• Title/Summary/Keyword: PLZT thin film

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The effects of TiO2 interlayer phase transition on structural and electrical properties of PLZT Thin Films (TiO2 Interlayer의 상변화에 따른 PLZT 박막의 구조 및 전기적 특성)

  • Lee, Chul-Su;Yoon, Ji-Eon;Hwang, Dong-Hyun;Cha, Won-Hyo;Sona, Young-Gook
    • Journal of the Korean Vacuum Society
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    • v.16 no.6
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    • pp.446-452
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    • 2007
  • [ $(Pb_{1.1},La_{0.08})(Zr_{0.65}.Ti_{0.35})O_3$ ] thin films on the $Pt/Ti/SiO_2/Si$, $TiO_2(interlayer)/Pt/Ti/SiO_2/Si$ substrate were fabricated by the R.F. magnetron-sputtering method and considered their characteristics depending on $TiO_2$ interlayer. Changing the deposition conditions of $TiO_2$ interlayer, we obtained $TiO_2$ anatase single phase and rutile single phase. PLZT was deposited on these substrates and analyzed by x-ray diffraction(XRD) for there crystallinity and orientation. To investigate $PLZT-TiO_2$, $TiO_2-Pt$ interface, glow discharge spectrometer(GDS) analysis was carried out and we performed electrical measurements for dielectric properties of PLZT thin films. The PLZT thin film on $TiO_2$ anatase interlayer was found to have (110)-preferred orientation and 12.6 ${\mu}C/cm^2$ remaining polarization value.

Electrical and Retention Properties of MFSFET Device (MFSFET 소자의 전기적 및 리텐션 특성)

  • Chung, Yeun-Gun;Kang, Seong-Jun;Joung, Yang-Hee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.11 no.3
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    • pp.570-576
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    • 2007
  • In this study, the characteristics of metal-ferroelectric-semiconductor FET (MFSFET) device is investigated using field-dependent polarization and square-law FET models. From drain current with the gate voltage variation, when coercive voltages of ferroelectric thin film are 0.5 and 1V, the memory windows are 1 and 2V, respectively. When the gate voltages are 0, 0.1, 0.2 and 0.3V, the difference of saturation drain currents of the MFSFET device at two threshold voltages in ID-VD curve are 1.5, 2.7, 4.0, and 5.7mA, respectively. As a result of the analysis for drain currents after tine lapse, which is based on the simulation for hysteresis loop and the fitting of retention properties of ferroelectric thin films such as PLZT(10/30/70), PLT(10) and PZT(30/70) thin film shows excellent reliability that the decrease of saturation current is about 18% after 10 years.

The electrical properties of PLZT thin films on ITO coated glass with various post-annealing temperature (ITO 기판에 제작된 PLZT 박막의 후열처리 온도에 따른 전기적 특성평가)

  • Cha, Won-Hyo;Youn, Ji-Eon;Hwang, Dong-Hyun;Lee, Chul-Su;Lee, In-Seok;Sona, Young-Guk
    • Journal of the Korean Vacuum Society
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    • v.17 no.1
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    • pp.28-33
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    • 2008
  • Lanthanum modified lead zirconate titanate ($Pb_{1.1}La_{0.08}Zr_{0.65}Ti_{0.35}O_3$) thin films were fabricated on indium doped tin oxide (ITO)-coated glass substrate by R.F magnetron sputtering method. The thin films were deposited at $500^{\circ}C$ and post-annealed with various temperature ($550-750^{\circ}C$) by rapid thermal annealing technique. The structure and morphology of the films were characterized with X-ray diffraction (XRD) and atomic force microscopy (AFM) respectively. The hysteresis loops and fatigue properties of thin films were measured by precision material analyzer. As the annealing temperature was increased, the remnant polarization value was increased from $10.6{\mu}C/cm^2$ to $31.4{\mu}C/cm^2$, and coercive field was reduced from 79.9 kV/cm to 60.9 kV/cm. As a result of polarization endurance analysis, the remnant polarization of PLZT thin films annealed at $700^{\circ}C$ was decreased 15% after $10^9$ switching cycles using 1MHz square wave form at ${\pm}5V$.

Effect of Hydrogen on leakage current characteristics of (Pb, La) (Zr, Ti )$O_3$(PLZT) thin film capacitors with Pt or Ir-based top electrodes (Pt 또는 Ir 계열의 상부전극을 갖는 (Pb, La) (Zr, Ti)$O_3$ (PLZT) 박막의 누설전류특성에 미치는 수소 열처리의 효과)

  • Yun, Sun-Gil
    • Korean Journal of Materials Research
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    • v.11 no.2
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    • pp.151-154
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    • 2001
  • The leakage current behaviors of PLZT capacitors with top electrodes of Pt, Ir, and $IrO_2$ are investigated before and after hydrogen forming gas anneal. The P-E hysteresis and fatigue properties of Pt/PLZT/Pt capacitors are almost recovered after recovery anneal in $O_2$ ambient. The leakage current mechanisms of PLZT capacitors with Pt and $IrO_2$ top electrodes are consistent with space-charge influenced injection model showing the strong time dependence irrespective of annealing conditions. On the other hand, the leakage current behavior of Ir/PLZT/Pt capacitor shows steady state independent of time because IrPb, conducting phase, formed at interface between Ir top and PLZT is a high conduction path. Teh leakage current mechanism of Ir/PLZT/Pt capacitor is consistent with Schottky barrier model.

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Cryogenic Behavior of Perovskite Materials

  • Paik, D.S.;Shin, H.Y.;Yoon, S.J.;Kim, H.J.;Park, C.Y.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.05a
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    • pp.126-129
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    • 1999
  • Dielectric and piezoelectric properties of perovskite materials such as La modified $Pb(Zr,Ti)O_3$ ceramics and $Pb(Zn_{1/3}Nb_{2/3})O_3-PbTiO_3$ single crystals were investigated for cryogenic capacitor and actuator applications. Enhanced extrinsic contributions resulted in piezoelectric coefficient (d33) as high as 250 pC/N at 30 K, superior to that of PZT ($d_{33}$ ~ 100 pC/N). This cryogenic property enhancement was associated with retuning the MPB (or cryogenic temperatures. PZN-PT single crystals exhibited dramatic property improvements such as $d_{33}$ > 500 pC/N at 30 K as a result of an engineered domain state.

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Characteristics of $(Pb_{1-x}La_x)(Zr_{0.5}Ti_{0.5})O_3$ thin films as a function of La content ($(Pb_{1-x}La_x)(Zr_{0.5}Ti_{0.5})O_3$ 박막의 La 치환량에 따른 특성)

  • Jang, Nak-Won;Lee, Seong-Hwan;Yi, Dong-Young;Kim, Dong-Hun
    • Journal of Advanced Marine Engineering and Technology
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    • v.30 no.8
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    • pp.894-900
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    • 2006
  • The electrical characteristics associated with crystal structure changes as a function of La content for $(Pb_{1-x}La_x)(Zr_{0.5}Ti_{0.5})O_3$ thin films were investigated for applications in memory capacitors. Tetragonality of PLZT films decreased with increasing La content. Thin films with La $\geq$ 20 mol% were found to be cubic. Films with La $\geq$ 12 mol% exhibited broader dielectric peaks compared to those of bulk ceramics and behaved as relaxer ferroelectrics. Tetragonal PLZT film with 12 mol% La had a dielectric constant maximum of 1330 at room temperature and a charge storage density of ${\sim}18{\mu}C/cm^2$ at 5 V. Decrease in coercive field and remnant polarization with increase in La content were resulting from less dipolar response caused by the decreased crystal anisotropy. The leakage current densities $<10^{-8}A/cm^2$ up to 5 V bias voltage were observed for the films with La $\geq$ 14 mol%.

A Study on Pyroelectric Properties of PLZT/PVA Composite Material (PLZT/PVA 복합재료의 초전특성에 관한 연구)

  • Lee, E.S.;Choi, S.C.;Park, H.;Kim, J.W.
    • Journal of the Korean Ceramic Society
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    • v.27 no.5
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    • pp.605-612
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    • 1990
  • In Pb1-xLax(Zry, Tiz)1-x/4O3 system, it selects the composition 7/65/35 (x=7, y=65, z=35) that was reported to have eminent Pyroelectric properties, and that is sintered with PbZrO3+0.3wt.% PbO2 atmosphere powder. From the sintered ceramic and Poly Vinyl Alcohol, the thin wafers are fabricated with 0-3connectivity, and they are researched in Pyroelectric properties and the others according to volume ratio between ceramic and polymer. It was possible to fabricate the film containing ceramic up to 80vol% in PVA polymer. The increment of PLZT ceramic volume fraction improve the pyroelectric coefficient of the composite. On Pyroelectric coefficient and the figure of merit, a little inflection caused by glass point(Tg) of PVA appeared. The degree of inflection is proportioned to the amount of PVA.

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Characteristics of Ferroelectric-Gate MFISFET Device Behaving to NDRO Configuration (NDRD 방식의 강유전체-게이트 MFSFET소자의 특성)

  • 이국표;강성준;윤영섭
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.40 no.1
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    • pp.1-10
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    • 2003
  • Device characteristics of the Metal-Ferroclecric-Semiconductor FET(MFSFET) are simulated in this study. The field-dependent polarization model and the square-law FET model are employed in our simulation. C-V$_{G}$ curves generated from our MFSFET simulation exhibit the accumulation, the depletion and the inversion regions clearly. The capacitance, the subthreshold and the drain current characteristics as a function of gate bias exhibit the memory windows are 1 and 2 V, when the coercive voltages of ferroelectric are 0.5 and 1 V respectively. I$_{D}$-V$_{D}$ curves are composed of the triode and the saturation regions. The difference of saturation drain currents of the MFSFET device at the dual threshold voltages in I$_{D}$-V$_{D}$ curve is 1.5, 2.7, 4.0, and 5.7 ㎃, when the gate biases are 0, 0.1, 0.2 and 0.3V respectively. As the drain current is demonstrated after time delay, PLZT(10/30/70) thin film shows excellent reliability as well as the decrease of saturation current is about 18 % after 10 years. Our simulation model is expected to be very useful in the estimation of the behaviour of MFSFET devices.T devices.