• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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• pp.502-502
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• 2007

Current thin film process using memory device fabrication process use expensive processes such as manufacturing of photo mask, coating of photo resist, exposure, development, and etching. However, direct printing technology has the merits about simple and cost effective processes because inks are directly injective without mask. And also, this technology has the advantage about fabrication of fine pattern line on various substrates such as PCB, FCPB, glass, polymer and so on. In this work, we have fabricated the fine and thick metal pattern line for the electronic circuit board using metal ink contains Ag nano-particles. Metal lines are fabricated by two types of printing methods. One is a conventional printing method which is able to quick fabrication of fine pattern line, but has various difficulties about thick and high resolution DPI(Dot per Inch) pattern lines because of bulge and piling up phenomenon. Another(Second) methods is sequential printing method which has a various merits of fabrication for fine, thick and high resolution pattern lines without bulge. In this work, conductivities of metal pattern line are investigated with respect to printing methods and pattern thickness. As a result, conductivity of thick pattern is about several un.

• 한국정보통신학회논문지
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• 제10권5호
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• pp.983-989
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• 2006

현재의 출입국 관리는 여권을 제시하면 여권을 육안으로 검색하고 수작업으로 정보를 입력하여 여권 데이터베이스와 대비하는 것이다. 본 논문에서는 여권의 정보를 인식 할 수 있는 방법을 제안한다. 제안된 여권 인식 방법은 소벨 연산자와 수평 스미어링, 윤곽선 추적 알고리즘을 적용하여 코드의 문자열 영역을 추출한다. 추출된 문자열 영역을 이진화하고 이진화된 문자열 영역에 대해서 개별 코드의 문자들을 복원하기 위하여 CDM 마스크를 적용한 후에 수직 스미어링을 적용하여 개별 코드의 문자를 추출한다. 개별 코드의 인식은 ART2 알고리즘을 RBF 네트워크의 중간층으로 적용하고 중간층과 출력층의 학습에는 일반화된 델타 학습 방법으로 동작하는 RBF 네트워크를 적용한다. 사진 영역은 코드의 문자열 영역을 추출한 후에 코드의 문자열 영역이 시작되는 좌표를 중심으로 사진 영역을 추출한 후, Luminance, Edge, Hue 정보를 이용하여 사진 부분을 검증한다. 검증된 사진 부분 영상은 ART2 알고리즘을 적용하여 사진의 특징들을 분류하고, 이를 이용하여 사진 인증을 하게 된다. 제안된 방법의 성능을 확인하기 위해서 실제 여권 영상을 대상으로 실험한 결과, 제안된 방법이 여권 인식에 우수한 성능이 있음을 확인하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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• pp.906-911
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• 2004

In this paper, we used only PR as etching mask, while it used usually Cr/AU as etching mask, and in order to fabricate a photosensor has the increased sensitivity, we investigated on the sensitivity of general type and p-i-n type diode. we designed microchannel size width max 10um, min 5um depth max 10um, reservoir size max 100um, min 2mm. Fabrication of microfluidic devices in glass substrate by glass wet etching methods and glass to glass fusion bonding. The p-i-n diode has higher sensitivity than photodiode. Considering these results, we fabricated p-i-n diodes on the high resistive($4k{\Omega}{\cdot}cm$) wafer into rectangle and finger pattern and compared internal resistance of each pattern. The internal resistance of p-i-n diode can be decreased by the application of finger pattern has parallel resistance structure from $571\Omega$ to $393\Omega$.

• 한국생산제조학회지
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• 제19권6호
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• pp.834-840
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• 2010

Photo lithography process is very important technology to fabricate highly integrated micro patterns with high precision for semiconductor and display industries. Up to now, mask type lithography process has been generally used for this purpose; however, it is not efficient for small quantity and/or frequently changing products. Therefore, in order to obtain higher productivity and lower manufacturing cost, the mask type lithography process should be replaced. In this study, a maskless lithography system using the DMD(Digital Micromirror Device) is developed, and the exposure condition and optical properties are analyzed and simulated for a single beam case. From the proposed experimental conditions, required exposure experiments were preformed, and the results were investigated. As a results, 10${\mu}m$ spots can be generated at optimal focal length.

• 대한전자공학회논문지SP
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• 제41권2호
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• pp.89-98
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• 2004

본 논문에서는 랜덤 위상 암호화된 기준빔을 이용한 광 보안 기술과 생체 인식기술을 접목시킨 새로운 디지털 홀로그래픽 보안 시스템을 제안하고 구현하였다. 일반적인 광보안 시스템의 암호화된 아날로그 영상이 아닌 지문 및 얼굴사진, 문서 정보 등을 포함하는 디지털 정보가 홀로그래픽 메모리의 다중화 기술에 의해 저장되었다. 랜덤 위상 마스크는 기준빔을 암호화하여 불법 복제를 방지하는 복호화 키로 사용되었고, 64×64 크기를 갖는 2차원 위상 마스크를 통해 3.6×10-4의 Raw BER과 4㎛의 매우 높은 위치 선택도를 얻을 수 있었다. 또한 실시간 정보 추출을 위해 위치 제어 센서가 필요 없는 저가의 판독기 구현에 적합한 기록패턴과 영상 신호처리를 개발하였으며, 홀로그램 지문 정보와 사용자의 지문 정보를 비교 검증함으로서 타인에 의한 불법 도용의 위험성을 제거하였다.

• 천문학회보
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• 제37권2호
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• pp.209.2-209.2
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• 2012

UFFO Burst Alert & Trigger telescope (UBAT) is one of major instruments of UFFO-Pathfinder. The UBAT aims at 10 arcmin resolution localization of Gamma Ray Bursts with X-ray coded mask technique. It has $400mm{\times}400mm$ coded mask aperture, hopper, shielding and detector module with effective area of $191cm^2$. The detector module consists of an assembly of 36 64-ch MAPMTs and $25mm{\times}25mm$ pixellated YSO crystal array, and associated analog and digital electronics of about 2500 channels. We performed a vibration test using a dummy MAPMT with the detector module structure to measure the indused stress applied onto the MAPMT. We designed a sub-structure on the detector module to avoid the resonance that would otherwise deforms the detector module structure. A finite element analysis confirms the reduction of the load acceleration down to 12g. The experimental results are to be reported. Consequently, it proves that the MAPMT arrays of the flight UBAT detector module structure would survive in the space launch environment.

• 한국전기전자재료학회논문지
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• 제27권9호
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• pp.566-570
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• 2014

Electrode pattern effects on the capacitive humidity sensor were investigated. The fabrication of the capacitive humidity sensor was formed with three steps. The bottom electrode was formed on the silicon substrate with Pt/Ti thin layer by using shadow mask and e-beam evaporator. The photo sensitive polyimide was formed on the bottom electrode by using photolithography process as a humidity sensitive thin film. The upper electrode was formed on the polyimide thin film with Pt/Ti thin layer by using e-beam evaporator and lift-off method. Three electrode patterns, such as circle, square, and triangle pattern, were used and changed the sizes to investigate the effects. The capacitances of the sensors were decreased 622 to 584 pF with the area decreament of patterns 250,000 to $196,250{\mu}m^2$. From these results, a capacitive humidity sensor with photo sensitive polyimide is expected to be applied to a high sensitive humidity sensor.

• 한국측량학회지
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• 제40권1호
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• pp.15-22
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• 2022

본 연구에서는 딥러닝 객체탐지 기법의 정확도 향상을 위해 항공사진과 드론 영상을 대상으로 확대율 조건과 계절요인이 탐지정확도에 미치는 영향을 실험을 통해 분석하였다. 딥러닝 객체탐지기법 중 빠른 학습 속도와 높은 정확도를 나타내는 Mask R-CNN을 사용하여 탐지대상인 자동차를 픽셀 단위로 탐지하고자 하였다. '서울시 항공사진서비스'를 통해 화면 확대 레벨을 달리하며 학습 영상을 캡처하고 각각을 학습하여 정확도를 분석하였다. 실험결과에 따르면 확대 레벨이 높아질수록 mAP 평균이 60%, 67%, 75%로 높아졌다. 데이터 세트의 train, test 데이터의 확대율을 엇갈려서 배치한 경우에는 확대율이 매우 낮은 경우를 제외하고 저배율의 데이터를 train 데이터로, 고배율의 데이터를 test 데이터로 배치하였을 때 높은 mAP로 반대의 경우보다 20% 이상 차이를 보였다. 그리고 4개월의 시차로 계절적 차이를 두고 촬영한 드론 영상의 경우, 같은 시기 영상자료 학습결과가 평균 93%로 높은 정확도를 나타내어 계절적 차이도 학습에 영향을 주는 것을 확인되었다.

• International Journal of Precision Engineering and Manufacturing
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• 제7권1호
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• pp.13-17
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• 2006

Self-Assembled Monolayers (SAMs) formed by alkanethiol adsorption to thin metal film are widely being investigated for applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecules and bio molecules. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance of Self-Assembled Monolayers in selective etching of thin metal film. In this report, we present the several machining method to form the nanoscale structure by Mask-Less laser patterning using alknanethiolate Self-Assembled Monolayers such as thin metal film etching and heterogeneous SAM structure formation.

• Korean Chemical Engineering Research
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• 제54권1호
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• pp.108-113
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• 2016

A miniaturized lab-scale Cu plating cell for the metallization of electronic devices was fabricated and its deposit uniformity and profile were investigated. The plating cell was composed of a polypropylene bath, an electrolyte ejection nozzle which is connected to a circulation pump. In deposit uniformity evaluation, thicker deposit was found on the bottom and sides of substrate, indicating the spatial variation of deposit thickness was governed by the tertiary current distribution which is related to $Cu^{2+}$ transport. The surface morphology of Cu deposit inside photo-resist pattern was controlled by organic additives in the electrolyte as it led to the flatter top surface compared to convex surface which was observed in the deposit grown without organic additives.