• Journal of Korea Spatial Information System Society
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• v.11 no.1
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• pp.35-42
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• 2009

This paper proposes a new GeoPhoto contents markup language that can create u-GIS contents by using the spatial photos. GeoPhoto contents markup language has designed the GeoPhoto contents model and markup language for contents that can be used the spatial photos information. GeoPhoto con tents markup language is represented by the convergence of GIS information, location information, photos information respectively. GeoPhoto contents markup language to provide a variety of pictures related to the content model consists of GeoPhoto contents model and operations between the GeoPhoto contents. GeoPh oto contents model supports GeoPhoto model, CubicPhoto model, Photo model and SequenceGeoPhoto mod el. In addition, this paper propose the Annotation operation, Enlargement operation and Overlay operation for represent the GeoPhoto contents. GeoPhoto Contents Markup Language has the advantage of supportin g user custom contents model of u-GIS.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.13 no.2
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• pp.157-162
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• 2000

The electro-optical characteristics of TN(twisted nematic)-LCD(liquid crystal display) with photo-dimerized on a PMCh(poly(4'methacryoyloxylchalcone)) surface using a new photo-dimerization method was studied. The excellent voltage-transmittance(V-T) curve of TN-LCD with photo-dimerized on a PNCh surface for 1 min. using a new photo-dimerization method was observed. Also, the voltage-hold-ing-ratio(VHR) of TN-LCD with photo-dimerized on a PMCh surface using a new photo-dimerization method is higher than that of conventional photo-dimerization method. Consequently, we suggest that the new photo-dimerization method. Consequently, we suggest that the new photo-dimerization method for LC aligning is the most promising rubbing-free techniques.

• Proceedings of the KIEE Conference
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• 1988.07a
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• pp.315-318
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• 1988

THE STUDY ABOUT CHARACTERISTICS OF PHOTO RESIST ITSELF (MINIMUM RESOLUTION, DEPTH OF FOCUS MARGIN AND CRITICAL DIMENSION CONTROL LATITUDE) WAS DONE AND REPORTED. THREE TYPES OF PHOTO RESISTS WERE TESTED. THE FIRST IS THE LOW MOLECULAR WEIGHT PHOTO-RESIST SHOWING THE NARROW DISTRIBUTION OF MOLECULAR WEIGHT (LOW MOLECULAR WEIGHT CONTROL TYPE), THE SECOND IS A PHOTO-RESIST CONTAINING THE INNER CONTRAST ENCHANCEMENT MATERIAL (INNER CEM TYPE) AND THE THIRD IS A NORMAL PHOTO-RESIST (HIGH MOLECULAR WEIGHT TYPE). THE INNER CEM TYPE AND THE LOW MOLECULAR WEIGHT CONTROL TYPE PHOTO-RESIST ARE MORE IMPROVED PHOTO-RESISTS. IT PROVED THAT THE MINIMUM RESOLUTION WAS IMPROVED BY 0.2 - 0.3 um, THE DEPTH OF FOCUS MARGIN WAS IMPROVED BY 0.8 - 1.2 um AND THE C.D. CONTROL LATITUIDE WAS IMPROVED.

• Toxicological Research
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• v.21 no.2
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• pp.99-105
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• 2005

Photo-mutagenic compounds have been known to alter skin cancer rates by acting as initiators or by affecting subsequent steps in carcinogenesis. The objectives of this study are to investigate the utility of photo-chromosomal aberration (photo-CA) assay for detecting photo-clastogens, and to evaluate its ability to predict rodent photocarcinogenicity. Photo-CA assay was performed with five test substances that demonstrated positive results in photo-carcinogenicity tests: 8-Methoxypsoralen (photoactive substance that forms DNA adducts in the presence of ultraviolet A irradiation), chlorpromazine (an aliphatic phenothiazine an alpha-adrenergic blocking agent), lomefloxacin (an antibiotic in a class of drugs called fluoroquinolones), anthracene (a tricyclic aromatic hydrocarbon a basic substance for production of anthraquinone, dyes, pigments, insecticides, wood preservatives and coating materials) and Retinoic acid (a retinoid compound closely related to vitamin A). For the best discrimination between the test substance-mediated genotoxicity and the undesirable genotoxicity caused by direct DNA absorption, a UV dose-response of the cells in the absence of the test substances was firstly analyzed. All 5 test substances showed a positive outcome in photo-CA assay, indicating that the photo-CA test is very sensitive to the photo-genotoxic effect of UV irradiation. With this limited data-set, an investigation into the predictive value of this photo-CA test for determining the photo-carcinogenicity showed that photo-CA assay has the high ability of a test to predict carcinogenicity. Therefore, the photo-CA test using mammalian cells seems to be a sensitive method to evaluate the photo-carcinogenic potential of new compounds.

• Environmental Mutagens and Carcinogens
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• v.25 no.1
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• pp.6-12
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• 2005

Many compounds might become activated after absorption of UV light energy. In some cases, the resulting molecule may undergo further biological reaction of toxicological relevance related especially to the photo-carcinogenicity resulting from photo-genotoxicity. However, no regulatory requirements have been issued with the exception of guideline issued by the Scientific Committee of Cosmetology, Commission of the European Communities (SCC/EEC) on the testing of sunscreens for their photo-genotoxicity. Thus, the objectives of this study are to investigate the utility of photo-Ames assay for detecting photo-mutagens, and to evaluate its ability to predict rodent photo-carcinogenicity. Photo-Ames assay was performed on five test substances that demonstrated positive results in photo-carcinogenicity tests: 8-methoxypsoralen (photoactive substance that forms DNA adducts in the presence of ultraviolet A irradiation), chlorpromazine (an aliphatic phenothiazine an a-adr-energic blocking agent), lomefloxacin (an antibiotic in a class of drugs called fluoroquinolones), anthracene (a tricyclic aromatic hydrocarbon a basic substance for production of anthraquinone, dyes, pigments, insecticides, wood preservatives and coating materials) and retinoic acid (a retinoid compound closely related to vitamin A). Out of 5 test substances, 3 showed a positive outcome in photo-Ames assay. With this limited data set, an investigation into the predictive value of this photo-Ames test for determining the photo-carcinogenicity showed that photo-Ames assay has relatively low sensitivity (the ability of a test to predict carcinogenicity). Thus, to determine the use of in vitro genotoxicity tests for prediction of carcinogenicity,' several standard photo-genotoxicity assays should be compared for their suitability in detecting photo-genotoxic compounds.

• The Journal of the Korea Contents Association
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• v.7 no.1
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• pp.1-9
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• 2007

Semantic photo retrieval has been an important role in reducing the semantic gap between the simple visual features and the abundant semantics delivered by a photo. Effective photo retrieval using semantics is one of the major challenges in photo retrieval. And we propose a new event semantic photo retrieval method by using photo annotation user interface. In this paper, A photo album management system that facilitates photo management and semantic retrieval, which fully relies on the MPEG-7 standard as an information base and a native XML database, has been designed and implemented.

• Proceedings of the Korea Information Processing Society Conference
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• 2019.05a
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• pp.451-454
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• 2019

In this paper, we propose a verifiable image transformation networks to transform face sketch to photo and vice versa. Face sketch-photo is very popular in computer vision applications. It has been used in some specific official departments such as law enforcement and digital entertainment. There are several existing face sketch-photo synthesizing methods that use feed-forward convolution neural networks; however, it is hard to assure whether the results of the methods are well mapped by depending only on loss values or accuracy results alone. In our approach, we use two Resnet encoder-decoder networks as image transformation networks. One is for sketch-photo and another is for photo-sketch. They depend on each other to verify their output results during training. For example, using photo-sketch transformation networks to verify the photo result of sketch-photo by inputting the result to the photo-sketch transformation networks and find loss between the reversed transformed result with ground-truth sketch. Likely, we can verify the sketch result as well in a reverse way. Our networks contain two loss functions such as sketch-photo loss and photo-sketch loss for the basic transformation stages and the other two-loss functions such as sketch-photo verification loss and photo-sketch verification loss for the verification stages. Our experiment results on CUFS dataset achieve reasonable results compared with the state-of-the-art approaches.

• The Transactions of the Korean Institute of Electrical Engineers
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• v.36 no.2
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• pp.122-128
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• 1987

In this paper, the photo-induced of a-$Sc_{75} Ge_{25}$thin films has been investigated as a function of annealing, exposure and obliqueness. The photo-induced effect consists of photo-thermal and photo-optical effect, which the photo-optical effect increases with increasing obliqueness. As the results, these photo-induced effects are related to the creation of atomic and electronic metastable state due to the surface defects.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.76-76
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• 2007

Several kinds of photo-chromic polymers containing push-pull structure were synthesized and investigated on optical patterning by photo-induced surface relief gratings (SRG) technique. The azobenzene segment was introduced as a functional group for a photo-triggered tran-cis isomerization. Consequently, we have fabricated micro-size regular pattern by one-step process without photo-mask.

• Journal of the Speleological Society of Korea
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• no.77
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• pp.21-30
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• 2007

Photo-lithography lies in the middle of the wafer fabrication process. It is often considered as the most critical step in the IC process. We use a mask in exposure steps of the photo-lithography. Typically, 20 to 25 different levels of masks are required to complete an IC device. That means, if a photo process can be developed with the use of only one photo mask, we can reduce more process cost. To satisfy this, we plan to develop an alternative photo mask. For this reason, we chose to use a LCD. We expect to develop a LCD panel that can be changed by electrical control. This is the main idea about the adjustive photo mask. The Photo mask made of LCD panel will replace the former one.