• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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• pp.369-372
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• 2008

Black matrix and Ag electrode with uniform line pitches were successfully fabricated through the photolithographic process by using the photosensitive black pastes and Ag pastes with optimized photosensitive properties for high resolution PDPs. The photosensitivity of the black and Ag pastes in the photolithographic process was investigated with the variation of photosensitive BM and Ag pastes and the photolithography process conditions. The important components and formulation of the photosensitive BM and Ag paste we discussed.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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• pp.381-384
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• 2003

Photosensitive electordes(Ag and Black) are widely used in the patterning of both address and bus electrodes on the rear and front panel of plasma display panel (PDP). As the need for high resolution(>XGA) and large area(>60 inches) PDP is increased, basic understanding of each component of formulation on the photolithographic process of patterning electrodes are required in order to increase the yield in the production of PDP. In this work, the materials and amount of necessary components of photosensitive electrode paste and their effect on the photolithographic process of patterning electrodes were studied.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
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• pp.177-179
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• 2000

Barrier rib for the plasma display panel (PDP) was made by photolithographic process utilizing photosensitive barrier rib paste. The barrier rib paste was prepared by first dissolving poly(MMA-co-MAA) binder polymer in butyl carbitol(BC) solvent at 15 wt% concentration. To this solution were added a mixture of functional monomers , Irgacure 651 photoinitiator, and barrier rib power and then the whole mixture was dispersed in the three roll mill for 2 hour. The effect of component and concentration of photosensitive barrier rib paste was studied. After optimization of the paste formulation and photolithographic process, barrier rib could be obtained with good resolution up to 110-120 ${\mu}m$ height and 80-90 ${\mu}m$ width.

• 공업화학
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• 제9권1호
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• pp.6-12
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• 1998

감광성 고분자를 감지막 재료로 한 FET(Field Effect Transistor)형 $CO_2$센서를 사진식각법으로 제작하였다. 즉, 바탕소자인 pH-ISFET gate 위에 먼저 Ag/AgCl 기준전극을 형성한 후, 수화젤(hydrogel)막 및 기체투과막의 순서로 감지막을 사진식각법으로 형성하였다. 광가교형 감광성 고분자 polyvinyl alcohol 또는 poly(vinyl pyrrolidinone-co-vinyl acetate)를 감지막의 재료로 할 경우에는 사진식각법으로 용매를 포함하는 일정두께의 수화젤막을 형성하는 것이 어려운 것으로 판단되었다. 광중합 감광성 고분자로서 2-hydroxy methacrylate, acrylamide 단량체를 수화젤막 재료로, polyurethane acrylate oligomer를 기체투과막의 재료로써 사용할 경우 사진식각법으로 용이하게 막의 형성이 가능하였고, 제조된 FET형 $CO_2$ sensor는 $CO_2$농도 $10^{-3}{\sim}10^0mole/{\ell}$에서 좋은 직선성을 나타내었다.

• 공업화학
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• 제10권8호
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• pp.1114-1118
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• 1999

플라즈마 디스플레이 패널(PDP)의 격벽(barrier rib)은 일정한 선폭과 높이를 가져 균일한 방전 공간을 제공하고, 인접한 셀 간의 전기적, 광학적 혼선(crosstalk)을 방지하기 위해 PDP의 하부 유리 기판 패널에 들어가는 구조물이다. 본 연구에서는 사진식각(photolithography)법으로 격벽을 형성하는데 필요한 감광성 격벽 페이스트가 제조되었다. 페이스트는 바인더 고분자인 에틸셀룰로오즈를 BC/BCA = 30/70 wt %인 혼합 용매에 15 wt %로 용해한 다음 관능성 단량체로서TPGDA/PETA = 50/50 wt % 혼합물, 광개시제로서 Irgacur 651 및 격벽 분말을 도입한 다음 전체를 균일하게 분산시켜 제조하였다. 감광성 격벽 페이스트의 각 성분, 조성 및 공정을 최적화하여 소성 후 높이 약 $100{\mu}m$ 에 이르는 PDP용 격벽을 고해상도로 사진식각법으로 얻을 수 있었다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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• pp.823-827
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• 2005

Barrier ribs in the plasma display panel (PDP) function to maintain the discharge space between the glass plates as well as to prevent optical crosstalk. Patterning of barrier ribs is one of unique processes for making PDP. Barrier ribs could be formed by screen-printing, sand blasting, etching, and photolithographic process. In this work photosensitive barrier rib pastes were prepared by incorporating binder polymer, solvent, functional monomers photoinitiator, and barrier rib powder of which surface was treated with fumed silica particles. Studies on the function of materials for the barrier rib paste were undertaken. After optimization of paste formulation and photolithographic process, it was applied to the photosensitive barrier rib green sheet and was found that photolithographic patterning of barrier ribs could be formed with good resolution up to $110{\mu}m$ height and $60{\mu}m$ width after sintering.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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• pp.1225-1228
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• 2005

Barrier ribs in the plasma display panel(PDP) function to maintain the discharge space between the glass plates as well as to prevent optical crosstalk. Patterning of barrier ribs is one of unique processes for making PDP. In this work photosensitive barrier rib pastes were prepared by incorporating binder polymer, solvent, functional monomers photoinitiator, and barrier rib powder of which surface was treated with fumed silica particles. Study on the function of materials for the barrier rib paste were undertaken. After optimization of paste formulation and photolithographic process, it was found that photolithographic patterning of barrier ribs with photosensitive barrier rib green sheet could be used in the fabrication of high resolution PDP.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.105.2-105.2
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• 2016

For the rational design and facile fabrication of novel nanostructures, we present a new approach to generating arrays of three-dimensionally tunable nanostructures by exploiting light-matter interaction. To create controlled three-dimensional (3D) nanostructures, we utilize the 3D spatial distribution of light, induced by the light-matter interaction, within the matter to be patterned. As a systematic approach, we establish 3D modeling that integrates the physical and chemical effects of the photolithographic process. Based on a comprehensive analysis of structural formation process and nanoscale features through this modeling, we are able to realize three-dimensionally tunable nanostructures using facile photolithographic process. Here we first demonstrate the arrays of three-dimensionally controlled, stacked nanostructures with nanoscale, tunable layers. We expect that the promising strategy would open new opportunities to produce the arrays of tunable 3D nanostructures using more accessible and facile fabrication process for various biomedical applications ranging from biosensors to drug delivery devices.

• International Journal of Precision Engineering and Manufacturing
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• 제4권5호
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• pp.22-26
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• 2003

In this work, a new non-photolithographic micro-fabrication technique is presented. The motivation of this work is to overcome the demerits of the most commonly used photolithographic techniques. The micro-fabrication technique presented in this work is a two-step process which consists of mechanical scribing followed by chemical etching. This method has many advantages over other micro-fabrication techniques since it is simple, cost-effective, rapid, and flexible. Also, the technique can be used to obtain a metal structure which has sub-micrometer width patterns. In this paper, the concept of this method and its application to microsystem technology are described.

• 한국정밀공학회지
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• 제19권11호
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• pp.228-233
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• 2002

In this work, a new non-photolithographic micro-fabrication technique is presented. The motivation of this work is to overcome the demerits of the most commonly used photolithographic techniques. The micro-fabrication technique presented in this work is a two-step process which consists of mechanical scribing followed by chemical etching. This method has many advantages over other micro-fabrication techniques since it is simple, cost-effective, rapid, and flexible. Also, the technique can be used to obtain a metal structure which has sub-micrometer width patterns. In this paper, the concept of this method and its application to microsystem technology are described.