• Title/Summary/Keyword: Photo-mask

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Investigation of Conductive Pattern Line for Direct Digital Printing (디지털 프린팅을 위한 전도성 배선에 관한 연구)

  • Kim, Yong-Sik;Seo, Shang-Hoon;Lee, Ro-Woon;Kim, Tae-Hoon;Park, Jae-Chan;Kim, Tae-Gu;Jeong, Kyoung-Jin;Yun, Kwan-Soo;Park, Sung-Jun;Joung, Jae-Woo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.502-502
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    • 2007
  • Current thin film process using memory device fabrication process use expensive processes such as manufacturing of photo mask, coating of photo resist, exposure, development, and etching. However, direct printing technology has the merits about simple and cost effective processes because inks are directly injective without mask. And also, this technology has the advantage about fabrication of fine pattern line on various substrates such as PCB, FCPB, glass, polymer and so on. In this work, we have fabricated the fine and thick metal pattern line for the electronic circuit board using metal ink contains Ag nano-particles. Metal lines are fabricated by two types of printing methods. One is a conventional printing method which is able to quick fabrication of fine pattern line, but has various difficulties about thick and high resolution DPI(Dot per Inch) pattern lines because of bulge and piling up phenomenon. Another(Second) methods is sequential printing method which has a various merits of fabrication for fine, thick and high resolution pattern lines without bulge. In this work, conductivities of metal pattern line are investigated with respect to printing methods and pattern thickness. As a result, conductivity of thick pattern is about several un.

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Recognition of Passports using Enhanced Neural Networks and Photo Authentication (개선된 신경망과 사진 인증을 이용한 여권 인식)

  • Kim Kwang-Baek;Park Hyun-Jung
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.10 no.5
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    • pp.983-989
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    • 2006
  • Current emigration and immigration control inspects passports by the naked eye, registers them by manual input, and compares them with items of database. In this paper, we propose the method to recognize information codes of passports. The proposed passport recognition method extracts character-rows of information codes by applying sobel operator, horizontal smearing, and contour tracking algorithm. The extracted letter-row regions is binarized. After a CDM mask is applied to them in order to recover the individual codes, the individual codes are extracted by applying vertical smearing. The recognizing of individual codes is performed by the RBF network whose hidden layer is applied by ART 2 algorithm and whose learning between the hidden layer and the output layer is applied by a generalized delta learning method. After a photo region is extracted from the reference of the starting point of the extracted character-rows of information codes, that region is verified by the information of luminance, edge, and hue. The verified photo region is certified by the classified features by the ART 2 algorithm. The comparing experiment with real passport images confirmed the good performance of the proposed method.

Microfluidic LOC System (Microfluidic LOC 시스템)

  • Kim, Hyun-Ki;Gu, Hong-Mo;Lee, Yang-Du;Lee, Sang-Yeol;Yoon, Young-Soo;Ju, Byeong-Kwon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07b
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    • pp.906-911
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    • 2004
  • In this paper, we used only PR as etching mask, while it used usually Cr/AU as etching mask, and in order to fabricate a photosensor has the increased sensitivity, we investigated on the sensitivity of general type and p-i-n type diode. we designed microchannel size width max 10um, min 5um depth max 10um, reservoir size max 100um, min 2mm. Fabrication of microfluidic devices in glass substrate by glass wet etching methods and glass to glass fusion bonding. The p-i-n diode has higher sensitivity than photodiode. Considering these results, we fabricated p-i-n diodes on the high resistive($4k{\Omega}{\cdot}cm$) wafer into rectangle and finger pattern and compared internal resistance of each pattern. The internal resistance of p-i-n diode can be decreased by the application of finger pattern has parallel resistance structure from $571\Omega$ to $393\Omega$.

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Development of a LDI System for the Maskless Exposure Process and Energy Intensity Analysis of Single Laser Beam (Maskless 노광공정을 위한 LDI(Laser Direct Imaging) 시스템 개발 및 단일 레이저 빔 에너지 분포 분석)

  • Lee, Soo-Jin;Kim, Jong-Su;Shin, Bong-Cheol;Kim, Dong-Woo;Cho, Meyong-Woo
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.19 no.6
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    • pp.834-840
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    • 2010
  • Photo lithography process is very important technology to fabricate highly integrated micro patterns with high precision for semiconductor and display industries. Up to now, mask type lithography process has been generally used for this purpose; however, it is not efficient for small quantity and/or frequently changing products. Therefore, in order to obtain higher productivity and lower manufacturing cost, the mask type lithography process should be replaced. In this study, a maskless lithography system using the DMD(Digital Micromirror Device) is developed, and the exposure condition and optical properties are analyzed and simulated for a single beam case. From the proposed experimental conditions, required exposure experiments were preformed, and the results were investigated. As a results, 10${\mu}m$ spots can be generated at optimal focal length.

Digital Holographic Security Identification System (디지털 홀로그래픽 보안 인증 시스템)

  • Kim, Jung-Hoi;Kim, Nam;Jeon, Seok-Hee
    • Journal of the Institute of Electronics Engineers of Korea SP
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    • v.41 no.2
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    • pp.89-98
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    • 2004
  • In this paper, we implement a digital holographic security card system that combines digital holographic memory using random phase encoded reference beams with electrical biometrics. Digitally encoded data including a document, a picture of face, and a fingerprint are recorded by multiplexing of holographic memory. A random phase mask encoding reference beams are used as a decoded key to protect illegal counterfeit. As a result, we can achieve a raw BER of 3.6${\times}$10-4 and shift selectivity of 4${\mu}{\textrm}{m}$ using the 2D random phase mask. Also, we develop a recording pattern and image processing which are suitable for a low cost reader without a position sensing photo-detector for real time data extraction and remove danger of fraud from unauthorized person by comparing the reconstructed holographic data with the live fingerprint data.

Vibration test and verification of Multi-Anode-Photo-Multiplier-Tube's survivability with X-Ray Coded Mask Gamma Ray Burst Alert Trigger mechanical system in space launch environment

  • Choi, Ji Nyeong;Choi, Yeon Ju;Jeong, Soomin;Jung, Aera;Kim, Min Bin;Kim, Ji Eun;Kim, Sug-Whan;Kim, Ye Won;Lee, Jik;Lim, Heuijin;Min, Kyung Wook;Na, Go Woon;Nam, Ji Woo;Park, Il Hung;Ripa, Jakub.;Suh, Jung Eun
    • The Bulletin of The Korean Astronomical Society
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    • v.37 no.2
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    • pp.209.2-209.2
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    • 2012
  • UFFO Burst Alert & Trigger telescope (UBAT) is one of major instruments of UFFO-Pathfinder. The UBAT aims at 10 arcmin resolution localization of Gamma Ray Bursts with X-ray coded mask technique. It has $400mm{\times}400mm$ coded mask aperture, hopper, shielding and detector module with effective area of $191cm^2$. The detector module consists of an assembly of 36 64-ch MAPMTs and $25mm{\times}25mm$ pixellated YSO crystal array, and associated analog and digital electronics of about 2500 channels. We performed a vibration test using a dummy MAPMT with the detector module structure to measure the indused stress applied onto the MAPMT. We designed a sub-structure on the detector module to avoid the resonance that would otherwise deforms the detector module structure. A finite element analysis confirms the reduction of the load acceleration down to 12g. The experimental results are to be reported. Consequently, it proves that the MAPMT arrays of the flight UBAT detector module structure would survive in the space launch environment.

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Humidity Sensitive Characterization by Electrode Pattern on the Capacitive Humidity Sensor Using Polyimide (폴리이미드 용량형 습도센서의 전극 패턴에 따른 감습 특성)

  • Park, Sung-Back;Shin, Hoon-Kyu;Lim, Jun-Woo;Chang, Sang-Mok;Kwon, Young-Soo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.27 no.9
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    • pp.566-570
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    • 2014
  • Electrode pattern effects on the capacitive humidity sensor were investigated. The fabrication of the capacitive humidity sensor was formed with three steps. The bottom electrode was formed on the silicon substrate with Pt/Ti thin layer by using shadow mask and e-beam evaporator. The photo sensitive polyimide was formed on the bottom electrode by using photolithography process as a humidity sensitive thin film. The upper electrode was formed on the polyimide thin film with Pt/Ti thin layer by using e-beam evaporator and lift-off method. Three electrode patterns, such as circle, square, and triangle pattern, were used and changed the sizes to investigate the effects. The capacitances of the sensors were decreased 622 to 584 pF with the area decreament of patterns 250,000 to $196,250{\mu}m^2$. From these results, a capacitive humidity sensor with photo sensitive polyimide is expected to be applied to a high sensitive humidity sensor.

Analysis of the Effect of Learned Image Scale and Season on Accuracy in Vehicle Detection by Mask R-CNN (Mask R-CNN에 의한 자동차 탐지에서 학습 영상 화면 축척과 촬영계절이 정확도에 미치는 영향 분석)

  • Choi, Jooyoung;Won, Taeyeon;Eo, Yang Dam
    • Journal of the Korean Society of Surveying, Geodesy, Photogrammetry and Cartography
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    • v.40 no.1
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    • pp.15-22
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    • 2022
  • In order to improve the accuracy of the deep learning object detection technique, the effect of magnification rate conditions and seasonal factors on detection accuracy in aerial photographs and drone images was analyzed through experiments. Among the deep learning object detection techniques, Mask R-CNN, which shows fast learning speed and high accuracy, was used to detect the vehicle to be detected in pixel units. Through Seoul's aerial photo service, learning images were captured at different screen magnifications, and the accuracy was analyzed by learning each. According to the experimental results, the higher the magnification level, the higher the mAP average to 60%, 67%, and 75%. When the magnification rates of train and test data of the data set were alternately arranged, low magnification data was arranged as train data, and high magnification data was arranged as test data, showing a difference of more than 20% compared to the opposite case. And in the case of drone images with a seasonal difference with a time difference of 4 months, the results of learning the image data at the same period showed high accuracy with an average of 93%, confirming that seasonal differences also affect learning.

Thin Film Micromachining Using Femtosecond Laser Photo Patterning of Organic Self-assembled Monolayers

  • Chang Won-Seok;Choi Moo-Jin;Kim Jae-Gu;Cho Sung-Hak;Whang Kyung-Hyun
    • International Journal of Precision Engineering and Manufacturing
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    • v.7 no.1
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    • pp.13-17
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    • 2006
  • Self-Assembled Monolayers (SAMs) formed by alkanethiol adsorption to thin metal film are widely being investigated for applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecules and bio molecules. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance of Self-Assembled Monolayers in selective etching of thin metal film. In this report, we present the several machining method to form the nanoscale structure by Mask-Less laser patterning using alknanethiolate Self-Assembled Monolayers such as thin metal film etching and heterogeneous SAM structure formation.

A Study on the Deposit Uniformity and Profile of Cu Electroplated in Miniaturized, Laboratory-Scale Through Mask Plating Cell for Printed Circuit Board (PCBs) Fabrication

  • Cho, Sung Ki;Kim, Jae Jeong
    • Korean Chemical Engineering Research
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    • v.54 no.1
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    • pp.108-113
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    • 2016
  • A miniaturized lab-scale Cu plating cell for the metallization of electronic devices was fabricated and its deposit uniformity and profile were investigated. The plating cell was composed of a polypropylene bath, an electrolyte ejection nozzle which is connected to a circulation pump. In deposit uniformity evaluation, thicker deposit was found on the bottom and sides of substrate, indicating the spatial variation of deposit thickness was governed by the tertiary current distribution which is related to $Cu^{2+}$ transport. The surface morphology of Cu deposit inside photo-resist pattern was controlled by organic additives in the electrolyte as it led to the flatter top surface compared to convex surface which was observed in the deposit grown without organic additives.