• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.641-644
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• 2009

We demonstrated a solvent-assisted soft-lithographic patterning method for producing patterned structure and patterned ordering with lyotropic liquid crystalline polymer (LCP) film. Experimental results showed that the liquid crystalline ordering of lyotropic film could be controlled by shearing effects of the fluidic solvent though the patterned mold channels. In this work, two types of lyotropic LCPs were used to investigate the effects of the alkyl chain length of the lyotropic LCP on producing liquid crystalline ordering through the solvent-assisted fluidic patterning.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.303-303
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• 2007

Photo-imageable thick-film lithography technology was developed for the fabrication of embedded passives such as inductors and capacitors. In this study, photo-imageable dielectric and conductor pastes have apoted a negative type. Sodalime glass wafer, alumina substrate and zero-shrinkage LTCC green tapes were used as substrates. In result, The lithographic patterns were designed as lines and spaces for conductor material, or via-holes for ceramic, LTCC, materials. The scattering and reflection of UV-beam on the substrate had negative effects on fine patterning. The patterning performance was varied with the exposing and developing process conditions, and also varied with the substrate materials. Fine resolution of less then $50/50{\mu}m$ in line and space was obtained, which is difficult in screen printing method.

• Korean Journal of Metals and Materials
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• v.48 no.2
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• pp.163-168
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• 2010

We here describe the laser-direct patterning of nanostructured metal thin films. This method involves light-matter interaction in which a pulsed laser beam impinging on the film generates a thermoelastic force that plays a role to detach the film from the substrate or underlying layers. A moderate cohesion of the nanostructured film enables localized desorption of the material upon irradiation by a spatiallymodulated laser beam, giving good fidelity with the transfered pattern. This photoresist-free process provides a simple high-resolution scheme for patterning metal thin films.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2012.05a
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• pp.473-474
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• 2012

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.1197-1199
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• 2009

Self-alignment for the fabrication of printed thin film transistors has become of great interest because of the resolution and registration limits of printing technologies. In this work, self-patterning and selfregistration processes are introduced, which do not need surface energy patterning and the resulting minimum gate channel length could be down to $11.2{\mu}m$ with the sheet resistance of 2.6 ${\Omega}/{\square]$ for the source and drain electrodes.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.63-64
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• 2007

Polystyrene-block-polymethyl methacrylate (PS-b-PMMA) can pattern nanoscale structures over large areas. However these patterns have a short-range order. These short-range order limits their utility in some applications. Consequently, we have to overcome this limitation of block-copolymer. In this study we added a electrical field to the standard block-copolymer patterning method for long-range ordered arrays of nanostructures. This method is conformed by annealing a block copolymer with applied voltages. It is very simple method that do not have any additional hour. In this reason it can be applied easily for other nanostructure fabrications. This method opens up a new route to the controlled phase separation of block copolymers with precise place of the nanostructures.

• Journal of Institute of Control, Robotics and Systems
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• v.13 no.11
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• pp.1137-1145
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• 2007

Palletizing tasks are necessary to promote efficient storage and shipping of boxed products. These tasks, however, involve some of the most monotonous and physically demanding labor in the factory. Thus, many types of robot palletizing systems have been developed, although many robot motion commands still depend on the teach pendant. That is, the operator inputs the motion command lines one by one. This is very troublesome and, most importantly, the user must know how to type the code. We propose a new GUI(Graphic User Interface) for the palletizing system that is more convenient. To do this, we used the PLP "Fast Algorithm" and 3-D auto-patterning visualization. The 3-D patterning process includes the following steps. First, an operator can identify the results of the task and edit them. Second, the operator passes the position values of objects to a robot simulator. Using those positions, a palletizing operation can be simulated. We chose a widely used industrial model and analyzed the kinematics and dynamics to create a robot simulator. In this paper we propose a 3-D patterning algorithm, 3-D robot-palletizing simulator, and modified trajectory generation algorithm, an "overlapped method" to reduce the computing load.

• Journal of the Korean Society for Precision Engineering
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• v.30 no.6
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• pp.573-577
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• 2013

The one of the most important issue in roll-to-roll gravure printing is increase of ink transfer ratio or printability. As the result of high ink transfer ratio or printability, we can assess the quality of the printed patterns. The rheological properties are the important factors for the printability of electrodes patterning. In this study, the rheological properties of conductive ink are controlled by adding the solvent. The inks with different rheological properties are used for the patterning of the electrodes of $100{\mu}m$ by gravure printing equipment. The various printing speed, which also affect the rheological properties of conductive ink, is applied and the printed patterns are compared for their width and aspect ratio. Decreasing in the ink viscosity as well as increasing in the printing speed decreases the printability in gravure patterning, which shows that the rheological properties are important factors for the printability of gravure patterning.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.05c
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• pp.116-119
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• 2003

Self-patterning of thin films using photosensitive sol solution has advantages such as simple manufacturing process compared to photoresist/dry etching process. In this study, ferroelectric $Sr_{0.9}Bi_{2.1}Ta_2O_9$(SBT) and $La_{0.5}Sr_{0.5}CoO_3$(LSCO)thin films have been prepared by spin coating method using photosensitive sol solution. $Sr(OC_2H5)_2$, $Bi(TMHD)_3$ and $Ta(OC_2H)_5)_5$ were used as starting materials for SBT solution and $La(OCH_2CH_2OCH_3)_3$, $Sr(OC_2H_5)_2$, $CO(OCH_2CH_2OCH_3)_2$ were used for LSCO solution. Solubility difference by UV irradiation on LSCO thin film allows to obtain a fine patterning due to M-O-M bond formation. The lowest resistivity($4{\times}10^{-3}{\Omega}cm$) of LSCO thin films was obtained by annealing at $740^{\circ}C$.

• Proceedings of the Korean Vacuum Society Conference
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• 2009.08a
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• pp.297-297
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• 2009