• Journal of the Korean Ceramic Society
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• v.56 no.4
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• pp.360-364
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• 2019

PZT suspensions for photo-curable 3D printing were fabricated and their characteristics were evaluated. After mixing the PZT, photopolymer, photo-initiator, and dispersant for 10 min by using a high-shear mixer, the viscosity characteristics were investigated based on the powder content. To determine an appropriate dispersant content, the dispersant was mixed at 1, 3, and 5 wt% of the powder and a precipitation test was conducted for two hours. Consequently, it was confirmed that the dispersibility was excellent at 3 wt%. Through thermogravimetric analysis, it was confirmed that weight reduction occurred in the photopolymer between 120? and 500?, thereby providing a debinding heat treatment profile. The fabricated suspensions were cured using UV light, and the polymer was removed through debinding. Subsequently, the density and surface characteristics were analyzed by using the Archimedes method and field-emission scanning electron microscopy. Consequently, compared with the theoretical density, an excellent characteristic of 97% was shown at a powder content of 87 wt%. Through X-ray diffraction analysis, it was confirmed that the crystallizability improved as the solid content increased. At the mixing ratio of 87 wt% powder and 13 wt% photo-curable resin, the viscosity was 3,100 cps, confirming an appropriate viscosity characteristic as a stereolithography suspension for 3D printing.

• Applied Chemistry for Engineering
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• v.21 no.4
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• pp.411-416
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• 2010

In this research, we intended to improve the tolerance of thick film resistor using photosensitive polymer resistor paste which was fabricated with alkali-solution developable photosensitive resin and conductive carbon black. At first, we investigated the effect of the selection of carbon black and photosensitive resin on the resistance range and tolerance level of polymer thick film resistor (PTFR). And then, a difference in resistance tolerance was evaluated according to the coating methods of photosensitive resistor paste on test board. In case that the photosensitive resistor paste was coated on whole surface of test board using screen printing, large positional tolerance was obtained because the formation of the thick film with uniform thickness was difficult. On the other hand, when the paste was coated with roller, the resistive thick film with uniform thickness was formed on the whole board area and the result of resistance evaluation showed low tolerance in ${\pm}10%$ range. The tolerance of PTFR could be improved by combination of the precise patterning using photo-process and the coating process for the resistive thick film with uniform thickness.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.10a
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• pp.220-223
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• 2005

The rapid prototyping (RP) technology has been advanced for various applications such as verification of design, functional test. However, many RP machines still have low accuracy and limitation of applications for various materials. In this research, a hybrid RP system was developed to improve precision of micro parts. This hybrid system consists of deposition and material removal process by mechanical micro machining to fabricate nano composites using photo-curable polymer resin with various nano particles. In this work, using hybrid RP process with Multi-Walled Carbon Nano Tube (MWCNT) and hydroxyapatite, micro parts were fabricated. The precision of parts was evaluated based on the original CAD design, and to see the effect of nano particles on mechanical properties, tensile strength was measured. From the results of experiments, it was confirmed that the part made by hybrid process had higher precision, and the addition of nano particles improved mechanical properties.

• Journal of the Microelectronics and Packaging Society
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• v.12 no.4 s.37
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• pp.275-280
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• 2005

We propose a new approach to greatly simplify the fabrication of conventional nanoimprint lithography (NIL) by combined nanoimprint and photolithography (CNP). We introduce a hybrid mask mold (HMM) made from UV transparent material with a UV-blocking Cr metal layer placed on top of the mold protrusions. We used a negative tone photo resist (PR) with higher selectivity to substrate the CNP process instead of the UV curable monomer and thermal plastic polymer that has been commonly used in NIL. Self-assembled monolayer (SAM) on HMM plays a reliable role for pattern transfer when the HMM is separated from the transfer layer. Hydrophilic $SiO_2$ thin film was deposited on all parts of the HMM, which improved the formation of SAM. This $SiO_2$ film made a sub-10nm formation without any pattern damage. In the CNP technique with HMM, the 'residual layer' of the PR was chemically removed by the conventional developing process. Thus, it was possible to simplify the process by eliminating the dry etching process, which was essential in the conventional NIL method.