• Title/Summary/Keyword: Photoconductive Cell

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Sensitivity Enhancement of a Hot-Wire Anemometer by Changing Overheat Ratio with Velocity (유속에 따른 열선의 과열비 조정을 통한 열선유속계의 감도향상에 관한 연구)

  • ;;Kauh, S. K.
    • Transactions of the Korean Society of Mechanical Engineers
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    • v.19 no.10
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    • pp.2678-2689
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    • 1995
  • In this study, a new hot-wire anemometer which has greater sensitivity than that of a constant temperature anemometer (CTA) was proposed. In contrast to CTA, the wire working resistance of the new anemometer increases with flow velocity, that is, the operating mode of the wire becomes variable temperature. The variable temperature anemometer(VTA) was made by substituting a voltage controlled variable resistor such as photoconductive cell or transistor for one of the resistors in the bridge. By positively feeding back the bridge top signal to the input side of these electronic components, the wire overheat ratio could be increased with velocity automatically. Static response analyses of the VTA, constant voltage anemometer (CVA) and CTA were made in detail and calibration experiments were performed to validate the proposed operating principle. The wire operating resistance of the CVA decreases with velocity and this leads to lower sensitivity than that of a CTA. But the sensitivity of the newly proposed VTA is superior to that of a CTA, since the wire overheat ratio increases with velocity. Consequently, it is found that the major factor that is responsible for large sensitivity of a VTA is not the working resistance itself but the change of the wire working resistance with velocity.

Growth of $Cd_{1-x}Zn_xS $ Thin films Using Hot Wall Epitaxy Method and Their Photoconductive Characteristics (HWE에 의한 $Cd_{1-x}Zn_xS $박막의 성장과 광전도 특성)

  • 홍광준;유상하
    • Korean Journal of Crystallography
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    • v.9 no.1
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    • pp.53-63
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    • 1998
  • The Cd1-xZnxS thin films were grown on the Si(100) wafers by a hot wall epitaxy method (HWE). the source and substrate temperature are 600℃ and 440℃, respectively. The crystalline structure of epilayers was investigated by double crystal X-ray diffraction (DCXD). Hall effect on the sample was measured by the van der Pauw method and the carrier density and mobility dependence of Hall characteristics on temperature was also studied. In order to explore the applicability as a photoconductive cell, we measured the sensitivity (γ), the ratio of photocurrent to darkcurrent (pc/dc), maximum allowable power dissipation (MAPD), spectral response and response time. The results indicated that the best photoconductive characteristic were observed in the Cd0.53Zn0.47S samples annealed in Cu vapor comparing with in Cd, Se, air and vacuum vapour. Then we obtained the sensitivity of 0.99, the value of pc/dc of 1.65 × 107, the MAPD of 338mW, and the rise and decay time of 9.7 ms and 9.3 ms, respectively.

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Growth and Photoconductive Characteristics of $ZnGa_2Se_4$ Epilayers by the Hot Wall Epitaxy

  • Park, Chang-Sun;Hong, Kwang-Joon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07a
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    • pp.263-266
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    • 2004
  • The stochiometric mix of evaporating materials for the $ZnGa_2Se_4$ single crystal thin films were prepared from horizental furnace. The polycrystal structure obtaind from the power x-ray diffraction was defect chalcopyrite. The lattice costants $a_0\;and\;c_0\;were\;a_0=5.51\;A,\;c_0=10.98\;A$. To obtains the single crystal thin films, $ZnGa_2Se_4$ mixed crystal were deposited on throughly etched Si(100) by the Hot Wall Epitaxy (HWE) system. The temperates of the source and the substrate were $590^{\circ}C\;and\;450^{\circ}C$, respectively. The crystalline structure of single crystal thin films was investigated by the double crystal X-ray diffraction(DCXD). Hall effect on this sample was measured by the method of van der Pauw and studied on carrier density and mobility dependence on temperature. In order to explore the applicability as a photoconductive cell, we measured the sensitivity($\gamma$), the ratio of photocurrent to dark current(pc/dc), maximum allowable rower dissipation(MAPD), spectral response and response time.

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Growth and optoelectrical properties for $Cd_{1-x}Zn_xS$ thin films byg Hot Wall Epitaxy method (HWE에 의한 $Cd_{1-x}Zn_xS$ 박막의 성장과 광전기적 특성)

  • Lee, Sang-Youl;Hong, Kwang-Joon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07a
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    • pp.304-308
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    • 2004
  • The $Cd_{1-x}Zn_xS$ thin films were grown on the Si(100) wafers by a hot wall epitaxy method(HWE). The source and substrate temperature are $600^{\circ}C\;and\;440^{\circ}C$ respectively. The crystalline structure of epilayers was investigated by double crystal X-ray diffraction(DCXD). Hall effect on the sample was measured by the van der Pauw method and studied on the carrier density and mobility dependence on temperature. In order to explore the applicability as a photoconductive cell, we measured the sensitivity($\gamma$), the ratio of photocurrent to darkcurrent(pc/dc), maximum allowable power dissipation(MAPD), spectral response and response time. The results indicated that the photoconductive characteristic were the best for the $Cd_{0.53}Zn_{0.47}S$ samples annealed in Cu vapor compare with in Cd, Se, air and vacuum vapour. Then we obtained the sensitivity of 0.99, the value of pc/dc of $1.65{\times}10^7$, the MAPD of 338mW, and the rise and decay time of 9.7ms and 9.3ms, respectively

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Growth and Photoconductive Characteristics of $AgInS_2$ Single Crystal Thin Films by the Hot Wall Epitaxy

  • Hong, Kwang-Joon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07a
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    • pp.381-384
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    • 2004
  • The stochiometric nix of evaporating materials for the $AgInS_2$ single crystal thin films were prepared from horizontal furnace. The polycrystal structure obtaind from the power x-ray diffraction was chalcopyrite. The lattice costants $a_0\;and\;c_0$ were $a_0=5.86(5.82)\;A,\;c_0=11.355(11.17)\;A$. To obtains the single crystal thin films, $AgInS_2$ mixed crystal were deposited on throughly etched GaAs(100) by the Hot Wall Epitaxy(HWE) system. The temperates of the source and the substrate were $590^{\circ}C\;and\;450^{\circ}C$, respectively. The crystalline structure of single crystal thin films was investigated by the double crystal X-ray diffraction(DCXD). Hall effect on this sample was measured by the method of van der Pauw and studied on carrier density and mobility dependence on temperature. In order to explore the applicability as a photoconductive cell, we measured the sensitivity($\gamma$), the ratio of photocurrent to dark current (pc/dc), maximum allowable power dissipation(MAPD), spectral response and response time.

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Growth and Photosensor Properties for $AgInS_2$ Single Crystal Thin Film ($AgInS_2$ 단결정 박막 성장과 광센서 특성)

  • Hong, Kwang-Joon;Baek, Seong-Nam
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.06a
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    • pp.134-135
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    • 2006
  • $AgInS_2$ single crystal thin filmsl was deposited on throughly etched semi-insulator GaAs(100) substrate by the Hot Wall Epitaxy (HWE) system. The source and substrate temperature were $680^{\circ}C$ and $410^{\circ}C$ respectively, and the thickness of the single crystal thin films is $6{\mu}m$. From the photocurrent spectrum by illumination of perpendicular light on the c-axis of the $AgInS_2$ single crystal thin film, we have found that the values of spin orbit coupling ${\Delta}So$ and the crystal field splitting ${\Delta}Cr$ were 0.0098 eV and 0.15 eV at 10 K, respectively. In order to explore the applicability as a photoconductive cell, we measured the sensitivity ($\gamma$), the ratio of photocurrent to darkcurrent (pc/dc), maximum allowable power dissipation (MAPD), spectral response and response time. The result indicated that the samples annealed in S vapour the photoconductive characteristics are best. Therefore we obtained the sensitivity of 0.98, the value of pc/dc of $1.02{\times}10^6$, the MAPD of 312 mW, and the rise and decay time of 10.4ms and 10.8ms respectively.

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Growth of CdS thin film using hot wall epitaxy method and their photoconductive characteristics (HWE 방법에 의한 CdS 박막의 성장과 광전도 특성)

  • 홍광준
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.6 no.3
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    • pp.341-350
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    • 1996
  • The CdS thin films are grown on quartz plate by hot wall epitaxy. The source and substrate temperature is $590^{\circ}C$ and $400^{\circ}C$ respectively, and thickness of the film is $2.5\;\mu\textrm{m}$. Using extrapolation method of X-ray diffraction patterns for the CdS thin film, it was found hexagonal structure whose lattice constant a and c were $4.137\;{\AA}$ and $6.713\;{\AA}$, respectively. Hall effect on this sample was measured by the method of van der Pauw and studied on cattirer density and mobility depending on temperature. From hall data, the mobility was likely to be decreased by piezoelectric scattering in the temperature range 30 K to 200 K and by polar optical scattering in the temperature range 200 K to 293 K. In order to explore the applicability as a photoconductive cell we measured the sensitivity ($\gamma$), the ratio of photocurrent to darkcurrent (pc/dc), maximum allowable power dissipation (MAPD), spectral response and response time. The results indicated that for the samples annealed in Cu vapor the photoconductive characteristics are the best. Then we obtained the sensitivity of 0.99, the value of pc/dc of $9.42{\times}10^{6}$, the MAPD of 318 mW, and the rise and decay time of 10 ms and 9 ms, respectively.

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Growth of $CdS_{0.67}Se_{0.33}$ single crystal by sublimation method and their photoconductive characteristics (승화법에 의한 $CdS_{0.67}Se_{0.33}$ 단결정 성장과 광전도 특성)

  • Hong, K.J.;Lee, S.Y.
    • Journal of Sensor Science and Technology
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    • v.7 no.2
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    • pp.131-139
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    • 1998
  • $CdS_{0.67}Se_{0.33}$ single crystal was grown by vertical sublimation method of closed tube physical vapour deposition. The (0001) growth plane of oriented single crystals was confirmed from the back-ref1ection Laue patterns. From the Hall effects by van der Pauw method, the as-grown $CdS_{0.67}Se_{0.33}$ single crystals were found to be n-type semiconductors. The mobility appeared to be decreased by lattice scattering at temperature range from 150K to 293K and by impurity scattering at temperatures ranging from 30K to 150K In order to explore its applicability in photoconductive cells, we measured the ratio of photo-current to dark-current (pc/dc), maximum allowable power dissipation (MAPD), spectral response and response time respectively. The results indicated that for the samples annealed in Cu vapour the photoconductive characteristics are best. We obtained sensitivity of 0.99, the value of pc/de of $1.84{\times}10^{7}$, the MAPD of 323mW and the rise and decay time of 9.3 ms and 9.7 ms, respectively.

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Development and Properties of Carbon monoxide Detector for Ambient Air monitoring (대기오염 측정용 일신화 탄소 검출기의 제작 및 특성)

  • Cho, Kyung-Haeng;Lee, Sang-Wha;Lee, Joung-Hae;Choi, Kyong-Sik
    • Analytical Science and Technology
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    • v.13 no.2
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    • pp.222-228
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    • 2000
  • A detector for monitoring carbon monoxide (CO) in ambient air by nondispersive infrared (NDIR) spectroscopy has been developed and investigated its sensitivity and stability. The essential parts of the absorption cell are three spherical concave mirrors so as to improve the sensitivity by increasing the light path length in the cell. The radius and center of curvature of mirrors and position in the cell was calculated by computer simulation in order that the light path length may be 16m into the 50cm cell. The number of traversals and optical path properties were confirmed by laser beam alignment in transparent absorption cell. The photoconductive type lead selenide (PbSe) was used as CO sensing material, which was cooled to increase the responsibility by thermoelectric cooling method. The detection limit and span drift of the developed CO detector was 0.24ppm and 0.03ppm(v/v) respectively.

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Fabrication and optoelectrical properties for cdSSe photoconductive cell by using print/sintering (인쇄/소결 방법에 의한 CdSSe 광전도 셀 제작과 광전기적 특성)

  • Hong, Kwang-Joon;Lee, Sang-Youl
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.04b
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    • pp.46-50
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    • 2004
  • 인쇄/소결 방법으로 가시영역에서 광감도가 매우 큰 CdSSe 다결정 후막을 만들고 이를 이용하여 광전도 젤을 제작하였다. 후막의 낱알 크기는 $5{\mu}m$ 정도이였다. 광전도 셀은 소결 촉진제로 첨가한 $cucl_2$ 양이 CdSSe 1 g 당 3.06~0.10 mg 정도이변 감도, 광전류와 암전류의 비율이 각각 0.7과 $10^5$ 이상을 나타내었고, Cds 와 CdSe 의 질량비가 1:0, 9:1, 8:2, 7:3, 6:4, 5:5일 때 응답파장은 각각 500nm, 520nm, 540nm, 570nm, 620nm, 660nm였다. 또한 주파수 특성을 나타내는 응답시간은 오름시간과 감쇠시간이 각각 30관 20ms 정도 이였으며 최대허용 소비 전력은 80mw 이상이었다. 이상과 같이 인쇄/소결 방법으로 제작된 광전도 셀은 $cucl_2$ 양이 CdSSe 1g 당 0.06~0.10 mg 정도 주입되면 센서로써 좋은 특성을 나타내었다.

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