• 제목/요약/키워드: Optical thickness

검색결과 1,654건 처리시간 0.026초

물질의 광학적 두께에 따른 EMP-simulation을 통한 광특성 대조 (The Comparison of Optical Properties with Different Optical Thickness of Materials by EMP-simulation)

  • 장강재;장건익;이남일;정재일;임광수
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.345-345
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    • 2007
  • ZnS/$Na_3AlF_6$/ZnS/Cu multi-layered thin film were simulated by EMP. EMP is a comprehensive software package for the design and analysis of optical thin film. ZnS and $Na_3AlF_6$ was selected as a high refractive index material and low refractive index material And Cu was selected as mid reflective material. Optical properties including color effect were systematically studied in terms of different low refractive index materials thickness. $Na_3AlF_6$ were changed 0.25, 0.5, 0.75, $1.0{\lambda}$. The thin film showed $0.25{\lambda}$ : blue, purple / $0.5{\lambda}$ : yellow $0.75{\lambda}$ : blue, purple, red / $1.0{\lambda}$ : yellow, green, blue, purple. It was becaused by different optical thickness of $Na_3AlF_6$. The maximum of optical interference by refractive layer.

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RF magnetron sputter에 의해 제조된 AZO/Ag/AZO 다층박막의 Ag 두께가 전기적 광학적 특성에 미치는 영향 (Influence of Ag Thickness on Electrical and Optical Properties of AZO/Ag/AZO Multi-layer Thin Films by RF Magnetron Sputtering)

  • 안진형;강태원;김동원;김상호
    • 한국표면공학회지
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    • 제39권1호
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    • pp.9-12
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    • 2006
  • Al-doped ZnO(AZO)/Ag/AZO multi-layer films deposited on PET substrate by RF magnetron sputtering have a much better electrical properties than Al-doped ZnO single-layer films. The multi-layer structure consisted of three layers, AZO/Ag/AZO, the optimum thickness of Ag layers was determined to be $112{\AA}$ for high optical transmittance and good electrical conductivity. With about $1800{\AA}$ thick AZO films, the multi-layer showed a high optical transmittance in the visible range of the spectrum. The electrical and optical properties of AZO/Ag/AZO were changed mainly by thickness of Ag layers. A high quality transparent electrode, having a resistance as low as $6\;W/{\square}$ and a high optical transmittance of 87% at 550 nm, was obtained by controlling Ag deposition parameters.

전면 유기 발광 소자의 유기물층 두께 변화에 따른 광학적 특성 (Organic-layer thickness dependent optical properties of top emission organic light-eitting diodes)

  • 안희철;주현우;나수환;김태완;홍진웅;오용철;송민종
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.413-414
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    • 2008
  • We have studied an organic layer thickness dependent optical properties and microcavity effects for top-emission organic light-emitting diodes. Manufactured top emission device, structure is Al(100nm)ITPD(xnm)/$Alq_3$(ynm)/LiF(0.5nm)/Al(23nm). While a thickness of hole-transport layer of TPD was varied from 35 to 65nm, an emissive layer thickness of $Alq_3$ was varied from 50 to 100nm for two devices. A ratio of those two layers was kept to about 2:3. Variation of the layer thickness changes a traverse time of injected carriers across the organic layer, so that it may affect on the chance of probability of exciton formation. View-angle dependent emission spectra were measured for the optical measurements. Top-emission devices show that the emission peak wavelength shifts to longer wavelength as the organic layer thickness increases. For instance, it shifts from 490 to 555nm in the thickness range that we used. View-angle dependent emission spectra show that the emission intensity decreases as the view-angle increases. The organic layer thickness-dependent emission spectra show that the full width at half maximum decreases as the organic layer thickness increases. Top emission devices show that the full width at half maximum changes from 90 to 35nm as the organic layer thickness increases. In top-emission device, the microcavity effect is more vivid as the organic layer thickness increases.

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x-cut $LiNbO_3$ 광도파로 제작 및 Ti 두께에 따른 Near-field 특성 변 화 (Preparation of x-cut $LiNbO_3$ Optical Waveguide and the Change in Near-field Properties according to Ti thickness)

  • 김성구;윤형도;윤대원;한상필;김창민;박계춘;이진;유용택
    • 한국전기전자재료학회논문지
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    • 제11권2호
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    • pp.146-153
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    • 1998
  • The optical near-field patterns, propagation loss and mode sizes of x-cut $Ti:LiNbO_3$ optical waveguide which was fabricated by Ti-diffusion varying with Ti strip thickness in wet oxygen atmosphere were discussed at optical wavelength 1550nm. As Ti thickness increased from $760{\AA}$, the insertion loss of waveguide was decreased. But at Ti thickness $1500{\AA}$, mode sizes are widely broadened. The Ti thickness of below $1100{\AA}$ and above $1500{\AA}$ showed negative effects to propagation loss and fiber coupling. The best Ti thickness for fabricating low propagation loss and good fiber coupling was inferred to be between $1100{\AA}-1500{\AA}$ in our conditions. And for Ti thickness $1150{\AA}$, its propagation loss, horizontal/vertical mode sizes were showed 1.61 dB/cm, $11.9/8.9{\mu}m$ for TM, 0.22 dB/cm, $12.0/9.1{\mu}m$ for TE respectively.

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Influence of ZnO Thickness on the Optical and Electrical Properties of GZO/ZnO Bi-layered Films

  • Kim, Sun-Kyung;Kim, So-Young;Kim, Seung-Hong;Jeon, Jae-Hyun;Gong, Tae-Kyung;Kim, Daeil;Yoon, Dae Young;Choi, Dong Yong
    • Transactions on Electrical and Electronic Materials
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    • 제15권4호
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    • pp.198-200
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    • 2014
  • 100 nm thick Ga doped ZnO (GZO) thin films were deposited with RF magnetron sputtering on polyethylene terephthalate (PET) and ZnO coated PET substrate and then the effect of the ZnO thickness on the optical and electrical properties of the GZO films was investigated. GZO single layer films had an optical transmittance of 83.7% in the visible wavelength region and a sheet resistance of $2.41{\Omega}/{\square}$, while the optical and electrical properties of the GZO/ZnO bi-layered films were influenced by the thickness of the ZnO buffer layer. GZO films with a 20 nm thick ZnO buffer layer showed a lower sheet resistance of $1.45{\Omega}/{\square}$ and an optical transmittance of 85.9%. As the thickness of ZnO buffer layer in GZO/ZnO bi-layered films increased, both the conductivity and optical transmittance in the visible wavelength region were increased. Based on the figure of merit (FOM), it can be concluded that the ZnO buffer layer effectively increases the optical and electrical performance of GZO films as a transparent and conducting electrode without intentional substrate heating or a post deposition annealing process.

Soild-state reaction in Ti/Ni multilayers

  • 이주열;이영백;김태하;김기원
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 1999년도 제17회 학술발표회 논문개요집
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    • pp.140-140
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    • 1999
  • Ti/Ni multilayered films (MLF) are ideal for neutron optics particularly in neutron guides and focusing devices. This system also possesses the tendency of amorphization through a solid-state reaction (SSR). This behaviors are closely related to the electronic structures and both magneto-optical (MO) and optical properties of metals depend strongly on their electron energy structures. Mutual inter-diffusion of the Tin and Ni atoms in the MLF caused by a low temperature annealing should decrease the thickness of pure Ni, as well as change the chemical and atomic order in the reactive zone. The application of the MO spectroscopy to the study of SSR in the MLF allows us to obtain an additional information on the changes in the atomic and chemical orders in the interface region. The optical one has no restriction on the magnetic state of the constituent sublayers. Therefore, the changes in magnetic, MO and optical properties of the Ti/Ni MLF due to SSR can be expected. To the best of our knowledge, the MO and optical spectroscopies were not used for this purpose. SSR has been studied in the series of the Ti/Ni MLFs with bilayer periods of 0.65-22.2nm and constant ratio of the Ti to Ni sublayers thickness by using MO and optical spectroscopies as well as an x-ray diffraction. The experimental MO and optical spectra are compared with the computer-simulated spectra, assuming various interface models. The relative changes in the x-ray diffraction spectra and MO properties of the Ti/Ni MLF caused by annealing are bigger for the multilayers with "thick" sublayers, or the SSR with the formation of amorphous alloy takes place mainly in the Ti/Ni multilayers with "thick" sublayers, while in the nominal threshold thickness of the Ni-sublayer for the observation of the equatorial Kerr effect in the as-deposited and annealed Ti/Ni MLFs of about 3.0 and 4.5nm thick is explained by the formation of amorphous alloy during the deposition or the formation of the nonmagnetic alloyed regions between pure components as a result of the SSR. For the case of Ti/Ni MLF the MO approach is more sensitive for the determination of the thickness of the reacted zone, while x-ray diffraction is more useful for structural analyses.structural analyses.

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월면 디지털 영상 분석을 이용한 대기 광학두께 산출 (Retrieval of Atmospheric Optical Thickness from Digital Images of the Moon)

  • 정명재
    • 대한원격탐사학회지
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    • 제29권5호
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    • pp.555-568
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    • 2013
  • 이 연구에서는 상용 디지털 카메라를 이용하여 야간에 촬영된 월면 영상을 분석하여 야간의 대기 광학두께와 에어로솔 광학두께를 추정하였다. 기본적으로 랑리회귀법을 이용하였으며 구름이 없고 대기의 광학적 특성이 비교적 안정한 날에 관측을 수행하였다. 카메라의 적색(R), 녹색(G), 청색(B) 채널의 파장별 반응함수를 이용하여 월광관측에 대한 유효 중심파장 및 레일리 광학두께를 추정하였으며, 랑리 회귀법에서 유도된 대기광학두께로부터 레일리 광학두께를 제하여 에어로솔 광학 두께를 산출하였다. 야간에는 독립적인 방법으로 산출된 검증자료나 다른 에어로솔 광학두께 자료가 거의 없으므로 월면 관측이 이루어지기 수 시간 전의 주간에 정밀한 태양분광광도계로 측정된 에어로솔 광학두께 자료와 MODIS 위성센서 관측으로부터 산출된 에어로솔 광학두께 자료를 본 연구에서 월면 관측을 통해 산출된 자료와 비교하였다. 비교 결과 R, G, B 채널에서 대략 0.1정도의 오차 범위에서 월면 영상분석을 통해 에어로솔 광학두께의 추정이 가능함을 알 수 있었다. 단, 대기 중의 에어로솔 입자들의 크기를 나타내는 모수인 앙스트롬지수(${\AA}$ngstr$\ddot{o}$m Exponent)는 파장별 광학두께의 작은 오차에도 큰 오차를 가질 수 있기 때문에 에어로솔 광학두께의 오차에 비해 비교적 큰 오차를 보일 수 있음이 나타났다. 그럼에도 불구하고, 야간의 에어로솔 광학두께 자료가 많지 않은 현실에서 저비용으로 월면 관측을 통하여 에어로솔 광학두께를 산출할 수 있는 가능성을 찾았다는 점에서 본 연구의 의의가 있으며 앞으로 보다 많은 관측과 분석을 통해 보다 향상된 야간 에어로솔 광학두께 추정이 가능할 것으로 보인다.

단일벽 탄소나노튜브 필름의 전기적 및 광학적 특성 (Electrical and Optical Property of Single-Wall Carbon Nanotubes Films)

  • 오동훈;강영진;정혁;송혜진;조유석;김도진
    • 한국재료학회지
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    • 제19권9호
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    • pp.488-493
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    • 2009
  • Thin films of single-wall carbon nanotubes (SWNT) with various thicknesses were fabricated, and their optical and electrical properties were investigated. The SWNTs of various thicknesses were directly coated in the arc-discharge chamber during the synthesis and then thermally and chemically purified. The crystalline quality of the SWNTs was improved by the purification processes as determined by Raman spectroscopy measurements. The resistance of the film is the lowest for the chemically purified SWNTs. The resistance vs. thickness measurements reveal the percolation thickness of the SWNT film to be $\sim$50 nm. Optical absorption coefficient due to Beer-Lambert is estimated to be $7.1{\times}10^{-2}nm^{-1}$. The film thickness for 80% transparency is about 32 nm, and the sheet resistance is 242$\Omega$/sq. The authors also confirmed the relation between electrical conductance and optical conductance with very good reliability by measuring the resistance and transparency measurements.

Experimental study on the shear thinning effects of viscosity index improver added lubricant by in-situ optical viscometer

  • Jang, Siyonl
    • Korea-Australia Rheology Journal
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    • 제15권3호
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    • pp.117-124
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    • 2003
  • Elastohydrodynamic lubrication (EHL) film is measured under the condition of viscosity index improver added to base oil. In-situ optical contact method using the interference principle make the measuring resolution of ~5 nm possible and enables the measuring range all over the contact area of up to ~300 $\mu\textrm{m}$ diameter. What is more important to the developed method by the author is that the measurement of EHL film thickness is possible in the range from 100 nm to 2 $\mu\textrm{m}$, which is the regime of worst contact failures in precision machinery. Viscosity index improver (VII) is one of the major additives to the modem multigrade lubricants for the viscosity stability against temperature rise. However, it causes shear thinning effects which make the film thickness lessened very delicately at high shear rate (over $10^5 s^{-1}$) of general EHL contact regime. In order to exactly verify the VIIs performance of viscosity stability at such high shear rate, it is necessary to make the measurement of EHL film thickness down to ~100 nm with fine resolution for the preliminary study of viscosity control. In this work, EHL film thickness of VII added lubricant is measured with the resolution of ~5 nm, which will give very informative design tool for the synthesis of lubricants regarding the matter of load carrying capacity at high shear rate condition.

초소형 초광각 비구면 유리렌즈의 초정밀 연삭가공기술에 관한 연구 (An Research on Ultra Precisive Polishing Manufacturing Technology of Glass for Micromini and Super Wide-Angle Aspherics Glasses Lens.)

  • 김두진;유경선;현동훈
    • 한국생산제조학회지
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    • 제19권2호
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    • pp.275-281
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    • 2010
  • This research's goal is to process directly aspherics with big sagment and thin center thickness. If we can process directly aspherics with big sagment and thin center thickness, we think it greatly helps to reduce the time of developing optical system. We made very thin glass using diamond grinding whetstone regarding the trace of tool and the detailed drawing of tool super precisive aspherics that has 0.46mm center thickness and over $30^{\circ}$ segment, $0.1{\mu}m$ machining accuracy, 15nm surface accuracy. We think this research's result will be effective to open new market because it is applied not only cell phone optical system but also CCTV robot optical system, internet phone optical system. Also we expect to enhance the super strong brittle precisive process's possibility with super precisive processing technique that achieves 0.46mm glass center thickness as first in the world.