Browse > Article
http://dx.doi.org/10.12656/jksht.2012.25.5.244

Effect of Annealing Temperature on the Properties of ITO/TiO2 Films Deposited with RF Magnetron Sputtering  

Lee, Young-Jin (School of Materials Science and Engineering, University of Ulsan)
Heo, Sung-Bo (School of Materials Science and Engineering, University of Ulsan)
Lee, Hak-Min (School of Materials Science and Engineering, University of Ulsan)
Kim, Yu-Sung (R&D Division, New optics LTD.)
Kim, Daeil (School of Materials Science and Engineering, University of Ulsan)
Publication Information
Journal of the Korean Society for Heat Treatment / v.25, no.5, 2012 , pp. 244-248 More about this Journal
Abstract
ITO/$TiO_2$ films were deposited by RF magnetron sputtering on glass substrates and then the effect of vacuum annealing on the structural, optical and electrical properties of the films was investigated. The structural, optical and electrical properties are strongly related to annealing temperature. The films annealed at $300^{\circ}C$ showed a grain size of 40.9 nm, which was larger than as-deposited amorphous films. The optical transmittance in the visible wavelength region also increased, while the electrical resistivity decreased. The ITO/$TiO_2$ films annealed at $300^{\circ}C$ showed the highest optical transmittance of 81% and also showed the lowest electrical resistivity of $3.05{\times}10^{-4}{\Omega}cm$, in this study.
Keywords
ITO/$TiO_2$; Magnetron sputtering; Buffer layer; Annealing temperature;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
연도 인용수 순위
1 U. Bets, M. kharrazi, J. Marthy, M. Escola and F. Atarmny : Surf. Coat. Technol. 200 (2006) 5751.   DOI
2 H. Kim, J. S. Horwitz, S. B. Qadri, and D. B. Chrisey : Thin Solid Films 420 (2002) 107.   DOI
3 Y. Shigesato, S. Takaki, and T. Haranou : Appl. Surf. Sci. 48/49 (1991) 269.   DOI
4 R. Oesterlein and H. J. Krokoszinski : Thin Solid Films 175 (1989) 241.   DOI
5 S. Takaki, K. Matsumoto, and K. Suzuki : Appl. Surf. Sci. 33/34 (1988) 919.   DOI
6 T. Maruyama and K. Fukui : J. Appl. Phys. 70 (1991) 3848   DOI
7 J. Fahlteich, M. Fahland, W. Schonberger and N. Schiller : Thin Solid Films 517 (2009) 3075.   DOI
8 Z. Yu, Y. Li, F. Xia and W. Xue : Surf. Coat. Technol. 200 (2006) 5751.   DOI
9 L. Miao, Appl. Surf. Sci. 212 (2003) 255.   DOI
10 F. M. Amanullah, K. J. Pratap, and V. H. Babu : Thin solid films 254 (1995) 28.   DOI
11 J. H. Shin, S. H. Shin and J. I. Park : J. Kor. Inst. Electric. Electron. Mater. Eng 12 (1999) 43
12 B. D. Cullity : Elements of X-ray diffractions, Addition-Wesley, Reading, MA (1978) 102-212.
13 Y. J. Jo, J. K. Kim, S. C. Han, J. S. Kwak and J. M. Lee : J. Kor. Inst. Met. & Mater 47 (2009) 44.
14 C. G. Choi, K. No, W. J. Lee, H. G. Kim, S. O. Jung, W. J. Lee, W. S. Kim, S. J. Kim and C. Yoon : Thin Solid Films 274 (2000) 258.
15 H. J. Choi, H. J. Jung, S. G. Hur and S. G. Yoon : J. KIEEME, 24 (2011) 126-130
16 D. Kim, Y. Han, J. S. Cho, and S. K. Ko : Thin Solid Films, 81 (2006) 377-378.
17 J. H. Park, S. J. Kang, S. I. Na, H. H. Lee, S. W. Kim, H. Hosono and H. K. Kim : Sol. Energ. Mater. Sol. Cell, 95 (2011) 2178.   DOI   ScienceOn
18 S. Song, T. Yang, Y. Li, Z. Pang, L. Lin, M. Lv and S. Han : Vacuum 83 (2009) 1091.   DOI
19 G. haacke : J. Appl, Surf. Sci., 47 (1976) 4086
20 Y. M. Kong, Y. J. Lee, S. B. Heo, H. M. Lee, M. S. Seo, Y. S. Kim and D. Kim : Kor. J. Mater. Res 22 (2012) 24.   DOI