Analysis of Nonniformity of Residual Layer Thickness on UV-Nanoimprint Using an EPS(Elementwise Patterned Stamp) (EPS(Elementwise Patterned Stamp)를 이용한 UV 나노임프린트 공정에서 웨이퍼 변형에 따른 잔류층 분석)
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- Transactions of the Korean Society of Mechanical Engineers A
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- 제29권9호
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- pp.1169-1174
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- 2005