• 제목/요약/키워드: Normal arc discharge

검색결과 7건 처리시간 0.018초

트랜지스터 부착 RC 방전회로의 마이크로 방전가공 특성 (Characteristics of RC circuit with Transistor in Micro-EDM)

  • 조필주;이상민;최덕기;주종남
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2002년도 추계학술대회 논문집
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    • pp.235-240
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    • 2002
  • In micro-EBM, it is well blown that RC circuit is suitable for discharge circuit because of its low pulse width and relatively high peak current. To increase machining speed without changing unit discharge energy, charge resistance should be decreased. But, if very low, continuous (or normal) arc discharge occurs, then increases electrode wear and reduces machining speed remarkably. In this paper, RC circuit with transistor is used to micro-EDM. Experimental results show that RC circuit with transistor can cut off continuous (or normal) arc discharge effectively if duty factor and switching period of transistor are set up optimally. Through experiments with varying charge resistance, it can be known that RC circuit with transistor has about two times faster machining speed than that of RC circuit. Especially, it has prominent rise-effect of machining speed in low unit discharge energy, so that a high-quality and high-speed micro-EDM can be realized through RC circuit with transistor.

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트랜지스터 부착 RC 방전회로의 마이크로 방전가공 특성 (Characteristics of RC Circuit with Transistors in Micro-EDM)

  • 조필주;이상민;최덕기;주종남
    • 한국정밀공학회지
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    • 제21권12호
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    • pp.44-51
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    • 2004
  • In a micro-EDM, it is well known that an RC circuit is suitable as a discharge circuit because of its low pulse width and relatively high peak current. To increase machining speed without changing unit discharge energy, charge resistance should be decreased. But, when the resistance is very low, continuous (or normal) arc discharge occurs, electrode wear increases and machining speed is reduced remarkably. In this paper, an RC circuit with transistors is used in a micro-EDM. Experimental results show that the RC circuit with transistors can cut off a continuous (o. normal) arc discharge effectively if the duty factor and switching period of the transistor are set up optimally. Through experiments with varying charge resistances, it is shown that the RC circuit with transistors has about two times faster machining speed than that of an RC circuit.

원격감시 기능을 갖는 고감도 부분방전센서 (Highly Sensitive Partial Discharge Sensor with Remote Monitoring Capabilities)

  • 최규남
    • 한국전자통신학회논문지
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    • 제10권3호
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    • pp.349-356
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    • 2015
  • 광학적 잡음과 전기적 잡음을 복합적으로 제거할 수 있는 하이브리드 필터를 채용하고 펄스형태의 아크 광 신호를 적분하여 수신되는 아크에너지의 크기로 감지할 수 있는 원격감시 기능을 갖는 고감도 부분방전 센서를 구현하였다. 하이브리드 필터는 부분방전 센서가 설치되는 배전반 내 환경에서 내부 형광등과 백열등 조명에 대하여 영향을 받지 않음을 보여주었다. 종래에는 아크광의 불규칙한 파형특성으로 인하여 첨두치가 감지되어 아크광의 크기에 비례한 선택적 감지가 어려웠으나, 센서에 적용된 적분연산 기능은 각기 다른 아크광의 에너지 레벨에 대하여도 선택적으로 감지가 가능함을 실험적으로 보여주었다. 센서는 2m 이격된 원격지에서 100A 저압 MCCB의 정상 개폐 시 발생하는 섬광에 해당하는 광 에너지에 대해서도 감지가 가능함을 보여주어 원격감시 기능을 갖는 고감도 부분방전센서에 적용 가능함을 보여주었다.

The Magnetic Filtering Vacuum Arc Film Deposition System and Its Applications

  • Wang, G.F.;Zhang, H.X.;Zhang, H.J.;Zhu, H.
    • 한국진공학회지
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    • 제6권S1호
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    • pp.137-140
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    • 1997
  • A cathodic arc with beam filter is employed for the deposition of metallic and hydrogen-free amorphous carbon films. A solenoid filter is used to prevent macropaticles and nonionized atoms from reaching the substrate. The detail transport characters of the filter are presented in the paper. With an optmum filter arrangement we are able to obtain a filter output of 18.4% of the total number of ions produced by the vacuum arc discharge. The deposited amorphous cabon thin film contains no hydrogen and a high fraction of $sp^3$ is determined by XPS. A dense Ti film deposited on H13 steel improves the corrosion resistance of the H13 steel and significant improvements of corrosion resistance were observed by implanting Ti, C in the film.

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Vacuum Rotary Arc Gap Switch의 설계 및 시험 (Design and Test of Vacuum Rotary Arc Gap Switch)

  • 서길수;황동원;이태호;황리호;김희진;이홍식;임근희
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제52권1호
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    • pp.19-24
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    • 2003
  • Design and test results of a VRAG(Vacuum Rotary Arc Gap) switch were presented. To control the damage of electrodes caused by the vacuum arc, Lorentz's force by the radial magnetic field between spiral electrodes was used to rotate the vacuum uc. VRAG switch electrodes were made of the material of CuCr and OFHC. Gap distance between two spiral type electrodes for the rotation of the arc discharge is 8, 10, 12mm. In the cathode, one trigger electrode was inserted into each spiral wing. Normal operation of the VRAG switch was confirmed with 10.6[$mutextrm{s}$]of trigger delay and 2~3[$mutextrm{s}$] of the jitter time. The speed of the vacuum arc was measured to be 0.6 ~ 1[km/s] by a motion analyzer.

저압배선계통에서 직렬아크의 검출에 관한 연구 (A Study on the Series Arc Detection in Low-voltage Wiring Systems)

  • 김일권;박대원;최수연;박찬용;김황국;길경석
    • 한국전기전자재료학회논문지
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    • 제21권2호
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    • pp.182-187
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    • 2008
  • This paper dealt with the detection algorithm of series arcing, which is a cause of electric fires in low-voltage wiring systems. To find the distinguished electrical features of series arc, we simulated series arcing by the arc generator specified in UL1699. An electric heater, an inverter-controlled vacuum cleaner, and a phase-controlled incandescent lamp were used as loads to generate series arcing. A high-pass filter (HPF) with the low cut-off frequency of 3 kHz at -3 dB was fabricated and applied to separate the series arc signal from the AC voltage source. The experiment showed that the high frequency signal generates randomly during series arcing, and the phase-controlled incandescent lamp produces high frequency pulses even in normal state. In this case, the magnitude, the width, and the randomness of high frequency signal should be analyzed to estimate series arcing precisely.

KrF 엑사이머 레이저 법을 이용한 다이아몬드 박막의 평탄화 (Planarization of Diamond Films Using KrF Excimer Laser Processing)

  • 이동구
    • 열처리공학회지
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    • 제13권5호
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    • pp.318-323
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    • 2000
  • The planarization of rough polycrystalline diamond films synthesized by DC arc discharge plasma jet CVD (chemical vapor deposition) was attempted using KrF excimer laser pulses. The effects of laser incidence angle and reaction gases (ozone and oxygen) on etching rate of diamond were studied. The temperature change of diamond and graphite with different laser fluences was calculated by computer simulation to explain the etching behavior of diamond films. The threshold energy density from the experiment for etching of pure crystalline diamond was about $1.7J/cm^2$ and fairly matched the simulation value. Preferential etching of a particular crystallographic plane was observed through scanning electron microscopy. The etching rate of diamond with ozone was lower than that with oxygen. When the angle of incidence was $80^{\circ}$ to the diamond surface normal, the peak-to-valley surface roughness was Significantly reduced from $20{\mu}m$ to $0.5{\mu}m$.

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