Investigation on DHF Application at Metal CMP Cleaning Process
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김남훈
(중앙대학교 전지전자공학부)
김상용 ((주)아남반도체) 김인표 (중앙대학교 전지전자공학부) 장의구 (중앙대학교 전지전자공학부) |
1 |
An effective end point detector on oxide CMP by motor current
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2 |
Aging effect in CMP slurries probed by multiple light scattering
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3 |
A study for global planarization of multilevel metal by CMP
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과학기술학회마을 |
4 |
A study on EPD of STI CMP process with reverse moat pattern
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5 |
A study on relationship between pattern wafer and blanket wafer for STI CMP
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