• 제목/요약/키워드: Particle deposition

검색결과 569건 처리시간 0.023초

VAD공정 관련 회전하는 원판으로의 입자 부착 (Particle deposition on a rotating disk in application to vapor deposition process (VAD))

  • 송창걸;황정호
    • 대한기계학회논문집B
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    • 제22권1호
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    • pp.61-69
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    • 1998
  • Vapor Axial Deposition (VAD), one of optical fiber preform fabrication processes, is performed by deposition of submicron-size silica particles that are synthesized by combustion of raw chemical materials. In this study, flow field is assumed to be a forced uniform flow perpendicularly impinging on a rotating disk. Similarity solutions obtained in our previous study are utilized to solve the particle transport equation. The particles are approximated to be in a polydisperse state that satisfies a lognormal size distribution. A moment model is used in order to predict distributions of particle number density and size simultaneously. Deposition of the particles on the disk is examined considering convection, Brownian diffusion, thermophoresis, and coagulation with variations of the forced flow velocity and the disk rotating velocity. The deposition rate and the efficiency directly increase as the flow velocity increases, resulting from that the increase of the forced flow velocity causes thinner thermal and diffusion boundary layer thicknesses and thus causes the increase of thermophoretic drift and Brownian diffusion of the particles toward the disk. However, the increase of the disk rotating speed does not result in the direct increase of the deposition rate and the deposition efficiency. Slower flow velocity causes extension of the time scale for coagulation and thus yields larger mean particle size and its geometric standard deviation at the deposition surface. In the case of coagulation starting farther from the deposition surface, coagulation effects increases, resulting in the increase of the particle size and the decrease of the deposition rate at the surface.

외부증착공정(OVD)에서 열전달 및 입자부착에 관한 실험적 연구 (An experimental study of heat transfer and particle deposition during the outside vapor deposition process)

  • 김재윤;조재걸
    • 대한기계학회논문집
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    • 제19권11호
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    • pp.3063-3071
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    • 1995
  • An experimental study has been carried out for the heat transfer and particle deposition during the Outside Vapor Deposition process. The surface temperatures of deposited layers, and the rates, efficiencies and porosities of particle deposition were measured. It is shown that the axial variation of the surface temperature can be assumed to be quasi-steady and that as the traversing speed of burner is increased, the deposition rate, efficiency and porosity increase due to the decreased surface temperature. As the flow rate of the chemicals is increased, both the thickness of deposition layers and the surface temperature increase. Deposition rate also increases, however, deposition efficiency decreases for tests done. Later passes in early deposition stage result in higher surface temperatures due to increased thickness of porous deposited layers, which cause the deposition rate, efficiency, and porosity to decrease.

수정된 화학증착(MCVD)에 관한 실험적 연구 - 온도분포와 입자부착 측정 (An Experimental Study of the Modified Chemical Vapor Deposition Process -Temperature Distribution and Particle Deposition Measurements-)

  • 조재걸;최만수
    • 대한기계학회논문집
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    • 제18권11호
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    • pp.3057-3065
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    • 1994
  • An experimental study has been made for heat transfer and particle deposition during the Modified Chemical Vapor Deposition process which is currently utilized to manufacture high quality optical waveguides. The distributions of tube wall temperatures, rates and efficiencies of particle deposition were measured. Results indicate that the temperature distributions of the tube wall in the axial direction yield the quasi-steady form in which temperature distributions fit in one curve if the relative distance from the moving torch is used as an axial coordinate. Due to the repeated heatings from the traversing torch, the wall temperatures are shown to reach the minimum ahead of torch and it is shown that the two torch formulation suggested by Park and Choi is valid to predict this minimum temperature. Measured wall temperatures, particle deposition efficiencies and tapered entry length are compared with the previous modelling results and shown to be in agreement.

외부증착(OVD)공정에 관한 열전달과 입자부착에 관한 연구 (A Study of Heat Transfer and Particle Deposition During Outside Vapor Deposition Process)

  • 송영휘;최만수;강신형
    • 대한기계학회논문집
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    • 제18권1호
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    • pp.193-202
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    • 1994
  • A study of heat transfer and particle deposition has been made numerically for outside vapor deposition process. Heat conduction through the two layer cylinder which consists of the target and the deposited layer is included together with heat transfer and gas jet flow onto the cylinder from the torch. Temperature and flow fields have been obtained by an iterative method and thermophoretic particle deposition has been studied. Of particlar interests are effects of the thickness of the deposited layer, the torch speed and the rotation speed of the cylinder on particle deposition flux and efficiency. Effects of buoyancy, variable properties and tube rotation are included.

실린더의 회전이 원형 실린더 주위의 입자 부유 유동 및 입자 부착에 미치는 영향 (Effects of Cylinder Rotation on Particle Laden Flow and Particle Deposition on a Rotating Circular Cylinder)

  • 이승우;김동주
    • 대한기계학회논문집B
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    • 제41권4호
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    • pp.239-248
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    • 2017
  • 원형 실린더 주위의 유동에 부유된 입자가 실린더 근처에서 분산되거나 실린더에 부착되는 특성을 이해하는 것이 중요하다. 본 연구에서는 입자의 부착을 조절하는 방안으로 실린더의 회전을 고려해 보았고, 실린더의 회전 속도 및 입자의 Stokes 수가 실린더 주위의 유동과 입자의 분산 및 부착 특성에 미치는 영향을 수치해석적으로 연구하였다. 해석 결과 4보다 작은 Stokes 수에서는 회전속도가 증가함에 따라 부착효율이 크게 감소하였고, 4보다 큰 Stokes 수에서는 회전속도가 증가함에 따라 부착효율이 다소 증가하였다. 한편, 회전속도가 일정한 경우에는 Stokes 수가 증가함에 따라 입자의 부착효율이 증가하고, 입자의 부착 위치도 넓어졌다.

균일 층류유동중에 있는 원형 실린더 주위의 열영동에 의한 입자 부착 (Thermophoretic Particle Deposition Around a Circular Cylinder in a Uniform Laminar Air Dlow)

  • 홍기혁;강신형
    • 대한기계학회논문집B
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    • 제20권2호
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    • pp.641-648
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    • 1996
  • Thermophoretic particle deposition on a circular cylinder in a uniform laminar air flow was numerically investigated using a control volume method based on the generalized non-orthogonal coordinate system. Variation of air properties due to the change of temperature was taken into account. Effects of variable property on the distribution of heat transfer and deposition rates of particle were discussed. A new correlation of thermophoretic particle deposition on a circular cylinder was proposed in the present study.

정전효과가 있는 가열 회전원판으로의 입자침착 해석 (Analysis on Particle Deposition onto a Heated Rotating Disk with Electrostatic Effect)

  • 유경훈
    • 설비공학논문집
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    • 제14권5호
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    • pp.424-432
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    • 2002
  • Numerical analysis has been conducted to characterize deposition rates of aerosol particles onto a heated, rotating disk with electrostatic effect under the laminar flow field. The particle transport mechanisms considered were convection, Brownian diffusion, gravitational settling, thermophoresis and electrophoresis. The aerosol particles were assumed to have a Boltzmann charge distribution. The electric potential distribution needed to calculate local electric fields around the disk was calculated from the Laplace equation. The Coulomb, the image, the dielectrophoretic and the dipole-dipole forces acting on a charged particle near the conducting rotating disk were included in the analysis. The averaged particle deposition vetocities and their radial distributions on the upper surface of the disk were calculated from the particle concentration equation in a Eulerian frame of reference, along with a rotation speed of 0∼1,000rpm, a temperature difference of 0∼5K and a charged disk voltage of 0∼1000V.Finally, an approximate deposition velocity model for the rotating disk was suggested. The present numerical results showed relatively good agreement with the results of the present approximate model and the available experimental data.

Wafer Surface Scanner를 이용한 반도체 웨이퍼상의 입자 침착속도의 측정 (Measurement of Particle Deposition Velocity toward a Horizontal Semiconductor Wafer Using a Wafer Surface Scanner)

  • 배귀남;박승오;이춘식;명현국;신흥태
    • 설비공학논문집
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    • 제5권2호
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    • pp.130-140
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    • 1993
  • Average particle deposition velocity toward a horizontal semiconductor wafer in vertical airflow is measured by a wafer surface scanner(PMS SAS-3600). Use of wafer surface scanner requires very short exposure time normally ranging from 10 to 30 minutes, and hence makes repetition of experiment much easier. Polystyrene latex (PSL) spheres of diameter between 0.2 and $1.0{\mu}m$ are used. The present range of particle sizes is very important in controlling particle deposition on a wafer surface in industrial applications. For the present experiment, convection, diffusion, and sedimentation comprise important agents for deposition mechanisms. To investigate confidence interval of experimental data, mean and standard deviation of average deposition velocities are obtained from more than ten data set for each PSL sphere size. It is found that the distribution of mean of average deposition velocities from the measurement agrees well with the predictions of Liu and Ahn(1987) and Emi et al.(1989).

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정체점 입자유동에서 복사열전달을 고려한 열영동 입자부착 연구 (A study of thermophoretic particle deposition in a particle laden stagnation flow including the effect of radiative heat transfer)

  • 정창훈;이공훈;최만수;이준식
    • 대한기계학회논문집B
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    • 제20권5호
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    • pp.1624-1638
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    • 1996
  • A study of thermophoretic particle deposition has been carried out for a particle laden stagnation flow considering the effect of radiative heat transfer. Energy, concentration and radiative transfer equations are all coupled and have been solved iteratively assuming that absorption and scattering coefficients were proportional to the local concentration of particles. Radiative heat transfer was shown to strongly affect the profiles of temperature and particle concentration. e. g., radiation increases the thickness of thermal boundary layer and wall temperature gradients significantly. As the wall temperature gradients increase, the particle concentration at the wall decreases due to thermophoretic particle transport. The deposition rate that is thermophoretic velocity times particle concentration at the wall decreases as the effects of radiation increases. The effects of optical thickness, conduction to radiation parameter and wall emissivity have been determined. The effects of anisotropic scattering are shown as insignificant.