• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
• /
• 2007.10a
• /
• pp.747-750
• /
• 2007

This study proposes that chlorine residue after metal etch as the source of metal corrosion, and charges should be removed by optimizing etch, PR strip and cleaning condition. Charges distributed along the metal line acts as a source of tungsten (W) plug corrosion when associated with following cleaning solution. In cleaning process after metal etch and PR strip, chemical selection is significantly important in terms of metal corrosion. Optimal corrosion preventive PH, no metal attack (choice of optimal inhibitants), high by product removal efficiency and optimal de ionized water treatment condition is critical to the metal corrosion prevention.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2010.06a
• /
• pp.109-109
• /
• 2010

On-line partial discharge(PD) diagnostic system is the most prominent systems to diagnose insulation condition for the high voltage rotating machines. Partial discharge measuring system(PDMS) series with ceramic coupler(PD detecting sensor) installed hydro generator and high voltage motor have been measured the PD data for many years. The trend of PD magnitude in the on-line PD system increased for some machines. These machines showed a same result in the conventional off-line PD test and PD magnitude decreased after stator winding insulation cleaning. This case study show that PDMS has been proved to be good results by comparing PD magnitude with on-line and off-line PD test and it is important to plan the maintenance project for the hydro generator stator winding because PD value was decreased after insulation cleaning.

• Proceedings of the KIEE Conference
• /
• 2005.10b
• /
• pp.421-423
• /
• 2005

Power transmission lines have been playing a key role as the mainstay of national industry. When a power failure occurs, it can have severe effects on national security as well as national industry and economy. In this paper, we consider an insulator failure, which is one of the main causes of such a power failure. In spite of its importance, however, a shortage of manpower in the insulator maintenance field is getting more serious due to working environments with a high voltage and a high place. For this reason, a new active maintenance technique using a robot system is required to prevent such an insulator failure. In this paper, a new robot mechanism for insulator cleaning and inspection was developed. We confirmed its effectiveness through experiments.

• KEPCO Journal on Electric Power and Energy
• /
• v.7 no.1
• /
• pp.73-77
• /
• 2021

As the big data analysis technologies has been developed worldwide, the importance of asset management for electric power facilities based data analysis is increasing. It is essential to secure quality of data that will determine the performance of the RISK evaluation algorithm for asset management. To improve reliability of asset management, asset data must be preprocessed. In particular, the process of cleaning dirty data is required, and it is also urgent to develop an algorithm to reduce time and improve accuracy for data treatment. In this paper, the result of the development of an automatic cleaning algorithm specialized in overhead transmission asset data is presented. A data cleaning algorithm was developed to enable data clean by analyzing quality and overall pattern of raw data.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2013.02a
• /
• pp.272-273
• /
• 2013

Some living thingsuse micro- or nano- structures for living in nature. Scientists and engineers made efforts to mimic them, and they succeeded in making new types of applications. They used 'Namib desert beetle' to self-filling device by moisture harvesting and 'lotus leaf' to self-cleaning device by water repelling. 'Namib desert beetle' and lotus leaf have micro-patterns on their surface, which consists of hydrophobic or hydrophilic materials [1]. Moreover, micro-patterns on the surface make self-filling or self-cleaning property enhanced because of the surface roughness. Surface roughness enhances wettability [2]. Micro-pattern is a significant factor to make the surface be functional, so we want to make new types of functional surface by micro-patterning. In this work,we make several functional micro-patterns (radial, line, and dot arrays) using maskless lithography and analyze the characteristics of each micro-pattern. In order to analyze and understand surface characteristics, micro-patterns with varying sizes are investigated. All experiments are proceeded on mr-DWL5 photo resists coated on silicon wafers in same condition. All the experiments have demonstrated good performances about hydrophobic or hydrophilic property corresponding to their material and structural combinations. In radial micro-pattern, although the surface is flat, water drops on hydrophilic radial pattern can be convergent to a middle point and water drops on hydrophobic radial pattern can be divergent from the middle point. In line array micro-pattern, water drops can roll off along only one direction in parallel with the line arrays. Such phenomena might be mainly caused by the local change of surface roughness. From these results, controlling the movement and direction of water drops is made feasible without introducing a slope, which can potentially be used for new types of applications.

• Journal of the Korean Vacuum Society
• /
• v.6 no.1
• /
• pp.9-19
• /
• 1997

The reaction mechanisms of dry cleaning with UV-excited chlorine radical for Zn, Fe and Ti trace contaminants on the Si wafer have been studied by SEM, AFM and XPS analyses in this work. The patterned Zn, Fe and Ti films were deposited on the Si wafer surface by thermal evaporation and changes in the surface morphology after dry cleaning with $Cl_2$and UV/$Cl_2$at $200^{\circ}C$ were studied by optical microscopy and SEM. In addition, changes in the surface roughness of Si wafer with the cleaning was observed by AFM. The chemical bonding states of the Zn, Fe and Ti deposited silicon surface were observed with in-line XPS analysis. Zn and Fe were easily cleaned in the form of volatile zinc-chloride and iron-chloride as verified by the surface morphology changes. Ti which forms involatile oxides was not easily removed at room temperature but was slightly removed by UV/$Cl_2$at elevated temperature of $200^{\circ}C$. It was also found that the surface roughness of the Si wafer increased after $Cl_2$and UV/$Cl_2$cleaning. Therefore, the metallic contaminants on the Si wafer can be easily removed at lower temperature without surface damage by a continuous process using wet cleaning followed by UV/$Cl_2$dry cleaning.

• FOCUS: LIFE SCIENCE
• /
• no.1
• /
• pp.1.1-1.4
• /
• 2024

This article provides comprehensive guidance on the maintenance, cleaning, regeneration, and storage of silica-based HPLC (High-Performance Liquid Chromatography) columns. The general considerations emphasize the importance of using in-line filters and guard cartridges to protect columns from blockage and irreversible sample adsorption. While these measures help, contamination by strongly adsorbed sample components can still occur over time, leading to an increase in back pressure, loss of efficiency, and other issues. To maximize column lifetime, especially with UHPLC (Ultra-High Performance Liquid Chromatography) columns, it is advisable to use ultra-pure solvents, freshly prepared aqueous mobile phases, and to filter all samples, standards, and mobile phases. Additionally, an in-line filter system and sample clean-up on dirty samples are recommended. However, in cases of irreversible compound adsorption or column voiding, regeneration may not be possible. The document also provides specific recommendations for column cleaning procedures, including the flushing procedures for various types of columns such as reversed phase, unbonded silica, bonded normal phase, anion exchange, cation exchange, and size exclusion columns for proteins. The flushing procedures involve using specific solvents in a series to clean and regenerate the columns. It is emphasized that the flow rate during flushing should not exceed the specified limit for the particular column, and the last solvent used should be compatible with the mobile phase. Furthermore, the article outlines the storage conditions for silica based HPLC columns, highlighting the impact of storage conditions on the column's lifetime. It is recommended to flush all buffers, salts, and ion-pairing reagents from the column before storage. The storage solvent should ideally match the one used in the initial column test chromatogram provided by the manufacturer, and column end plugs should be fitted to prevent solvent evaporation and drying out of the packing bed.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.16 no.7
• /
• pp.569-572
• /
• 2003

In this study, we evaluated the dilute HF cleaning to reduce residual defects made by metal CMP process. The purpose of this test is to observe the existence of barrier metal damage during DHF cleaning on condition that it should not affect metal thin film reliability, so we will get rid of slurry residual particles as a main defect of the metal CMP process for the better yield. In-line defect data showed us that slurry residual particles were removed by DHF application. The HF rinse significantly reduced metal contamination levels and surface roughness. The best effect by additional oxide loss was discovered when Dilute HF condition is 10".

• Membrane and Water Treatment
• /
• v.8 no.2
• /
• pp.185-199
• /
• 2017

Low-pressure membrane filtration is increasingly used for tertiary treatment of wastewater effluent organic matter (EfOM), mainly comprising organic base/neutral compounds. In-line coagulation with underdosing, charge neutralization, and sweep floc conditions prior to ultrafiltration (UF) was studied to determine removals of the EfOM components and consequent reduction of fouling using polyethersulfone membranes. Coagulation and UF substantially reduced fouling for all coagulation conditions while removing from 7 to 38% of EfOM organic acids. From 7 to 16% of EfOM organic base/neutrals were removed at neutral pH but there was no significant removal for slightly acid coagulation conditions even though fouling was substantially reduced. Sweep floc produced the lowest resistance to filtration but may be inappropriate for in-line use due to the large added volume of solids. Charge-neutralization resulted in poor recovery of the initial flux with hydraulic cleaning. Under-dosing paralleled sweep floc in reducing hydraulic resistance to filtration (for sub-critical flux) and the initial flux was also easily recovered with hydraulic cleaning. Hydrophobic and hydrophilic base/neutrals were identified on the fouled membranes but as previously reported the extent of fouling was not correlated with accumulation of organic base/neutrals.

• Journal of the Korean Chemical Society
• /
• v.47 no.6
• /
• pp.608-613
• /
• 2003

In order to remove particles on surface of post-oxide CMP wafer, new cleaning solution was prepared by mixing with DHF (Diluted HF), nonionic surfactant PAAE (Polyoxyethylene Alkyl Aryl Ether), DMSO (Dimethylsulfoxide) and D.I.W.. Silicone wafers were intentionally contaminated by silica, alumina and PSL (polystylene latex) which had different zeta potentials in cleaning solution. This cleaning solution under megasonic irradiation could remove particles and metals simultaneously at room temperature in contrast to traditional AMP (mixture of $NH_4OH,\;H_2O_2$ and D.I.W) without any side effects such as increasing of microroughness, metal line corrosion and deposition of organic contaminants. This suggests that this cleaning solution would be useful future application with copper CMP in brush cleaning process as well as traditional post CMP cleaning process.