• Industry Promotion Research
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• v.1 no.2
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• pp.7-11
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• 2016

$SnO_2$ films were annealed in a vacuum atmosphere conditions to research the temperature dependency of current-voltage characteristics, crystal structure and chemical properties. The $SnO_2$ film annealed in a vacuum became an amorphous structure, but the degree of amorphous structure changed in accordance with the content of oxygen vacancy, which increased at film annealed at $100^{\circ}C$ and then decreased over the sample at annealed at $150^{\circ}C$. Because the crystallinity was affected the content of oxygen vacancy. The oxygen vacancy as carriers disappeared with increasing the annealing temperatures, and the depletion layer increased. Therefore the content of exiton as optical properties increased with becoming the amorphous structure. So the intensity of PL spectra increased with increasing the annealing temperature.

• Korean Journal of Agricultural Science
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• v.41 no.3
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• pp.169-175
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• 2014

Objective of this study was to investigate effects of pre-processing method and number of sampling leaves on stability of the reflectance measurement for Chinese cabbage and kale leaves. Chinese cabbage and kale were transplanted and cultivated in a plant factory. Leaf samples of the kale and cabbage were collected at 4 weeks after transplanting of the seedlings. Spectra data were collected with an UV/VIS/NIR spectrometer in the wavelength region from 190 to 1130 nm. All leaves (mature and young leaves) were measured on 9 and 12 points in the blade part in the upper area for kale and cabbage leaves, respectively. To reduce the spectral noise, the raw spectral data were preprocessed by different methods: i) moving average, ii) Savitzky-Golay filter, iii) local regression using weighted linear least squares and a $1^{st}$ degree polynomial model (lowess), iv) local regression using weighted linear least squares and a $2^{nd}$ degree polynomial model (loess), v) a robust version of 'lowess', vi) a robust version of 'loess', with 7, 11, 15 smoothing points. Effects of number of sampling leaves were investigated by reflectance difference (RD) and cross-correlation (CC) methods. Results indicated that the contribution of the spectral data collected at 4 sampling leaves were good for both of the crops for reflectance measurement that does not change stability of measurement much. Furthermore, moving average method with 11 smoothing points was believed to provide reliable pre-processed data for further analysis.

• Korean Journal of Optics and Photonics
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• v.11 no.5
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• pp.360-364
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• 2000

We demonstrate self-starting passIve mode locking of a Cr:LiSAF laser, using a SCIDlconduclor Saturable Absorber Mirror (SESAM), Two high-power red semiconductor lasers (Coherent S-67-500C-100-H) of wavelength 667 nm and maximum power of 500 mW were used as pump lasers, The cavity has 10 cm radius-ai-curvature folding minors, two SF 10 prisms, a 99% reflectivity output coupler and a SESAM at dIe focus of a 10 cm radIus-at-curvature mirror. We used the laser crystal in BrewsterBrewster shape with 1 5% $Cr^{+3}$ ion concentration and the length of 6 mm, An X-shaped resonator was used to compensate the astigmatism induced by tile crystal. The structure of the SESAM cOllSists of 30 pmr of $AlAs/Al_{0.15}Ga_{0.85}As$ layer, wi1l1 a 10 nm GaAs quantum well situated in the topmost layer Output spectra were centeled at 833 nm, with 4 nm spectral bandwidth and pulse width was measured to be 220 fs, Output power of 3 mW is obtained at a pump power of 800 mW. 00 mW.

• Journal of Surface Science and Engineering
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• v.48 no.3
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• pp.82-86
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• 2015

$Dy^{3+}$- and $Eu^{3+}$-codoped $CaMoO_4$ Phosphors were synthesized by using the solid-state reaction method. The crystal structure, morphology, and optical properties of the resulting phosphor particles were investigated by using the X-ray diffraction, field-emission scanning electron microscopy, and photoluminescence spectroscopy. XRD patterns exhibited that all the synthesized phosphors showed a tetragonal system with a main (112) diffraction peak, irrespective of the content of $Eu^{3+}$ ions. As the content of $Eu^{3+}$ ions increased, the grains showed a tendency to agglomerate. The excitation spectra of the synthesized powders were composed of one strong broad band centered at 305 nm in the range of 220 - 350 nm and several weak peaks in the range of 350 - 500 nm resulting from the 4f transitions of activator ions. Upon ultraviolet excitation at 305 nm, the yellow emission line due to the $^4F_{9/2}{\rightarrow}^6H_{13/2}$ transition of $Dy^{3+}$ ions and the main red emission spectrum resulting from the $^5D_0{\rightarrow}^7F_2$ transition of $Eu^{3+}$ ions were observed. With the increase of the content of $Eu^{3+}$, the intensity of the yellow emission band gradually decreased while that of the red emission increased. These results indicated that the emission intensities of yellow and red emissions could be modulated by changing the content of the $Dy^{3+}$ and $Eu^{3+}$ ions incorporated into the host crystal.

• Journal of Surface Science and Engineering
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• v.43 no.3
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• pp.121-126
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• 2010

The PS(porous Si) were fabricated with different anodization time and current density. The structural and optical properties of PS were investigated by SEM(scanning electron microscopy), AFM(atomic force microscopy), and PL(photoluminescence). It is found that the pore size and surface roughness of PS are proportional to the current density. The PL spectra show that the PL peak position is red-shifted with increasing anodization time. This behavior corresponds to the change of pore size which is consistent with the quantum confinement model. The FWHM(full width at half maximum) of PL peak is decreased from 97 to 51 nm and the PL peak position is blue-shifted with increasing current density up to 10 mA/$cm^2$. The PL peak intensity of the PS fabricated under 1 mA/$cm^2$ is the highest among samples.

• Journal of Sensor Science and Technology
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• v.17 no.6
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• pp.437-446
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• 2008

Single crystalline ${ZnIn_2}{Se_4}$ layers were grown on thoroughly etched semi-insulating GaAs (100) substrate at $400^{\circ}C$ with hot wall epitaxy (HWE) system by evaporating ${ZnIn_2}{Se_4}$ source at $630^{\circ}C$. The crystalline structure of the single crystalline thick films was investigated by the photoluminescence (PL) and Double crystalline X-ray rocking curve (DCRC). The carrier density and mobility of ${ZnIn_2}{Se_4}$ single crystalline thick films measured from Hall effect by van der Pauw method are $9.41{\times}10^{16}cm^{-3}$ and $292cm^2/V{\cdot}s$ at 293 K, respectively. The temperature dependence of the energy band gap of the ${ZnIn_2}{Se_4}$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)$=1.8622 eV-$(5.23{\times}10^{-4}eV/K)T^2$/(T+775.5 K). After the as-grown ${ZnIn_2}{Se_4}$ single crystalline thick films was annealed in Zn-, Se-, and In-atmospheres, the origin of point defects of ${ZnIn_2}{Se_4}$ single crystalline thick films has been investigated by the photoluminescence (PL) at 10 K. The native defects of $V_{Zn}$, $V_{Se}$, $Zn_{int}$, and $Se_{int}$ obtained by PL measurements were classified as a donors or acceptors type. And we concluded that the heat-treatment in the Se-atmosphere converted ${ZnIn_2}{Se_4}$ single crystalline thick films to an optical p-type. Also, we confirmed that In in ${ZnIn_2}{Se_4}$/GaAs did not form the native defects because In in ${ZnIn_2}{Se_4}$ single crystalline thick films existed in the form of stable bonds.

• Journal of Surface Science and Engineering
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• v.41 no.3
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• pp.83-87
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• 2008

This study described the effects of RF power, DC bias voltage, chamber pressure and gas mixing ratio on the etch rates of TiN thin film and selectivity of TiN thin film to $SiO_2$ with $BCl_3$/Ar gas mixture. When the gas mixing ratio was $BCl_3$(20%)/Ar(80%) with other conditions were fixed, the maximum etch rate of TiN thin film was 170.6 nm/min. When the DC bias voltage increased from -50 V to -200 V, the etch rate of TiN thin film increased from 15 nm/min to 452 nm/min. As the RF power increased and chamber pressure decreased, the etch rate of TiN thin film showed an increasing tendency. When the gas mixing ratio was $BCl_3$(20%)/Ar(80%) under others conditions were fixed, the intensity of optical emission spectra from radical or ion such as Ar(750.4 nm), $Cl^+$(481.9 nm) and $Cl^{2+}$(460.8 nm) was highest. The TiN thin film was effectively removed by the chemically assisted physical etching in $BCl_3$/Ar ICP plasma.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.79-80
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• 2007

To obtain the single crystal thin films, $AgGaSe_2$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wall epitaxy (HWE) system. The source and substrate temperatures were $630^{\circ}C\;and\;420^{\circ}C$, respectively. The temperature dependence of the energy band gap of the $AgGaSe_2$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g$(T) = 1.9501 eV - ($8.79{\times}10^{-4}$ eV/K)$T^2$/(T + 250 K). After the as-grown $AgGaSe_2$ single crystal thin films was annealed in Ag-, Se-, and Ga-atmospheres, the origin of point defects of $AgGaSe_2$ single crystal thin films has been investigated by the photoluminescence(PL) at 10 K. The native defects of $V_{Ag},\;V_{Se},\;Ag_{int},\;and\;Se_{int}$ obtained by PL measurements were classified as a donors or acceptors type. And we concluded that the heat-treatment in the Ag-atmosphere converted $AgGaSe_2$ single crystal thin films to an optical p-type. Also, we confirmed that Ga in $AgGaSe_2$/GaAs did not form the native defects because Ga in $AgGaSe_2$ single crystal thin films existed in the form of stable bonds.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.27 no.12
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• pp.831-836
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• 2014

One-dimensional (1D) photonic crystals (PCs) were prepared by $TeO_x(2<x<3)/SiO_2$ with the difference refractive index, and fabricated by sputtering technique from a $TeO_2$ and $SiO_2$ target. The $TeO_x$(2$Ar:O_2=40:10$). A 10-pair $TeO_x(2<x<3)/SiO_2$ 1D PCs were fabricated with the structure parameters of filling factor=0.5185, and period=410 nm. The properties of 1D PCs with and without a defect layer were evaluated by UV-VIS-NIR. A normal mode 1D PC have a photonic band gap (PBG) in the near infrared (NIR) region from 1,203 to 1,421 nm. In the case of 1D PC containing a defect layer, a defect level appears at 1,291 nm. The measured transmittance (T) spectra are nearly corresponding to calculated results. After He-Cd laser exposure, the defect level is shifted from 1,291 nm to 1,304 nm.

• Korean Journal of Optics and Photonics
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• v.1 no.2
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• pp.198-203
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• 1990

In this paper, a system has been proposed for the measurement of the spectral characteristic of semiconductor light sources driven by very short pulse currents. This system has been constituted a monochrometer of 600 groovedmm grating and of 275 mm focal length, X-Y recorder, scanning motor which enables the system to get the analog data, and amplifier coupled with peak detector. Especially, peak detector was used to convert the short pulse signal to continuous one. In order to verify the resolution with slit width, several slits were made by the hands. By using this system, the spectra of commercial LEDs, AlGaAdGaAs LD, and InGaAsPIInP BH-LD which were driven with pulse current (duty cy$e = 0.01) were measured. From these measurements, it has been shown that the proposed system has about 1 A1$\AA$ resolution and 10$\mu$W sensitivity.