• 제목/요약/키워드: PL properties

검색결과 748건 처리시간 0.021초

Effects of Carrier Leakage on Photoluminescence Properties of GaN-based Light-emitting Diodes at Room Temperature

  • Kim, Jongseok;Kim, Seungtaek;Kim, HyungTae;Choi, Won-Jin;Jung, Hyundon
    • Current Optics and Photonics
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    • 제3권2호
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    • pp.164-171
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    • 2019
  • Photoluminescence (PL) properties of GaN-based light-emitting diodes (LEDs) were analyzed to study the effects of carrier leakage on the luminescence properties at room temperature. The electrical leakage and PL properties were compared for LEDs showing leakages at forward bias and an LED with an intentional leakage path formed by connecting a parallel resistance of various values. The leakages at the forward bias, which could be observed from the current-voltage characteristics, resulted in an increase in the excitation laser power density for the maximum PL efficiency (ratio of PL intensity to excitation power) as well as a reduction in the PL intensity. The effect of carrier leakages on PL properties was similar to the change in PL properties owing to a reduction of the photovoltage by a reverse current since the direction of the carrier movement under photoexcitation is identical to that of the reverse current. Valid relations between PL properties and electrical properties were observed as the PL properties deteriorated with an increase in the carrier leakage. The results imply that the PL properties of LED chips can be an indicator of the electrical properties of LEDs.

InGaAsP/InP이종접합구조의 격자부정합이 Photoluinescence효율에 미치는 영향 (Effects of Lattice Mismatch on Photoluminescence Efficiency of InGaAsP/InP Heterostructures)

  • 이종원
    • 한국재료학회지
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    • 제4권5호
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    • pp.516-523
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    • 1994
  • 이논문에서는 metal organic chemical vapor deposition(MOCVD)에 의해서 성장된 InGaAsP/InP이종접합구조의 격자부정합이 Photoluminescence(PL)효율에 미치는 영향을 연구하였다. 격자부정합은 (400)과 {511} x-ray reflection을 통해 측정하였고, 부정합 전위의 유무는 x-ray to-pography와 PL imaging을 통해 확인했다. PL강도 측정결과, 상대적으로 높은 PL강도는 탄성적으로 스트레인을 받은 시료에, 낮은 PL강도는 전위로 인해 비탄성적으로 변형된 시료에서 얻어졌다. 성장온도에서 격자정합된 시료의 PL효율이 실온에서 가장 높은 것을 알 수 있었다. PL강도와 X-ray반치폭과 관계에서, 시료의 광전자 특성이 구조적 특성과 밀접하게 연관됨을 알 수 있었다.

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Irreversible luminescence from graphene quantum dots prepared by the chain of oxidation and reduction process

  • Jang, Min-Ho;Ha, Hyun Dong;Lee, Eui-Sup;Kim, Yong-Hyun;Seo, Tae Seok;Cho, Yong-Hoon
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.222.1-222.1
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    • 2015
  • Recently, graphene quantum dots (GQDs) have attracted great attention due to various properties including cost-effectiveness of synthesis, low toxicity, and high photostability. Nevertheless, the origins of photoluminescence (PL) from GQDs are unclear because of extrinsic states of the impurities, disorder structures, and oxygen-functional groups. Therefore, to utilize GQDs in various applications, their optical properties generated from the extrinsic states should be understood. In this work, we have focused on the effect of oxygen-functional groups in PL of the GQDs. The GQDs with nanoscale and single layer are synthesized by employing graphite nanoparticles (GNPs) with 4 nm. The series of GQDs with different amount of oxygen-functional groups were prepared by the chain of chemical oxidation and reduction process. The fabrication of a series of graphene oxide QDs (GOQDs) with different amounts of oxygen-contents is first reported by a direct oxidation route of GNPs. In addition, for preparing a series of reduced GOQDs (rGOQDs), we employed the conventional chemical reduction to GOQDs solution and controlled the amount of reduction agents. The GOQDs and rGOQDs showed irreversible PL properties even though both routes have similar amount of oxyen-functional groups. In the case of a series of GOQDs, the PL spectrum was clearly redshifted into blue and green-yellowish color. On the other hand, the PL spectrum of rGOQDs did not change significantly. By various optical measurement such as the PL excitation, UV-vis absorbance, and time-resolved PL, we could verify that their PL mechanisms of GOQDs and rGOQDs are closely associated with different atomic structures formed by chemical oxidation and reduction. Our study provides an important insights for understanding the optical properties of GQDs affected by oxygen-functional groups. [1]

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디지털 합금 InGaAlAs 다중 양자 우물의 열처리 온도에 따른 발광 특성 (Effect of Annealing Temperature on the Luminescence Properties of Digital-Alloy InGaAlAs Multiple Quantum Wells)

  • 조일욱;변혜령;류미이;송진동
    • 한국진공학회지
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    • 제22권6호
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    • pp.321-326
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    • 2013
  • 디지털 합금(digital alloy) InGaAlAs 다중 양자 우물(multiple quantum wells: MQWs) 구조의 열처리(rapid thermal annealing: RTA) 온도에 따른 발광 특성을 PL (photoluminescence)와 TRPL (time-resolved PL)를 이용하여 분석하였다. $700^{\circ}C$에서 $850^{\circ}C$까지 온도를 변화시켜 RTA한 디지털 합금 MQWs의 PL 결과는 $750^{\circ}C$에서 RTA한 시료가 가장 강한 PL 세기와 가장 좁은 반치폭을 나타내었다. 이것은 $750^{\circ}C$에서 30초 동안 RTA하였을 때 비발광 재결합 센터가 감소하고 가장 매끄러운 경계면이 형성되는 것을 나타낸다. RTA 온도를 $800^{\circ}C$$850^{\circ}C$로 증가하였을 때 PL 피크는 청색편이 하였으며 PL 세기는 감소하였다. PL 피크의 청색편이는 RTA 온도가 증가함에 따라 InGaAs/InAlAs SPS (short-period superlattice)의 경계면에서의 Ga과 Al의 혼합(intermixing)으로 Al 함량이 증가한 것으로 설명되며, PL 세기의 감소는 경계면의 거칠기의 증가와 인듐의 상분리(phase separation)로 인한 비균일 조성(compositional fluctuation)으로 설명된다. RTA 온도를 증가하였을 때 PL 소멸시간은 증가하였으며, 이것은 비발광 재결합 센터(결정 결함)가 감소한 것을 나타낸다. 디지털 합금 InGaAlAs MQWs 시료의 PL 특성은 적절한 RTA 조건에서 현저히 향상되는 것을 확인하였다.

초음파분무법으로 제조한 ZnO막의 PL특성 (PL Properties of ZnO Films Prepared by Ultrasonic Spray Pyrolysis)

  • 최무희;천영덕;마대영
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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    • pp.195-198
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    • 2004
  • ZnO films were Prepared by ultrasonic spray Pyrolysis on MgO substrates. The surface morphology and crystallinity were observed as a function of substrate temperature by SEM and XRD, respectively. PL properties of the ZnO films were studied by using Cd-He laser. UV light around 3.37 eV was pronounced in the PL spectra. The origin of the PL peak was discussed.

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InAs/GaAs 양자점의 발광특성에 대한 InGaAs 캡층의 영향 (Influence of InGaAs Capping Layers on the Properties of InAs/GaAs Quantum Dots)

  • 권세라;류미이;송진동
    • 한국진공학회지
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    • 제21권6호
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    • pp.342-347
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    • 2012
  • Migration-enhanced molecular beam epitaxy법을 이용하여 GaAs 기판에 성장한 InAs 양자점(quantum dots: QDs)의 광학적 특성을 PL (photoluminescence)과 time-resolved PL을 이용하여 분석하였다. 시료 온도, 여기 광의 세기, 발광 파장에 따른 InAs/GaAs QDs (QD1)과 $In_{0.15}Ga_{0.85}As$ 캡층을 성장한 InAs/GaAs QDs (QD2)의 발광특성을 연구하였다. QD2의 PL 피크는 QD1의 PL 피크보다 장파장에서 나타났으며, 이것은 InGaAs 캡층의 In이 InAs 양자점으로 확산되어 양자점의 크기가 증가한 것으로 설명된다. 10 K에서 측정한 QD1과 QD2의 PL 피크인 1,117 nm와 1,197 nm에서 PL 소멸시간은 각각 1.12 ns와 1.00 ns이고, 발광파장에 따른 PL 소멸시간은 PL 피크 근처에서 거의 일정하게 나타났다. QD2의 PL 소멸시간이 QD1보다 짧은 것은 QD2의 양자점이 커서 파동함수 중첩이 향상되어 캐리어 재결합이 증가한 때문으로 설명된다.

Properties of Silicon for Photoluminescence

  • Baek, Dohyun
    • Applied Science and Convergence Technology
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    • 제23권3호
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    • pp.113-127
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    • 2014
  • For more than five decades, silicon has dominated the semiconductor industry that supports memory devices, ICs, photovoltaic devices, etc. Photoluminescence (PL) is an attractive silicon characterization technique because it is contactless and provides information on bulk impurities, defects, surface states, optical properties, and doping concentration. It can provide high resolution spectra, generally with the sample at low temperature and room-temperature spectra. The photoluminescence properties of silicon at low temperature are reviewed and discussed in this study. In this paper, silicon bulk PL spectra are shown in multiple peak positions at low temperature. They correspond with various impurities such as In, Al, and Be, phonon interactions, for example, acoustical phonons and optical phonons, different exciton binding energies for boron and phosphorus, dislocation related PL emission peak lines, and oxygen related thermal donor PL emissions.

Luminescence Properties of InAlAs/AlGaAs Quantum Dots Grown by Modified Molecular Beam Epitaxy

  • Kwon, Se Ra;Ryu, Mee-Yi;Song, Jin Dong
    • Applied Science and Convergence Technology
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    • 제23권6호
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    • pp.387-391
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    • 2014
  • Self-assembled InAlAs/AlGaAs quantum dots (QDs) on GaAs substrates were grown by using modified molecular epitaxy beam in Stranski-Krastanov method. In order to study the structural and optical properties of InAlAs/AlGaAs QDs, atomic force microscopy (AFM) and photoluminescence (PL) measurements are conducted. The size and uniformity of QDs have been observed from the AFM images. The average widths and heights of QDs are increased as the deposition time increases. The PL spectra of QDs are composed of two peaks. The PL spectra of QDs were analyzed by the excitation laser power- and temperature-dependent PL, in which two PL peaks are attributed to two predominant sizes of QDs.

Electrical Leakage Levels Estimated from Luminescence and Photovoltaic Properties under Photoexcitation for GaN-based Light-emitting Diodes

  • Kim, Jongseok;Kim, HyungTae;Kim, Seungtaek;Choi, Won-Jin;Jung, Hyundon
    • Current Optics and Photonics
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    • 제3권6호
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    • pp.516-521
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    • 2019
  • The electrical leakage levels of GaN-based light-emitting diodes (LEDs) containing leakage paths are estimated using photoluminescence (PL) and photovoltaic properties under photoexcitation conditions. The PL intensity and open-circuit voltage (VOC) decrease because of carrier leakages depending on photoexcitation conditions when compared with reference values for typical LED chips without leakage paths. Changes of photovoltage-photocurrent characteristics and PL intensity due to carrier leakage are employed to assess the leakage current levels of LEDs with leakage paths. The current corresponding to the reduced VOC of an LED with leakage from the photovoltaic curve of a reference LED without leakage is matched with the leakage current calculated using the PL intensity reduction ratio and short-circuit current of the LED with leakage. The current needed to increase the voltage for an LED with a leakage under photoexcitation from VOC of the LED up to VOC of a reference LED without a leakage is identical to the additional current needed for optical turn-on of the LED with a leakage. The leakage current level estimated using the PL and photovoltaic properties under photoexcitation is consistent with the leakage level measured from the voltage-current characteristic obtained under current injection conditions.

Temperature-dependent Luminescence Properties of Digital-alloy In(Ga1-zAlz)As

  • Cho, Il-Wook;Ryu, Mee-Yi;Song, Jin Dong
    • Applied Science and Convergence Technology
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    • 제27권3호
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    • pp.56-60
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    • 2018
  • The optical properties of the digital-alloy $(In_{0.53}Ga_{0.47}As)_{1-z}/(In_{0.52}Al_{0.48}As)_z$ grown by molecular beam epitaxy as a function of composition z (z = 0.4, 0.6, and 0.8) have been studied using temperature-dependent photoluminescence (PL) and time-resolved PL (TRPL) spectroscopy. As the composition z increases from 0.4 to 0.8, the PL peak energy of the digital-alloy $In(Ga_{1-z}Al_z)As$ is blueshifted, which is explained by the enhanced quantization energy due to the reduced well width. The decrease in the PL intensity and the broaden FWHM with increasing z are interpreted as being due to the increased Al contents in the digital-alloy $In(Ga_{1-z}Al_z)As$ because of the intermixing of Ga and Al in interface of InGaAs well and InAlAs barrier. The PL decay time at 10 K decreases with increasing z, which can be explained by the easier carrier escape from InGaAs wells due to the enhanced quantized energies because of the decreased InGaAs well width as z increases. The emission energy and luminescence properties of the digitalalloy $(InGaAs)_{1-z}/(InAlAs)_z$ can be controlled by adjusting composition z.