• Title/Summary/Keyword: Nitrogen stress

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Oxidative Stress and Antioxidant Responses in Poplar Clones Irrigated with Livestock Waste Leachate (양돈폐수 처리에 의한 포플러클론의 산화스트레스와 항산화반응)

  • Je, Sun-Mi;Yeo, Jin-Gi;Woo, Su-Young
    • Korean Journal of Agricultural and Forest Meteorology
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    • v.13 no.3
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    • pp.140-147
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    • 2011
  • We studied the influence of livestock waste leachate on oxidative damage and antioxidative responses in poplar clones in August which increase the demand of antioxidants because of high temperature and high light during this period. We measured ion leakage, antioxidant enzyme activities (APX, GR), and carotenoid contents. Oxidative damage and antioxidative responses by treated livestock waste leachate in poplar clones showed various results. We divided poplar clones into three groups using the criteria based on ion leakage which represent cell damage induced oxidative stress. Eco 28, 62-10, Bonghwa1 and Dorskamp belonged to the first group in which the cell damaged level was lower than that of the control. The results suggest that this group augmented for demand of antioxidative in summer because high concentration of nitrogen induced by treatment of live stock wastes acted as environmental stress. Consequently, they failed to keep up the homeostasis of reactive oxygen species. The second group in which the cell damaged level was similar to that of the control was Suwon, 72-30 and 72-31 clones. Finally, 97-18 clone belonged to the third group in which the cell damaged level was lower than that of the control group. In this case, nitrogen treated by livestock waste leakage decreased oxidative stress. 97-18 clone was the clones with the least damage in summer oxidative stresses treated by livestock waste leakage. These results suggest that the high concentration nitrogen due to the livestock waste leakage can act differently upon the clones. We speculate that the added oxidation damage in the summer (growing season) may have an effect on the total fresh weight and also influence the purification ability for livestock waste leakage. However, further studies are needed for the confirmation.

Effect of Primary Si size and Residual Stress on the Wear Properties of B.390 Al Alloys (B.390 알루미늄 합금의 마모특성에 미치는 초정Si 입자크기와 잔류응력의 영향)

  • Kim, Heon-Joo;Kim, Sung-Jae
    • Journal of the Korean Society for Heat Treatment
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    • v.19 no.1
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    • pp.20-29
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    • 2006
  • Wear behaviour of B.390 aluminum alloy with different particle sizes of primary Si against a SM45C counterface was studied as a function of wear load and sliding velocity, using pin-on-disk apparatus under dry condition. The wear rate of specimen with fine primary Si particles showed increased wear resistance at high wear load, on the other side wear resistance of coarse primary Si particle size was improved at low wear load. As the compressive residual stress in the matrix increased remarkably by liquid nitrogen(LN) treatment, wear resistance of the LN treated specimen was more excellent than that of T6 treated specimen.

The effect of phosphorus stress on the energy status and bacteroid content in soybean nodules (인산결핍이 대두근류의 bacteroid 함량과 energy 상태에 미치는 영향)

  • Sa, Tong-Min;Lim, Sun-Uk;Israel, Daniel W.
    • Applied Biological Chemistry
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    • v.35 no.6
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    • pp.449-456
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    • 1992
  • Expermient were conducted to determine the effect of phosphorus stress on bacteroid content and energy status of soybean (Glycine max [L.] Merr.) nodules. Plants inoculated with Bradyrhizobium japonicum MN 110 were grown with P-stressed (0.05 mM-P) and control (1 mM-P) treatment in the greenhouse. Phosphorus stress decreased nodule mass per plant and nodule mass to whole plant mass ratio. Phosphorus concentration in leaf, stem and root tissues were reduced by 75% but in nodule tissue was reduced only by 40% under phosphorus stress during 3 week experimental period. The bacteroid content per unit nodule mass and the distribution of total nitrogen and total phosphorus among the bacteroid and plant cell fractions of nodule were not affected significantly by phosphorus stress. Regardless of phosphorus treatment, 22% of the nitrogen and 27% of the phosphorus in whole nodules were associated with the bacteroid fraction. The ATP and total adenylate concentrations in and energy charge of whole nodule were decreased 77%, 46% and 37%, respectively, by phosphorus stress. The ATP concentration in and energy charge of the host plant cell fraction of nodules were decreased 86% and 59%, respectively, but these parametres in bacteroid in nodules were not affected by phosphorus stress. These results indicated that nodule is a strong phosphorus sink and that nodule growth and development are regulated to maintain a high phosphorus and energy content in bacteroid even when the host plant is subjected to phosphorus deficiency.

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Oxygen Consumption and Ammonia Excretion in Cultured Soft-Shelled Turtle, Pelodiscus sinensis Exposed Vibration Stress (진동 스트레스에 따른 양식 자라, Pelodiscus sinensis의 산소소비 및 암모니아 배설)

  • Lee, Jeong-Yeol;Sung, Young-Sik;Hur, Jun-Wook
    • Journal of Aquaculture
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    • v.20 no.1
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    • pp.60-64
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    • 2007
  • We examined the effects of the vibration stress on oxygen consumption and ammonia excretion of cultured soft-shelled turtle, Pelodiscus sinensis. For the stressed group vibration of $45{\sim}78\;dB$ (V) from electric vibrator was turned on for 15 min with 2-h intervals during daytime hours ($08:00{\sim}18:00$) for 28 days. Two different sizes of soft-shelled turtle, large (carapace length: $12{\sim}16\;cm$, body weight: $300{\sim}600\;g$, large size turtle: LST) and middle ($16{\sim}20\;cm,\;700{\sim}1,000\;g$, middle size turtle: MST) were used. The oxygen consumption of LST the beginning of the experiment (1 day) was 124.30 mg $O_2/kg/hr$, and after 7, 14, 21 and 28 days of stress decreased by 47.2, 71.6, 79.1 and 86.0%, respectively. In MST, oxygen consumption of beginning day was 66.04 mg $O_2/kg/hr$, and after 28 days of stress decreased by 76.5%. Ammonia nitrogen excretion showed a similar pattern to that of oxygen consumption. Ammonia nitrogen excretion of beginning of the experiment was 0.537 mg N/kg/hr, and after 28 days of stress decreased by 75.4% for LST, and by 74.3% for the middle ones. From in this study it was showed that the physiological activity was reduced by 50% following 8.4 days of vibration stress for LST, and 15.5 days for MST.

Use of plant growth-promoting rhizobacteria to control stress responses of plant roots

  • Kang, Bin-Goo;Kim, Woo-Taek;Yun, Hye-Sup;Chang, Soo-Chul
    • Plant Biotechnology Reports
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    • v.4 no.3
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    • pp.179-183
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    • 2010
  • Ethylene is a key gaseous hormone that controls various physiological processes in plants including growth, senescence, fruit ripening, and responses to abiotic and biotic stresses. In spite of some of these positive effects, the gas usually inhibits plant growth. While chemical fertilizers help plants grow better by providing soil-limited nutrients such as nitrogen and phosphate, overusage often results in growth inhibition by soil contamination and subsequent stress responses in plants. Therefore, controlling ethylene production in plants becomes one of the attractive challenges to increase crop yields. Some soil bacteria among plant growth-promoting rhizobacteria (PGPRs) can stimulate plant growth even under stressful conditions by reducing ethylene levels in plants, hence the term "stress controllers" for these bacteria. Thus, manipulation of relevant genes or gene products might not only help clear polluted soil of contaminants but contribute to elevating the crop productivity. In this article, the beneficial soil bacteria and the mechanisms of reduced ethylene production in plants by stress controllers are discussed.

Effects of Stress Mismatch on the Electrical Characteristics of Amorphous Silicon TFTs for Active-Matrix LCDs

  • Lee, Yeong-Shyang;Chang, Jun-Kai;Lin, Chiung-Wei;Shih, Ching-Chieh;Tsai, Chien-Chien;Fang, Kuo-Lung;Lin, Hun-Tu;Gan, Feng-Yuan
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.729-732
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    • 2006
  • The effect of stress match between silicon nitride ($SiN_2$) and hydrogenated amorphous silicon (a-Si:H) layers on the electrical characteristics of thin-film transistors (TFTs) has been investigated. The result shows that modifying the deposition conditions of a Si:H and $SiN_2$ thin films can reduce the stress mismatch at a-Si:H/SiNx interface. Moreover, for best a-Si:H TFT characteristics, the internal stress of gate $SiN_2$ layer with slightly nitrogen-rich should be matched with that of a-Si:H channel layer. The ON current, field-effect mobility, and stability of TFTs can be enhanced by controlling the stress match between a-Si:H and gate insulator. The improvement of these characteristics appears to be due to both the decrease of the interface state density between the a-Si:H and SiNx layer, and the good dielectric quality of the bottom nitride layer.

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Lamellar Structured TaN Thin Films by UHV UBM Sputtering (초고진공 UBM 스퍼터링으로 제조된 라멜라 구조 TaN 박막의 연구)

  • Lee G. R.;Shin C. S.;Petrov I.;Greene J, E.;Lee J. J.
    • Journal of the Korean institute of surface engineering
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    • v.38 no.2
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    • pp.65-68
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    • 2005
  • The effect of crystal orientation and microstructure on the mechanical properties of $TaN_x$ was investigated. $TaN_x$ films were grown on $SiO_2$ substrates by ultrahigh vacuum unbalanced magnetron sputter deposition in mixed $Ar/N_2$ discharges at 20 mTorr (2.67 Pa) and at $350^{\circ}C$. Unlike the Ti-N system, in which TiN is the terminal phase, a large number of N-rich phases in the Ta-N system could lead to layers which had nano-sized lamella structure of coherent cubic and hexagonal phases, with a correct choice of nitrogen fraction in the sputtering mixture and ion irradiation energy during growth. The preferred orientations and the micro-structure of $TaN_x$ layers were controlled by varing incident ion energy $E_i\;(=30eV\~50eV)$ and nitrogen fractions $f_{N2}\;(=0.1\~0.15)$. $TaN_x$ layers were grown on (0002)-Ti underlayer as a crystallographic template in order to relieve the stress on the films. The structure of the $TaN_x$ film transformed from Bl-NaCl $\delta-TaN_x$ to lamellar structured Bl-NaCl $\delta-TaN_x$ + hexagonal $\varepsilon-TaN_x$ or Bl-NaCl $\delta-TaN_x$ + hexagonal $\gamma-TaN_x$ with increasing the ion energy at the same nitrogen fraction $f_{N2}$. The hardness of the films also increased by the structural change. At the nitrogen fraction of $0.1\~0.125$, the structure of the $TaN_x$ films was changed from $\delta-TaN_x\;+\;\varepsilon-TaN_x\;to\;\delta-TaN_x\;+\;\gamma-TaN_x$ with increasing the ion energy. However, at the nitrogen fraction of 0.15 the film structure did not change from $\delta-TaN_x\;+\;\varepsilon-TaN_x$ over the whole range of the applied ion energy. The hardness increased significantly from 21.1 GPa to 45.5 GPa with increasing the ion energy.

Effects of Osmoprotectants on the Growth and Nitrogenase Activity of Rhizobium and Azospirillum under Osmotic Stress (질소고정균의 성장과 질소고정력에 대한 osmoprotectant의 영향)

  • Gal, Sang-Wan;Choi, Young-Ju
    • Applied Biological Chemistry
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    • v.41 no.1
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    • pp.53-59
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    • 1998
  • The Rhizobium and Azospirillum spp. were isolated from the root nodules of several leguminous plants and rhizosphere of various paddy rice varieties. The growth of the nitrogen-fixing strains isolated was largely inhibited in yeast extract-mannitol medium (AMA) containing 0.6 M NaCl. In response to osmotic stress, the nitrogen-fixing strains accumulate intracellular free glutamate. The growth and nitrogenase activity of Rhizobium and Azospirillum were increased by addition of osmoprotectants such as proline, glycine betaine, and glutamate during salt stress. Glycine betaine was the most effective among exogenous osmoprotectants tested. In the absence of sodium chloride, nitrogenase activity seem to be slightly decreased by the presence of the proline or glycine betaine. These results revealed that nitrogenase activity was repressed by fixed nitrogens such as proline or glycine betaine.

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1-Aminocyclopropane-1-Carboxylate Deaminase from Pseudomonas stutzeri A1501 Facilitates the Growth of Rice in the Presence of Salt or Heavy Metals

  • Han, Yunlei;Wang, Rui;Yang, Zhirong;Zhan, Yuhua;Ma, Yao;Ping, Shuzhen;Zhang, Liwen;Lin, Min;Yan, Yongliang
    • Journal of Microbiology and Biotechnology
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    • v.25 no.7
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    • pp.1119-1128
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    • 2015
  • 1-Aminocyclopropane-1-carboxylate (ACC) deaminase, which is encoded by some bacteria, can reduce the amount of ethylene, a root elongation inhibitor, and stimulate the growth of plants under various environmental stresses. The presence of ACC deaminase activity and the regulation of ACC in several rhizospheric bacteria have been reported. The nitrogen-fixing Pseudomonas stutzeri A1501 is capable of endophytic association with rice plants and promotes the growth of rice. However, the functional identification of ACC deaminase has not been performed. In this study, the proposed effect of ACC deaminase in P. stutzeri A1501 was investigated. Genome mining showed that P. stutzeri A1501 carries a single gene encoding ACC deaminase, designated acdS. The acdS mutant was devoid of ACC deaminase activity and was less resistant to NaCl and NiCl2 compared with the wild-type. Furthermore, inactivation of acdS greatly impaired its nitrogenase activity under salt stress conditions. It was also observed that mutation of the acdS gene led to loss of the ability to promote the growth of rice under salt or heavy metal stress. Taken together, this study illustrates the essential role of ACC deaminase, not only in enhancing the salt or heavy metal tolerance of bacteria but also in improving the growth of plants, and provides a theoretical basis for studying the interaction between plant growth-promoting rhizobacteria and plants.

Ultrathin Gate Oxide for ULSIMOS Device Applications

  • 황현상
    • Proceedings of the Korean Vacuum Society Conference
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    • 1998.02a
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    • pp.71-72
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    • 1998
  • 반도체 집적 공정의 발달로 차세대 소자용으로 30 A 이하의 극 박막 Si02 절연막이 요구되고 있으며, 현재 제품으로 50-70 A 두께의 절연막을 사용한 것이 발표되고 있다. 절연막의 두께가 앓아질수록 많은 문제가 발생할 수 있는데 그 예로 절연막의 breakdo때둥에 의한 신뢰성 특성의 악화, 절연막올 통한 direct tunneling leakage current, boron풍의 dopant 침투로 인한 소자 특성 ( (Threshold Voltage)의 불안, 전기적 stress하에서의 leakage current증가와 c charge-trap 및 피terface s쩌.te의 생성으로 인한 소자 특성의 변화 둥으로 요약 된다. 절연막의 특성올 개선하기 위해 여러 가지 새로운 공정들이 제안되었다. 그 예로, Nitrogen올 Si/Si02 계면에 doping하여 절연막의 특성을 개선하는 방법 으로 고온 열처 리 를 NH3, N20, NO 분위 기 에서 실시 하거 나, polysilicon 또는 s silicon 기판에 nitrogen올 이온 주입하여 열처리 하는 방법, 그리고 Plasma분 위기에서 Nitrogen 함유 Gas를 이용하여 nitrogen을 doping시키는 방법 둥이 연구되고 있다. 또한 Oxide cleaning 후 상온에서 성장되는 oxide를 최소화 하여 절연막의 특성올 개선하기 위하여 LOAD-LOCK을 이용하는 방법, C뼈피ng 공정의 개선올 통한 contamination 감소와 silicon surface roughness 감소 로 oxide 신뢰성올 개선하는 방법 둥이 있다. 구조적 인 측면 에 서 는 Polysilicon 의 g없n size 를 최 적 화하여 OxideIPolysilicon 의 계면 특성올 개선하는 연구와 Isolation및 Gate ETCH공정이 절연막의 특성에 미 치 는 영 향도 많이 연구되 고 있다 .. Plasma damage 가 Oxide 에 미 치 는 효과 를 제어하는 방법과 Deuterium열처리 퉁올 이용하여 Hot electron Stress하에서 의 MOS 소자의 Si/Si02 계면의 신뢰성을 개선하고 있다. 또한 극 박막 전연막의 신뢰성 특성올 통계적 분석올 통하여 사용 가능한 수명 올 예 측 하는 방법 과 Direct Tunneling Leakage current 를 고려 한 허 용 가농 한 동작 전 압 예측 및 Stress Induced Leakage Current 둥에 관해서 도 최 근 활발 한 연구가 진행되고 있다.

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