• Title/Summary/Keyword: Pd/Ge

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Synthesis of Superconducting $SrPd_2Ge_2$ Single Crystals ($SrPd_2Ge_2$ 초전도 단결정 합성)

  • Sung, Nak-Heon;Kang, B.Y.;Cho, B.K.
    • Progress in Superconductivity
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    • v.11 no.2
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    • pp.92-95
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    • 2010
  • $SrPd_2Ge_2$ single crystals were grown by self-flux method. Several shiny plate-like single crystals were obtained. The crystal structure and lattice parameters were characterized using the x-ray diffractometor, which indicates the crystals are in a single phase of $ThCr_2Si_2$-type. We confirmed superconducting transition temperature at 2.7 K by measuring magnetization and electrical resistivity.

Effect of Panax ginseng on the Development of Morphine Induced Tolerance and Dependence (VI). On the oral administration of ginseng ether fraction and saponins

  • Kim, Hack-Seang;Oh, Ki-Wan;Park, Woo-Kyu;Choi, Jae-Won;Bae, Dae-Sik
    • Archives of Pharmacal Research
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    • v.10 no.3
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    • pp.188-192
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    • 1987
  • The present study was undertaken to determine the inhibitory effects of orally administered ginseng saponins (GS), protopanaxadiol saponins (PD), protopanaxatriol saponins (PT) and ginseng ether fraction (GE) on the development of morphine induced tolerance and physical dependence in mice and also to determine the hepatic glutathione contents. GS, PD and PT inhibited significantly the development of morphine induced tolerance and physical dependence, but GE was effective only on the inhibition of the development of morphine induced physical dependence. GS, PD, PT and GE also inhibited the hepatic glutathione level decrease induced by morphine multiple injections.

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Thermal Stability Improvement of Ni Germanosilicide using Ni-Pd alloy for Nano-scale CMOS Technology (Nano-scale CMOS에 적용하기 위한 Ni-Germanosilicide에서 Ni-Pd 합금을 이용한 Ni-Germanosilicide의 열안정성 향상)

  • Kim, Yong-Jin;Oh, Soon-Young;Agchbayar, Tuya;Yun, Jang-Gn;Lee, Won-Jae;Ji, Hee-Hwan;Han, Kil-Jin;Cho, Yu-Jung;Kim, Yeong-Cheol;Wang, Jin-Suk;Lee, Hi-Deok
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.31-32
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    • 2005
  • Ge 농도가 30%인 SiGe 위에 Ni-Pd 합금을 이용한 새로운 Ni-Germanosilicide의 방법을 제안하여 열안정성 향상에 대해 연구하였다. 새롭게 제안한 Ni-Pd 합금을 이용하여 3 가지 구조 (Ni-Pd, Ni-Pd/TiN, Ni-Pd/Co/TiN) 중 Cobalt 다층구조를 사용한 구조 (Ni-Pd/Co/TiN)가 면저항이 가장 낮고 안정한 silicide 특성을 갖는 것을 나타냈으며, 고온열처리 $700^{\circ}C$, 30분에서도 낮고 안정한 면저항 특성을 유지시켜 열안정성을 개선하였다.

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Thermally Stable Ohmic Contacts for High Electron Mobility Transistors (High Electron Mobility Transistor 소자의 고 내열성)

  • Kim, Yeong-Jung;Kim, Hyeong-Jun
    • Korean Journal of Materials Research
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    • v.7 no.5
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    • pp.390-396
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    • 1997
  • AIGaAs/InGaAs/GaAs high electron mobility transisters(HEMT)소자의 오믹 접합재료로 일반적으로 사용되고 있는 AuGeNi의 접합저항과 열적 안정성을 향상시키기 위한 새로운 접합재료에 대해 연구하였다. 이를 위해 sub/M$_{1}$Au-Ge/M$_{2}$Au의 구조에서 M$_{1}$을 Ni과 Pd, M$_{2}$를 Ni, Ti, Mo로 하였을 경우의 접합 재료에 대한 오믹 접합 특성의 변화를 조사하였다. 또한 일반 열처리로와 램프 히터를 이용한 고속 열처리에 따른 오믹 특성을 조사하였다. M$_{1}$을 Ni에서 Pd으로 대체하였을 경우 접합 저항은 약간 증가하였으며 접합 특성의 개선을 관찰되지 않았다. M$_{2}$를 Ni에서 Ti이나 Mo로 대치하였을 경우, 접합 저항은 감소하였고 열적 안정성과 접합 형상은 현저히 개선되었다. 특히 Ni/Au-Ge/Mo/Au의 접합재료는 급속 열처리에 의해 -0.1Ωmm의 극히 낮은 잡합 저항과 우수한 접합 형상을 갖는 것으로 조사되었다.

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The Photoluminescence(PL) Spectroscopy and the Photo-Darkening(PD) Effect of the Amorphous SeGe Thin Films (비정질 SeGe 박막의 PL 특성과 광흑화 효과에 관한 연구)

  • 김진우;이현용;정홍배
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.15 no.5
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    • pp.435-440
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    • 2002
  • In this study, we have investigated photo-induced changes of optical energy gap( $E_{OP)}$ and photoluminescence (PL) in amorphous ($\alpha$-) S $e_{100-x}$G $e_{x}$ (x=5, 25 and 33) thin films prepared by conventional thermal evaporation method. In the $\alpha$-S $e_{100-x}$G $e_{x}$ thin film, the $E_{OP}$ is obtained by a linear extrapolation of the ($\alpha$hν)$^{\frac{1}{2}}$ versus hν plot to the energy axis using the optical absorption coefficient ($\alpha$) calculated from the extinction coefficient k measured in the wavelength range of 290~900nm. Although the values of $\Delta$ $E_{OP}$ are very different, all films exhibit photo-induced photo-darkening (PD) effect that is a red shift of $E_{OP}$ . In particular, $\Delta$ $E_{OP}$ in $\alpha$-S $e_{75}$ G $e_{25}$ thin film exhibits the largest value (i, e., $\Delta$ $E^{OP}$ ~40meV for $\alpha$-S $e_{95}$ G $e_{5}$ , $\Delta$ $E_{OP}$ ~200meV for $\alpha$-S $e_{75}$ G $e_{25}$ , $\Delta$ $E_{OP}$ ~130meV for $\alpha$-S $e_{67}$ G $e_{33}$ ). PL spectra in $\alpha$-SeGe by hν$_{HeCd}$ have no-Stokes shift (SS) and show a tendency dependent on both composition and illumination time. We explain the energy-induced phenomena such as the PD and thermal bleaching, the native charged-defect generation and the no-SS PL, etc..the PD and thermal bleaching, the native charged-defect generation and the no-SS PL, etc..tc..

Effect of a SiO2 Anti-reflection Layer on the Optoelectronic Properties of Germanium Metal-semiconductor-metal Photodetectors

  • Zumuukhorol, Munkhsaikhan;Khurelbaatar, Zagarzusem;Kim, Jong-Hee;Shim, Kyu-Hwan;Lee, Sung-Nam;Leem, See-Jong;Choi, Chel-Jong
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.17 no.4
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    • pp.483-491
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    • 2017
  • The interdigitated germanium (Ge) meta-lsemiconductor-metal (MSM) photodetectors (PDs) with and without an $SiO_2$ anti-reflection (AR) layer was fabricated, and the effect of $SiO_2$ AR layer on their optoelectronic response properties were investigated in detail. The lowest reflectance of 15.6% at the wavelength of 1550 nm was obtained with a $SiO_2$ AR layer with a thickness of 260 nm, which was in a good agreement with theoretically calculated film thickness for minimizing the reflection of Ge surface. The Ge MSM PD with 260 nm-thick $SiO_2$ AR layer exhibited enhanced device performance with the maximum values of responsivity of 0.65 A/W, the quantum efficiency of 52.2%, and the detectivity of $2.49{\times}10^9cm\;Hz^{0.5}W^{-1}$ under the light illumination with a wavelength of 1550 nm. Moreover, time-dependent switching analysis of Ge MSM PD with 260 nm- thick $SiO_2$ AR layer showed highest on/off ratio with excellent stability and reproducibility. All this investigation implies that 260 nm-thick $SiO_2$ AR layer, which is effective in the reduction in the reflection of Ge surface, has a great potential for Ge based optoelectronic devices.

Synthesis and Reactivity of the Pentacoordinate Organosilicon and -germanium Compounds Containing the C,P-Chelating ο-Carboranylphosphino Ligand [ο-C2B10H10PPh2-C,P](CabC,P

  • Lee, Tae-Gweon;Kim, Sang-Hoon;Kong, Myong-Seon;Kang, Sang-Ook;Ko, Jae-Jung
    • Bulletin of the Korean Chemical Society
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    • v.23 no.6
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    • pp.845-851
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    • 2002
  • The synthesis of the intramolecular donor - stabilized silyl and germyl complexes of the type ($Cab^c.p) MMe_2X$ (2a:M=Si, X=Cl;2b;M= Ge, X=Cl;2e;M=Si,X=H) was achieved by the reaction of $LiCab^c,p$ (1) with $Me_2SiClX$ and $Me_2GeCl_2$ respectively. The intramolecular M←P interacion in 2a-2c is provided by $^1H$, $13^C.$, $31^P$ and $29^Si$ NMR spectroscopy. The salt elimination reactions of dichlorotetramethyldisilane and -digermane with 1 afforded the $bis(\sigma-carboranylphosphino)disilane$ and disgermane [$(Cab^C.P)MMe_2]_2(4a;M$ = Si;4b: M=Ge). The oxidative addition reaction of 4a-4b with $pd_2(dba)_3CHCl_3afforded$ the bis(silyl)-and bis(germyl)-palladium complexes. The chloro-bridged dipalladium complexes were obtained by the reaction of 2a-2b with $pd_2(dba)_3CHCl_3$ The crystal structures of 5a and 7b were determined by X-ray structural studies.