• 한국안전학회지
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• 제27권2호
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• pp.7-12
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• 2012

This paper describes electrical fire on electric pad caused by defect of hot wires. We analyzed two type electric pad using by carbon type hot wire and magnetic shielded type hot wire. First, a carbon type hot wires electric pad is virtually impossible to connect hot wire as a method of electrical welding or soldering. In order to connect between hot wires, that has to splice carbon type material connector. If junction of hot wires was occurrence of poor connection on electric pad, it increase contact resistance on this junction point. With increasing contact resistance, junction of hot wires on electric pad generates local heating and finally leads to electrical fire. An electric pad using by a magnetic shielded type hot wire happened local heating on signal wire for sensing temperature-rise caused by applying current for magnetic shielded. With increasing local heating of signal wire, insulated coating of hot wire was melted. Finally the magnetic shielded type hot wire electric pad lead to electrical fire with breakdown between signal wire and hot wire. In this paper, we analyzed shape of damage in hot wire caused by electrical local heating and investigated fire cause on electric pad due to defect of hot wires.

• 한국자동차공학회논문집
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• 제10권4호
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• pp.216-222
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• 2002

Brake Moan is a laud and strong noise occurring at any vehicle speed over 2 mph as a low frequency in below 600Hz. In this study, we targeted to shift the unstable mode that causes the brake moan from the moats frequency range to sufficiently higher frequency range to avoid the moan phenomenon. We simulated the finite element model and found out the nodes in which the brake moan occurs the most and we regarded the boundary and its relationship between the brake pad and the rotor as a spring coefficient k. With the binary set of the spring coefficient k, we finally used genetic algorithm (GA) to get the optimal topology of the brake pad and its shape to avoid the brake moan. The final result remarkably shows that genetic algorithm can be used in topology optimization procedures requiring complex eigenvalue problems.

• 한국철도학회:학술대회논문집
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• 한국철도학회 2004년도 추계학술대회 논문집
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• pp.824-829
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• 2004

In this paper, the process of development of resilient sleepers, which improves the train safety, passenger comfort and reduces the noise and vibration, is presented. To optimize the bonding method between elastic pad and PC sleeper, special pad shape like arrow is adopted and is applied in manufacturing. Bonding strength and reduction effects of vibration of the resilient sleepers are experimentally investigated. From the experiment results, it is investigated that the bonding strenth is enough to satisfaction the criteria and the vibration characteristic is also more effective for sleeper with elastic pad than that in ordinary PC form. These results indicate that the elastic pad can reduce possibility of rail-corrugations and thus resulting in the reduction of maintenance costs.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 추계학술대회 논문집
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• pp.171-175
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• 2001

Chemical mechanical polishing(CMP) process has been widely used to planarize dielectrics and metal, which can apply to employed in integrated circuits for sub-micron technology. Despite the increased use of CMP process, it is difficult to accomplish the global planarization of free-defects in inter level dielectrics and metal. Especially, defects like (micro-scratch) lead to severe circuit failure, and affects yield. Current conditioning method - bladder type, orbital pad motion - usually provides unsuitable pad profile during ex-situ conditioning near the end of pad life. Since much of the pad wear occurs by the mechanism of bladder tripe conditioning and its orbital motion without rotation, we need to implement new ex-situ conditioner which can prevent abnormal regional force on pad caused by bladder-type and also need to rotate the pad during conditioning. Another important study of ADPC is related to the orbital scratch of which source is assumed as diamond grit dropped from the strip during ex-situ conditioning. Scratch from diamond grit damaged wafer severely so usual1y scraped. Figure 1 shows the typical shape of scratch damaged from diamond. We suspected that intensive forces to the edge area of bladder type stripper accelerated the drop of Diamond grit during conditioning, so new designed Flat stripper was introduced.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2011년도 춘계학술대회 논문집
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• pp.455-456
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• 2011

• The Journal of Advanced Prosthodontics
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• 제15권6호
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• pp.302-314
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• 2023

PURPOSE. The aim of this study was to classify the shapes of retromolar pads and assess their morphometric differences using a 3D model. MATERIALS AND METHODS. Two hundred fully edentulous or Kennedy Class I partially edentulous patients (400 retromolar pads) were enrolled. Scan data of the definitive mandibular casts produced through functional impressions were obtained using a 3D laser scanner. Seven parameters (transverse diameter, longitudinal diameter, transverse-contour length, longitudinal-contour length, longitudinal/transverse diameter ratio, longitudinal/transverse-contour length ratio, and angle of the retromolar pad line to the residual alveolar ridge line) were measured using image analysis software. Subsequently, the pads were classified according to the shape. Statistical analyses were performed using 95% confidence intervals. RESULTS. Classifying the retromolar pads into three shapes led to high intra-examiner reliability (Cronbach's alpha = 0.933). The pear shape was the most common (56.5%), followed by oval/round (27.7%) and triangular (15.8%) shapes. There were no significant differences between the left and right sides according to the shape and no significant differences in any parameter according to age. The transverse diameter and longitudinal/transverse diameter ratio differed between sexes (P < .05). The triangular shape had a significantly different transverse diameter, transverse-contour length, longitudinal/transverse diameter ratio, and longitudinal/transverse-contour length ratio compared with the pear and oval/round shapes (P < .05). CONCLUSION. From a clinical reliability standpoint, classifying retromolar pads into three shapes (oval/round, pear-shaped, and triangular) is effective. The differences in the sizes among the shapes were attributed to the transverse measurement values.

• 마이크로전자및패키징학회지
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• 제13권3호
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• pp.47-51
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• 2006

디바이스의 고집적화로 인한 다층 배선구조로 인해 초점심도가 중요해짐에 따라 표면의 평탄도가 디바이스에 매우 큰 영향을 주게 되어, 표면의 평탄도를 결정지어주는 CMP(Chemical Mechanical Polishing) 공정이 매우 중요한 요소가 되었다. CMP 공정에는 슬러리, 연마패드, 컨디셔닝 디스크와 같은 소모품들이 사용된다. 이러한 소모품 중 하나인 컨디셔닝 디스크를 이용한 컨디셔닝 공정은 CMP 공정이 끝난 후 패드의 기공과 groove 내에 잔류 하는 화학반응물이나 슬러리와 같은 잔유물들을 컨디셔닝 디스크 표면에 부착되어 있는 다이아몬드를 이용하여 제거 함으로써 연마율을 높이고, 연마 패드의 수명을 증가 시켜주는 역할을 한다. 컨디셔닝 공정을 실시함으로써 연마 패드의 수명이 연장되기 때문에 경제적인 부분에서도 큰 이점을 가지게 된다. 본 연구에서는 이러한 CMP 공정에서 중요한 역할을 하는 소모품 중 하나인 컨디셔닝 디스크 표면에 존재하는 다이아몬드의 밀도, 형상 그리고 크기에 따라 연마 패드의 회복력 변화를 알아봄으로써 효율적인 컨디션닝 디스크의 특성을 평가해 보았다.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2006년도 춘계학술대회 논문집
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• pp.481-482
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• 2006

Chemical-mechanical polishing, the dominant technology for LSI planarization, is trending to play an important function in micro-electro mechanical systems (MEMS). However, MEMS CMP process has a couple of different characteristics in comparison to LSI device CMP since the feature size of MEMS is bigger than that of LSI devices. Preliminary CMP tests are performed to understand material removal rate (MRR) with blanket wafer under a couple of polishing pressure and velocity. Based on the blanket CMP data, this paper focuses on the consumable approach to enhance MEMS CMP by the adjustment of slurry and pad. As a mechanical tool, newly developed microstructured (MS) pad is applied to compare with conventional pad (IC 1400-k Nitta-Haas), which is fabricated by micro melding method of polyurethane. To understand the CMP characteristics in real time, in-situ friction force monitoring system was used. Finally, the topography change of poly-si MEMS structures is compared according to the pattern density, size and shape as polishing time goes on.

• Tribology and Lubricants
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• 제38권4호
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• pp.152-161
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• 2022

Chemical mechanical planarization (CMP) is a technology that planarizes the surfaces of semiconductor devices using chemical reaction and mechanical material removal, and it is an essential process in manufacturing highly integrated semiconductors. In the CMP process, a conditioning process using a diamond conditioner is applied to remove by-products generated during processing and ensure the surface roughness of the CMP pad. In previous studies, prediction of pad wear by CMP conditioning has depended on numerical analysis studies based on mathematical simulation. In this study, using an artificial neural network, the ratio of conditioner coverage to the distance between centers in the conditioning system is input, and the average conditioning density, standard deviation, nonuniformity (NU), and conditioning density distribution are trained as targets. The result of training seems to predict the target data well, although the average conditioning density, standard deviation, and NU in the contact area of wafer and pad and all areas of the pad have some errors. In addition, in the case of NU, the prediction calculated from the training results of the average conditioning density and standard deviation can reduce the error of training compared with the results predicted through training. The results of training on the conditioning density profile generally follow the target data well, confirming that the shape of the conditioning density profile can be predicted.

• Tribology and Lubricants
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• 제33권1호
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• pp.1-8
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• 2017

Drag torque reduction in a wet clutch pack is a key aspect of the design process of the dual clutch transmission (DCT) system. In order to reduce the drag torque caused by lubricant shear resistance, recently developed wet clutch pack systems of DCT, as well as automatic transmission and other four-wheel drive (4WD) couplings, frequently utilize wavy wet clutch pads. Therefore, wavy shape of friction pad are made on the groove patterns like waffle pattern for the reduction of drag torque. Additionally, the groove patterns are designed with larger channels at several locations on the friction pad to facilitate faster outflow of lubricant. However, channel performance is a function of the waviness of the friction pad at the location of the particular channel. This is because the discharge sectional area varies according to the waviness amplitude at the location of the particular channel. The higher location of the additional channel on the friction pad results in a larger cross-sectional area, which allows for a larger flow discharge rate. This results in reduction of the drag torque caused by the shear resistance of DCTF, because of marginal volume fraction of fluid (VOF) in the space between the friction pad and separator. This study computes the VOF in the space between the friction pad and separator, the hydrodynamic pressure developed, and the shear resistance of friction torque, by using CFD software (FLUENT). In addition, the study investigates the dependence of these parameters on the location and waviness amplitude of the channel pattern on the friction pad. The paper presents design guidelines on the proper location of high waviness amplitude on wavy friction pads.