• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.293-294
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• 2011

It is known that semiconductor quantum-dot (QD) heterostructures have superior zero-dimensional quantum confinement, and they have been successfully applied to semiconductor laser diodes (QDLDs) for optical communication and infrared photodetectors (QDIPs) for thermal images [1]. The self-assembled QDs are normally formed at Stranski-Krastanov (S-K) growth mode utilizing the accumulated strain due to lattice-mismatch existing at heterointerfaces between QDs and cap layers. In order to increase the areal density and the number of stacks of QDs, recently, sub-monolayer (SML)-thick QDs (SQDs) with reduced strain were tried by equivalent thicknesses thinner than a wetting layer (WL) existing in conventional QDs (CQDs) by S-K mode. Despite that it is very different from CQDs with a well-defined WL, the SQD structure has been successfully applied to QDIP[2]. In this study, optical characteristics are investigated by using photoluminescence (PL) spectra taken from self-assembled InAs/GaAs QDs whose coverage are changing from submonolayer to a few monolayers. The QD structures were grown by using molecular beam epitaxy (MBE) on semi-insulating GaAs (100) substrates, and formed at a substrate temperature of 480$^{\circ}C$ followed by covering GaAs cap layer at 590$^{\circ}C$. We prepared six 10-period-stacked QD samples with different InAs coverages and thicknesses of GaAs spacer layers. In the QD coverage below WL thickness (~1.7 ML), the majority of SQDs with no WL coexisted with a small amount of CQDs with a WL, and multi-peak spectra changed to a single peak profile. A transition from SQDs to CQDs was found before and after a WL formation, and the sublevel of SQDs peaking at (1.32${\pm}$0.1) eV was much closer to the GaAs bandedge than that of CQDs (~1.2 eV). These revealed that QDs with no WL could be formed by near-ML coverage in InAs/GaAs system, and single-mode SQDs could be achieved by 1.5 ML just below WL that a strain field was entirely uniform.

• 한국재료학회지
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• 제3권5호
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• pp.443-450
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• 1993

실리콘이 주입된 CaAs 기판위에 플라즈마 화학 증착법으로 자기정렬 gate구조의 Schottky contact을 형성하였다. 갈륨비소 소자 제조를 위하여 두께 1600$\AA$의 턴스텐질화막을 $350^{\circ}C$에서 증착하여 $750^{\circ}C$에서 $900^{\circ}C$까지 급속 열처리 하였다. 텅스텐 질화막과 GaAs계면의 열적 안정성을 XRD(X-ray diffraction), PL(photoluminescence),ODLTS(optical deep livel transient spectroscopy)측정으로 조사하였으며, W보다 $W_{67}N_{33}$ gate를 형성시킬 경우에 GaAs에 미치는 열적손상이 적음을 알 수 있으며 이온 주입한 Si이온이 활성화 되는 것으로 생각된다. $W_{67}N_{33}$ GaAs 다이오드가 약 800-$900^{\circ}C$의 고온열처리 온도에서 W/GaAs 다이오드의 경우보다 열적 안정성이 우수하였다.

• Korean Chemical Engineering Research
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• 제44권3호
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• pp.284-288
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• 2006

분무열분해법을 이용하여$(Ca,Sr)_{2-y}MgSi_2O_7:Eu^{2+}{_y}$ 형광체 분말을 제조하고 $Eu^{2+}$의 농도, 후열처리온도 변화 및 Ca/Sr 비에 따른 발광특성을 조사하였다. 또한, Ca/Sr의 비를 변화시켜 발광특성의 변화를 관찰하였다. $Ca_2MgSi_2O_7$나 $Sr_2MgSi_2O_7$ 분말 모두 $1,000^{\circ}C$ 이상의 온도에서 열처리를 했을 때 순수한 정방정계 상이 제조되었다. $Ca_2MgSi_2O_7:Eu^{2+}{_y}$ 녹색 형광체는 $Eu^{2+}(y)$의 농도가 5 mol％, 후열처리 온도가 $1,250^{\circ}C$ 일 때 가장 높은 발광 강도는 보였다. ${(Ca_{1-x},Sr_x)}_{1.95}MgSi_2O_7:{Eu^{2+}}_{0.05}$의 발광 파장은 Sr의 농도가 증가함에 따른 결정장 감소로 인해 524nm에서 456nm로 점진적으로 blue shift 되었다. $Sr_2MgSi_2O_7:Eu^{2+}$는 Sr 자리에 약 10 mol％ Ca를 치환시킴으로써 청색 형광체의 발광 강도는 크게 향상되었다. 제조된 분말들은 치밀하지 못하고 다공성 구조를 가져 후열처리 전에는 구형을 유지하였으나 열처리($900{\sim}1,300^{\circ}C$) 후에는 구형의 형상을 잃고 입자들 간의 응집이 발생하였다.

• 한국재료학회지
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• 제22권4호
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• pp.180-184
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• 2012

Nanostructures of ZnO, such as nanowires, nanorods, nanorings, and nanobelts have been actively studied and applied in electronic or optical devices owing to the increased surface to volume ratio and quantum confinement that they provide. ZnO seed layer (about 40 nm thick) was deposited on Si(100) substrate by RF magnetron sputtering with power of 60 W for 5 min. ZnO nanorods were grown on ZnO seed layer/Si(100) substrate at $95^{\circ}C$ for 5 hr by hydrothermal method with concentrations of $Zn(NO_3)_2{\cdot}6H_2O$ [ZNH] and $(CH_2)_6N_4$ [HMT] precursors ranging from 0.02M to 0.1M. We observed the microstructure, crystal structure, and photoluminescence of the nanorods. The ZnO nanorods grew with hexahedron shape to the c-axis at (002), and increased their diameter and length with the increase of precursor concentration. In 0.06 M and 0.08 M precursors, the mean aspect ratio values of ZnO nanorods were 6.8 and 6.5; also, ZnO nanorods had good crystal quality. Near band edge emission (NBE) and a deep level emission (DLE) were observed in all ZnO nanorod samples. The highest peak of NBE and the lower DLE appeared in 0.06 M precursor; however, the highest peak of DLE and the lower peak of NBE appeared in the 0.02 M precursor. It is possible to explain these phenomena as results of the better crystal quality and homogeneous shape of the nanorods in the precursor solution of 0.06 M, and as resulting from the bed crystal quality and the formation of Zn vacancies in the nanorods due to the lack of $Zn^{++}$ in the 0.02 M precursor.

• Bulletin of the Korean Chemical Society
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• 제26권11호
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• pp.1807-1818
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• 2005

New PPV based conjugated polymers, containing terphenyl units, were prepared as the electroluminescent (EL) layer in light-emitting diodes (LEDs). The prepared polymers, poly[2,5-bis(4-(2-etylhexyloxy)phenyl)-1,4-phenylenevinylene] (BEHP-PPV), poly[2-(2-ethylhexyloxy)-5-(4-(4-(2-etylhexyloxy)phenyl)phenyl)-1,4-phenylenevinylene] (EEPP-PPV) and poly[2-(2-ethylhexyloxy)-5-(9,9-bis(2-etylhexyl)fluorenyl)-1,4 phenylenevinylene] (EHF-PPV), were soluble in common organic solvents and used as the EL layer in double layer light-emitting diodes (LEDs) (ITO/PEDOT/polymer/Al). The polymers were prepared by the Gilch reaction. The number-average molecular weight $(M_n)$, weight-average molecular weight $(M_w)$, and the polydispersities (PDI) of these polymers were in the range of 9000-58000, 27000-231000, 2.9-3.9, respectively. These polymers have quite good thermal stability with decomposition starting above 320-350. The polymers show photoluminescence (PL) with maximum peaks at around 526-562 nm (exciting wavelength, 410 nm) and blue EL with maximum peaks at around $\lambda_{max}$ = 526-552 nm. The current-voltageluminance (I-V-L) characteristics of polymers show turn-on voltages of 5 V. Even though both of EEPP-PPV and BEHP-PPV have the same terphenyl group in the repeating unit, EEPP-PPV with directly substituted alkoxy group in the back bone has longer effective conjugation length than BEHP-PPV, and exhibits red shift in the PL spectra. Both of EEPP-PPV and EHF-PPV have ter-phenyl units and directly substituted alkoxy group in back bone. EHF-PPV with fluorenyl unit attached to the PPV backbone has shorter effective conjugation length than EEPP-PPV with biphenyl unit, and exhibits blue shift in the PL spectra.

• 청정기술
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• 제17권1호
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• pp.78-82
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• 2011

본 연구에서는 보다 효율적인 광 전기화학적 수소제조를 위하여 광촉매로써 티타니아 골격에 positive-type 반도체로써 B 이온, negative-type 반도체로써 P 이온을 삽입하여 고온 고압에서 용매열(solvothermal)법으로 P- 그리고 B-$TiO_2$ 나노 입자를 제조하였다. 제조한 P-$TiO_2$와 B-$TiO_2$의 물리적 특성은 X-ray 회절분석법, 투과전자현미경, 자외선-가시선 분광광도계, 발광분광계를 통해 확인하였다. 메탄올/물(1:1) 광분해 수소제조 실험 결과, 1.0 mol% B-$TiO_2$ 광촉매가 순수 anatase $TiO_2$ 광촉매 보다 활성이 향상되었으며, 0.5 g의 1.0 mol% B-$TiO_2$ 촉매를 사용한 경우 10시간 반응 시 0.42 mL의 수소가 발생되었다.

• Korean Chemical Engineering Research
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• 제48권1호
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• pp.75-79
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• 2010

에틸렌디아민테트라아세트산, 구연산 및 $NH_4Cl$ 융제가 첨가된 분무용액으로부터 분무열분해법에 의해 얇은 막 구조의 전구체 분말들을 합성하였다. $1,200^{\circ}C$에서 소성 과정을 거친 유기 첨가제와 융제를 사용하지 않은 $BaMgAl_{10}O_{17}:Eu$ 형광체는 $1{\sim}5{\mu}m$ 크기의 구형이며, 두꺼운 막 형태의 속이 빈 구조를 가졌다. 반면에 에틸렌디아민아세트산과 구연산을 첨가하여 합성된 BAM:Eu 형광체는 판상 구조의 미세한 크기를 가졌다.$NH_4Cl$ 융제의 첨가량이 0, 6, 35 wt%일때 합성된 미세 형광체들의 결정자 크기는 각각 23, 35, 33 nm였다. 최대의 발광 세기를 나타내는 최적의 융제 첨가량은 형광체의 35 wt%였으며, 융제를 첨가하지 않은 분무용액으로부터 합성된 형광체의 발광 세기의 215%였다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1988년도 추계학술대회 논문집 학회본부
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• pp.372-375
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• 1988

The III-V ternary alloy semiconductor $In_{l-x}Ga_{x}As$ were grown by the temperature Gradient of $0.60{\leq}x{\leq}0.98$. The electrical properties were investigated by the Hall effect measurement with the Van der Pauw method in the temperature range of $90{\sim}300K$. $In_{l-x}Ga_{x}As$ were revealed n-type and the carrier concentration at 300K were in the range of $9.69{\times}10^{16}cm^{-3}{\sim}7.49{\times}10^{17}cm^{-3}$. The resistivity was increased and the carrier mobility was decreased with increasing the composition ratio. The optical energy gap determined by optical transmission were $20{\sim}30meV$ lower than theoretical valves on the basis of absorption in the conduction band tail and it was decreased with increasing the temperature by the Varshni rule. In the photoluminescence of undoped $In_{l-x}Ga_{x}As$ at 20K, the main emission was revealed by the radiative recombination of shallow donor(Si) to acceptor(Zn) and the peak energy was increased with increasing the composition, X. The diffusion depth of Zn increases proportionally with the square root of diffusion time, and the activation energy for the Zn diffusion into $In_{0.10}Ga_{0.90}As$ was 2.174eV and temperatures dependence of diffusion coefficient was D = 87.29 exp(-2.174/$K_{B}T$). The Zn diffusion p-n $In_{x}Ga_{x}As$ diode revealed the good rectfying characteristics and the diode factor $\beta{\approx}2$. The electroluminescence spectrum for the Zn-diffusion p-n $In_{0.10}Ga_{0.90}As$ diode was due to radiative recombation between the selectron trap level(${\sim}140meV$) and Zn acceptor level(${\sim}30meV$). The peak energy and FWHM of electroluminescence spectrum at 77K were 1.262eV and 81.0meV, respectively.

• 한국진공학회지
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• 제15권3호
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• pp.294-300
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• 2006

금속유기화학증착기 (metal-organic chemical vapor deposition)를 이용하여 분포귀환형 (distributed feed back) InP/InGaAs/InP 회절격자 구조를 제작하고 원자력간현미경 (atomic force microscopy)과 주사전자현미경 (scanning electron microscopy) 실험을 통해 표면 및 단면을 분석하였다. 그 위에 분자선증착기(molecular beam epitaxy)법을 이용하여 자발형성 (self-assembled) InAs/InAlGaAs 양자점 (quantum dot)을 성장하고, 광학적 특성을 온도변화 광여기 발광 (photoluminescence)으로 회절격자 구조 없이 성장한 양자점 시료와 비교 분석하였다. 회절격자의 간격 대비 폭의 비가 약 30%인 InP/InGaAs/InP 회절격자가 제작되었으며, 그 위에 성장된 양자점의 경우 상온 파장이 1605 nm에서 PL이 관찰되었다. 이는 회절격자 없이 같은 조건에서 성장된 시료의 상온 파장인 1587 nm 보다 장파장에서 발광하였으며, 회절격자의 영향으로 양자점 크기가 변하였음을 조사하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.11-11
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• 2008

ZnO has a very large exciton binding energy (60 meV) as well as thermal and chemical stability, which are expected to allow efficient excitonic emission, even at room temperature. ZnO based electronic devices have attracted increasing interest as the backplanes for applications in the next-generation displays, such as active-matrix liquid crystal displays (AMLCDs) and active-matrix organic light emitting diodes (AMOLEDs), and in solid state lighting systems as a substitution for GaN based light emitting diodes (LEDs). Most of these electronic devices employ the electrical behavior of n-type semiconducting active oxides due to the difficulty in obtaining a p-type film with long-term stability and high performance. p-type ZnO films can be produced by substituting group V elements (N, P, and As) for the O sites or group I elements (Li, Na, and K) for Zn sites. However, the achievement of p-type ZnO is a difficult task due to self-compensation induced from intrinsic donor defects, such as O vacancies (Vo) and Zn interstitials ($Zn_i$), or an unintentional extrinsic donor such as H. Phosphorus (P) doped ZnO thin films were grown on c-sapphire substrates by radio frequency magnetron sputtering with various Ar/ $O_2$ gas ratios. Control of the electrical types in the P-doped ZnO films was achieved by varying the gas ratio with out post-annealing. The P-doped ZnO films grown at a Ar/ $O_2$ ratio of 3/1 showed p-type conductivity with a hole concentration and hole mobility of $10^{-17}cm^{-3}$ and $2.5cm^2/V{\cdot}s$, respectively. X-ray diffraction showed that the ZnO (0002) peak shifted to lower angle due to the positioning of $p^{3-}$ ions with a smaller ionic radius in the $O^{2-}$ sites. This indicates that a p-type mechanism was due to the substitutional Po. The low-temperature photoluminescence of the p-type ZnO films showed p-type related neutral acceptor-bound exciton emission. The p-ZnO/n-Si heterojunction LEO showed typical rectification behavior, which confirmed the p-type characteristics of the ZnO films in the as-deposited status, despite the deep-level related electroluminescence emission.