• Title/Summary/Keyword: PC substrate

검색결과 193건 처리시간 0.035초

폴리카보네이트에서의 표면개질 조건과 DC-Bias Sputtering 증착에 따른 Cu 밀착성 (Adhesion of Cu on Polycarbonate with the Condition of Surface Modification and DC-Bias Sputtering Deposition)

  • 배길상;엄준선;이인선;김상호;고영배;김동원
    • 한국표면공학회지
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    • 제37권1호
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    • pp.5-12
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    • 2004
  • The enhancement of adhesion for Cu film on polycarbonate (PC) surface with the $Ar/O_2$ gas plasma treatment and dc-bias sputtering was studied. The plasma treatment with this reactive mixture changes the chemical property of PC surface into hydrophllic one, which is shown by the variation of contact angle with surface modification. The micro surface roughness that also gives the high adhesive environment is increased by the $Ar/O_2$ gas plasma treatment. These results were observed distinctly from the atomic force microscopy (AFM). The negative substrate dc-bias effect for the Cu adhesion on PC was also investifated. Accelerated $Ar^{+}$ lons in sheath area of anode bombard the bare surface of PC during initial stage of dc bias sputtering. PC substrate. therefore, has severe roughen and hydrophilic surface due to the physical etching process with more activated functional group. As dc-bias sputtering process proceeds, morphology of Cu film shows better step coverage and dense layer. The results of peel test show the evidence of superiority of bias sputtering for the adhesion between metal Cu and PC.C.

Next Generation AMLCD Production Technologies for Large Substrate

  • Ohta, Takashi
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2001년도 International Meeting on Information Display
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    • pp.3-8
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    • 2001
  • This paper will review the state of the latest development of AMLCD manufacturing facilities for large Substrate and discuss the future technologies. The trend of the display size enlargement of Note book PC has hauled the enlargement of the mother glass substrate in past 10 years. The enlargement of a substrate size has brought about the productivity improvement of the TFT panel with process innovation as yet. Will this trend be continuing hereafter too? The issues of the processing and facilities related with the large square substrate and mask step reduction will be overviewed and the future processing and facilities will be discussed.

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근접장 마이크로파 현미경을 이용한 Copper(II)-phthalocyanine의 Phase Transition 연구 (Study of Phase Transition of Copper(II)-phthalocyanine using a Near Field Scanning Microwave Microscope)

  • 박미화;유현준;윤순일;임은주;이기진;차덕준;이용산
    • 한국전기전자재료학회논문지
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    • 제17권6호
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    • pp.641-646
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    • 2004
  • We report the changes of the microwave reflection coefficients S$_{11}$ of copper(II)-phthalocyanine (CuPc) thin films by using a near-field microwave microscope(NSMM) in order to understand the phase transition of CuPc. For a NSMM system, a high-quality microstrip resonator coupled with a dielectric resonator was used. CuPc thin films were prepared on the pre-heated glass substrates using a thermal evaporation method. The reflection coefficients S$_{11}$ of CuPc thin films were changed by the dependence on the substrate pre-heating temperatures. By comparing reflection coefficient S$_{11}$ and crystal structures, we found the phase transition of CuPc thin films from $\alpha$-phase to $\beta$-phase at the substrate heating temperature 200 $^{\circ}C$./TEX>.

인라인 스퍼터 시스템을 이용한 공정 압력의 변화에 따른 PC 기판상의 ITO 박막특성에 관한 연구 (Characteristics of ITO Thin Films Sputtered on Polycarbonate substrates at Various Pressures by In-line Sputter)

  • 안민형;조의식;권상직
    • 한국전기전자재료학회논문지
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    • 제22권9호
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    • pp.772-775
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    • 2009
  • Indium tin oxide(ITO) thin film was deposited at room temperature on polycarbonate(PC) substrate by in-line sputter system. ITO sputtering process was carried out at a various pressure for the reduction of ion damage on PC substrate and the electrical and the optical properties of deposited ITO films were obtained and analyzed. From the experimental results, the sheet resistances of as-deposited ITO films varied with a different pressure and the optical transmittances at visible wavelength were maintained above 85%. The results are considered to be related to the pressure of oxygen atoms as a reaction gas.

플라스틱 기판에 증착한 ZnO:Al 박막의 특성에 미치는 스퍼터 압력 효과 (Effects of Sputter Pressure on the Properties of Sputtered ZnO:Al Films Deposited on Plastic Substrate)

  • 이재형
    • 한국전기전자재료학회논문지
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    • 제22권3호
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    • pp.277-283
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    • 2009
  • In this paper, aluminum doped zinc oxide (ZnO:Al) thin films on plastic substrate such as poly carbonate (PC), polyethylene terephthalate (PET) were prepared by RF magnetron sputtering method for flexible solar cell applications. Effects of the sputter pressure on the structural, electrical and optical properties were investigated. The crystallinity and the degree of the (002) orientation were deteriorated with increasing the sputter pressure. When the sputter pressure was higher, the conductivity of ZnO:Al films was improved because of the high carrier concentration and the Hall mobility. High quality ZnO:Al films with resistivity as low as $1.9{\times}10^{-3}{\Omega}-cm$ and the optical transmittance over 80 % in the visible region have been obtained on PC substrate at 2 mTorr.

RF Magnetron Sputtering 법으로 제조된 AIN 박막에 관한 연구 (A study on the AIN thin films fabricated by RF magnetron sputtering)

  • 남창길;최승우;천희곤;조동율
    • 한국진공학회지
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    • 제6권1호
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    • pp.44-49
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    • 1997
  • 반응성 RF 스퍼터링 장치에 반응성 질소와 작업가스 아르곤을 동시에 주입하면서 Al을 스퍼터링하여 AIN박막을 형성하였다. polycarbonate기판이나 이 디스크 표면 위의 micron크기의 pregroove형태의 손상이 일어나지 않을 정도의 저온의 저온을 유지키 위하여 플라즈마(plasma) 자체 온도($100^{\circ}C$이하)로 가열하면서 silicon과 glass기판 위에 AIN박막을 증착시켰다. 여러 증착변수 변화에 따른 박막의 결정성, 단면형상 및 굴절율 변화 등을 분석 하였다.

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유연한 기판위에 성장된 CdS 박막의 전기적, 광학적 특성 (Electrical and Optical Properties of CdS Thin Films grown on the Flexible Substrate)

  • 김영동;나영일;이재형;정학기;정동수;임동건;양계준;이준신
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
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    • pp.276-279
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    • 2004
  • CdS thin films on polymer substrates such as polycarbonate(PC) and polyethylene terephthalat(PET) have many merits such as light weight, small volume and can make the obtained devices folded, easily carried. In present work, CdS thin films on glass, PC, and PET substrates have been prepared by chemical bath deposition. The structural and optical propertied of the films depending on substrate types have been investigated.

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ZnO 박막의 기판종류에 따른 구조적, 광학적 특성 (Dependence of Substrate Type on the Properties of ZnO Films deposited by r.f. magnetron sputtering)

  • 이동진;이재형;주정훈;송준태;이규일;양계준;임동건
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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    • pp.125-126
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    • 2006
  • ZnO Films have been prepared on polycarbonate (PC), polyethylene terephthalate (PET), and Coming 7059 substrates by r.f. magnetron sputtering technique. A comparison of the properties of the films deposited on polymer and glass substrates was performed. In addition, the effect of the sputter power on the structural and optical properties of these films was evaluated.

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스핀 스프레이법으로 PC 기판에 제작한 산화아연 박막의 특성 (Property of Spin-sprayed ZnO Film on PC Substrate)

  • 홍정수;;;박용서;김경환
    • 반도체디스플레이기술학회지
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    • 제17권3호
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    • pp.27-30
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    • 2018
  • In this study, ZnO film was deposited on polycarbonate substrate by spin-spray method at low substrate temperature of $85^{\circ}C$. Surface morphology of ZnO films was changed by adding citrate from rod to dense structure. As-deposited ZnO film indicated high transmittance above 80%. In case of the resistivity, as-deposited ZnO film had high resistivity due to the existence of organic substance in the film. However, organic substance was removed and resistivity was decreased to $3.9{\times}10^{-2}{\Omega}{\cdot}cm$, after UV irradiation.

CuPe/Au 소자의 기판 온도 변화에 따른 표면전위 특성 (Surface Potential Properties of CuPc/Au Device with Different Substrate Temperature)

  • 이호식;박용필;김영표;천민우;유성미
    • 한국정보통신학회:학술대회논문집
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    • 한국해양정보통신학회 2007년도 추계종합학술대회
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    • pp.758-760
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    • 2007
  • 최근에 유기물 전계효과 트랜지스터의 연구는 전자 소자 분야에서 널리 알려져 있다. 특히 본 연구에서는 CuPc 물질을 기본으로 하여 소자를 제작하고, 또한 기판의 온도를 달리 하여 CuPc/Au 구조 소자의 표면 전위 특성을 측정하였다. 기판은 slide glass를 사용하였고, CuPc 박막파 Au 전극은 진공 증착법을 이용하였다. 측정 온도의 범위는 0 - $100^{\circ}C$이었으며, 모든 측정은 진공 상태에서 측정이 이루어 졌다. 상온에서의 표면 전위 값은 약 600mV의 값을 보이고 있으며, 기판의 온도가 $100^{\circ}C$일 때 표면 전위 값은 약 500mV의 값으로 감소하는 것을 알 수 있다. 이러한 표면 전위 값의 변화는 기판의 온도가 상승하면서 CuPc 벌크 박막의 특성이 변화하는 것으로 판단되며, AFM 측정을 통해 확인 할 수 있었다.

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