• 연구논문집
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• 통권23호
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• pp.29-43
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• 1993

Photoetching of AISI 304 stainless steel in ferric chloride solution has been studied. This paper investigated on the single side etching characteristics of 304 stainless steel, especially influence of etching temperature, spray pressure of ferric chloride etchant, and etching time with $50\mum$ and $75\mum$ line width photomask.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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• pp.994-996
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• 2002

We present a novel fabrication method for a V-grooved mold of the light guide plat of TFT-LCD with MEMS technology. This method is performed by the inclined UV lithography and Ni electroplating unlike the previous mechanical processing technique. V-grooves with different dimension can be made simultaneously with single photomask.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.I
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• pp.598-601
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• 2005

Z-correction is new method to be used when measuring pattern registration of photomasks. The method is based on measurement of the plate profile in the Zaxis and takes into account the impact on the registration deviations caused by plate support, contamination as well as the photomask flatness itself. Z-correction further facilitates a more neutral way of judging the overlay properties between individual photomasks within a mask set.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.213-213
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• 2016

현재 반도체 산업에서는 디바이스의 고 집적화, 고 수율을 목적으로 패턴의 미세화 및 웨이퍼의 대면적화와 같은 이슈가 크게 부각되고 있다. 다중 패터닝(multiple patterning) 기술을 통하여 고 집적 패턴을 구현이 가능해졌으며, 이와 같은 상황에서 각 패턴의 임계치수(critical dimension) 변화는 패턴의 위치 및 품질에 큰 영향을 끼치기 때문에 포토마스크의 임계치수 균일도(critical dimension uniformity, CDU)가 제작 공정에서 주요 파라미터로 인식되고 있다. 반도체 광 리소그래피 공정에서 크롬(Cr) 박막은 사용되는 포토 마스크의 재료로 널리 사용되고 있으며, 이러한 포토마스크는 fused silica, chrome, PR의 박막 층으로 이루어져 있다. 포토마스크의 패턴은 플라즈마 식각 장비를 이용하여 형성하게 되므로, 식각 공정의 플라즈마 균일도를 계측하고 관리 하는 것은 공정 결과물 관리에 필수적이며 전체 반도체 공정 수율에도 큰 영향을 미친다. 흔히, 포토마스크 임계치수는 플라즈마 공정에서의 라디칼 농도 및 식각 선택비에 의해 크게 영향을 받는 것으로 알려져 왔다. 본 연구에서는 Cr 포토마스크 에칭 공정에서의 Cl2/O2 공정 플라즈마에 대해 O2 가스 주입량에 따른 식각 선택비(etch selectivity) 변화를 계측하여 선택비 제어를 통한 Cr 포토마스크 임계치수 균일도 향상을 실험적으로 입증하였다. 연구에서 사용한 플라즈마 계측 방법인 발광분광법(OES)과 optical actinometry의 적합성을 확인하기 위해서 Cl2 가스 주입량에 따른 actinometer 기체(Ar)에 대한 atomic Cl 농도비를 계측하였고, actinometry 이론에 근거하여 linear regression error 1.9%을 보였다. 다음으로, O2 가스 주입비에 따른 Cr 및 PR의 식각률(etch rate)을 계측함으로써 식각 선택비(etch selectivity)의 변화율이 적은 O2 가스 농도 범위(8-14%)를 확인하였고, 이 구간에서 임계치수 균일도가 가장 좋을 것으로 예상할 수 있었다. (그림 1) 또한, spatially resolvable optical emission spectrometer(SROES)를 사용하여 플라즈마 챔버 내부의 O atom 및 Cl radical의 공간 농도 분포를 확인하였다. 포토마스크의 임계치수 균일도(CDU)는 챔버 내부의 식각 선택비의 변화율에 강하게 영향을 받을 것으로 예상하였고, 이를 입증하기 위해 각각 다른 O2 농도 환경에서 포토마스크 임계치수 값을 확인하였다. (표1) O2 11%에서 측정된 임계치수 균일도는 1.3nm, 그 외의 O2 가스 주입량에 대해서는 임계치수 균일도 ~1.7nm의 범위를 보이며, 이는 25% 임계치수 균일도 향상을 의미함을 보인다.

• 한국인쇄학회지
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• 제28권1호
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• pp.65-75
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• 2010

Environmentally friendly, stencil and screen printing for cost-effective for maskless. In this study, UV -LED light source for the dispersion characteristics and high competence photoresist coating was prepared. Wavelength of 365nm UV-LED exposure device using the maskless lithography, 1.7kgf/$cm^2$ $2600mmH_2O$ the injection pressure and the suction pressure by using a dry photoconductor symptoms were dry emulsion on the market as a result, curing properties and adhesion, hardness, solvent resistance and excellent reproduction of fine patterns and ecological stencil technology was available and could be confirmed as a possibility.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2009년도 제40회 하계학술대회
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• pp.1340_1341
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• 2009

In this report, high-resolution metal electrode patterning is demonstrated by using selective surface treatment and dip casting for low-cost printed electronic applications. On hydrophobic octadecyltrichlorosilane treated $SiO_2$ surface, deep UV irradiation was performed through a patterned quartz photomask to selectively control the surface energy of the $SiO_2$ layer. The deep UV irradiated region becomes hydrophilic and by dipping into Ag nano-ink, Ag patterns were formed on the surface. Using this patterning technique, line patterns and dot arrays having less than $10{\mu}m$ pitch were fabricated.

• 전기학회논문지
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• 제57권1호
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• pp.137-141
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• 2008

Biochip, which implements bioanalytical process on a tiny surface, is one of candidates for medical diagnosis, drug screening, and molecular sensing. In general, a type of biochip based on microfluidics is composed of microcomponents including microchannel, pump, and valve, which require complicated processes. In this study, gray-scale photolithography(GSPL) was applied to fabricate a biochip with multiple layers. A mould for casting PDMS(polydimethylsiloxane) channel, was fabricated using GSPL. A gray-photomask was prepared by printing gray patterns on a high-quality glossy paper followed by photoreducing by 10:1 onto the photo-film. The formation of multiple layers was studied according to the change of gray level of pattern and the developing time. A biochip composed of a weir(multiple layer structure) and a reaction chamber in a single microchannel was fabricated in a glass plate. Finally, we investigated the application of biochip to antigen-antibody reaction by packing the microbead coated with antibody.

• 한국생산제조학회지
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• 제20권1호
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• pp.108-113
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• 2011

There are a lot of PDP TV for a plasma discharge pulse voltage generated by the use of electromagnetic waves. EMI mesh film is near Infrared ray caused by malfunction of the remote control intended to prevent this phenomenon. In this study, the formation of fine pattern by making the mold is imprinted on the film sheet. EMI mesh film has been granted by filling in the conductive material region imprinted with electroforming in the manufacture of resistance. The fine patterns fabricated with electroforming facility thickness of homogenization process technology were established to optimize the working conditions.

• 한국정밀공학회지
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• 제26권6호
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• pp.36-40
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• 2009

Development of maskless lithography techniques can provide a potential solution for the photomask cost issue. Furthermore, it could open a market for small scale manufacturing applications. Since femtosecond lasers have been found suitable for processing of a wide range of materials with sub-micrometer resolution, it is attractive to use this technique for maskless lithography. As a femtosecond laser has recently been developed, both of high power and high photon density are easily obtained. The high photon density results in photopolymerization of photoresist whose absorption spectrum is shorter than that of the femtosecond laser. The maskless lithography using the two-photon absorption (TPA) makes micro structures. In this paper, we present a femtosecond laser direct write lithography for submicron PR patterning, which show great potential for future application.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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• pp.405-408
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• 2002

In this paper, we propose a novel method to form polymer walls without accurate alignment of photomask. The method can be used to form polymer walls in reflective LCDs.