• 제목/요약/키워드: PLASMA SURFACE TREATMENT

검색결과 991건 처리시간 0.029초

폴리케톤 섬유의 산소 플라즈마 처리에 따른 천연고무와의 계면접착 특성 (Interfacial Adhesion Properties of Oxygen Plasma Treated Polyketone Fiber with Natural Rubber)

  • 원종성;최혜영;유재정;최한나;용다경;이승구
    • 접착 및 계면
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    • 제13권1호
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    • pp.45-50
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    • 2012
  • 폴리케톤(polyketone, PK) 섬유는 고무의 강화재로 사용하기 위해서 최근 개발되고 있는 소재이다. 섬유의 고무와의 접착성을 향상시키기 위하여 플라즈마로 표면을 개질하였다. 산소 플라즈마 처리에 의한 섬유표면의 물리적 형태변화를 관찰하기 위하여 주사전자현미경과 원자현미경을 이용하여 관찰하였다. 섬유표면의 화학적 조성변화를 XPS (X-ray photoelectron spectroscopy)를 이용하여 알아보았다. 최종적으로 이러한 변화가 PK 섬유와 고무와의 계면접착력에 어떠한 영향을 미치는지를 microdroplet debonding 시험을 통해 분석하였다. 플라즈마 처리에 의하여 섬유표면에 산소함유기들이 증가하는 결과를 보였으며, 처리시간과 처리전력이 증가함에 따라 에칭에 의한 표면조도(RMS roughness)가 증가하였다. 그러나 장시간의 플라즈마 처리조건에서는 표면에 degradation이 발생하여 오히려 표면조도가 감소하는 결과를 보였다. PK 섬유와 고무와의 계면전단강도는 처리시간 60 s의 80 W, 처리전력 60 W의 180 s에서 처리한 경우에 최대 계면전단강도를 나타내었다. 그러나 그 이상으로 증가하면 degradation이 발생하면서 계면전단강도가 감소하였다.

상압 플라즈마 표면처리에 의한 고분자 재질의 표면특성변화 (Surface Characteristics of Polymer Material Treated by Atmospheric Pressure Plasma)

  • 서승호;장성환;유영은;정재동
    • 설비공학논문집
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    • 제22권5호
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    • pp.282-288
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    • 2010
  • Experiment on the surface characteristics of polymer films treated by atmospheric pressure plasma has been conducted. We chose the process parameters as frequency, gas flow, treatment time, and scrutinized the effects of the process parameters on the surface characteristics of polymer materials by measuring the contact angle and examining SEM. As the result, the surface characteristics highly depends on frequency, reaction gas and treatment time. In the case of PC substrate, the contact angle was changed from $83.5^{\circ}$ (before plasma treatment) to $30^{\circ}$ (after plasma treatment) at 30 kHz, CDA 0.6%, and number of repeat 7. In the case of PET substrate, the contact angle change was found from $59^{\circ}$ to $23.5^{\circ}$ at 20 kHz, CDA 0.6%, and number of repeat 7. In the case of EVA substrate, it shows from $84^{\circ}$ to $44.2^{\circ}$ at 30 kHz, CDA 0.6%, and number of repeat 7.

플라즈마 표면처리 방법을 이용한 웨이퍼레벨 몰딩 공정용 기판의 최적 이형조건 도출 (Study on the Optimal Release Condition of Wafer Level Molding Process using Plasma Surface Treatment Method)

  • 연시모;박진호;이낙규;박석희;이혜진
    • 융복합기술연구소 논문집
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    • 제5권1호
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    • pp.13-17
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    • 2015
  • In wafer level molding progress, the thermal releasing failure phenomenon is shown up as the important problem. This phenomenon can cause the problem including the warpage, crack of the molded wafer. The thermal releasing failure is due to the insufficiency of adhesion strength degradation of the molding tape. To solve this problem, we studied experimental method increasing the release property of the molding tape through the plasma surface treatment on the wafer substrate. In this research, the vacuum plasma treatment system is used for release property improvement of the molding tape and controls the operating condition of the hydrophilic($O_2$, 100kW, 10min) and hydrophobic($C_2F_6$, 200kW, 10min). In order to perform the peeling test for measuring the releasing force precisely, we remodel the micro scale material property evaluation system developed by Korea institute of industrial technology. In case of hydrophilic surface treatment on the wafer substrate, we can figure out the releasing property of molding tape increase. In order to grasp the effect that it reaches to the release property increase when repeating the hydrophilic treatment, we make an experiment with twice treatment and get the result to increase about 12%. We find out the hydrophilic surface treatment method using plasma can improve releasing property of molding tape in the wafer level molding process.

Surface Cleaning of Polyethylene Terephthalate Film with Non-equilibrium Atmospheric Discharge Plasma

  • Sung, Youl-Moon
    • Transactions on Electrical and Electronic Materials
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    • 제9권2호
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    • pp.79-83
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    • 2008
  • The dampness by treating the surface with polyethylene terephthalate (PET) film was measured to grasp the plasma parameters and was observed the surface condition with an atomic force microscope (AFM) to find the causes of the dampness. Also, the vibrational and rotational temperatures in the plasma were calculated after identifying the radicals within the plasma by analyzing the emission spectral with an emission spectrum. The hydrophilic properties were enhanced, by treating the surface of the PET film with non-equilibrium atmospheric discharge plasma. When the rotational temperature was 0.22 to 0.31 eV within the plasma, surface modification control could be easily carried out to surface treatment of PET film on non-equilibrium atmospheric pressure plasma.

The Influence of Plasma Surface Modification on Frictional Property of Natural Rubber Vulcanizates

  • Nah, C.;Kim, D.H.;Mathew, G.;Jeon, D.J.;Jurkowski, B.;Jurkowska, B.
    • Elastomers and Composites
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    • 제39권1호
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    • pp.12-22
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    • 2004
  • 라디오 주파수(13.56 MHz) 무전극 종형 플라즈마 반응기를 이용하여 천연고무 가교체의 표면을 클로로디플루오로메탄으로 처리하였다. FT-적외선 분광분석으로 표면개질 정도를 정성적으로 조사하였다. 플라즈마 처리표면의 마찰힘은 플라즈마 처리시간 증가에 따라 감소하였다. 고무표면에 에틸렌글리콜과 물을 떨어뜨려 접촉각을 측정한 결과 플라즈마 처리에 따라 감소하는 것으로 미루어 플라즈마 개질에 따라 표면극성이 증가하는 것을 확인하였다. 유리판 표면을 동일조건으로 플라즈마 처리한 경우는 극성의 감소만이 확인되었다. 표면자유에너지의 London 비극성 및 극성요소를 계산하는데 있어서 기하평균법과 조화평균법이 유용한 것으로 확인되었다. 평균방법에 관계없이 플라즈마 처리시간이 증가함에 따라 표면자유에너지는 증가하였다 그러나 조화평균법으로 계산된 자유에너지가 기하평균법으로 계산된 값에 비해 상대적으로 높았다. 플라즈마 표면개질은 마찰의 계면, 히스테리시스, 점성요소들에 영향을 미침으로써 마찰계수를 변화시키는 것으로 나타났다.

XPS와 표면전위감소 통한 PET 필름의 표면분석 (Surface analysis of PET films by XPS and surface potential decay)

  • 임겸범;유도현;이붕주;이백수;이상희;신태현;신백균;이덕출
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2004년도 하계학술대회 논문집 C
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    • pp.1682-1684
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    • 2004
  • In this study, the surface properties of PET film were analyzed after plasma surface treatment. After plasma treatment of surface roughness and XPS were evaluated to analyze the chemical property, while the surface potential decay and surface resistivity was measured to analyze the electrical characteristic. When plasma discharge treatment was conducted for less than 10 minutes, the electrical insulating property was found to be improved through evaporation of low molecular weight materials and cleaning of surface. However, when the treatment was conducted for more than 10 minutes, the insulating property was decreased due to excessive discharge energy. Analysis of chemical characteristics showed that 10-minute treatment resulted in increase of C-O and O=C-O. However, when treated for more than 10 minutes, they were relatively decreased.

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표면처리된 CFRP와 알루미늄 복합재료의 파괴인성 향상에 대한 연구 (A Study on the Fracture Toughness Improvement of Surface-treated CFRP and Aluminum Composites)

  • 이경엽;김만태;최낙삼
    • 대한기계학회논문집A
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    • 제27권4호
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    • pp.632-637
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    • 2003
  • In this study, the effect of surface treatment of CFRP and aluminum on the fracture toughness of CFRP/aluminum composites was investigated. CFRP was surface-treated by Ar$^{+}$ ion beam under oxygen environment, and the aluminum was surface-treated by DC plasma. CFRP was adhesively bonded to aluminum using the secondary bonding procedure. Cracked lap shear specimens were used to determine fracture toughness. Three cases of cracked lap shear specimens were made depending on the surface treatment. The values of fracture toughness of three cases were compared to each other It was found that the fracture toughness of ion beam-treated CFRP/aluminum composites was almost 72 % higher than that of unrented CFRP/aluminum composites. The fracture toughness of CFRP/plasma-treated aluminum composites was 50 % higher than that of untreated CFRP/aluminum composites.s.

질소 플라즈마 표면처리가 쌀겨 기반 활성탄소의 전기 이중층 커패시터 성능에 미치는 영향 (Effect of Nitrogen Plasma Surface Treatment of Rice Husk-Based Activated Carbon on Electric Double-Layer Capacitor Performance)

  • 이란은;곽철환;이혜련;김석진;이영석
    • 공업화학
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    • 제33권1호
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    • pp.71-77
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    • 2022
  • 바이오매스 활용을 높이기 위하여, 쌀겨 기반 활성탄소(RHAC)를 제조한 뒤 질소 플라즈마 표면처리를 수행하여 전기이중층 커패시터(EDLC) 성능을 고찰하였다. 질소 플라즈마 표면처리를 통하여, RHAC 표면에 최대 2.17%의 질소가 도입되었으며 특히, 5 min 동안 반응한 샘플의 경우 pyrrolic/pyridine계 N 작용기의 형성이 우세하였다. 또한, 실리카 제거에 의해 쌀겨 기반 탄소재에 메조기공이 형성되었고 질소 플라즈마 표면처리에 의해 탄소재 표면 거칠기가 증가하여 미세기공이 많이 형성되는 것을 확인할 수 있었다. 순환전압전류법 측정 실험으로부터, 5 mV/s의 전압 주사 속도에서 질소 플라즈마 처리된 RHAC의 비정전용량은 최대 200 F/g로, 미처리 RHAC (111 F/g)에 비교하여 80.2% 향상된 값을 나타내었다. 이러한 결과는 질소 플라즈마 표면처리로 인해 탄소재 표면에 도입된 pyrrolic/pyridine계 질소 작용기 도입과 탄소재 표면 미세기공 부피 향상으로 인한 시너지 효과인 것으로 판단된다. 본 연구는 폐기 자원을 재활용하고, 플라즈마 표면처리법을 통해 이종원소 도입을 한다는 점에서 환경적으로 긍정적인 영향을 미칠 것으로 사료된다.

ITO 기판의 산소 플라즈마 표면 처리에 의한 OLED의 전기적ㆍ광학적 특성에 관한 연구 (A Study on ElectricalㆍOptical Properties of Organic Light Emitting Diode by Oxygen Plasma Surface Treatment of Indium-Tin-Oxide Substrates)

  • 양기성;김병상;김두석;신훈규;권영수
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제54권1호
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    • pp.8-12
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    • 2005
  • Indium tin oxide(ITO) surface treated by Oxygen plasma has been in situ analyzed using XPS(X-ray Photoelectron Spectroscopy) and EDS(Energy Dispersive Spectroscopy), to investigate the relations between the properties of the ITO surface and the properties of OLED(Organic Light Emitting Diode). We measured electrical resistivity using Four-Point-Probe and calculated sheet resistance, and ITO surface roughness was measured by AFM(Atomic Force Microscope). We fabricated OLED using substrate that was treated optimum ITO surface. The plasma treatment of the ITO surface lowered the operating voltage of the OLED. We have obtained an improvement of luminance and decrease of turn-on voltage.