• Journal of the Korean Society for Precision Engineering
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• v.33 no.10
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• pp.845-850
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• 2016

A direct laser lithography system is widely used to fabricate various types of DOEs (Diffractive Optical Elements) including lenses made as CGH (Computer Generated Hologram). However, a parametric study that uniformly and precisely fabricates the diffractive patterns on a large area (up to $200mm{\times}200mm$) has not yet been reported. In this paper, four parameters (Focal Position Error, Intensity Variation of the Lithographic Beam, Patterning Speed, and Etching Time) were considered for stabilization of the direct laser lithography system, and the experimental results were presented.

• Bulletin of the Korean Space Science Society
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• 2004.04a
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• pp.33-33
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• 2004

Traditional bound abrasive grinding leaves the machine marks and subsurface damages ranging from 1 to few tens microns ms in height. These are removed typically by subsequent craftmen-based loose abrasive lapping, polishing and figuring. Using the multi-variable regression technique, we established a new automated grinding process control method for the removal of loose abrasive lapping from the traditional fabrication process. (omitted)

• Korean Journal of Optics and Photonics
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• v.11 no.4
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• pp.261-264
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• 2000

Continuous ND filters are fabricated on the silver halide photoplates. These filters enable us to get intensity modulated laser beam. Two kinds of continuous ND filters are fabricated. Optical density of one filter is increased radically and that of the other is decreased. In order to get a filter having desirable optical density, a mask which has reversed optical density has to be made. made.

• Journal of the Optical Society of Korea
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• v.20 no.2
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• pp.291-299
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• 2016

We have investigated the ultimate limits of nonuniform grating couplers (NGCs) for optimized fiber coupling to silicon waveguides, compared to uniform grating couplers (UGCs). Simple grating coupler schemes, which can be fabricated in etching steps of the conventional complementary metal-oxide semiconductor (CMOS) process on silicon-on-insulator (SOI) wafers without forming any additional overlay structure, have been simulated numerically and demonstrated experimentally. Optimum values of the grating period, fill factor, and groove number for ultimate coupling efficiency of the NGCs are determined from finite-difference time-domain (FDTD) simulation, and confirmed with experimentally demonstrated devices by comparison to those for the UGCs. Our simulated results indicate that maximum coupling efficiency of NGCs is possible when the minimum pattern size is below 50 nm, but the experimental value for the maximum coupling efficiency is limited by the attainable fabrication tolerance in a practical device process.

• Proceedings of the KSME Conference
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• 2003.04a
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• pp.1407-1411
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• 2003

Due to the heat confinement in the shallow region of the target for a short time scale, pulsed laser annealing has received increasing interest for the fabrication of poly-Si thin film transistors(TFTs) on glass as a low cost substrate in the flat panel displays. The formation and growth mechanisms of poly silicon(poly-Si) grains in thin films are investigated using an excimer laser crystallization system. To understand the crystallization mechanism, the grain formations are observed by FESEM analysis. The optical reflectance and transmittance during the crystallization process are measured using HeNe laser optics. A two-step ELC(Excimer Laser Crystallization) process is applied to enhance the grain formation uniformity.

• Journal of the Korean Society of Radiology
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• v.4 no.3
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• pp.27-31
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• 2010

Spatial resolution is determined by the performance of x-ray optics used in the x-ray imaging system. A zone plate was designed for obtaining a high spatial resolution image at x-ray energy of 8.5keV. A spatial resolution of 80 nm was estimated by the ray tracing when an x-ray tube of tungsten targe was used instead of synchrotron radiation. The designed zone plate of outermost zone width of 40nm was successfully fabricated by the electron-beam lithography.

• Transactions of the Korean Society of Machine Tool Engineers
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• v.16 no.5
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• pp.140-144
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• 2007

As an electron scanning microscopes has traditionally required a considerably large room equipped with several service and pipe lines due to its inherent size. As an alternative, a small sized SEM, simply called a mini-SEM, is introduced even if the performance in terms of magnification and resolution is a little inferior to a classical thermal SEM. However, the size and fabrication cost is dramatically reduced, dedicating to opening a new market. The optical system in the mini-SEM is redesigned and specimen stage is quitely reduced and vertical axis is excluded. The design tools and calibration techniques to develope the mini-SEM are introduced and its performance is verified through numerical analysis experiments.

• Laser Solutions
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• v.6 no.2
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• pp.9-17
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• 2003

Due to the heat confinement in the shallow region of the target for a short time scale, pulsed laser annealing has received an increasing interest for the fabrication of poly-Si thin film transistors(TFTs) on glass as a low cost substrate in the flat panel displays. The formation and growth mechanisms of poly silicon(poly-Si) grains in thin films are investigated using an excimer laser crystallization system. To understand the crystallization mechanism, the grain formations are observed by FESEM photography. The optical reflectance and transmittance during the crystallization process are measured using HeNe laser optics. A two-step ELC(Excimer Laser Crystallization) process is applied to enhance the grain formation uniformity.

• Korean Journal of Optics and Photonics
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• v.5 no.2
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• pp.311-318
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• 1994

We fabricated fiber-optic polarizers utilizing polarization selective mode coupling between the guided mode of a fiber and the surface plasmon mode supported by a thin aluminium film deposited on the polished side of a fiber. AI thin films with various thicknesses were coated onto the 633 nm, 830 nm, 1.3 fJITI single mode fibers. The maximum extinction ratio was higher than 30 dB for most of the samples and the best result was 42 dB at 90 A film thickness, with 1.3 fJITI single mode fiber. The insertion loss ranged from 0.2 dB to 1.5 dB.1.5 dB.

• Korean Journal of Optics and Photonics
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• v.5 no.2
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• pp.340-346
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• 1994

2.5Gbps 광통신시스템용 수광소자로서 charge plate층을 갖는 링구조의 separate absorption grading multiplication avalanche photodiode를 제작하고 그 특성을 조사 분석하였다. Avalanche Photodiode의 제작은 Metal-Organic Chemical Vapor Deposition 과 Liquid Phase Epitaxy법을 이용한 에피성장과 Br:Methanol을 이용한 채널식각 방법을 사용하였고, passivation과 평탄화는 photosensitive polyimide를 이용하였다. 제작된 ADP는 10nA 이하의 작은 누설전류를 나타내었고, -38~39 V의 항복전압을 나타내었다. 제작된 ADP를 GaAs FET hybrid 전치증폭기와 결합하여 2.5Gbps 속도에서 $2^{23}-1$의 길이를 갖는 입력 광신호에 대해 $ 10^{-10}$ Bit Error Rate에서 -31.0dBm의 수신감도를 얻었다.