• 제목/요약/키워드: Organic TFT

검색결과 177건 처리시간 0.025초

High performance organic gate dielectrics for solution processible organic and inorganic thin-film transitors

  • 가재원;장광석;이미혜
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2012년도 춘계학술발표대회
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    • pp.64.1-64.1
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    • 2012
  • Next generation displays such as high performance LCD, AMOLED, flexible display and transparent display require specific TFT back-planes. For high performance TFT back-planes, low temperature poly silicon (LTPS), and metal-oxide semiconductors are studied. Flexible TFT backplanes require low temperature processible organic semiconductors. Not only development of active semiconducting materials but also design and synthesis of semiconductor corresponding gate dielectric materials are important issues in those display back-planes. In this study, we investigate the high heat resistant polymeric gate dielectric materials for organic TFT and inorganic TFT with good insulating properties and processing chemical resistance. We also controlled and optimized surface energy and morphology of gate dielectric layers for direct printing process with solution processible organic and inorganic semiconductors.

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Printable organic TFT technologies for FPD applications

  • Ando, Masahiko
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.I
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    • pp.57-60
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    • 2005
  • We have recently developed new organic TFT technologies such as self-aligned self-assembly (SALSA) process and a high-resolution color active-matrix LCD panel. A new method to realize high-resolution printable organic TFT array to drive active-matrix flat-panel display will be discussed.

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유기절연체를 사용한 ZnO 박막트랜지스터 (ZnO TFT with Organic Dielectric)

  • 최운섭
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.56-56
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    • 2008
  • ZnO Oxide TFT with organic dielectric was prepared. ZnO thin film as active channel was prepared by plasma enhanced atomic deposition technique. Organic dielectric was spin coated on the gate metal. The structure of prepared TFT is bottom gate type and top contact structure. The characterization of oxide TFT was performed. We obtained the mobility of $0.7cm^2$/Vs, the threshold voltage of -14V, and the on-off ratio of $10^4$. We also obtained good output characterization with solid saturation.

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구동 TFT에 따른 TFT-LCD Array 특성 시뮬레이션 (Simulations of TFT-LCD Array Characteristic with Driving TFT Types)

  • 홍성진;이종혁;임동훈;최종선
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2002년도 추계학술대회 논문집 전기물성,응용부문
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    • pp.71-73
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    • 2002
  • 본 연구에서는 TFT-LCD 의 동작특성을 정확하게 계산하기 위해 준 실험적인 TFT 모델을 사용하여 a-Si TFT poly-Si TFT, Organic TFT에 대하여 파라미터를 추출하였다. 이렇게 추출된 TFT의 파라미터를 TFT-LCD 등가회로에 적용하여 화소의 동작 특성에 관하여 연구하였다. 또한 보다 정확한 시뮬레이션을 위하여 VLSI분야에서 사용되는 준 실험적인 정정용량 모델과 액정의 특성과 인가된 전압에 의존하는 액정 용량모델들을 사용하여 화소의 충 방전 특성을 시뮬레이션 하였는데 대면적 고화질의 패널일수록 특성이 우수한 TFT가 적용되어야 하며, 유기 TFT를 TFT-LCD에 적용시키기 위하여 유기 TFT의 성능향상 및 고전압의 구동방식이 필요하게 된다.

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Technology Issues on Oxide and Organic TFTs for AMOLED Display

  • 장진
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.75-75
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    • 2012
  • 박막 트랜지스터(TFT: Thin-Film-Transistor)는 미래 산업에 여러 가지로 사용 가능한 소자이기 때문에, 많은 연구가 진행되고 있고 그 성능이 계속 향상되고 있다. 특히, 평판 디스플레이인 AMLCD, AMOLED, 전자 종이 등이 모두 유리 혹은 플라스틱 기판에 향성된 TFT 어레이를 이용하고 있다. 현재 상업화에 응용되는 TFT는 비정질 실리콘과 저온 다결정 실리콘이며, 유기반도체 및 산화물 반도체 TFTs에 대한 연구가 매우 활발히 진행되고 있다. 본 발표에서는 산화물 반도체 TFT와 유기 반도체 TFT 기술 및 AMOLED에의 응용 기술 이슈에 대해 논의할 예정이다.

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유기절연막을 이용한 고개구율 TFT-LCD의 공정개발 (Development of High Aperature TFT LCD Process by Organic Insulator)

  • 이정호;노수귀;남효락;김치우;석준형
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1997년도 춘계학술대회 논문집
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    • pp.86-90
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    • 1997
  • We were evaluated from organic insulator of low dielectric constants, This organic insulator material is not only conservate TFT chanel but also used to insulator material to data line and pixel ITO electrod. This organic insulator material is possessed high platness and we can coat by Spin-On-Glass type. And we can make high aperature device because minimized black matrix width from coupling cap to data line and pixel ITO electrod, This evaluation with acryl over coat and PFCB(perflorecyclobutine) and we got good results.

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The Optimization of the Organic Passivation Process in the TFT-LCD Panel for LCD Televisions

  • Lee, Yeong-Beom;Jun, Sahng-Ik
    • Journal of Information Display
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    • 제10권2호
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    • pp.54-61
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    • 2009
  • The results of the optimization of the organic passivation process for fabricating thin-film transistors (TFTs) with a high aperture ratio on a seventh-generation glass (2200${\times}$1870 mm) substrate for LCD-TV panels are reported herein. The optimization of the organic passivation process has been verified by checking various factors, including the material properties (e.g., thickness, stain, etching, thermal reflow) and the effects on the TFT operation (e.g., gate/data line delay and display-driving properties). The two main factors influencing the organic passivation process are the optimization of the final thickness of the organic passivation layer, and the gate electrode. In conclusion, the minimum possible final thickness was found to be $2.42{\um}m$ via simulation and pilot testing, using the full-factorial design. The optimization of the organic passivation layer was accomplished by improving its brightness by over 10 cd/$m^2$ (ca. 2% luminance) compared to that of the conventional organic passivation process. The results of this research also help reduce the reddish stain on display panels.

능동형 유기 발광 다이오드(AMOLED)에서 발생하는 수소화된 비정질 실리콘 박막 트랜지스터(Hydrogenated Amorphous Silicon Thin Film Transistor)의 이력 (Hysteresis) 현상 (Hysteresis Phenomenon of Hydrogenated Amorphous Silicon Thin Film Transistors for an Active Matrix Organic Light Emitting Diode)

  • 최성환;이재훈;신광섭;박중현;신희선;한민구
    • 전기학회논문지
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    • 제56권1호
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    • pp.112-116
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    • 2007
  • We have investigated the hysteresis phenomenon of a hydrogenated amorphous silicon thin film transistor (a-Si:H TFT) and analyzed the effect of hysteresis phenomenon when a-Si:H TFT is a pixel element of active matrix organic light emitting diode (AMOLED). When a-Si:H TFT is addressed to different starting gate voltages, such as 10V and 5V, the measured transfer characteristics with 1uA at $V_{DS}$ = 10V shows that the gate voltage shift of 0.15V is occurred due to the different quantities of trapped charge. When the step gate-voltage in the transfer curve is decreased from 0.5V to 0.05V, the gate-voltage shift is decreased from 0.78V to 0.39V due to the change of charge do-trapping rate. The measured OLED current in the widely used 2-TFT pixel show that a gate-voltage of TFT in the previous frame can influence OLED current in the present frame by 35% due to the change of interface trap density induced by different starting gate voltages.

SOI 웨이퍼를 이용한 Top emission 방식 AMOLEDs의 스위칭 소자용 단결정 실리콘 트랜지스터 (Single Crystal Silicon Thin Film Transistor using 501 Wafer for the Switching Device of Top Emission Type AMOLEDs)

  • 장재원;김훈;신경식;김재경;주병권
    • 한국전기전자재료학회논문지
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    • 제16권4호
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    • pp.292-297
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    • 2003
  • We fabricated a single crystal silicon thin film transistor for active matrix organic light emitting displays(AMOLEDs) using silicon on insulator wafer (SOI wafer). Poly crystal silicon thin film transistor(poly-Si TFT) Is actively researched and developed nowsdays for a pixel switching devices of AMOLEDs. However, poly-Si TFT has some disadvantages such as high off-state leakage currents and low field-effect mobility due to a trap of grain boundary in active channel. While single crystal silicon TFT has many advantages such as high field effect mobility, low off-state leakage currents, low power consumption because of the low threshold voltage and simultaneous integration of driving ICs on a substrate. In our experiment, we compared the property of poly-Si TFT with that of SOI TFT. Poly-Si TFT exhibited a field effect mobility of 34 $\textrm{cm}^2$/Vs, an off-state leakage current of about l${\times}$10$\^$-9/ A at the gate voltage of 10 V, a subthreshold slope of 0.5 V/dec and on/off ratio of 10$\^$-4/, a threshold voltage of 7.8 V. Otherwise, single crystal silicon TFT on SOI wafer exhibited a field effect mobility of 750 $\textrm{cm}^2$/Vs, an off-state leakage current of about 1${\times}$10$\^$-10/ A at the gate voltage of 10 V, a subthreshold slope of 0.59 V/dec and on/off ratio of 10$\^$7/, a threshold voltage of 6.75 V. So, we observed that the properties of single crystal silicon TFT using SOI wafer are better than those of Poly Si TFT. For the pixel driver in AMOLEDs, the best suitable pixel driver is single crystal silicon TFT using SOI wafer.

ZnO 나노선과 P3HT 폴리머를 이용한 유/무기 복합체 TFT 소자 (ZnO Nanowires and P3HT Polymer Composite TFT Device)

  • 문경주;최지혁;;명재민
    • 한국재료학회지
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    • 제19권1호
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    • pp.33-36
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    • 2009
  • Inorganic-organic composite thin-film-transistors (TFTs) of ZnO nanowire/Poly(3-hexylthiophene) (P3HT) were investigated by changing the nanowire densities inside the composites. Crystalline ZnO nanowires were synthesized via an aqueous solution method at a low temperature, and the nanowire densities inside the composites were controlled by changing the ultrasonifiaction time. The channel layers were prepared with composites by spin-coating at 2000 rpm, which was followed by annealing in a vacuum at $100^{\circ}C$ for 10 hours. Au/inorganic-organic composite layer/$SiO_2$ structures were fabricated and the mobility, $I_{on}/I_{off}$ ratio, and threshold voltage were then measured to analyze the electrical characteristics of the channel layer. Compared with a P3HT TFT, the electrical properties of TFT were found to be improved after increasing the nanowire density inside the composites. The mobility of the P3HT TFT was approximately $10^{-4}cm^2/V{\cdot}s$. However, the mobility of the ZnO nanowire/P3HT composite TFT was increased by two orders compared to that of the P3HT TFT. In terms of the $I_{on}/I_{off}$ ratio, the composite device showed a two-fold increase compared to that of the P3HT TFT.