• 제목/요약/키워드: Photochemical deposition

검색결과 26건 처리시간 0.019초

In Vitro에서 광증감제에 의한 광학적 영향에 관한 연구 (A Study on the Optical Influence by Photosensitizer in Vitro)

  • 김기준;성기천
    • 한국응용과학기술학회지
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    • 제22권2호
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    • pp.182-190
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    • 2005
  • The propagation of light radiation within tissues is an important problem that confronts the dosimetry of therapeutic laser delivery and the development of diagnostic spectroscopy. In the clinical application of photodynamic therapy(PDT) and in photobiology, the photon deposition within a tissue determines the spatial distribution of photochemical reactions. Scattered light is measured as a function of the distance (r) between the axis of the incident beam and the detection spot. Consequently, knowledge of the photosensitizer(Chlorophyll-a) function that characterizes a phantom is important. To obtain the results of scattering coefficients(${\mu}s$) of a turbid material from diffusion described by experimental approach. It was measured the energy fluency of photon radiation at the position of penetration depth. From fluorescence experimental method obtained the analytical expression for the scattered light as the values of $(I\;/I_o)_{wavelength}$ vs the distance between the center of the incident beam and optical fiber in terms of the condition of "in situ spectroscopy(optically thick)" and real time by fluorometric measurements.

PREPARATION OF POLYMERIC PHOTOSTABILIZERS CONTAINING HALS GROUPS AND THEIR PHOTOSTABILIZATION EFFECTS ON POLYSTYRENE

  • Chae, Kyu Ho;Oh, Jae-Seong;Ham, Heui Suk
    • Journal of Photoscience
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    • 제3권3호
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    • pp.167-169
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    • 1996
  • Absorption of UV light induces photocleavage of polymer chains to produce free radicals which initiate photodegradation of the polymer molecules. Discoloration, cracking of surface, stiffening, and decreasing of mechanical properties of polymeric products occur as a result of photodegradation of the polymers. Photostabilizers are added to the polymer systems in order to minimize the unwanted effects of UV light. It is well known that Hindered Amine Light Stabilizers (HALS) are one of the most effective photostabilizer for polymers.' HALS have been used in a large number of commercial polymers and predominantly used in styrenic and engineering plastics. They are efficient and cost-effective in many applications despite their high prices. However, low molecular weight HALS vaporize easily, emitting harmful amines, and have poor extraction resistance, decreasing their photostabilization effect. They also decompose during processing and migrate within the polymers resulting in deposition on the polymer surfaces called 'blooming". These drawbacks of low molecular HALS can be overcome by use of the polymeric HALS. We have been studying photochemical reactions of the polymer systems. The present paper reports the preparation of a new polymeric photostabilizer containing HALS groups and their stabilization effects on photooxidation of polystyrene. The synthetic scheme for the preparation of polymeric photostabilizers containing HALS groups were shown at Scheme 1. N-[(Chloroformyl) phenyl]maleimide (CPMI) and N-[4-(chlorocarbonyl) phenyl]maleimide (CPMIC) were prepared by the known procedure. N[4-N'-(2,2,6,6-tetramethyl-4-piperidinyl)aminocarbonyl-phenyl] maleimide (TMPI) was prepared by the reaction of CPMI with 4-amino-2,2,6,6-tetramethylpiperidine (ATMP).

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Synthesis of direct-patternable ZnO film incorporating Pt Nanoparticles

  • Choi, Yong-June;Park, Hyeong-Ho;Reddy, A.Sivasankar;Park, Hyung-Ho
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.369-369
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    • 2007
  • ZnO film has been investigated during several decades because it has excellent optical property like a transmittance among the range of visible light for using transparent conducting oxide (TCO) films. But ZnO film has not enough conductivity for applying to TCO devices. Therefore we synthesized platinum nanoparticles and they incorporated into ZnO due to improve the electrical property of ZnO film by sol-gel synthesis method. Also, we fabricated photosensitive ZnO thin film containing Pt nanoparticles by sol-gel process and spin-coating for using photochemical solution deposition. Photosensitive ZnO film could carry out the direct-pattern which allow the etching process to be convenient. The optical and electrical properties of ZnO film with or without various atomic percent of Pt nanoparticles annealed at various temperatures were investigated by using UV-Vis spectroscopy and 4-point probe method, respectively. We characterized the ZnO thin film containing Pt nanoparticles using X-ray diffraction, scanning electron microscopy, and X-ray photoelectron spectroscopy.

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SLA을 이용한 소수성 표면 제작 (Fabrication of Hydrophobic Surfaces with Stereolithography)

  • 홍성호
    • Tribology and Lubricants
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    • 제37권1호
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    • pp.1-6
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    • 2021
  • This paper presents the experimental results of hydrophobic surfaces developed using a stereolithography-based additive-manufacturing technique. The additive manufacturing technique can be used to manufacture objects with complex geometries from computer-aided design data. Several additive manufacturing methods, such as selective laser sintering, fused deposition modeling, stereolithography apparatus (SLA), and inkjet-based system, have been developed. The SLA is a form of three-dimensional printing technology used to create prototypes, patterns, and production parts in successive layers through photochemical processes. Light causes chemical monomers and oligomers to cross-link together to form objects composed of polymers. Moreover, this method is economical for fabricating surfaces with high output resolution and quality. Here, we fabricate various surfaces using different shapes using an SLA. The surfaces with micro-patterns are fabricated for 10 cases, including the biomimetic surface. The fabricated surfaces with various micro-patterns are evaluated for hydrophobicity performance based on the static contact angle. The contact angle is measured three times for each case, and the averaged value is used. The results indicate that the arrangements in a staggered structure have a larger contact angle than those in a line when the same micro-pattern is applied. Moreover, the mimetic surfaces exhibit more hydrophobic characteristics than those of artificial micro-patterns.

반월공단지역의 잣나무 및 리기다소나무의 생장과 광합성 특성 (Growth and Photosynthetic Rate of Pinus koraiensis and Pinus rigida in Banwol Industrial Region)

  • 이충화;최동수;이승우;김은영;진현오;정진현;이천용;오정수
    • 임산에너지
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    • 제23권1호
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    • pp.19-25
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    • 2004
  • 본 연구의 목적은 현재 산림쇠퇴 징후가 나타나고 있는 반월공단지역에 식재되어 있는 잣나무와 리기다소나무의 생장저하 실태와 광합성 특성을 밝히는데 있다. 이를 위해 안산시 전망대공원에 피해구를, 경기도 광주시에 소재하고 있는 경희대학교 연습림에 대조구를 선정하여 인공식재된 약 10년생의 잣나무와 리기다소나무 2수종을 비교하였다. 잣나무 및 리기다소나무 2수종 모두 피해구에서 생장량이 감소하였으며, 침엽의 잔존율도 저하하였다. 또한 2수종 모두 피해구에서 대조구에 비하여 순광합성속도가 저하하였고, 광-광합성곡선의 초기기울기인 양자수율도 저하하였다. 클로로필 a+b, b의 함량도 피해구에서 감소하였으며, 이 결과는 침엽의 연령이 증가함에 따라서 집광운반능력이 낮아져 침엽의 잔존율이 낮아지는 결과를 초래하였다고 생각된다. 이상의 결과로부터 최근 대기오염이 심한 반월공단지역에서 생육하고 있는 잣나무 및 리기다소나무의 생장감소 원인은 침엽의 클로로필 함량이 광화학계의 활성을 저하시켜 광합성 능력이 감소되어 최종적으로 생장감소를 초래한 것으로 판단된다.

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Experimental Studies on the Effects of Ozone on Growth and Photosynthetic Activity of Japanese Forest Tree Species

  • Yamaguchi, Masahiro;Watanabe, Makoto;Matsumura, Hideyuki;Kohno, Yoshihisa;Izuta, Takeshi
    • Asian Journal of Atmospheric Environment
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    • 제5권2호
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    • pp.65-78
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    • 2011
  • Ozone ($O_3$) is a main component of photochemical oxidants, and a phytotoxic anthropogenic air pollutant. In North America and Europe, the current concentration of $O_3$ has been shown to have significant adverse effects on vegetation. In this review, we summarize the experimental studies on the effects of $O_3$ on the growth and photosynthetic activity of Japanese forest tree species to understand the present knowledge and provide sound basis for future research toward the assessment of $O_3$ impacts on Japanese forest ecosystem. Since the 1990s, several Japanese researchers have conducted the experimental studies on the effects of ambient levels of $O_3$ on growth and physiological functions such as net photosynthesis of Japanese forest tree species. Although the sensitivity to $O_3$ of whole-plant growth is quite different among the species, it was suggested that the current ambient levels of $O_3$ in Japan are high enough to adversely affect growth and photosynthetic activity of Japanese forest tree species classified into high $O_3$ sensitivity group such as Japanese beech. The N load to soil has been shown to reduce the sensitivity to $O_3$ of Japanese larch and increase that of Japanese beech. To establish the critical level of $O_3$ for protecting Japanese forest tree species, therefore, it is necessary to take into account the N deposition from the atmosphere. There is little information on the combined effects of $O_3$ and other environmental factors such as elevated $CO_2$ and drought on growth and physiological functions of Japanese forest tree species. Therefore, it is necessary to promote the experimental study and accumulate the information on the combined effects of $O_3$ and any other abiotic environmental factors on Japanese forest tree species.