atmospheric pressure plasma jet which have profound biomedical applications [1, 2]. In this work, reactive oxygen species like hydroxyl radical (OH) are generated by using non-thermal direct plasma jet above water surface using Ar gas and their properties have been studied using ultraviolet absorption spectroscopy. OH radicals are found to be generated simultaneously with the discharge current with concentration of $2.7{\times}1015/cm3$ at 7mm above water surface while their persistence time have been measured to be $2.8{\mu}S$. In addition, it has been shown that plasma initiated ultraviolets play a major role to generate RONS inside water. Further works are going on to measure the temporal behavior of OH and $O2^*-$.

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Stability of hydrophobic properties of plasma polymerized tetrakis(trimethylsilyloxy)silane film surface

  • Jang, Jinsub;Woo, Sungmin;Ban, Wonjin;Nam, Jaehyun;Lee, Yeji;Choi, Woo Seok;Jung, Donggeun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.147.1-147.1
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    • 2016
  • Hydrophobic thin films are variously applicable for encapsulation of organic devices and water repulsive glass, etc. In this work, the stability of hydrophobic characteristics of plasma polymerized tetrakis (trimethylsilyloxy) silane (ppTTMSS) thin films were investigated. The films were deposited with plasma enhanced chemical vapor deposition (PECVD) on the glass. The deposition plasma power and deposition pressure was 70 W and 600 mTorr, respectively. Thereafter, deposited films were treated by 248nm KrF excimer laser. Stability of hydrophobic properties of plasma polymerized tetrakis(trimethylsilyloxy)silane film surface was tested by excimer laser irradiation, which is thought to simulate severe outdoor conditions. Excimer laser irradiation cycles changed from 10 to 200 cycles. The chemical structure and hydrophobicity of ppTTMSS films were analyzed by using Fourier transform infrared (FTIR) spectroscopy and water contact angle (WCA) measurement, respectively. Absorption spectra peaks and WCA of excimer laser treated ppTTMSS films did not change notably. These results show that our ppTTMSS films possess stable hydrophobic properties.

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Improvement of Interface Adhesionin Ball Grid Array Packages by Plasma Treatment (플라즈마 처리에 의한 BGA 패키지의 계면 접착력 향상)

  • 김경섭;한완옥;장의구
    • Journal of Welding and Joining
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    • v.18 no.4
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    • pp.64-69
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    • 2000
  • Reliability of PBGA(Plastic Ball Grid Array) package is very weak compared with normal plastic packages. The reliability are the lower resistance to popcorn cracking, which is reduced by moisture absorption in PCB(Printed Circuit Board). This paper adapts plasma treatment process and analyzes their effect. The contents of C and Cl decrease after plasma treatment but O, Ca and N relatively increase. The Plasma treatment to improve the adhesion between EMC(Epoxy Molding Compound) and PCB(solder mask). The degree of improvement was over 100% Max., which is depend on the properties of EMC. Ar+H$_2$as plasma gas show good result. There is a little difference in RF power and treatment time.

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