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Thick Film Resistors with Low Tolerance Using Photosensitive Polymer Resistor Paste  

Kim, Dong-Kook (Department of Chemistry & Applied Chemistry, Hanyang University)
Park, Seong-Dae (Department of Chemistry & Applied Chemistry, Hanyang University)
Lee, Kyu-Bok (Korea Electronics Technology Institute)
Kyoung, Jin-Bum (Department of Chemistry & Applied Chemistry, Hanyang University)
Publication Information
Applied Chemistry for Engineering / v.21, no.4, 2010 , pp. 411-416 More about this Journal
Abstract
In this research, we intended to improve the tolerance of thick film resistor using photosensitive polymer resistor paste which was fabricated with alkali-solution developable photosensitive resin and conductive carbon black. At first, we investigated the effect of the selection of carbon black and photosensitive resin on the resistance range and tolerance level of polymer thick film resistor (PTFR). And then, a difference in resistance tolerance was evaluated according to the coating methods of photosensitive resistor paste on test board. In case that the photosensitive resistor paste was coated on whole surface of test board using screen printing, large positional tolerance was obtained because the formation of the thick film with uniform thickness was difficult. On the other hand, when the paste was coated with roller, the resistive thick film with uniform thickness was formed on the whole board area and the result of resistance evaluation showed low tolerance in ${\pm}10%$ range. The tolerance of PTFR could be improved by combination of the precise patterning using photo-process and the coating process for the resistive thick film with uniform thickness.
Keywords
photosensitive; thick film resistor; tolerance; roller coating; uniform thickness;
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Times Cited By KSCI : 2  (Citation Analysis)
Times Cited By SCOPUS : 1
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