• 제목/요약/키워드: Pb(Zr, Ti)O$_3$ thin

검색결과 226건 처리시간 0.03초

Structural and Dielectric Properties of Sol-gel Derived BiFeO3/Pb(Zr,T)O3 Heterolayered Thin Films

  • Nam, Sung-Pill;Lee, Sung-Gap;Lee, Young-Hie
    • Transactions on Electrical and Electronic Materials
    • /
    • 제11권5호
    • /
    • pp.212-215
    • /
    • 2010
  • $BiFeO_3/Pb(Zr_{0.95}Ti_{0.05})O_3$ (BFO/PZT) heterolayered thin films were fabricated by the spin coating method on a Pt/Ti/$SiO_2$/Si substrate using metal alkoxide solutions. The coating and heating procedure was repeated 6 times to form the heterolayered films. The thickness of the BFO/PZT films after one cycle of drying/sintering is about 30-40 nm. All BFO/PZT films show a void free uniform grain structure without the presence of rosette structures. It can be assumed that the crystal growth of the upper BFO layers can be influenced by the lower PZT layers. As the number of coatings increased, the dielectric constant increased, so that the value for the 6-layer film was 1360 at 1 KHz.

Polypropanediol을 이용한 sol-gel법에 의한$Pb_{1-x}La_x(Zr_{1/2}Ti_{1/2})_{1-{x/4}}O_3$박막의 제조 (Preparation of $Pb_{1-x}La_x(Zr_{1/2}Ti_{1/2})_{1-{x/4}}O_3$ thin films by a sol-gel method using a polypropanediol)

  • 김태희;박경봉;김찬규
    • 한국결정성장학회지
    • /
    • 제12권4호
    • /
    • pp.178-183
    • /
    • 2002
  • 용매제로서 polypropanediol을 사용한 sol-gel법으로, La의 함량을 1, 2, 5, 7 ㏖%로 변화시킨 PLZT(x/50/50) 박막을 제조하고 La 함량에 따른 유전특성의 변화를 연구하였다. 제조한 sol을 사용하여 $Pt/Ti/SiO_2$/Si 위에 10회 코팅한 후, 560~$600^{\circ}C$까지 10분간 열처리하여 600nm 두께의 박막을 얻을 수 있었다 $560^{\circ}C$ 이상에서는 조성에 관계없이 perovskite 단일 상만이 나타났고, La 함량이 증가함에 따라 입자 크기가 증가하였다. 모든 조성의 박막에서 열처리 온도가 증가함에 따라 유전상수 및 잔류분극 값이 증가되었으며 $600^{\circ}C$에서 열처리한 박막이 가장 우수한 유전 특성을 나타내었다. $600^{\circ}C$에서 열처리한 박막에서 La함량이 증가함에 따라 잔류분극, 항전계, 유전상수 모두 감소하였다.

(Pb0.72La0.28)Ti0.94O3 Buffer를 사용한 Pb(Zr0.52Ti0.48)O3 박막의 수소 후열처리 효과 (Effect of the Hydrogen Annealing on the Pb(Zr0.52Ti0.48)O3 Film using (Pb0.72La0.28)Ti0.94O3 Buffers)

  • 이은선;이동화;정현우;임성훈;이상렬
    • 한국전기전자재료학회논문지
    • /
    • 제18권4호
    • /
    • pp.327-329
    • /
    • 2005
  • Pb(Zr/sub 0.52/Ti/sub 0.48/)O₃(PZT) thin films were deposited by using a pulsed laser deposition method on a Pt/Ti/SiO₂/Si substrate with (Pb/sub 0.72/La/sub 0.28/)Ti/sub 0.93/O₃ (PLT) buffer and on a Pt/Ti/SiO₂/Si substrate without buffer. These films were annealed in H₂-contained ambient for 30 minutes at the substrate temperature of 400。C to evaluate the forming gas annealing effects. The comparative studies on the ferroelectric properties of these two films were carried out, which are shown that ferroelectric properties, such as remanent polarization didn't change in the case of PLT buffered PZT film while remanent polarization value of PZT film degraded from 20.8 C/㎠ to 7.3 C/㎠. The leakage current became higher in both cases, but that of the more-oriented PZT film had the moderate value of the 10/sup -6/ order of A/㎠. This is mainly because the hydrogen atoms which make the degradation of PZT films cannot infiltrate into the more -oriented PZT film as well as the less-oriented PZT film.

RF Power에 따른 PZT/BST 이종층 박막의 구조 및 유전 특성 (The Structural and Dielectric Properties of the PZT/BST Heterolayered Thin Films with RF Power)

  • 이상철;남성필;이성갑;이영희
    • 대한전기학회논문지:전기물성ㆍ응용부문C
    • /
    • 제54권1호
    • /
    • pp.13-17
    • /
    • 2005
  • The Pb(Zr/sub 0.52/Ti/sub 0.48/)O₃/(Ba/sub 0.6/Sr/sub 0.4/)TiO₃[PZT/BST] heterolayered thin films were deposited on Pt/Ti/SiO₂/Si substrates by using the RF sputtering method with different RF power. The PZT/BST heterolayered thin films had the tetragonal structure of the PZT phase and BST phase. Increasing the RF power. the intensity of the PZT (100), (110) peaks and BST (111) peaks were decreased and the intensity of the BST (100), (110) peaks were increased. The thickness ratio of the top layered BST thin film and the bottom layered PZT thin film was 2 to1. The atomic concentration of the Ba, Sr, Pb. Zr, Ti atoms were constant in the PZT thin films and BST thin films, respectively. The Pt atom was diffused to the PZT region in the PZT/BST heterolayered thin films deposited at condition of 60[W] RF power. Increasing the frequency, dielectric constant and loss of the PZT/BST heterolayered thin films were decreased. The dielectric constant and loss of the PZT/BST heterolayered thin films deposited with RF power of 90[W] were 406 and 3%, respectively.

Ar/$O_2$ 비에 따른 PZT(30/70)/(70/30) 이종층 박막의 유전 특성 (The dielectric properties of the PZT(30/70)/(70/30) heterolayered thin films with Ar/$O_2$ rates)

  • 남성필;이상철;이상헌;이성갑;배선기;이영희
    • 대한전기학회:학술대회논문집
    • /
    • 대한전기학회 2003년도 추계학술대회 논문집 전기물성,응용부문
    • /
    • pp.117-119
    • /
    • 2003
  • The $Pb(Zr_{0.3}Ti_{0.7)O_3/Pb(Zr_{0.7}/Ti_{0.3})O_3$ [PZT(30/70)/(70/30)] heterolayered thin films were deposited by RF sputtering method on the $Pt/TiO_2/SiO_2/Si$ substrate. Sputter gas ratio(AR/O2) was changed form 90/10 to 50/50. The structural properties and electrical properties of the PZT(30/70)/ (70/30) heterolayered thin films were studied. The relative dielectric constant and dielectric loss at 100Hz of the PZT(30/70)/PZT(70/30) heterolayered thin films with Ar/$O_2$(80/20) ratio were about 982 and 0.036, respectively.

  • PDF

Pb(Zr, Ti)$O_3$ 박막에서 결정립 크기 포화 현상에 관한 연구 (A Study on the Saturation of Grain Size in Pb(Zr, Ti)$O_3$ Thin Films)

  • 이장식;김찬수;주승기
    • 한국세라믹학회지
    • /
    • 제37권6호
    • /
    • pp.530-536
    • /
    • 2000
  • During the grain growth of the PZT thin films by selective nucleation method using PZT seed, it was found that the grain size was saturated with the annealing temperature. The saturation of grain size was analyzed by the interfacial energy which appeared during the crystallization. The factors affecting the saturation of grain size were found to be the interfacial energy between perovskite phase and pyrochlore phase, and PZT thin film and the bottom Pt electrode. When the ion damage was introduced to the grain-size saturated PZT thin films, further lateral growth was observed. Pt bottom electrode thickness was changed to control the interfacial energy between the PZT thin film and the Pt bottom electrode. When Pt thickness was increased, the grain size was also increased, because the lattice parameter of Pt films was increased with the thickness of the Pt films. The incubation time of nucleation was increased with the amount of the ion damage on the Pt films.

  • PDF

PLD법으로 제작된 xPb(Al0.5Nb0.5)O3-(1-x)Pb(Zr0.52Ti0.48)O3박막의 유전 및 압전 특성 (Dielectric and Piezoelectric Properties of xPb(Al0.5Nb0.5)O3-(1-x)Pb(Zr0.52Ti0.48)O3 Thin films Prepared by PLD)

  • 김민철;박용욱;최지원;강종윤;안병국;김현재;윤석진
    • 한국전기전자재료학회논문지
    • /
    • 제16권9호
    • /
    • pp.795-800
    • /
    • 2003
  • The dielectric and piezoelectric properties of the xPb(A $l_{0.5}$N $b_{0.5}$) $O_3$-(1-x)Pb(Z $r_{0.52}$ $Ti_{0.48}$) $O_3$ [xPAN-(1-x)PZT] thin films by pulsed laser deposition (PLD) were investigated as a function of PAN contents. The effect of texture on dielectric and piezoelectric properties of the 0.05PAN-0.95PZT thin films having the highest piezoelectric constant( $d_{33}$) was studied more precisely. For 0$\leq$x$\leq$0.15 compositions in xPAN-(1-x)PZT thin films, the well-developed perovskite phase with (111) preferred orientation was obtained at the deposition temperature of 50$0^{\circ}C$. With increasing PAN content, remanent polarization and coercive field decreased. The dielectric constant increased with an increase of PAN content until it reached 1450 at $\chi$= 0.05, and then decreased for higher PAN content. The maximum points of dielectric constant coincides with the maximum points of the piezoelectric constant $d_{33}$.33/.33/././.

Sol-Ge법에 의한 $Pb(Zr_{0.65}Ti_{0.35})O_3$박막의 Yttrium acetate 첨가에 따른 강유전 특성의 변화 (Variations of ferroelectric properties with the addition of Yttrium acetate in the $Pb(Zr_{0.65}Ti_{0.35})O_3$ thin films prepared by Sol-Gel processing)

  • 김준한;이규선;이두희;박창엽
    • E2M - 전기 전자와 첨단 소재
    • /
    • 제8권3호
    • /
    • pp.261-266
    • /
    • 1995
  • In this study, PZT solutions added impurities of Yttrium acetate were prepared by sol-gel processing and were deposited on Pt/ $SiO_{2}$/Si substrates at 5000 rpm for 20 sec. using spin-coating method. Coated films were annealed at 700-750.deg. C for 30 min. using conventional furnace method. Variations of the crystallographic structure and microstructure of PZT thin films with adding impurities were observed using XRD and SEM, and the electrical properties, such as relative permittivity, tan .delta., hysteresis curves and leakage currents, were measured. As the yttrium contents were increased, the remanent polarization and coercive field were decreased. Variations of remanent polarizations and coercive fields of pure and yttrium doped specimens according to polarization reversal cycles were observed using hysteresis measurement. PZT thin films added $Y^{3+}$ ions were completely crystallized at 750.deg. C. $Y^{3+}$ ions, as donor impurity, substituted Pb.sup 2+/ ions located at A-site of perovskite structure. By substitution of $Y^{3+}$ ions, leakage currents became less by decreasing the space charges. Degradation of remanent polarizations of Yttrium added specimens after fatigue was not observed and coercive fields increased more than those of pure PZT thin films.

  • PDF