• Title/Summary/Keyword: Optical materials

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The Characteristics of Ultra Precision Machining of Si and Ge (Si와 Ge의 초정밀 절삭특성)

  • 원종호;박상진;안병민;도철진;홍권희;김건희;유병주
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2000.05a
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    • pp.775-778
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    • 2000
  • Single point diamond turning technique fur optical crystals is reported in this paper. The main factors influencing the machined surface quality are discovered and regularities of machining process are drawn. Optical crystals have found more and more important applications in the field of modern optics. Optical crystals are mostly brittle materials of poor machinability. The traditional machining method is polishing which has many shortcomings such as low production efficiency, poor ability to be automatically controlled and edge effect of the workpiece. SPDT has been widely used in manufacturing optical reflectors of non-ferrous metals such as aluminum and copper which are easy to be machined for their proper ductility. But optical crystals being discussed here are characterized by their high brittleness which makes it difficult to obtain high quality optical surfaces on them. The purpose of cur research is to find the optimum machining conditions for ductile cutting of optical crystals and apply the SPDT technique to the manufacturing of ultra precision optical components of brittle materials. As a result, the cutting force is steady, the cutting force range is 0.05-0.08N. The surface roughness is good when spindle is above 1400rpm. and feed rate is small. The influence of depth of cut is very small.

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Structural and Optical Properties of Sol-gel Derived MgxZn1-x Thin Films

  • Kim, In-Soo;Kim, Do-Yun;Choi, Se-Young
    • Korean Journal of Materials Research
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    • v.19 no.3
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    • pp.125-131
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    • 2009
  • In this report, the structural and optical properties of sol-gel derived $Mg_xZn_{1-x}O$ thin films upon changes in the composition and annealing temperature were investigated. The $Mg^{2+}$ content and the annealing temperature were varied in the range of $0{\leq}x{\leq}0.35$ and $400^{\circ}C{\leq}T{\leq}600^{\circ}C$, respectively. The films exhibited a hexagonal wurtzite structure of a polycrystalline nature. The optical transmittance exceeded 85% and the optical band gap of the film was tuned as high as 3.84 eV at a value of x = 0.35 (annealed at $400^{\circ}C$), which was evidently the maximum $Mg^{2+}$ content for the single-phase polycrystalline $Mg_xZn_{1-x}O$ thin films prepared in this experiment. The optical band gap and photoluminescence emission were tailored to the higher energy side while maintaining crystallinity without a significant change of the lattice constant.

Effect of annealing atmosphere on the properties of chemically deposited Ag2S thin films

  • Pawar, S.M.;Shin, S.W.;Lokhande, C.D.;Kim, J.H.
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2009.05a
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    • pp.34.2-34.2
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    • 2009
  • The silver sulphide (Ag2S) thin films have been chemically deposited from an alkaline medium (pH 8 to 10) by using a silver nitrate and thiourea as a Ag and S ion precursor sources. Ethylene Damine tetraacetic acid (EDTA) was used as a complexing agent. The effect of annealing atmosphere such as Ar, N2+H2S and O2 on the structural, morphological and optical properties of Ag2S thin films has been studied. The annealed films were characterized by using X-ray diffraction (XRD), scanning electron microscopy (SEM) and optical absorption techniques for the structural, morphological, and optical properties, respectively. XRD studies reveal that the as-deposited thin films are polycrystalline with monoclinic crystal structure, is converted in to silver oxide after air annealing. The surface morphology study shows that grains are uniformly distributed over the entire surface of the substrate. Optical absorption study shows the as-deposited Ag2S thin films with band gap energy of 0.92eV and after air annealing it is found to be 2.25 eV corresponding to silver oxide thin films.

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Fabry-Perot Filter Constructed with Anisotropic Space Layer and Isotropic Mirrors

  • Qi, Hongji;Hou, Yongqiang;Yi, Kui;Shao, Jianda
    • Journal of the Optical Society of Korea
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    • v.17 no.1
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    • pp.33-37
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    • 2013
  • In this study a new design concept of the Fabry-Perot filter, constructed with an anisotropic space layer and a couple of isotropic mirrors, was proposed based on the Maxwell equations and the characteristic matrix method. The single- and double-cavity Fabry-Perot filters were designed, and their optical properties were investigated with a developed software package. In addition, the dependence of the transmittance and phase shift for two orthogonal polarization states on the column angle of the anisotropic space layer and the incidence angle were discussed. We demonstrated that the polarization state of electromagnetic waves and phase shifts can be modulated by exploiting an anisotropic space layer in a polarization F-P filter. Birefringence of the anisotropic space layer provided a sophisticated phase modulation with varied incidence angles over a broad range, resulting in a wide-angle phase shift. This new concept would be useful for designing optical components with isotropic and anisotropic materials.

The Influence of Al Underlayer on the Optical and Electrical Properties of GZO/Al Thin Films

  • Kim, Sun-Kyung;Kim, So-Young;Kim, Seung-Hong;Jeon, Jae-Hyun;Gong, Tae-Kyung;Kim, Daeil;Choi, Dong-Hyuk;Son, Dong-Il
    • Transactions on Electrical and Electronic Materials
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    • v.14 no.6
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    • pp.321-323
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    • 2013
  • 100 nm thick Ga doped ZnO (GZO) thin films were deposited with DC and RF magnetron sputtering at room temperature on glass substrate and Al coated glass substrate, respectively. and the effect of the Al underlayer on the optical and electrical properties of the GZO films was investigated. As-deposited GZO single layer films had an optical transmittance of 80% in the visible wavelength region, and sheet resistance of 1,516 ${\Omega}/{\Box}$, while the optical and electrical properties of GZO/Al bi-layered films were influenced by the thickness of the Al buffer layer. GZO films with 2 nm thick Al film show a lower sheet resistance of 990 ${\Omega}/{\Box}$, and an optical transmittance of 78%. Based on the figure of merit (FOM), it can be concluded that the thin Al buffer layer effectively increases the performance of GZO films as a transparent and conducting electrode without intentional substrate heating or a post deposition annealing process.

Fabrication and Characterization of Ru/Ni Substrates for Superconductor Applications (고온 초전도체를 위한 Ru/Ni 기판의 제조와 특성 분석)

  • Kwangsoo No;Huyong Tian;Inki Hong;Hyunsuk Hwang;Tae-Hyun Sung
    • Proceedings of the Korea Institute of Applied Superconductivity and Cryogenics Conference
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    • 2002.02a
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    • pp.13-16
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    • 2002
  • Ru thin films were deposited on bi-axially textured Ni tape using rf-magnetron sputtering for a conductive buffer layer of high Tc superconductor applications. (002) textured Ni films were fabricated as the deposition temperature was over $600^{\circ}C$. Rocking curves of the films showed similar alignment to those the Ni tapes. The resistivity of the tapes fabricated below $600^{\circ}C$ was around 20$\mu\Omega$-cm which is good for the conductive layer for tape superconductor applications.

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Electrical and Optical Properties of Zinc Oxide Thin Films Deposited Using Atomic Layer Deposition

  • Kim, Jeong-Eun;Bae, Seung-Muk;Yang, Hee-Sun;Hwang, Jin-Ha
    • Journal of the Korean Ceramic Society
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    • v.47 no.4
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    • pp.353-356
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    • 2010
  • Zinc oxide (ZnO) thin films were deposited using atomic layer deposition. The electrical and optical properties were characterized using Hall measurements, spectroscopic ellipsometry and UV-visible spectrophotometry. The electronic concentration and the mobility were found to be critically dependent on the deposition temperature, exhibiting increased resistivity and reduced electronic mobility at low temperature. The corresponding optical properties were measured as a function of photon energy ranging from 1.5 to 5.0 eV. The simulated extinction coefficients allowed the determination of optical band gaps, i.e., ranging from 3.36 to 3.41 eV. The electronic carrier concentration appears to be related to the reduction in the corresponding band gap in ZnO thin films.

Optical Simulation of Transparent Electrode for Application to Organic Photovoltaic Cells

  • Jo, Se-Hui;Yang, Jeong-Do;Park, Dong-Hui;Wi, Chang-Hwan;Choe, Won-Guk
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.440-440
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    • 2012
  • The optical characteristics of transparent electrode with various kind of materials and thickness to be used for organic photovoltaic cells were studied by simulation methodology. It demonstrated that the transmittance varies with the kinds of materials, the number of layers and change in the thickness of each layer. In the case of the structure composed of dielectric/Ag/dielectric, optimized transmittance was higher than 90% at 550 nm and the thickness of the Ag layer was ~10nm. Top and bottom dielectric materials can be changed with different refractive index and extinction coefficient. The relation between the optical transmittance of device and transparent electrode with different refractive indices was discussed as well. By processing numerical simulations, an optimized optical transmittance can be obtained by tunning the thickness and materials of transparent electrode.

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Double Hole Transport Layers Deposited by Spin-coating and Thermal-evaporating for Flexible Organic Light Emitting Diodes

  • Chen, Shin Liang;Wang, Shun Hsi;Juang, Fuh Shyang;Tsai, Yu Sheng
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08a
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    • pp.741-744
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    • 2007
  • The research applied the processes of spin-coating and thermal-evaporating in proper order to deposit the hole transport material N,N'-Bis(naphthalen-1-yl)- N,N'-bis(phenyl)-benzidine (NPB) on the ITO substrate to make flexible organic light emitting diodes (FOLED) with double hole transport layer.

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