• Journal of the Optical Society of Korea
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• v.13 no.3
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• pp.330-334
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• 2009

A simple and compact frequency swept laser is demonstrated at $1.3{\mu}m$ using a wavelength scanning filter based on a rotating slit disk. The laser is comprised of a pigtailed semiconductor optical amplifier, a circulator, and a wavelength scanning filter in an extended cavity configuration. The wavelength scanning filter is composed of a collimator, a diffraction grating, a rotating slit disk, and a mirror. The instantaneous laser output power is more than 5 mW. The scanning range of the laser is extended to 80 nm at the maximum level, and 55 nm in the full width at half maximum at a scanning rate of 2 kHz.

• Current Optics and Photonics
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• v.5 no.1
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• pp.52-58
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• 2021

We show that a simple double-slit experimental setup can be used to measure the thickness of a transparent thin film. The phase difference between the light passing through one slit covered with photoresist film and that passing through the other slit without film was estimated using the simple Fraunhofer diffraction formula for a double slit. Our method gave error of a few percent or less for film thicknesses ranging from 0.7 to 1.7 ㎛, demonstrating that a laboratory double-slit experimental setup can be utilized in practical film-thickness measurements.

• Journal of the Korean Society for Precision Engineering
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• v.17 no.1
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• pp.129-137
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• 2000

In this paper, a new method of noncontact measurement has been developed for a 3 dimensional topography in semiconductor wafer, implementing a new optical probe based on the precision defocus measurement. The developed technique consists of the new optical probe, precision stages, and the measurement/control system. The basic principle of the technique is to use the reflected slit beam from the specimen surface, and to measure the deviation of the specimen surface. The defocusing distance can be measured by the reflected slit beam, where the defocused image is measured by the proposed optical probe, giving very high resolution. The distance measuring formula has been proposed for the developed probe, using the laws of geometric optics. The precision calibration technique has been applied, giving about 10 nanometer resolution and 72 nanometer of four sigma uncertainty. In order to quantitize the micro pattern in the specimen surface, some efficient analysis algorithms have been developed to analyse the 3D topography pattern and some parameters of the surface. The developed system has been successfully applied to measure the wafer surface, demonstrating the line scanning feature and excellent 3 dimensional measurement capability.

• Proceedings of the Optical Society of Korea Conference
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• 1996.09a
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• pp.39-39
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• 1996

• Textile Coloration and Finishing
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• v.29 no.3
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• pp.139-147
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• 2017

In this study, interesting area of development is retro-reflective thin film and then slitting to form retro-reflective material to be conbined with other fibers to form having retro-reflective characteristics, which slitting yarn can then be to provide fabrics. Glass beads are microscopic spherical size with diameters ranging from several microns to several millimeters. Applying the effects of optical property, glass beads are consumed for road safety used to make traffic signs, safety clothing and others. Glass beads retro-reflective films can be turned into slit yarns through slitting yarn process. The slit yarns can be combined into textiles using diverse methods such as weaving to provide a fabric having retro-reflective characteristics. Lightness and Luminance was increased with decreasing of interval of slit yarn in the fabric. Also, the hue is shifted greenish and bluish with interval of slit yarn.

• Transactions of the Korean Society of Mechanical Engineers
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• v.18 no.5
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• pp.1182-1191
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• 1994

This paper presents an enhanced method of slit beam projection intended for the rapid measurement of 3-dimensional surface profiles of dies and molds. Special emphasis is given to optimizing the design of optical system so that the measuring accuracy can be maximized by adopting two-plane camera calibration together with sub-pixel image processing techniques. Finally, several measurement examples are discussed to demonstrate that an actual measuring accuracy of $\pm$ 0.2 mm can be achieved over the measuring range of 500 mm{\times}300mm{\times}200mm$.

• Journal of the Korean Society for Precision Engineering
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• v.12 no.1
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• pp.5-14
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• 1995

An optical measurement method of three dimensional surface profiles which is named the slit beam projection is suggested and practically implemented. This method is intended especially for noncontact and fast digitization of sculptured surfaces for CAD modeling and die manufacturing. Its basic principles are based on geometric optics. Deatiled optical principles and an sub-pixel image processing technique to enhance the measuring resolutions are described in this study. The measuring performances of the slit beam projection are presented and discussed to demonstrate that an actual measuring accuracy of below .+-. 0.2mm can be achived over the whole measuring range(500mm*300mm*200mm)

• Journal of the Optical Society of Korea
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• v.14 no.4
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• pp.333-336
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• 2010

The generation of coherent x-ray beams by using a multi-slit diffraction phenomenon is presented. The mode-confinement conditions in the x-ray waveguide (XWG) needed to obtain single-mode beams are determined. The XWGs are stacked to form an XWG array. The core of the XWG array is used as a slit in an opaque screen, similar to those used for visible light. Diffraction patterns that interfered constructively in the XWG array are investigated based on multi-slit diffraction theory. The irradiance distributions are studied at on observation screen. The FWHM of diffracted x-ray spectra were between $1.67{\times}10^{-4}$ to $3.30{\times}10^{-5}$ radians which lead to a spot-size of a few tens of micrometers on the screen at distance of 1 m. The intensities decrease with increase in the period of the XWG array, i.e. a thicker cladding, due to growth of the higher-order diffraction peaks.

• Journal of The Korean Astronomical Society
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• v.39 no.4
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• pp.151-155
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• 2006

Long slit spectrometers are widely used in optical and infrared bands in astronomy. Absolute flux calibration for extended sources, however, is not straightforward, because a portion of the radiation energy from a flux calibration star is blocked by the narrow slit width. Assuming that the point spread function(PSF) of the star is circularly symmetric, we develop a robust method to extrapolate the detected stellar flux to the unobscured flux using the measured PSF along the slit-length direction. We apply this method to our long slit data and prove that the uncertainty of the absolute flux calibration is less than a few percents.

• Korean Journal of Optics and Photonics
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• v.12 no.4
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• pp.276-280
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• 2001

The quality of images displayed by using an LC projector is strongly influenced by the cell-gap variations over LC panels, the essential components of the projector. We show that such influence can be relieved by introducing slit patterns in the pixel electrodes in the LC panels. The improvement comes from the compensation of the influence of cell-gap variations by optical anisotropy variations arising from the lateral components of the electric field generated by the slit patterned electrodes. Simulations show that cell-gap tolerance can be increased by more than 50% by introducing the slit patterns. This method can be used in TN mode LC panels, which use LC's with positive dielectric anisotropy. tropy.