• Title/Summary/Keyword: Optical Probe

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A Study on the Interface and Luminescent Properties of OLED using $Al_2Nq_4$ as an Emitting Layer ($Al_2Nq_4$를 발광층으로 이용한 OLED의 계면 및 발광 특성에 관한 연구)

  • Yang, Ki-Sung;Lee, Ho-Sik;Shin, Hoon-Kyu;Kim, Doo-Seok;Kim, Chung-Kyun;Kwon, Young-Soo
    • Proceedings of the KIEE Conference
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    • 2004.11a
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    • pp.215-219
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    • 2004
  • Metal-chelate derivatives have been investigated intensively as an emitting layer and recognize to have excellent electroluminescence(EL) properties. We synthesized new luminescent material, 1,4-dihydoxy-5,8-naphtaquinone $Aiq_3$ complex($Al_2Nq_4$) and investigated the electrical optical properties. OLED has potential candidates for information display with merits of thickness, low power and high efficiency. Although the OLED show a lot of advantages for information display, it has the limit of inorganic(metal)/ organic interface. In this study, the two methods are used to study the interface of metal/organic in OLED. First, we treated $O_2$ plasma on an ITO thin film by using RIE system, and analyzed the ingredient of ITO thin film according to change of the processing conditions. We used the RDS and the XPS for the ingredient analysis of the surface and bulk. We measured electrical resistivity using Four-Point-Probe and calculated sheet resistance, and ITO surface roughness was measured by using AFM. We fabricated OLED using substrate that was treated optimum ITO surface. Second, we used the buffer layer of CuPc to improve the characteristics of the interface and the hole injection in OLED. The result of the study for electrical and optical properties by using I V L T System(Flat Panel Display Analysis System), we confirmed that the electrical properties and the luminance properties were improved.

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Study on Electron Temperature Diagnostic and the ITO Thin Film Characteristics of the Plasma Emission Intensity by the Oxygen Gas Flow (산소 유량별 플라즈마 방출광원 세기에 따른 전자온도 진단과 산화주석박막 특성연구)

  • Park, Hye Jin;Choi, Jin-Woo;Jo, Tae Hoon;Yun, Myoung Soo;Kwon, Gi-Chung
    • Journal of the Korean institute of surface engineering
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    • v.49 no.1
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    • pp.92-97
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    • 2016
  • The plasma has been used in various industrial fields of semiconductors, displays, transparent electrode and so on. Plasma diagnostics is critical to the uniform process and the product. We use the electron temperature of the various plasma parameters for the diagnosis of plasma. Generally, the range of the electron temperature which is used in a semiconductor process used the range of 1 eV to 10 eV. The difference of electron temperature of 0.5 eV has a influence in plasma process. The electron temperature can be measured by the electrical method and the optical method. Measurement of electron temperature for various gas flow rates was performed in DC-magnetron sputter and Inductively Coupled Plasma. The physical properties of the thin film were also determined by changing electron temperatures. The transmittance was measured using the integrating sphere, and wavelength range was measured at 300 ~ 1100 nm. We obtain the thin film of the mobility, resistivity and carrier concentration using the hall measurement system. As to the electron temperature increase, optical and electrical properties decrease. We determine it was influenced by the oxygen flow ratio and plasma.

Characteristic Analysis and Preparation of Multi-layer TiNOx Thin Films for Solar-thermal Absorber (태양열 흡수판용 복층 TiNOx 박막의 제조와 특성 분석)

  • Oh, Dong-Hyun;Han, Sang-Uk;Kim, Hyun-Hoo;Jang, Gun-Eik;Lee, Yong-Jun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.27 no.12
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    • pp.820-824
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    • 2014
  • TiNOx multi-layer thin films on aluminum substrates were prepared by DC reactive magnetron sputtering method. 4 multi-layers of $TiO_2$/TiNOx(LMVF)/TiNOx(HMVF)/Ti/substrate have been prepared with ratio of Ar and ($N_2+O_2$) gas mixture. $TiO_2$ of top layer is anti-reflection layer on double TiNOx(LMVF)/TiNOx(HMVF) layers and Ti metal of infrared reflection layer. In this study, the crystallinity and surface properties of TiNOx thin films were estimated by X-ray diffraction(XRD) and field emission scanning electron microscopy(FE-SEM), respectively. The grain size of TiNOx thin films shows to increase with increasing sputtering power. The composition of thin films has been investigated using electron probe microanalysis(EPMA). The optical properties with wavelength spectrum were recorded by UV-Vis-NIR spectrophotometry at a range of 200~1,500 nm. The TiNOx multi-layer films show the excellent optical performance beyond 9% of reflectance in those ranges wavelength.

Growth and characterization of molecular beam epitaxy grown GaN thin films using single source precursor with ammonia

  • Chandrasekar, P.V.;Lim, Hyun-Chul;Chang, Dong-Mi;Ahn, Se-Yong;Kim, Chang-Gyoun;Kim, Do-Jin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.174-174
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    • 2010
  • Gallium Nitride(GaN) attracts great attention due to their wide band gap energy (3.4eV), high thermal stability to the solid state lighting devices like LED, Laser diode, UV photo detector, spintronic devices, solar cells, sensors etc. Recently, researchers are interested in synthesis of polycrystalline and amorphous GaN which has also attracted towards optoelectronic device applications significantly. One of the alternatives to deposit GaN at low temperature is to use Single Source Molecular Percursor (SSP) which provides preformed Ga-N bonding. Moreover, our group succeeds in hybridization of SSP synthesized GaN with Single wall carbon nanotube which could be applicable in field emitting devices, hybrid LEDs and sensors. In this work, the GaN thin films were deposited on c-axis oriented sapphire substrate by MBE (Molecular Beam Epitaxy) using novel single source precursor of dimethyl gallium azido-tert-butylamine($Me_2Ga(N_3)NH_2C(CH_3)_3$) with additional source of ammonia. The surface morphology, structural and optical properties of GaN thin films were analyzed for the deposition in the temperature range of $600^{\circ}C$ to $750^{\circ}C$. Electrical properties of deposited thin films were carried out by four point probe technique and home made Hall effect measurement. The effect of ammonia on the crystallinity, microstructure and optical properties of as-deposited thin films are discussed briefly. The crystalline quality of GaN thin film was improved with substrate temperature as indicated by XRD rocking curve measurement. Photoluminescence measurement shows broad emission around 350nm-650nm which could be related to impurities or defects.

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Depositon of Transparent Conductive Films by a DC arc Plasmatron

  • Penkov, O.V.;Plaksin, V. Yu.;Joa, S.B.;Kim, J.H.;LEE, H.J.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.480-480
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    • 2010
  • In the present work, we studied effect of the deposition parameters on the structure and properties of ZnO films deposited by DC arc plasmatron. The varied parameters were gas flow rates, precursor composition, substrate temperature and post-deposition annealing temperature. Vapor of Zinc acetylacetone was used as source materials, oxygen was used as working gas and argon was used as the cathode protective gas and a transport gas for the vapor. The plasmatron power was varied in the range of 700-1,500 watts. Flow rate of the gases and substrate temperature rate were varied in the wide range to optimize the properties of the deposited coatings. After deposition films were annealed in the hydrogen atmosphere in the wide range of temperatures. Structure of coatings was investigated using XRD and SEM. Chemical composition was analyzed using x-ray photo-electron spectroscopy. Sheet conductivity was measured by 4-point probe method. Optical properties of the transparent ZnO-based coatings were studied by the spectroscopy. It was shown that deposition by a DC Arc plasmatron can be used for low-cost production of zinc oxide films with good optical and electrical properties. Sheet resistance of 4 Ohms cm was achieved after the deposition and 30 min annealing in the hydrogen at $350^{\circ}C$. Elevation of the substrate temperature during the deposition process up to $350^{\circ}C$ leads to decreasing of the film's resistance due to rearrangement of the crystalline structure.

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Targeting Orthotopic Glioma in Mice with Genetically Engineered Salmonella typhimurium

  • Wen, Min;Jung, Shin;Moon, Kyung-Sub;Jiang, Shen Nan;Li, Song-Yuan;Min, Jung-Joon
    • Journal of Korean Neurosurgical Society
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    • v.55 no.3
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    • pp.131-135
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    • 2014
  • Objective : With the growing interests of bacteria as a targeting vector for cancer treatment, diverse genetically engineered Salmonella has been reported to be capable of targeting primary or metastatic tumor regions after intravenous injection into mouse tumor models. The purpose of this study was to investigate the capability of the genetically engineered Salmonella typhimurium (S. typhimurium) to access the glioma xenograft, which was monitored in mouse brain tumor models using optical bioluminescence imaging technique. Methods : U87 malignant glioma cells (U87-MG) stably transfected with firefly luciferase (Fluc) were implanted into BALB/cAnN nude mice by stereotactic injection into the striatum. After tumor formation, attenuated S. typhimurium expressing bacterial luciferase (Lux) was injected into the tail vein. Bioluminescence signals from transfected cells or bacteria were monitored using a cooled charge-coupled device camera to identify the tumor location or to trace the bacterial migration. Immunofluorescence staining was also performed in frozen sections of mouse glioma xenograft. Results : The injected S. typhimurium exclusively localized in the glioma xenograft region of U87-MG-bearing mouse. Immunofluorescence staining also demonstrated the accumulation of S. typhimurium in the brain tumors. Conclusion : The present study demonstrated that S. typhimurium can target glioma xenograft, and may provide a potentially therapeutic probe for glioma.

Characteristics of Cu-Doped Ge8Sb2Te11 Thin Films for PRAM (PRAM용 Cu-도핑된 Ge8Sb2Te11 박막의 특성)

  • Kim, Yeong-Mi;Kong, Heon;Kim, Byung-Cheul;Lee, Hyun-Yong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.32 no.5
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    • pp.376-381
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    • 2019
  • In this work, we evaluated the structural, electrical and optical properties of $Ge_8Sb_2Te_{11}$ and Cu-doped $Ge_8Sb_2Te_{11}$ thin films prepared by rf-magnetron reactive sputtering. The 200-nm-thick deposited films were annealed in a range of $100{\sim}400^{\circ}C$ using a furnace in an $N_2$ atmosphere. The amorphous-to-crystalline phase changes of the thin films were investigated by X-ray diffraction (XRD), UV-Vis-IR spectrophotometry, a 4-point probe, and a source meter. A one-step phase transformation from amorphous to face-centered-cubic (fcc) and an increase of the crystallization temperature ($T_c$) was observed in the Cu-doped film, which indicates an enhanced thermal stability in the amorphous state. The difference in the optical energy band gap ($E_{op}$) between the amorphous and crystalline phases was relatively large, approximately 0.38~0.41 eV, which is beneficial for reducing the noise in the memory devices. The sheet resistance($R_s$) of the amorphous phase in the Cu-doped film was about 1.5 orders larger than that in undoped film. A large $R_s$ in the amorphous phase will reduce the programming current in the memory device. An increase of threshold voltage ($V_{th}$) was seen in the Cu-doped film, which implied a high thermal efficiency. This suggests that the Cu-doped $Ge_8Sb_2Te_{11}$ thin film is a good candidate for PRAM.

Preparation and Characterization of transparent electrode based on polymer/metal oxide composite via electrospinning (전기 방사를 이용한 고분자/금속산화물 복합소재 기반의 투명전극 제조 및 특성 분석)

  • Kang, Hye Ju;Jeong, Hyeon Taek
    • Journal of the Korean Applied Science and Technology
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    • v.38 no.6
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    • pp.1553-1560
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    • 2021
  • We have confirmed that optimized transmittance and surface resistance by electrospinning time, also the fabricated transparent electrode composed of silver nanofiber with excellent electrical, optical and mechanical performances is showed applicability to next generation flexible displays such as solar cells, displays, and touch screens. → We have confirmed the optimized transmittance and surface resistance by electrospinning time Also the fabricated transparent electrode composed of silver nanofiber with excellent electrical, optical and mechanical performances showed applicability to next generation flexible displays such as solar cells, displays, and touch screens.

Endoscopic Bio-Imaging Using Optical Coherence Tomography (마이크로 내시경 및 첨단 광 단층촬영기법을 이용한 생체 이미징)

  • Ahn, Yeh-Chan;Brenner, Matthew;Chen, Zhongping
    • Journal of the Korean Society for Nondestructive Testing
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    • v.31 no.5
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    • pp.466-471
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    • 2011
  • Optical coherence tomography(OCT) is an emerging medical diagnostic tool that draws great attention in medical and biological fields. It has a 10-100 times higher spatial resolution than that of the clinical ultrasound but lower imaging depth such as 1-2 mm. In order to image internal organs, OCT needs an endoscopic probe. In this paper, the principle of Fourier-domain optical coherence tomography with high-speed imaging capability was introduced. An OCT endoscope based on MEMS technology was developed. It was attached to the Fourier-domain OCT system to acquire three-dimensional tomographic images of gastrointestinal tract of New Zealand white rabbit. The endoscope had a two-axis scanning mirror that was driven by electrostatic force. The mirror stirred an incident light to sweep two-dimensional plane by scanning. The outer diameter of the endoscope was 6 mm and the mirror diameter was 1.2 mm. A three-dimensional image rendered by 200 two-dimensional tomographs with $200{\times}500$ pixels was displayed within 3.5 seconds. The spatial resolution of the OCT system was 8 ${\mu}m$ in air.

The Electrical, Optical and Structural Characteristics of ITO Films Formed by RF Reactive Magnetron Sputtering (저온 스퍼터링법으로 증착된 ITO박막의 온도 변화에 따른 구조, 표면 및 전기적 특성)

  • Lee, Seok-Ryoul;Choi, Jae-Ha;Kim, Ji-Soo;Jung, Jae-Hak;Lee, Lim-Soo;Kim, Jae-Yeal
    • Journal of the Korean Vacuum Society
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    • v.20 no.1
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    • pp.30-34
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    • 2011
  • We investigated the structural, electrical and optical characteristics of thin films with ITO deposited by a low temperature RF reactive magnetron sputtering. The deposited thin films were annealed for 2 hours at various temperatures of $50^{\circ}C$, $100^{\circ}C$, $150^{\circ}C$, $200^{\circ}C$ and $250^{\circ}C$ and were analyzed by using X-ray diffractometer, scanning electron microscopy and 4 point probe. The films annealed at temperatures higher than $150^{\circ}C$ were found to be crystallized and their electrical resistance were decreased from $40{\Omega}cm$to $18{\Omega}cm$. The optical transmittance of the film annealed at $150^{\circ}C$ was increased by over 87% in the 450 nm ~ 900 nm wavelength range. Our results indicate that the films with ITO deposited at even a low temperature can show better optical and electrical properties through a proper heat treatment.