• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.146-147
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• 2011

Processing a large area substrate for liquid crystal display (LCD) or solar panel applications in a capacitively coupled plasma (CCP) reactor is becoming increasingly challenging because of the size of the substrate size is no longer negligible compared to the wavelength of the applied radio frequency (RF) power. The situation is even worse when the driving frequency is increased to the Very High Frequency (VHF) range. When the substrate size is still smaller than 1/8 of the wavelength, one can obtain reasonably uniform process results by utilizing with methods such as tailoring the precursor gas distribution by adjustingthrough shower head hole distribution or hole size modification, locally adjusting the distance between the substrate and the electrode, and shaping shower head holes to modulate the hollow cathode effect modifying theand plasma density distribution by shaping shower head holes to adjust the follow cathode effect. At higher frequencies, such as 40 MHz for Gen 8.5 (2.2 m${\times}$2.6 m substrate), these methods are not effective, because the substrate is large enough that first node of the standing wave appears within the substrate. In such a case, the plasma discharge cannot be sustained at the node and results in an extremely non-uniform process. At Applied Materials, we have studied several methods of modifying the standing wave pattern to adjusting improve process non-uniformity for a Gen 8.5 size CCP reactor operating in the VHF range. First, we used magnetic materials (ferrite) to modify wave propagation. We placed ferrite blocks along two opposing edges of the powered electrode. This changes the boundary condition for electro-magnetic waves, and as a result, the standing wave pattern is significantly stretched towards the ferrite lined edges. In conjunction with a phase modulation technique, we have seen improvement in process uniformity. Another method involves feeding 40 MHz from four feed points near the four corners of the electrode. The phase between each feed points are dynamically adjusted to modify the resulting interference pattern, which in turn modulate the plasma distribution in time and affect the process uniformity. We achieved process uniformity of <20% with this method. A third method involves using two frequencies. In this case 40 MHz is used in a supplementary manner to improve the performance of 13 MHz process. Even at 13 MHz, the RF electric field falls off around the corners and edges on a Gen 8.5 substrate. Although, the conventional methods mentioned above improve the uniformity, they have limitations, and they cannot compensate especially as the applied power is increased, which causes the wavelength becomes shorter. 40 MHz is used to overcome such limitations. 13 MHz is applied at the center, and 40 MHz at the four corners. By modulating the interference between the signals from the four feed points, we found that 40 MHz power is preferentially channeled towards the edges and corners. We will discuss an innovative method of controlling 40 MHz to achieve this effect.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2001년도 춘계학술발표회 초록집
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• pp.14-14
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• 2001

Nitride films such as TiN, CrN etc. deposited on glass by PVD processes have been developed for many industrial applications. These nitride films deposited on glass were widely used for not only decorative and optical coatings but also wear and corrosion resistance coatings employed as dies and molds made of glass for the example of lens forming molds. However, the major problem of nitride coatings on glass by PVD process is non-uniform film owing to pin-hole and micro crack. It is estimated that nonuniform coating is influenced by a different surface energy between metal nitrides and glass due to binding states. In this work, therefore, for the evaluation of nucleation and growth mechanism of nitride films on glass TiN and CrN film were synthesized on glass with various nitrogen partial pressure by unbalanced magnetron sputtering. Prior to deposition, for the examination of relationship between surface energy and film microstructure plasma pre-treatment process was carried out with various argon to hydrogen flow rate and substrate bias voltage, duty cycle and frequency by using pulsed DC power supply. Surface energy owing to the different plasma pre-treatment was calculated by the measurement of wetting angle and surface conditions of glass were investigated by X-ray Photoelectron Spectroscopy(XPS) and Atomic Force Microscope(AFM). The microstructure change of nitride films on glass with increase of film thickness were analyzed by X-Ray Diffraction(XRD) and Scanning Electron Microscopy(SEM).

• 한국표면공학회지
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• 제53권6호
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• pp.351-359
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• 2020

Formation behavior and properties of PEO (Plasma Electrolytic Oxidation) film on AA2024 were investigated under application of pulsed current as a function of Na3PO4 concentration in 0.05 M Na2SiO3 solution by analyzing voltage-time behavior, in-situ observation of arc generation, observation of surface morphology and measurements of thickness and surface roughness. Arc generation voltage decreased with increasing Na3PO4 concentration. Color difference of PEO films between edge and inner part disappeared by addition of Na3PO4. It was also observed that size of nodules on PEO film decreased with increasing Na3PO4 concentration. Thickness of PEO films formed on AA2024 increased with increasing Na3PO4 concentration. Whereas, surface roughness of PEO films decreased with increasing Na3PO4 concentration up to 0.05 M of Na3PO4 which is attributed to the deceased size of nodules on the PEO films. However, the surface roughness increased with increasing Na3PO4 concentration more than 0.07 M of Na3PO4 which seems to be due to the formation of non-uniform PEO films with smooth surface and large size pores formed by orange-colored big arcs. The experimental results suggest that added sodium phosphate less than 0.2 M in an alkaline silicate solution can contribute to the formation of relatively thick and uniform thickness of PEO films under arc generation voltage lower than 300 V.

• Applied Science and Convergence Technology
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• 제26권3호
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• pp.52-54
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• 2017

An InGaN/GaN multiple quantum well (MQW) structure is grown on a GaN/sapphire template using a plasma-assisted molecular beam epitaxy (PA-MBE). The fluctuation of the quantum well thickness formed from roughly-grown InGaN layer results in a disordered photoluminescence (PL) spectrum. The surface morphologies of the InGaN layers with various In compositions are investigated by reflection high energy electron diffraction (RHEED) and atomic force microscopy (AFM). A blurred InGaN/GaN hetero-interface and the non-uniform QW size is confirmed by high resolution transmission electron microscopy (HR-TEM). Inhomogeneity of the quantum confinement results in a degradation of the quantum efficiency even though the InGaN layer has a uniform In composition.

• 한국세라믹학회지
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• 제47권6호
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• pp.485-490
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• 2010

In our previous studies, continuous SiC fiber-reinforced SiC-matrix composites ($SiC_f$/SiC) had been fabricated by two different slurry infiltration methods: vacuum infiltration and electrophoretic deposition (EPD). 12 wt% of $Al_2O_3-Y_2O_3$-MgO with respect to SiC powder was used as additives for liquid-phase assisted sintering. After hot pressing at $1750^{\circ}C$ under 20 MPa for 2 h in Ar atmosphere, a high composite density could be achieved for both cases, whereas the problems such as large grain size and non-uniform distribution of liquid phase were observed, which was resulted in the relatively poor mechanical properties of composites. Therefore, efforts have been made to reduce the grain growth during the sintering, including the optimization for hot pressing condition and utilization of spark plasma sintering using a SiC monolith. Based on the results, spark plasma sintering was found to be effective method in decreasing the amount of sintering additive, time and grain growth, which will be explained in comparison to the results of hot pressing in this paper.

• 천문학회보
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• 제44권1호
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• pp.48.4-48.4
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• 2019

Small-scale shear flows are ubiquitous in the universe, and astrophysical plasmas are often magnetized. We study the thermal condensation instability in magnetized plasmas with shear flows in relation to filamentary structure formation in cool structures in the universe, representatively solar prominences and supernova remnants. A linear stability analysis is extensively performed in the framework of magnetohydrodynamics (MHD) with radiative cooling, plasma heating and anisotropic thermal conduction to find the eigenfrequencies and eigenfunctions for the unstable modes. For a shear velocity less than the Alfven velocity of the background plasma, the eigenvalue with the maximum growth rate is found to correspond to a thermal condensation mode, for which the density and temperature variations are anti-phased (of opposite signs). Only when the shear velocity in the k-direction is near zero, the eigenfunctions for the condensation mode are of smooth sinusoidal forms. Otherwise each eigenfunction for density and temperature is singular and of a discrete form like delta functions. Our results indicate that any non-uniform velocity field with a magnitude larger than a millionth of the Alfven velocity can generate discrete eigenfunctions of the condensation mode. We therefore suggest that condensation at discrete layers or threads should be quite a natural and universal process whenever a thermal instability arises in magnetized plasmas.

• Asian-Australasian Journal of Animal Sciences
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• 제11권4호
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• pp.368-374
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• 1998

The study was conducted on six multiparous Murrah buffaloes which were earlier artificially induced into lactation. During the experimental period of 15 days, buffaloes were managed in a loose housing system. All the buffaloes were administered a single injection of bromocryptine (@ $100{\mu}g/kg$ body weight) subcutaneously in the neck region at 08:30 A.M., 50 days postpartum (early lactation). Blood samples were collected from four buffaloes for a period of 5 days before the administration of bromocryptine i.e. on days -5, -4, -3, -2, -1, on day of treatment (day 0) and thereafter daily for a period of 9 days i.e 1, 2, 3, 4, 5, 6, 7, 8 and 9 to determine the hormones and blood metabolites. Homogeneous milk samples from all the buffaloes were collected at morning and evening milkings on days coinciding with the days of blood sampling for analysis of milk constituents. Administration of bromocryptine resulted in a significant inhibition of plasma prolactin within 24 hrs of treatment, but the response in all the buffaloes was not uniform. The effect of bromocryptine on plasma prolactin hormone lasted for 1-4 days but Cortisol concentration were not altered. Administration of bromocryptine neither affected blood glucose nor plasma non-esterified fatty acids concentration. Irrespective of level of milk production from different buffaloes, there was no effect of bromocryptine on milk yield which indicated that prolactin is not required for milk secretion during early lactation in buffaloes. Milk constituents like fat, protein and lactose were not affected by bromocryptine may be due to no effect of bromocryptine of milk yield.

• 한국표면공학회지
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• 제35권2호
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• pp.122-128
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• 2002

This study was conducted to synthesize the diamond like carbon films by plasma enhanced chemical vapor deposition (PECVD). The effects of gas composition on growth and mechanical properties of the films were investigated. A little amount of hydrogen or oxygen were added to base gas mixture of methane and argon. Methane dissociation and diamond like carbon nucleation were enhanced by installing negatively bias grid near substrate. The deposited films were indentified as hard diamond like carbon films by micro-Raman spectroscopy. The surface and fractured cross section of the films which were observed by scanning electron microscopy showed that film growth is very slow as about 0.3$\mu\textrm{m}$/hour, and relatively uniform with hydrogen addition. Vickers hardness of tungsten carbide (WC) cutting tool increased from about 1000 to 1600~1800 by deposition of DLC film, that of commercial TiN coated tool was about 1270. In cutting test of aluminum 6061 alloy, DLC coated cutting tool showed 1/3 or lower crater and flank wear than TiN coated or non-coated WC cutting tools.

• 반도체디스플레이기술학회지
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• 제23권2호
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• pp.55-59
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• 2024

Plasma Enhanced Chemical Vapor Deposition (PE-CVD) is a widely used technology in semiconductor manufacturing for thin film deposition. The implementation of wafer guide rings in PE-CVD processes is crucial for enhancing efficiency and product quality by ensuring uniform deposition around wafer edges and reducing particle generation. On the other hand, to prevent overall temperature non-uniformity and degradation of thin film quality within the chamber, it is essential to consider various parameters comprehensively. In this study, after applying the wafer guide rings, temperature variations and fluid flow changes were simulated. Additionally, by simulating the temperature and flow changes when applied to the PE-CVD chamber, this paper discusses the importance of optimizing variables within the entire chamber.

• Advances in aircraft and spacecraft science
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• 제4권6호
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• pp.729-744
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• 2017

This investigation highlights rationale of electrically conductive nano adhesives for its essential application for Electromagnetic Interference (EMI) Shielding in satellites and Lightning Strike Protection in aircrafts. Carbon Nano Fibres (CNF) were functionalized by electroless process using Tollen's reagent and by Plasma Enhanced Chemical Vapour Deposition (PECVD) process by depositing silver on CNF. Different weight percentage of CNF and silver coated CNF were reinforced into the epoxy resin hardener system. Scanning Electron Microscopy (SEM) micrographs clearly show the presence of CNF in the epoxy matrix, thus giving enough evidence to show that dispersion is uniform. Transmission Electron Microscopy (TEM) studies reveal that there is uniform deposition of silver on CNF resulting in significant improvement in interfacial adhesion with epoxy matrix. There is a considerable increase in thermal stability of the conductive nano adhesive demonstrated by Differential Scanning Calorimetry (DSC) and Thermogravimetric Analysis (TGA). Four probe conductivity meters clearly shows a substantial increase in the electrical conductivity of silver coated CNF-epoxy composite compared to non-coated CNF-epoxy composite. Tensile test results clearly show that there is a significant increase in the tensile strength of silver coated CNF-composites compared to non-coated CNF-epoxy composites. Consequently, this technology is highly desirable for satellites and EMI Shielding and will open a new dimension in space research.