• 제목/요약/키워드: Optical materials

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광 반송파가 억압된 양측 대역 방식의 광 혼합을 통하여 발생된 밀리미터파 대역 연속파에서 광 반송파 억압 레벨에 따른 위상 잡음 특성 분석 (Phase Noise Characterization with Optical Carrier Suppression Level on Continuous Wave in the Ranges of Millimeter Waves Generated by Photomixing of Optical Double Sideband-Suppressed Carrier(DSB-SC))

  • 김성일;강광용
    • 한국전자파학회논문지
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    • 제20권9호
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    • pp.974-982
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    • 2009
  • 주파수 안정성 이 우수한 밀리미터파 및 테라헤르츠파 대역 연속파(Continuous Wave: CW) 신호를 발생시키기 위하여 상관관계가 큰 서로 다른 두 파장의 광 신호를 비팅(beating) 시켜 광 혼합(photomixing) 방법에 관한 많은 연구가 진행되고 있다. 광 반송파가 억압된 양측 대역(Double Sideband-Suppressed Carrier: DSB-SC) 방식은 단일 파장 광 신호를 국부 발진기와 광 변조기를 이용하여 CW 변조함으로써 상관관계가 큰 서로 다른 두 파장의 광 신호를 생성하는 방법이다. 본 논문에서는 DSB-SC를 이용한 광 혼합 밀리미터파 및 테라헤르츠파 대역 CW신호 발생 방법에서 광 반송파 억압 레벨에 따른 밀리미터파 및 테라헤르츠파 대역 CW 신호의 파워 및 위상 잡음 특성을 수치적으로 분석하고 실험적으로 증명하였다. 측정 결과, 광 반송파의 억압 레벨에 따라서 밀리미터파 및 테라헤르츠파 대역 CW 신호의 파워와 위상 잡음이 각각 23.9 dB와 21 dBc/Hz(@ 1 MHz offset frequency) 개선됨을 확인하였다. DSB-SC 방법을 다룬 기존 문헌에서는 직관적으로 광 반송파 억제 레벨을 중요성을 언급하였으나, 본 논문에서는 수식 및 측정 데이터에 기반한 밀리미터파 및 테라헤르츠파 대역 CW신호의 특성 향상을 위한 광 반송파 억제 레벨의 중요성을 확인하였다. 따라서 본 논문의 결과는 광 혼합 방법을 이용한 밀리미터파 및 테라헤르츠파 대역 CW 신호 발생 연구를 위한 기본적인 데이터로서 활용 가치가 높다.

A Vapor Sensor Based on a Porous Silicon Microcavity for the Determination of Solvent Solutions

  • Bui, Huy;Nguyen, Thuy Van;Nguyen, The Anh;Pham, Thanh Binh;Dang, Quoc Trung;Do, Thuy Chi;Ngo, Quang Minh;Coisson, Roberto;Pham, Van Hoi
    • Journal of the Optical Society of Korea
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    • 제18권4호
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    • pp.301-306
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    • 2014
  • A porous silicon microcavity (PSMC) sensor has been made for vapors of solvent solutions, and a method has been developed in order to obtain simultaneous determination of two volatile substances with different concentrations. In our work, the temperature of the solution and the velocity of the air stream flowing through the solution have been used to control the response of the sensor for ethanol and acetone solutions. We study the dependence of the cavity-resonant wavelength shift on solvent concentration, velocity of the airflow and solution temperature. The wavelength shift depends linearly on concentration and increases with solution temperature and velocity of the airflow. The dependence of the wavelength shift on the solution temperature in the measurement contains properties of the temperature dependence of the solvent vapor pressure, which characterizes each solvent. As a result, the dependence of the wavelength shift on the solution temperature discriminates between solutions of ethanol and acetone with different concentrations. This suggests a possibility for the simultaneous determination of the volatile substances and their concentrations.

Structural, Optical, and Chemical Properties of Cadmium Phosphate Glasses

  • Chung, Jae-Yeop;Kim, Jong-Hwan;Choi, Su-Yeon;Park, Hyun-Joon;Hwang, Moon-Kyung;Jeong, Yoon-Ki;Ryu, Bong-Ki
    • 한국세라믹학회지
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    • 제52권2호
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    • pp.128-132
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    • 2015
  • In this study, we prepared cadmium phosphate glasses with various compositions, given by $xCdO-(100-x)P_2O_5$ (x = 10-55 mol%), and analyzed their Fourier transform infrared spectra, dissolution rate, thermal expansion coefficient, glass transition temperature, glass softening temperature, and optical band gap. We found that the thermal expansion coefficient and dissolution rate increased while the glass transition temperature and glass softening temperature decreased with increasing CdO content. These results suggest that CdO acts as a network modifier in binary phosphate glass and weakens its structure.

Phase Transition Characteristics in $Ge_xSb_{100-x}$ Film for Optical Storage Media

  • Park Tae-jin;Kang Myung-jin;Choi Se-young
    • 정보저장시스템학회:학술대회논문집
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    • 정보저장시스템학회 2005년도 추계학술대회 논문집
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    • pp.124-127
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    • 2005
  • Rewritable optical memory devices such as an CD-RW and DVD+RW are data storage media, which take advantage of the different optical properties in the amorphous and crystalline states of phase change materials. The switching property, structural transformation, transformation kinetics and chemical bindings of $Ge_xSb_{100-x}$($6{\le}x{\le}$34) were studied to investigate the feasibility of applying $Ge_xSb_{100-x}$ alloys in optical memory. The $Ge_xSb_{100-x}$ thin film was deposited by RF magnetron co-sputtering system and phase change characteristics were investigated by X-ray diffraction (XRD), static tester, inductively coupled plasma atomic emission spectrometer (ICP-AES) and atomic force microscopy (AEM). Optimum fiim composition of $Ge_xSb_{100-x}$ was studied and its minimum time fur laser induced crystallization and optical contrast fur phase transition was performed. These results might be correlated with the binding energies between Ge and Sb, and indicate that $Ge_xSb_{100-x}$ have an potential far optical memory applications.

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Structural Modification of Alkali Tellurite Binary Glass System and Its Characterization

  • Lee, Kyu-Ho;Kim, Tae-Ho;Kim, Young-Seok;Jung, Young-Joon;Na, Young-Hoon;Ryu, Bong-Ki
    • 한국재료학회지
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    • 제18권5호
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    • pp.235-240
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    • 2008
  • This paper presents results and observations obtained from a study of the optical and thermal properties of alkali tellurite depending on the composition. Fourier transform infrared (FT-IR) spectra showed evidence of chemical modification from $TeO_4$ trigonal bipyramids (tbp) to $TeO_3$ trigonal pyramids (tp) in tellurite glasses. The optical band gaps of the different glass samples calculated using Tauc's method were found to range from 3.5-3.8 eV. The glass transition temperature (Tg) and glass stability (${\Delta}T$) of alkali tellurite glasses were investigated, as $M_2O$ [M: Li, Na, K] amounted to 25 mol%, through the use of differential thermal analysis (DTA). The coefficient of thermal expansion (CTE) was measured in a thermo mechanical analysis (TMA) with a slow heating rate after the glass samples were annealed. The results confirm that the optical band gap of alkali tellurite glasses depends on the Te-O-Te structural relaxation related to the ratio of bridging/non bridging oxygen (BO/NBO). In contrast, the thermal properties are related to the ionic field strength of the Te-O-M and M-O-M bonds, and the Te-O-Te breakage depends on the ratio of BO/NBO.

광학 현미경을 이용한 산화 그래핀 이미지 분석 조건에 관한 연구 (A Study on Image Analysis of Graphene Oxide Using Optical Microscopy)

  • 이유진;김나리;윤상수;오영석;이제욱;이원오
    • Composites Research
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    • 제27권5호
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    • pp.183-189
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    • 2014
  • 광학 현미경 관찰을 통해 산화 그래핀의 형상, 크기 및 두께를 쉽게 파악할 수 있는 광학 관찰을 위한 최적 조건을 확보하고자 하였다. 본 연구에서는 $SiO_2$ 절연막이 300 nm 두께로 도포된 실리콘 기판 위의 산화 그래핀을 하이드라진 증기 환원을 통하여 본래의 모폴로지를 유지한 채 환원된 산화 그래핀의 이미지의 선명도를 증가시켰고, 녹색 필터를 사용한 관찰을 통해 이미지의 대비값을 보다 증대시켰다. 추가적으로 얻어진 광학 이미지를 RGB 채널별로 분리하는 방법을 제안하고 이를 통해 이미지를 분석하였다. 그 결과 하이드라진 증기 환원 처리 및 녹색 파장에서의 광원 하에서 고대비의 이미지 확보가 가능하였으며, 더불어 광학 이미지의 RGB 채널 분리만으로도 선명한 그래핀 이미지를 얻을 수 있음을 알아내었다.

Effect of ZnO Buffer Layers on the Crystallization of ITO Thin Film at Low Temperature

  • Seong, Chung-Heon;Shin, Yong-Jun;Jang, Gun-Eik
    • Transactions on Electrical and Electronic Materials
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    • 제13권4호
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    • pp.208-211
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    • 2012
  • In the present study, a ZnO thin film, as a buffer layer of ITO (indium tin oxide) film was deposited on glass substrates by RF magnetron sputtering at low temperature of $150^{\circ}C$. In order to estimate the optical characteristics and compare with the experimental results in Glass/ZnO(100 nm)/ITO(35 nm) multilayered film, the simulation program, EMP (Essential Macleod Program) was adopted. The sheet resistance and optical transmittance of the films were measured using the four-point probe method and spectrophotometer, respectively. From X-ray diffraction patterns, all the films deposited at $150^{\circ}C$ demonstrated only the amorphous phase. Optical transmittance was the highest at a ZnO thickness of 100 nm. The ITO(35 nm)/ZnO(100 nm) film exhibits an optical transmittance of >92% at 550 nm. The multilayered film showed an electrical sheet resistance of 407 ${\Omega}/sq.$, which is significantly better than that of a single-layer ITO film without a ZnO buffer layer (815 ${\Omega}/sq.$).

Influence of the Ag interlayer on the structural, optical, and electrical properties of ZTO/Ag/ ZTO films

  • Gong, Tae-Kyung;Moon, Hyun-Joo;Kim, Daeil
    • Transactions on Electrical and Electronic Materials
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    • 제17권2호
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    • pp.121-124
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    • 2016
  • ZnSnO3 (ZTO)/Ag/ ZnSnO3 (ZTO) trilayer films were prepared on glass substrates by radio frequency (RF) and direct current (DC) magnetron sputtering. The electrical resistivity and optical transmittance of the films were investigated as a function of the Ag interlayer thickness. ZTO films with a 15 nm thick Ag interlayer show the highest average visible transmittance (83.2%) in the visible range. In this study, the highest figure of merit (2.1×10−2 Ω cm) is obtained with the ZTO 50 nm/Ag 15 nm/ZTO 50 nm films. The enhanced optical and electrical properties of ZTO films with a 15 nm thick Ag interlayer are attributed to the crystallization of the Ag interlayer, as supported by the distinct XRD pattern of the Ag (111) peaks. From the observed results, higher optical and electrical performance of the ZTO film with a 15 nm thick Ag interlayer seems to make a promising alternative to conventional transparent conductive ITO films.

RF 마그네트론 스퍼터링에 의해 증착된 ITO/TiO2 적층 박막의 어닐링 효과 (Effect of Annealing Temperature on the Properties of ITO/TiO2 Films Deposited with RF Magnetron Sputtering)

  • 이영진;허성보;이학민;김유성;김대일
    • 열처리공학회지
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    • 제25권5호
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    • pp.244-248
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    • 2012
  • ITO/$TiO_2$ films were deposited by RF magnetron sputtering on glass substrates and then the effect of vacuum annealing on the structural, optical and electrical properties of the films was investigated. The structural, optical and electrical properties are strongly related to annealing temperature. The films annealed at $300^{\circ}C$ showed a grain size of 40.9 nm, which was larger than as-deposited amorphous films. The optical transmittance in the visible wavelength region also increased, while the electrical resistivity decreased. The ITO/$TiO_2$ films annealed at $300^{\circ}C$ showed the highest optical transmittance of 81% and also showed the lowest electrical resistivity of $3.05{\times}10^{-4}{\Omega}cm$, in this study.

초전도 선재의 중간 반응 방지막으로써 Ni 기판위에 제조된 NiO 막의 특성 분석 (Fabrication and characterization of nickel oxide films on textured nickel substrate for a superconductor buffer layer)

  • Park, Eunchul;Inki Hong;Hyunsuk Hwang;Taehyun Sung;Kwangsoo No
    • Progress in Superconductivity
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    • 제3권1호
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    • pp.95-98
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    • 2001
  • Recently, NiO films have been studied as a buffer layer to fabricate the superconductor with preferred orientation and as a diffusion barrier to prevent the reaction between superconductor and textured nickel substrate . We fabricated NiO films on textured Ni substrate by thermal oxidation with various variables of temperature, oxidation time, atmosphere, and cooling rate. We investigated the alignment of NiO films by XRD and pole figure and the microstructures by SEM. (200) <001> alignment of NiO film was observed at the oxidation condition of $1200^{\circ}C$ far 10min and slow cooling in O2 atmosphere. During the process in Ar atmosphere, we could also observe the thermal faceting which affects the alignment of NiO alms on Ni substrate.

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