• 대한전기학회:학술대회논문집
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• 대한전기학회 1992년도 하계학술대회 논문집 B
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• pp.789-793
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• 1992

For improving the power supply reliability and minimizing maintenance work of E.H.V. underground transmission line, new surveillance systems are strongly desired for use in the field of electric power transmission. For underground installation, high system reliability is required because E.H.V. cables, if an accident happen, can have a serious impact on social activities and human life. In answer to this requirement, applications of optical fiber transmission system have been widely developed in a variety of field. The main function of this system are cable fault location, oil leak detection, and surveillance of the cable circuit and tunnel condition.

• 한국정보통신학회:학술대회논문집
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• 한국정보통신학회 2012년도 추계학술대회
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• pp.552-553
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• 2012

현재의 발전소 내부에 가동 중인 열교환기 배관 라인의 Clinker Monitoring System은 초고온의 열교환기 내부의 벽면 및 배관라인의 클링커 상태를 감시하는 시스템을 요구하고 있다. 이러한 열교환기 내부의 상태를 감시하기 위하여 초고온에 견딜 수 있고 회전이 가능한 장치를 열교환기 내부에 투입하여 회전 가능한 장치를 통하여 원격으로 영상을 전송하도록 하여 클링커 상태를 영상으로 모니터링 하여 열교환기 내부의 상태를 감시 관찰 분석할 수 있는 시스템을 구성하였다. 본 논문에서는 발전설비의 열교환기 내부의 클링커 상태를 모니터링 할 수 있도록 회전 가능한 렌즈 튜브와 보호용 냉각 시스템을 추가된 통합 모니터링 시스템을 제기하고자 한다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1998년도 춘계학술대회 논문집
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• pp.495-496
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• 1998

The measurement of the amplitude and phase of electric fields on high voltage transmission lines is important for several reasons including a) Metering and determination of power flow, b) protective relaying. and c) fault sensing. The work reported here is directed toward a major improvement to optically based, electric-field sensors. This is a signal processing based technique for overcoming the instabilities of conventional, optically-based, electric-field sensors to changes in optical power or temperature.

• 한국통신학회논문지
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• 제27권10C호
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• pp.933-936
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• 2002

인터넷 사용의 급증으로 말미암아 패킷을 효과적으로 처리할 수 있는 이더넷 장비의 용량도 빠른 속도로 증가하고 있다. 한편 이더넷의 용량이 증가함에 따라 장치의 고신뢰성이 요구되고 있다. 본 논문에서는 현재 메트로 영역에서 사용되는 장치들에 적용 가능한 광링크 보호절체 방식을 제시하고 실험 결과를 보였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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• pp.123.2-123.2
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• 2013

Etching endpoint detection with plasma impedance monitoring (PIM) is demonstrated for small area dielectric layers inductive coupled plasma etching. The endpoint is determined by the impedance harmonic signals variation from the I-V monitoring system. Measuring plasma impedance has been examined as a relatively simple method of detecting variations in plasma and surface conditions without contamination at low cost. Cluster analysis algorithm is modified and applied to real-time endpoint detection for sensitivity enhancement in this work. For verification, the detected endpoint by PIM and real-time cluster analysis is compared with widely used optical emission spectroscopy (OES) signals. The proposed technique shows clear improvement of sensitivity with significant noise reduction when it is compared with OES signals. This technique is expected to be applied to various plasma monitoring applications including fault detections as well as end point detection.

• 전력전자학회논문지
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• 제10권2호
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• pp.148-154
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• 2005

SRM은 회전자의 위치에 따라 상권선의 여자시점이 결정되므로 회전자의 정확한 위치정보가 요구된다. 회전자 위치검출을 위해 절대형 엔코더 및 레졸버를 사용할 경우 초기 회전자 위치 검출이 가능하여 초기기동이 가능하지만 경제성을 고려할 때 적절하지 않다. 증분형 엔코더의 경우 초기 회전자 위치 검출이 용이하지 않아 초기기동의 문제가 있고, 홀센서를 이용할 경우 별도의 링마그넷을 부착하여야 하는 단점이 있다. 초기기동과 경제성을 고려할 때 슬롯디스크 및 옵토 인터럽터를 이용한 광센서 기법이 적합하지만, 이 방식은 6/4 pole SRM의 경우 3개의 옵토 인터럽터와 슬롯디스크가 필요하다. 반면에 본 논문에서는 단지 2개의 광센서만을 이용하여 3상 6/4 pole SRM을 구동하였으며 초기기동 및 정·역 운전을 가능하게 하였다. 광센서의 개수를 1개 줄이고 슬롯디스크를 제거함으로써 제작의 편리성과 경제성이 개선되었으며 슬롯디스크 취부면적이 제거되어 모터의 부피도 줄일 수 있었다.

• 반도체디스플레이기술학회지
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• 제18권4호
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• pp.30-34
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• 2019

We analyzed how the features in plasma information based virtual metrology (PI-VM) for SiO₂ etching depth with variation of 5% contribute to the prediction accuracy, which is previously developed by Jang. As a single feature, the explanatory power to the process results is in the order of plasma information about electron energy distribution function (PI_EEDF), equipment, and optical emission spectroscopy (OES) features. In the procedure of stepwise variable selection (SVS), OES features are selected after PI_EEDF. Informative vector for developed PI-VM also shows relatively high correlation between OES features and etching depth. This is because the reaction rate of each chemical species that governs the etching depth can be sensitively monitored when OES features are used with PI_EEDF. Securing PI_EEDF is important for the development of virtual metrology (VM) for prediction of process results. The role of PI_EEDF as an independent feature and the ability to monitor variation of plasma thermal state can make other features in the procedure of SVS more sensitive to the process results. It is expected that fault detection and classification (FDC) can be effectively developed by using the PI-VM.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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• pp.132-132
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• 2015

Virtual metrology (VM) model based on plasma information (PI) parameter for C4F8 plasma-assisted oxide etching processes is developed to predict and monitor the process results such as an etching rate with improved performance. To apply fault detection and classification (FDC) or advanced process control (APC) models on to the real mass production lines efficiently, high performance VM model is certainly required and principal component regression (PCR) is preferred technique for VM modeling despite this method requires many number of data set to obtain statistically guaranteed accuracy. In this study, as an effective method to include the 'good information' representing parameter into the VM model, PI parameters are introduced and applied for the etch rate prediction. By the adoption of PI parameters of b-, q-factors and surface passivation parameters as PCs into the PCR based VM model, information about the reactions in the plasma volume, surface, and sheath regions can be efficiently included into the VM model; thus, the performance of VM is secured even for insufficient data set provided cases. For mass production data of 350 wafers, developed PI based VM (PI-VM) model was satisfied required prediction accuracy of industry in C4F8 plasma-assisted oxide etching process.

• Journal of Advanced Marine Engineering and Technology
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• 제32권6호
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• pp.955-963
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• 2008

In this paper, we propose an improved practical encryption and fault-tolerance decryption method using a non-negative value key and random function obtained with a white noise by using iterative phase wrapping method. A phase wrapping operating key, which is generated by the product of arbitrary random phase images and an original phase image. is zero-padded and Fourier transformed. Fourier operating key is then obtained by taking the real-valued data from this Fourier transformed image. Also the random phase wrapping operating key is made from these arbitrary random phase images and the same iterative phase wrapping method. We obtain a Fourier random operating key through the same method in the encryption process. For practical transmission of encryption and decryption keys via Internet, these keys should be intensity maps with non-negative values. The encryption key and the decryption key to meet this requirement are generated by the addition of the absolute of its minimum value to each of Fourier keys, respectively. The decryption based on 2-f setup with spatial filter is simply performed by the inverse Fourier transform of the multiplication between the encryption key and the decryption key and also can be used as a current spatial light modulator technology by phase encoding of the non-negative values. Computer simulations show the validity of the encryption method and the robust decryption system in the proposed technique.

• Applied Microscopy
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• 제44권1호
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• pp.34-39
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• 2014

Electron backscatter diffraction (EBSD) is widely used for quantitative microstructural analysis of the crystallographic nature of variety of materials such as metals, minerals, and ceramics. EBSD can provide a wide range of information on materials including grain size, grain orientation, texture, and phase identity. In the case of metallic alloys, EBSD now has become an essential technique to analyze the texture, particularly when severe deformation is applied to the alloys. In addition, EBSD can be one of the very useful tools in identification of twin, particularly in Mg alloys. In Mg alloys different type of twin can occur depending on the c/a ratio and stacking fault energy on the twinning plane. Such an occurrence of different type of twin can be most effectively analyzed using EBSD technique. In this article, the recent development of Mg alloys and occurrence of twin in Mg are reviewed. Then, recently published example for identification of tension and compression twins in AZ31 and ZX31 is introduced to explain how EBSD can be used for identification of twin in Mg.