• Title/Summary/Keyword: Nickel plating

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Depositing Rate of Electroless Nickel Plating Bath Contained Triethanolamine as a Complexing Agent (트리에탄올아민을 錯化劑로 사용한 無電解니켈鍍金浴의 析出速度에 관한 硏究)

  • Yeo, Woon-Kwan
    • Journal of the Korean institute of surface engineering
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    • v.18 no.4
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    • pp.153-163
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    • 1985
  • In the electroless nickel plating bath which contained nickel sulfate, sodium hypophosphite, boric acid and triethanolamine, effect of their concentration on the rate of deposition was tested by gravimetric method and polarization method. The polarization method that polarize small range of voltage anodicaly and cathodicaly at the mixed potential in the electroless plating bath can calculate mixed current (depositing rate) from $i_{mp}=\frac {i}{\eta}\;\frac{RT}{nF}\;or\;i_{mp}=\frac{i}{\eta}\;\frac{1}{2.3}(\frac{b_a\;\;b_c}{b_c+b_a})$ Where $i_{mp}$ is the depositing current, i is the polarized current, ${\eta}$ is the polarized voltage, $b_a\;and\;b_c$ are the Tafel slop of anodic and cathodic polarization curves respectively. The calculated mixed current ($i_{mp}$) is proportional to the depositing rate obtained by gravimetric method and corresponded mostly to the real depositing rate by multifying supplementary constant. The polarization method can be used for founding inclination of reaction on various concentration of each composition. Decreasing or increasing concentration of triethanolaminc as a complexing agent , the depositing rate is decreased and when the bath contained 25-50mL/L of triethanoloamine, the depositing rate is increased. The depositing rate is increased with increasing the concentration of boric acid, and when the bath contained 0.5M of boric acid, the depositing rate is increased abruptly. The optimum composition of the electroless nickel bath was estimated 0.1M of nickel sulfate, 0.25M of sodium hypophosphite, 0.5M of boric acid, and 25-50mL/L of triethanalamine.

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A Study on the Pd-Ni Alloy Hydrogen Membrane using the Porous Nickel Metal Support (다공성 Ni 금속 지지체를 사용한 Pd-Ni 합금 수소 분리막 연구)

  • Kim Dong-Won;Um Ki-Youn;Kim Sang-Ho;Park Jong-Su
    • Journal of the Korean institute of surface engineering
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    • v.37 no.5
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    • pp.289-295
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    • 2004
  • A dense palladium-nikel (Pd-Ni) alloy composite membrane has been fabricated on microporous nickel support mixed with submicron/micron nickel powder instead of mesoporous stainless steel support. Plasma treatment process is introduced as pre-treatment process instead of HCI activation. Pd-Ni alloy composite membrane prepared by electro plating was fairly a uniform and dense surface morphology. The membrane was characterized by permeation experiments with hydrogen and nitrogen gases at temperature 773 K and pressure 2.2 psi. The results showed that hydrogen ($H_2$) permeance was 27 ml/$\textrm{cm}^2$ㆍatmㆍmin and hydrogen/ nitrogen ($_H2$$N_2$) selectivity was 8 at 773 K.

A Study on the Characteristics of Electroplated Nickel with Plating Conditions (도금 조건에 따른 니켈 전기도금층의 특성 변화에 관한 연구)

  • Kim, Go-Eun;Lee, Jae-Ho
    • Proceedings of the KIEE Conference
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    • 1998.07g
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    • pp.2539-2540
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    • 1998
  • The characteristics of the electroplated nickel were investigated for the MEMS applications. Nickel sulfate bath was used and saccharine was added as the brightener. The effects of the brightener concentration were investigated by comparison of the surface morphology and the hardness of the electroplated nickel. The polarization characteristics were also investigated. The best results were obtained at 1g/$\ell$ saccharin addition.

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Effect od solution composition on electroless Ni plating on PZT (PZT의 무전해 니켈도금의에 미치는 액조현성의 영향)

  • 김제경;이명훈;문경만
    • Journal of the Korean institute of surface engineering
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    • v.31 no.4
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    • pp.209-216
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    • 1998
  • It is well knownthat electroledd plating is the desirable surface treatment method which is being widely used to all kinds of material such as requiring corrosing resistance, wear resistance and conductivity, especially nonconductivity materials' surface plating. However, it is suggested that there are some problems that must be solved, for exaple, rate of plating, corrosion resistance, thickness of plating film etc. Therefore in this paper, when electroless nickel plating was performed on the PZT(Pb(Zr,Ti))with varying of solution composition such as NaOH, and $H_2NCH_2COOH$, the effect of the rate of plating and corrosion resistance were investigated.

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Residual Strain Characteristics of Nickel-coated FBG Sensors (니켈이 코팅된 FBG 센서의 잔류 변형률 특성)

  • Cho, Won-Jae;Hwang, A-Reum;Kim, Sang-Woo
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.41 no.7
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    • pp.613-620
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    • 2017
  • A metal-coated FBG (fiber Bragg grating) sensor has a memory effect, which can recall the maximum strains experienced by the structure. In this study, a nickel-coated FBG sensor was fabricated through electroless (i.e., chemical plating) and electroplating. A thickness of approximately $43{\mu}m$ of a nickel layer was achieved. Then, we conducted cyclic loading tests for the fabricated nickel-coated FBG sensors to verify their capability to produce residual strains. The results revealed that the residual strain induced by the nickel coating linearly increased with an increase in the maximum strain experienced by the sensor. Therefore, we verified that a nickel-coated FBG sensor has a memory effect. The fabrication methods and the results of the cycle loading test will provide basic information and guidelines in the design of a nickel-coated FBG sensor when it is applied in the development of structural health monitoring techniques.

Improvement of Electrical Properties by Controlling Nickel Plating Temperatures for All Solid Alumina Capacitors

  • Jeong, Myung-Sun;Ju, Byeong-Kwon;Oh, Young-Jei;Lee, Jeon-Kook
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.10a
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    • pp.25.2-25.2
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    • 2011
  • Recently, thin film capacitors used for vehicle inverters are small size, high capacitance, fast response, and large capacitance. But its applications were made up of liquid as electrolyte, so its capacitors are limited to low operating temperature range and the polarity. This research proposes using Ni-P alloys by electroless plating as the electrode instead of liquid electrode. Our substrate has a high aspect ratio and complicated shape because of anodic aluminum oxide (AAO). We used AAO because film thickness and effective surface area are depended on for high capacitance. As the metal electrode instead of electrolyte is injected into AAO, the film capacitor has advantages high voltage, wide operating temperature, and excellent frequency property. However, thin film capacitor made by electroless-plated Ni on AAO for full-filling into etched tunnel was limited from optimizing the deposition process so as to prevent open-through pore structures at the electroless plating owing to complicated morphological structure. In this paper, the electroless plating parameters are controlled by temperature in electroless Ni plating for reducing reaction rate. The Electrical properties with I-V and capacitance density were measured. By using nickel electrode, the capacitance density for the etched and Ni electroless plated films was 100 nFcm-2 while that for a film without any etch tunnel was 12.5 nFcm-2. Breakdown voltage and leakage current are improved, as the properties of metal deposition by electroless plating. The synthesized final nanostructures were characterized by scanning electron microscopy (SEM).

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The Effect of Barrel Vibration Intensity to the Plating Thickness Distribution

  • Lee, Jun-Ho;Roselle D. Llido
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 1999.10a
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    • pp.15-15
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    • 1999
  • In chip plating, several parameters must be taken into consideration. Current density, solution concentration, pH, solution temperature, components volume, chip and media ratio, barrel geometrical shape were most likely found to have an effect to the process yields. The 3 types of barrels utilized in chip plating industry are the conventional rotating barrel. vibrational barrel (vibarrel), and the centrifugal type. Conventional rotating barrel is a close type and is commonly used. The components inside the barrel are circulated by the barrel's rotation at a horizontal axis. Process yield has known to have higher thickness deviation. The vibrational barrel is an open type which offers a wide exposure to electrolyte resulting to a stable thickness deviation. It rotates in a vertical axis coupled with multi-vibration action to facilitate mixed up and easy transportation of components, The centrifugal barrel has its plated work centrifugally compacted against the cathode ring for superior electrical contact with simultaneous rotary motion. This experiment has determined the effect of barrel vibration intensity to the plating thickness distribution. The procedures carried out in the experiment involved the overall plating process., cleaning, rinse, Nickel plating, Tin-Lead plating. Plating time was adjusted to meet the required specification. All other parameters were maintained constant. Two trials were performed to confirm the consistency of the result. The thickness data of the experiment conducted showed that the average mean value obtained from higher vibrational intensity is nearer to the standard mean. The distribution curve shown has a narrower specification limits and it has a reduced variation around the target value, Generally, intensity control in vi-barrel facilitates mixed up and easy transportation of components, However, it is desirable to maintain an optimum vibration intensity to prevent solution intrusion into the chips' internal electrode. A cathodic reaction can occur in the interface of the external and internal electrode. $2HD{\;}+{\;}e{\;}{\rightarrow}20H{\;}+{\;}H_2$ Hydrogen can penetrate into the body and create pressure which can cause cracks. At high intensity, the chip's motion becomes stronger, its contact between each other is delayed and so plating action is being controlled. However, the strong impact created by its collision can damage the external electrode's structure thereby resulting to bad plating condition. 1 lot of chip was divided into two equal partion. Each portion was loaded to the same barrel one after the other. Nickel plating and tin-lead plating was performed in the same station. Portion A maintained the normal barrel vibration intensity and portion B vibration intensity was increased two steps higher. All other parameters, current, solution condition were maintained constant. Generally, plating method find procedures were carried out in a best way to maintained the best plating condition. After plating, samples were taken out from each portion. molded and polished. Plating thickness was investigated for both. To check consistency of results. 2nd trial was done now using different lot of another characteristics.

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A Study on the Fabrication of Porous Nickel Substrates Using Graphite Powder (흑연분말을 이용한 다공성 니켈지지체의 제조에 관한 연구)

  • 박성용;백지흠;조원일;조병원;윤경석
    • Journal of the Korean institute of surface engineering
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    • v.28 no.5
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    • pp.276-288
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    • 1995
  • A nickel mesh and an expanded nickel sheet were used as a current collector for supporting active materials of cathode in rechargeable batteries, while a porous nickel substrate was extensively studied because of its 3-dimensional structure which has high capabilities for active materials and current collection. Optimum coating conditions were studied by SEM and two step d. c. constant current electrolysis for the graphite coating and electro-plated nickel on an urethane substance which was highly porous and 3-dimensional structure. The density and the porosity of nickel support obtained by using two step current density and 80 ppi urethane substance were 0.38∼0.40 g /㎤ and 94∼96%, respectively. It was possible to fabricate a highly porous and good packable nickel substrate using two step current density and surfactants at sulfamic acid nickel plating bath.

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Fabrication of nano pattern using the injection molding (사출성형을 이용한 미세 패턴 성형)

  • Lee, Kwan-Hee;Yoo, Yeong-Eun;Kim, Sun-Kyoung;Kim, Tae-Hoon;Je, Tae-Jin;Choi, Doo-Sun
    • Proceedings of the KSME Conference
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    • 2007.05a
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    • pp.1532-1536
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    • 2007
  • A plastic substrate with tiny rectangular pillars less than 100nm is injection molded to study pattern replication in injection molding. The size of the substrate is 50mm ${\times}$ 50mm and 1mm thick. The substrate has 9 patterned areas of which size is 2mm ${\times}$ 2mm respectively. The lengths of the pillars are 50nm, 100nm, 150nm and 200nm and the width and height are 50nm and about 100nm respectively. A pattern master is fabricated by e-beam writing using positive PR(photo resist) and then a nickel stamper replicated from the PR master by nickel electro-plating. Cr is deposited on the PR pattern master before nickel electro-plating as a conducting layer. Using this nickel stamper, several injection molding experiments are done to investigate effects of the injection molding parameters such as mold temperature, injection rate, packing pressure or pattern location on the replication of the patterns under 100nm.

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Selective Contact Hole Filling by Electroless Ni Plating (무전해Ni도금에 의한 선택적 CONTACT HOLE 충진)

  • 김영기;우찬희;박종완;이원해
    • Proceedings of the Materials Research Society of Korea Conference
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    • 1992.05b
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    • pp.26-27
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    • 1992
  • The effect of activation and electroless nickel plating conditions on contact properties were investigated for selective electroless nickel plating of Si farers in order to obtain an optimum condition of contact hole filling. According to RCA prosess, p-type si 1 icon (100) surface was cleaned out and activated. The effects of temperture, DMAB concentration, time, and stirring iwere investigated for activation of p-type Si(100) surface. The optimal activation condition obtained was 0.5M HF, 1mM PdCl$_2$, 2mM EDTA, 7$0^{\circ}C$, 90sec under ultrasonic vibration. In electroless nickel plating, the effect of temperature, DMAB concentration, pH, and plating ti me were studied. The optimal plating condition found was 0. 10M NiS0$_4$.$H_2O$, 0.lIM Citrate, pH 6.8, 6$0^{\circ}C$, 30 minutes. The contact resistence of fi]ms wascomparatively low. It took 30 minutes to obtain 1$\mu$m thick film with 8$\mu$M DMAB concentration. The film surface roughness was improved with increasing temperature and decreasing pH of the plating solution. The best quality of the film was obtained with the condition of temperature 6$0^{\circ}C$ and pH 6.8. The micro-victors hardness of film was about 600Hv and was decreased wi th increasing particle size of plating layer.

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