Crystallization of a-SiC:H thin films deposited by PECVD and annealing effect (PECVD법에 의해 증착된 a-SiC:H 박막의 결정화 및 annealing 효과)

• Kim, Yong-Tak;Park, Mun-Gi;Hong, Byeong-Yu;Yun, Dae-Ho
• • Proceedings of the Korean Ceranic Society Conference
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  • 2000.10a
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  • pp.79.1-79
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  • 2000
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Electric Properties of PLZT Thin Films Prepared Using ECR PECVD method for the Charge Storage Capacitor of a High Density Memory (ECR PECVD법으로 제조한 고접적 메모리 소자 charge storage capacitor용 PLZT 박막의 전기적 특성)

• 신중식;정수옥;천성순;이원종
• • Proceedings of the Materials Research Society of Korea Conference
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  • 1996.11a
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  • pp.69-69
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  • 1996
• PDF

A Study on Atomic Bonding Structure of a-C:H Thin Films Prepared by ECR-PECVD Method (ECR-PECVD 방법으로 제작된 a-C:H 박막의 결합구조에 관한 연구)

• 손영호;박형국;정재인;박노길;황도원;김인수;배인호
• • Proceedings of the Korean Institute of Surface Engineering Conference
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  • 1999.10a
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  • pp.76-78
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  • 1999
• PDF

Effect of Reaction Gas on the Structural and Optical Features of nc-Si:H Thin Films Prepared by PECVD Techniques (PECVD 기법에 의해 제조된 나노 결정 Si 박막의 구조 및 광학적 특성)

• Sim, Jae-Hyeon;Park, Myeong-Beom;Han, Gyu-Ho;Jo, Nam-Hui
• • Proceedings of the Korean Ceranic Society Conference
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  • 2002.10a
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  • pp.114.1-114
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  • 2002
• PDF

The Effect of RF Bias Power on the $SiO_2$ and SiON Thick Film Deposited by PECVD (PECVD법에 의해 증착된 $SiO_2$와 SiON 후막의 RF Bias power의 영향)

• Kim, Yong-Tak;Kim, Dong-Sin;Yun, Dae-Ho
• • Proceedings of the Korean Ceranic Society Conference
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  • 2003.10a
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  • pp.146.2-146
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  • 2003
• PDF

Effect of RTA on Electrical Properties of $Ta_{2}O_{5}$ Thin Film deposited by PECVD (PECVD 법으로 형성된 $Ta_{2}O_{5}$ 유전박막의 전기적 특성에 미치는 급속 후속 열처리의 영향)

• 한성욱;이재석;박종완;이재학;박형호
• • Proceedings of the Materials Research Society of Korea Conference
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  • 1993.05a
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  • pp.132-132
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  • 1993
• PDF

Electrical properties of ECR-PECVD $Ta_{2}O_{5}$ thin film heat-treated in $O_2$ and $N_2$ (산소와 질소분위기에서 열처리된 ECR-PECVD 탄탈륨 산화막의 전기적 성질 연구)

• Kim, Il;Kim, Jong-Seok;Ahn, Seong-Deok;Chun, Seong-Sun;Lee, Won-Jong
• • Proceedings of the Materials Research Society of Korea Conference
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  • 1994.05a
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  • pp.88-88
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  • 1994
• PDF

A Study on the Characteristics of Silicon Oxide Films by Multi-Step Sputteirng PECVD (Multi-Step 스퍼터링 PECVD에 의한 실리콘 산화막의 특성에 관한 연구)

• Park, Min;Lee, Jung-Hwan;Lee, Sang-Hwan;Yoo, Byeong-Gon;Goo, Jing-Eun
• • Proceedings of the Materials Research Society of Korea Conference
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  • 1994.05a
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  • pp.121-122
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  • 1994
• PDF

A Study on the Hydrogen Loss for PECVD Silicon Nitride Films during High Energy Ion Beam Irradiation (고 에너지 이온빔에 의한 PECVD 질화규소막 내의 수소 이탈현상에 관한 연구)

• Lee, Jung-Hwan;Lee, Sang-Hwan;Park, Min;Goo, Jing-Eun;Cho, Gyeong-Ik
• • Proceedings of the Materials Research Society of Korea Conference
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  • 1994.05a
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  • pp.125-126
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  • 1994
• PDF

The Effect of Process Conditions for Formation of n-type Microcrystalline Silicon Thin Films by TCP-PECVD (TCP-PECVD를 이용한 n-type 마이크로결정질 실리콘 박막형성에 공정조건이 미치는 영향)

• Lee, Hyeong-Cheol;Lee, Yu-Jin;Sin, Jin-Guk;Yeom, Geun-Yeong
• • Proceedings of the Materials Research Society of Korea Conference
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  • 2004.05a
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  • pp.61-61
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  • 2004
• PDF

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