• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2010.06a
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• pp.59-59
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• 2010

상변화 메모리 소자의 고집적화를 위한 새로운 패터닝 공정을 위하여 블락 공중합체의 자가 조립 특성을 적용한 고분자 패턴을 TiN기판 위에 적용화기 위한 연구를 진행하였다. 블락 공중합체의 자기 조립에 의한 패턴의 모양은 각 기판과 블락 공중합체간의 상호작용에 따라 sphere, cylinder, lamellar 형태의 모양을 띄게 된다. 표면처리가 안된 TiN기판 위의 PS-b-PMMA 블락 공중합체의 패턴의 형태는 cylinder와 lamellar 구조가 섞여 있는 구조로써 PS-r-PMMA 랜덤 공중합체로 기판 표면을 처리해 줄 경우 좀 더 균일한 cylinder 패턴 구조를 얻을 수 있었다. PS-r-PMMA로 기판 표면 처리 전 후의 상호 작용의 변화를 알아보기 위하여 물방울 접촉각 테스트를 하였으며 랜덤 공중합체와 블락 공중합체의 표면 처리 열처리 조건에 따른 패턴 행태의 변화를 관찰하기 위하여 모두 24,48,72시간으로 변화시켜 열처리 하였다. 최종 열처리 후 블락 공중합체의 패턴 형태의 주사 전자 현미경 관찰을 위하여 acetic acid에 60분 동안 침지시켜 PMMA를 제거 후 괄찰하였다.

• Journal of the Microelectronics and Packaging Society
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• v.12 no.2 s.35
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• pp.181-186
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• 2005

We fabricated thin films of polystyrene-block-poly(methyl methacrylate)(PS -b-PMMA) on the self-assembled monolayers(SAM) of 3-(p-methoxyphenyl)propyltrichlorosilane(MPTS) on silicon wafers. Cylindrical nanodomains of PMMA or PS were oriented perpendicular to the surface of silicon wafers due to the neutral affinity of the SAM to PS and PMMA blocks. By selective removal of the PMMA block with UV irradiation and washing, nanoporous films and nanorod assemblies were produced. The nanoporous film can be used for a nanolithographical mask.

• Textile Coloration and Finishing
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• v.5 no.1
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• pp.19-25
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• 1993

Plastic optical fibers(POFs) composed of poly(methylmethacrylate) (PMMA), polystyrene (PS), or polycarbonate(PC) as a core materials, and of fluorinated polymer or PMMA as a cladding were fabricated and their properties were investigated in this study. The attenuation loss of PMAA core POF was about 1,700 dB/Km at 660 nm, the loss of PS core POF was 1,800 dB/Km at 560 nm, and the loss of PC core POF was 2,200 dB/Km at 780 nm. These attenuation losses of POFs prepared ill this study were higher than those of commerically available POFs. Compared to PMMA and PS core POFs, PC core POF has excellent characteristics, including high thermal stability, high flexibility, and high impact strength.

• Journal of Adhesion and Interface
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• v.9 no.4
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• pp.30-33
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• 2008

Two polymeric interfaces with single component homo-polymers were prepared to control the orientation of block copolymer thin-film nanostructures. Poly(4-acetoxy styrene) (OH-PAS) and poly(4-methoxy styrene) (OH-PMS) which have the average chemical composition of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) were precisely synthesized through nitroxide-mediated radical polymerization. After dehydration reactions between above polymers and SiOx layers of silicon wafers, the polymer-modified interface induced partial (30%) vertical orientation of PS-b-PMMA thin film in the case of OH-PMS and wholly parallel orientation in the case of OH-PAS. Chemical compositions of polymeric interface layers are regarded as the key parameter to control the orientation of nanostructures of block copolymer thin film.

• Journal of the Korean Chemical Society
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• v.24 no.3
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• pp.259-265
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• 1980

Poly (styrene-b-methyl methacrylate) (PS-b-PMMA) was synthesized by free radical telomerization: the telomerization of styrene with $CCI_4$ by using AIBN as initiator followed by a second telomerization of methyl methacrylate using $CCI_3$ end group of the resulting polymer as the macrotelogen, with AIBN initiation, gave the styrene-methyl methacrylate block copolymer. The effects of the concentration of the macrotelogen, the concentration of monomer, the molecular weight of the macrotelogen, the reaction temperature and the concentration of the solvent on the formation of the block copolymer were investigated. Block copolymers containing up to 10 weight percent PMMA were obtained by adjusting the reaction conditions.

• Polymer(Korea)
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• v.28 no.6
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• pp.509-518
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• 2004

Microdomain structures and crystallization behavior of the binary blends consisting of an asymmetric block copolymer and a homopolymer were investigated using small-angle X-ray scattering (SAXS), optical micro scope (OM) and differential scanning calorimetry (DSC). Poly(methyl methacrylate)-block-polystyrene block copolymer (PMMA-b-PS) (weight fraction of PMMA =0.53) was mixed with low molecular weight poly(vinylidene fluoride) (PVDF). As the PVDF concentration was increased, the morphological change from a lamellar to a cylindrical structure occurred. The crystallization of PVDF significantly disturbed the orientation of the pre-existing microdomain structure, resulting in a poorly ordered morphology. In the blends, PVDF exhibited unique crystallization behavior due to the PMMA block which is preferentially miscible to PVDF and the space constraint imposed by the microdomains.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2015.11a
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• pp.332-332
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• 2015

Block Copolymer lithography는 deep nano-scale device 제작을 위한 기존의 top-down방식의 photo-lithography를 대체할만한 기술로 많은 연구가 진행되고 있다. polystyrene(PS)/poly-methyl methacrylate (PMMA)로 구성된 BCP의 nano-scale PS mask는 일반적인 플라즈마 공정에 쉽게 damage를 입는다. 중성빔 식각을 이용하여 식각 공정 중 발생하는 BCP의 degradation을 감소시키고, 비등방성 식각 profile을 얻을 수 있으며 sidewall roughness(SWR)와 sidewall angle(SWA)가 향상되는 것을 알 수 있었다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.63-64
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• 2007

Polystyrene-block-polymethyl methacrylate (PS-b-PMMA) can pattern nanoscale structures over large areas. However these patterns have a short-range order. These short-range order limits their utility in some applications. Consequently, we have to overcome this limitation of block-copolymer. In this study we added a electrical field to the standard block-copolymer patterning method for long-range ordered arrays of nanostructures. This method is conformed by annealing a block copolymer with applied voltages. It is very simple method that do not have any additional hour. In this reason it can be applied easily for other nanostructure fabrications. This method opens up a new route to the controlled phase separation of block copolymers with precise place of the nanostructures.

• Proceedings of the Korean Magnestics Society Conference
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• 2002.12a
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• pp.34-35
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• 2002

CoCrPt alloy films are attracting wide attention for applications to high-density magnetic recording media and hard magnetic layer in spin valve structure due to their high coercivity and strong magnetocrystalline anisotropy. Diblock copolymer templates are one of the most promising candidates for nanoscale patterning otherwise inaccessible by lithographic procedures [1]. In this study, we have investigated magnetic properties of Co$\sub$68/Cr$\sub$18/Pt$\sub$14/ nanodot arrays made by self-assembling polystyrene-block-methyl methacrylate ((PS-b-PMMA), (Mn = 82.5 Kg/mol, with a 1.12 polydispersity)) diblock copolymer. (omitted)

• Macromolecular Research
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• v.16 no.8
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• pp.686-694
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• 2008

We studied the molecular shapes and structural characteristics of a 33-armed, star polystyrene (PS-33A) and two $3^{rd}$-generation, dendrimer-like, star-branched poly(methyl methacrylate)s with different architectures (pMMA-G3a and PMMA-3Gb) and 32 end-branches under good solvent and theta ($\Theta$) solvent conditions by using synchrotron small angle X-ray scattering (SAXS). The SAXS analyses were used to determine the structural details of the star PS and dendrimer-like, star-branched PMMA polymers. PS-33A had a fuzzy-spherical shape, whereas PMMA-G3a and PMMA-G3b had fuzzy-ellipsoidal shapes of similar size, despite their different chemical architectures. The star PS polymer's arms were more extended than those of linear polystyrene. Furthermore, the branches of the dendrimer-like, star-branched polymers were more extended than those of the star PS polymer, despite having almost the same number of branches as PS-33A. The differences between the internal chain structures of these materials was attributed to their different chemical architectures.